摘要:
A three-dimensional object is manufactured from a powder of polymer material by selective sintering process by means of electromagnetic radiation of the powder, wherein the powder comprises a preselected polymer or copolymer and is subjected to selective sintering such that the manufactured three-dimensional object has a final crystallinity which is in such a range that the balance of properties, in particular mechanical properties including Young's modulus, tensile strength and elongation at break, is improved.
摘要:
A three-dimensional object is manufactured from a powder of polymer material by selective sintering process by means of electromagnetic radiation of the powder, wherein the powder comprises a preselected polymer or copolymer and is subjected to selective sintering such that the manufactured three-dimensional object has a final crystallinity which is in such a range that the balance of properties, in particular mechanical properties including Young's modulus, tensile strength and elongation at break, is improved.
摘要:
A composite pipe comprises a polyetheretherketone innermost pipe around which a reinforcing overwrap is arranged. A protective sheath surrounds the overwrap. Such a composite pipe may be made by selecting a polyetheretherketone pipe having an outer region having a crystallinity of less than 25%; overlaying the selected pipe with overwrap; and subjecting the combination to heat, thereby causing the crystallinity of the outer region of the polyetheretherketone pipe to increase. The method reduces the risk of pipe failure.
摘要:
A polyetheretherketone pipe of length greater than 250 meters and a residual stress of less than 5 MPa may be made using a calibrator device (2) which includes a cone shaped opening (6) arranged to receive a molten extruded pipe shaped polymer. Attached to the front member (4) is a vacuum plate (14a) and successive vacuum plates (14b-14h) are attached to one another to define an array of vacuum plates, the vacuum plates being arranged to allow a vacuum to be applied to a pipe precursor passing through opening (16). The vacuum plates (14) also include (10) temperature control means for heating or cooling the plates and therefore heating or cooling a pipe precursor passing through the openings. With a vacuum applied to opening (6, 16) and heating/cooling the plates, an extruded hot plastics pipe is inserted into calibrator (2) via opening (6) and conveyed through opening (16) in plates (14), whereupon it is urged by the vacuum against the cylindrical surface defined by plates (14) to maintain its shape and the (15) temperature of each plate is controlled to control the rate of cooling of the pipe precursor passing through. The pipe may be cooled at a relatively slow rate so that a pipe made from a relatively fast crystallizing polymer crystallizes and the crystallinity of the pipe along its extent and throughout its thickness is substantially constant.
摘要:
A composite pipe comprises a polyetheretherketone innermost pipe around which a reinforcing overwrap is arranged. A protective sheath surrounds the overwrap. Such a composite pipe may be made by selecting a polyetheretherketone pipe having an outer region having a crystallinity of less than 25%; overlaying the selected pipe with overwrap; and subjecting the combination to heat, thereby causing the crystallinity of the outer region of the polyetheretherketone pipe to increase. The method reduces the risk of pipe failure.
摘要:
A polyetheretherketone pipe of length greater than 250 meters and a residual stress of less than 5 MPa may be made using a calibrator device (2) which includes a cone shaped opening (6) arranged to receive a molten extruded pipe shaped polymer. Attached to the front member (4) is a vacuum plate (14a) and successive vacuum plates (14b-14h) are attached to one another to define an array of vacuum plates, the vacuum plates being arranged to allow a vacuum to be applied to a pipe precursor passing through opening (16). The vacuum plates (14) also include (10) temperature control means for heating or cooling the plates and therefore heating or cooling a pipe precursor passing through the openings. With a vacuum applied to opening (6, 16) and heating/cooling the plates, an extruded hot plastics pipe is inserted into calibrator (2) via opening (6) and conveyed through opening (16) in plates (14), whereupon it is urged by the vacuum against the cylindrical surface defined by plates (14) to maintain its shape and the (15) temperature of each plate is controlled to control the rate of cooling of the pipe precursor passing through. The pipe may be cooled at a relatively slow rate so that a pipe made from a relatively fast crystallising polymer crystalises and the crystallinity of the pipe along its extent and throughout its thickness is substantially constant.
摘要:
A semiconductor component includes a semiconductor substrate having a substrate contact, and a through wire interconnect (TWI) bonded to the substrate contact. The through wire interconnect (TWI) includes a via through the substrate contact and the substrate, a wire in the via bonded to the substrate contact, and a contact on the wire. A stacked semiconductor component includes the semiconductor substrate, and a second semiconductor substrate stacked on the substrate and bonded to a through wire interconnect on the substrate. A method for fabricating a semiconductor component with a through wire interconnect includes the steps of providing a semiconductor substrate with a substrate contact, forming a via through the substrate contact and part way through the substrate, placing the wire in the via, bonding the wire to the substrate contact, and then thinning the substrate from a second side to expose a contact on the wire. A system for fabricating the semiconductor component includes a bonding capillary configured to place the wire in the via, and to form a bonded connection between the wire and the substrate contact.
摘要:
A reusable burn-in/test fixture for testing unsingulated dice on a semiconductor wafer consists of two halves. The first half of the test fixture is a wafer cavity plate for receiving the wafer, and the second half establishes electrical communication between the wafer and electrical testing equipment. A rigid substrate has conductors thereon which establish electrical contact with the wafer. The test fixture need not be opened until the burn-in and electrical testing are completed. After burn-in stress and electrical testing, it is possible to establish interconnection between the single die or separate and package dice into discrete parts, arrays or clusters, either as singulated parts or as arrays.
摘要:
Methods for forming conductive vias include forming one or more via holes in a substrate. The via holes may be formed with a single mask, with the protective layers, bond pads, or other features of the substrate acting as hard masks in the event that a photomask is removed during etching processes. The via holes may be configured to facilitate adhesion of a dielectric coating that includes a low-K dielectric material to the surfaces thereof. A barrier layer may be formed over surfaces of each via hole. A base layer, which may comprise a seed material, may be formed to facilitate the subsequent, selective deposition of conductive material over the surfaces of the via hole. The resulting semiconductor devices, intermediate structures, and assemblies and electronic devices that include the semiconductor devices that result from these methods are also disclosed.
摘要:
Microelectronic imager assemblies comprising a workpiece including a substrate and a plurality of imaging dies on and/or in the substrate. The substrate includes a front side and a back side, and the imaging dies comprise imaging sensors at the front side of the substrate and external contacts operatively coupled to the image sensors. The microelectronic imager assembly further comprises optics supports superimposed relative to the imaging dies. The optics supports can be directly on the substrate or on a cover over the substrate. Individual optics supports can have (a) an opening aligned with one of the image sensors, and (b) a bearing element at a reference distance from the image sensor. The microelectronic imager assembly can further include optical devices mounted or otherwise carried by the optics supports.