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155 条记录 (耗时 0.045 秒)

    Systems for protecting internal components of an EUV light source from plasma-generated debris
    83.
    发明授权
    Systems for protecting internal components of an EUV light source from plasma-generated debris 失效

    公开(公告)号：US07247870B2

    公开(公告)日：2007-07-24

    申请号：US11512822

    申请日：2006-08-30

    申请人： Alexander I. Ershov ,  William N. Partlo

    发明人： Alexander I. Ershov ,  William N. Partlo

    IPC分类号： G01J3/10

    CPC分类号： G03F7/70925 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70916 ,  G21K2201/06 ,  H05G2/001

    摘要： Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least one hollow tube positioned between the optical element and a plasma formation site. The tube is oriented to capture debris while allowing light to pass through the tube's lumen via reflection at relatively small angles of grazing incidence. In another aspect of an embodiment of the present invention, a shield is disclosed which is heated to a temperature sufficient to remove one or more species of debris material that has deposited on the shield. In yet another aspect of an embodiment of the present invention, a system is disclosed which a shield is moved from a light source plasma chamber to a cleaning chamber where the shield is cleaned.

    Collector for EUV light source
    84.
    发明授权
    Collector for EUV light source 有权
    EUV光源收集器

    公开(公告)号：US07217940B2

    公开(公告)日：2007-05-15

    申请号：US10798740

    申请日：2004-03-10

    申请人： William N. Partlo ,  John Martin Algots ,  Gerry M. Blumenstock ,  Norbert Bowering ,  Alexander I. Ershov ,  Igor V. Fomenkov ,  Xiaojiang Pan

    发明人： William N. Partlo ,  John Martin Algots ,  Gerry M. Blumenstock ,  Norbert Bowering ,  Alexander I. Ershov ,  Igor V. Fomenkov ,  Xiaojiang Pan

    IPC分类号： H01J35/20

    CPC分类号： H05G2/001 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062

    摘要： A method and apparatus for debris removal from a reflecting surface of an EUV collector in an EUV light source is disclosed which may comprise the reflecting surface comprises a first material and the debris comprises a second material and/or compounds of the second material, the system and method may comprise a controlled sputtering ion source which may comprise a gas comprising the atoms of the sputtering ion material; and a stimulating mechanism exciting the atoms of the sputtering ion material into an ionized state, the ionized state being selected to have a distribution around a selected energy peak that has a high probability of sputtering the second material and a very low probability of sputtering the first material. The stimulating mechanism may comprise an RF or microwave induction mechanism.

    摘要翻译： 公开了一种用于从EUV光源中的EUV收集器的反射表面去除碎屑的方法和装置，其可以包括反射表面，其包括第一材料，并且所述碎屑包括第二材料和/或第二材料的化合物，所述系统 并且方法可以包括受控的溅射离子源，其可以包括包含溅射离子材料的原子的气体; 以及将溅射离子材料的原子激发成离子化状态的刺激机构，所选择的离子化状态具有围绕选择的能量峰的分布，其具有溅射第二材料的可能性很高，并且溅射的可能性非常低 材料。 刺激机构可以包括RF或微波感应机构。

    Relax gas discharge laser lithography light source
    86.
    发明授权
    Relax gas discharge laser lithography light source 有权
    放气放电激光光刻光源

    公开(公告)号：US07088758B2

    公开(公告)日：2006-08-08

    申请号：US10956784

    申请日：2004-10-01

    申请人： Richard L. Sandstrom ,  William N. Partlo ,  Daniel J. W. Brown ,  Thomas A. Yager ,  Alexander I. Ershov ,  Robert J. Rafac ,  German E. Rylov

    发明人： Richard L. Sandstrom ,  William N. Partlo ,  Daniel J. W. Brown ,  Thomas A. Yager ,  Alexander I. Ershov ,  Robert J. Rafac ,  German E. Rylov

    IPC分类号： H01S3/22

    CPC分类号： G01J1/429 ,  B23K26/0622 ,  B23K2101/40 ,  G01J9/02 ,  G02B26/002 ,  G02B26/0875 ,  G03F7/70041 ,  G03F7/70575 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/1055 ,  H01S3/225

    摘要： An apparatus and method are disclosed for operating a narrow band short pulse duration gas discharge laser output light pulse beam producing system, producing a beam comprising laser output light pulses at a selected pulse repetition rate, which may comprise: a dispersive center wavelength selection optic selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a tuning mechanism operative to select at least one angle of incidence of a first spatially defined portion of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic; and, the tuning mechanism comprising a variably refractive optical element defining a plurality of refractive angular displacements of the first spatially defined portion of the laser light pulse beam passing through the variably refractive optical element at one of a plurality of positions of incidence of the laser light pulse beam on the variably refractive optical element. The variably refractive optical element may comprise: a first generally flat face defining a surface of incidence for the laser light pulse beam; and, a second multifaceted or curved face defining a plurality of generally flat surfaces of exit or a continuously varying surface of exit for the laser light beam. Other aspects of pulse parameter metrology and pulse modulation control, including in response to signals from the utilization tool are disclosed, e.g., relating to proper dose control with differing center wavelength spectra.

    摘要翻译： 公开了一种用于操作窄带短脉冲持续时间气体放电激光输出光脉冲束产生系统的装置和方法，产生包括选定脉冲重复频率的激光输出光脉冲的光束，其可以包括：色散中心波长选择光学选择 用于每个脉冲的至少一个中心波长至少部分地由分散波长选择光学器件上包含相应脉冲的激光束的入射角确定; 调谐机构，用于在色散中心波长选择光学器件上选择包含相应脉冲的激光束脉冲光束的第一空间限定部分的至少一个入射角; 并且所述调谐机构包括可变折射光学元件，所述可变折射光学元件限定所述激光束的所述第一空间限定部分的多个折射角位移通过所述可变折射光学元件在所述激光的入射的多个位置中的一个位置 脉冲光束在可变折射光学元件上。 可变折射光学元件可以包括：限定用于激光束脉冲束的入射面的第一大致平坦的面; 以及限定用于激光束的出口的多个大致平坦的表面或出口的连续变化的表面的第二多面或弯曲面。 脉冲参数测量和脉冲调制控制的其它方面包括响应来自利用工具的信号，例如涉及具有不同中心波长光谱的适当剂量控制。

    Convolution method for measuring laser bandwidth
    88.
    发明授权
    Convolution method for measuring laser bandwidth 有权

    公开(公告)号：US06603549B2

    公开(公告)日：2003-08-05

    申请号：US09931726

    申请日：2001-08-16

    申请人： Steven F. Haas ,  Richard L. Sandstrom ,  Thomas Hofmann ,  Alexander I. Ershov

    发明人： Steven F. Haas ,  Richard L. Sandstrom ,  Thomas Hofmann ,  Alexander I. Ershov

    IPC分类号： G01J318

    CPC分类号： G01J3/26 ,  G01J1/4257 ,  G01J3/02 ,  G01J3/027 ,  G01J3/12 ,  G01J3/1809 ,  G01J3/22 ,  G01J3/28 ,  G01J9/02

    摘要： A simple, reliable, easy to use method for calculating bandwidth data of very narrow band laser beams based on bandwidth data obtained with a spectrometer in circumstances where the laser bandwidths are not large compared to the slit function of the spectrometer. The slit function of the spectrometer is determined. Spectral data of the laser beam is measured with the spectrometer to produce a measured laser beam spectrum which represents a convolution of the laser beam spectrum and the spectrometer slit function. This measured laser spectrum is then mathematically convolved with the slit function of the spectrometer to produce a doubly convolved spectrum. Bandwidth values representing true laser bandwidths are determined from measured laser spectrum and the doubly convolved spectrum. Preferably the true laser bandwidths are calculated by determining the difference between “twice a measured laser bandwidth” and a corresponding “doubly convolved bandwidth”. This method provides an excellent estimate of the true laser bandwidth because “twice the measured laser bandwidth” represents two laser bandwidths and two spectrometer slit function bandwidths and the “doubly convolved bandwidth” represents one laser bandwidth and two spectrometer slit function bandwidths. Thus, the difference is a representation of the true laser bandwidth. In a preferred embodiment the bandwidth parameters measured are the full width half-maximum bandwidth and the 95% integral bandwidth.

    High power excimer laser with a pulse stretcher
    89.
    发明授权
    High power excimer laser with a pulse stretcher 有权
    具有脉冲担架的大功率准分子激光器

    公开(公告)号：US07564888B2

    公开(公告)日：2009-07-21

    申请号：US11805583

    申请日：2007-05-23

    申请人： Alexander I. Ershov ,  James J. Ferrell ,  Thomas Hofmann ,  Daniel J. Reiley ,  Christopher R. Remen ,  Richard L. Sandstrom

    发明人： Alexander I. Ershov ,  James J. Ferrell ,  Thomas Hofmann ,  Daniel J. Reiley ,  Christopher R. Remen ,  Richard L. Sandstrom

    IPC分类号： H01S3/22 ,  H01S3/10

    CPC分类号： H01S3/225 ,  H01S3/0057 ,  H01S3/03 ,  H01S3/034

    摘要： An apparatus and method is disclosed which may comprise a high power excimer or molecular fluorine gas discharge laser DUV light source system which may comprise: a pulse stretcher which may comprise: an optical delay path mirror, an optical delay path mirror gas purging assembly which may comprise: a purging gas supply system directing purging gas across a face of the optical delay line mirror. The optical delay path mirror may comprise a plurality of optical delay path mirrors; the purging gas supply system may direct purging gas across a face of each of the plurality of optical delay line mirrors. The purging gas supply system may comprise: a purging gas supply line; a purging gas distributing and directing mechanism which may direct purging gas across the face of the respective optical delay path mirror.

    摘要翻译： 公开了一种装置和方法，其可以包括高功率准分子或分子氟气体放电激光DUV光源系统，其可以包括：脉冲展宽器，其可以包括：光学延迟路径反射镜，光学延迟路径镜气体清洗组件，其可以 包括：吹扫气体供应系统，其引导净化气体穿过光学延迟线反射镜的表面。 光学延迟路径镜可以包括多个光学延迟路径镜; 净化气体供应系统可以引导净化气体穿过多个光学延迟线反射镜中的每一个的表面。 净化气体供应系统可以包括：净化气体供应管线; 吹扫气体分配和引导机构，其可以将吹扫气体引导通过相应的光学延迟路径反射镜的表面。

    ArF laser with low pulse energy and high rep rate
    90.
    发明授权
    ArF laser with low pulse energy and high rep rate 有权
    ArF激光器具有低脉冲能量和高重现率

    公开(公告)号：US06553049B1

    公开(公告)日：2003-04-22

    申请号：US09451750

    申请日：1999-11-30

    申请人： Herve A. Besaucele ,  Jean-Marc Hueber ,  Alexander I. Ershov ,  Thomas Hofmann ,  Vladimir B. Fleurov

    发明人： Herve A. Besaucele ,  Jean-Marc Hueber ,  Alexander I. Ershov ,  Thomas Hofmann ,  Vladimir B. Fleurov

    IPC分类号： H01S322

    CPC分类号： G01J9/0246 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70358 ,  G03F7/70558 ,  G03F7/70575 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/0971 ,  H01S3/1055 ,  H01S3/1392 ,  H01S3/225

    摘要： A reliable modular production quality ArF excimer laser capable of producing laser pulses at repetition rates in the range of 3,000 to 4,000 Hz or greater with pulse energies in the range of about 2 mJ to 5 mJ or greater with a full width half, maximum bandwidth of about 0.4 pm or less and dose stability of less than 0.4 percent. Using this laser as an illumination source, stepper or scanner equipment can produce integrated circuit resolution of 0.10 &mgr;m (100 nm) or less. Replaceable modules include a laser chamber; a modular pulse power system; and a line narrowing module. For a given laser power output, the higher repetition rate provides two important advantages. The lower per pulse energy means less optical damage and the larger number of pulses for a specified illumination dose means better dose stability.

    摘要翻译： 可靠的模块化生产质量的ArF准分子激光器，其能够以3,000至4,000Hz或更大的重复频率产生激光脉冲，脉冲能量在约2mJ至5mJ或更大的范围内，具有全宽度的一半，最大带宽 约0.4μm或更小，剂量稳定性小于0.4％。 使用该激光器作为照明源，步进器或扫描仪设备可以产生0.10mum（100nm）或更小的集成电路分辨率。 可更换模块包括激光室; 模块式脉冲电源系统; 和线条缩小模块。 对于给定的激光功率输出，较高的重复率提供了两个重要的优点。 较低的每脉冲能量意味着更少的光学损伤，并且指定照射剂量的较大数量的脉冲表示更好的剂量稳定性。