Abstract:
A device includes a redistribution line, and a polymer region molded over the redistribution line. The polymer region includes a first flat top surface. A conductive region is disposed in the polymer region and electrically coupled to the redistribution line. The conductive region includes a second flat top surface not higher than the first flat top surface.
Abstract:
A semiconductor device and method that comprise a first dielectric layer over a encapsulant that encapsulates a via and a semiconductor die is provided. A redistribution layer is over the first dielectric layer, and a second dielectric layer is over the redistribution layer, and the second dielectric layer comprises a low-temperature polyimide material.
Abstract:
A chip package may include a die and a redistribution structure over the die. The redistribution structure may include a die, a redistribution structure over the die, and an under-bump metallurgy (UBM) structure over the redistribution structure. The UBM structure may include a central portion, a peripheral portion physically separated from and surrounding a perimeter of the central portion, and a bridging portion having a first end and a second end opposite the first end. The first end of the bridging portion may be coupled to the central portion of the UBM structure, while the second end of the bridging portion may be coupled to the peripheral portion of the UBM structure.
Abstract:
The embodiments described above provide enlarged overlapping surface areas of bonding structures between a package and a bonding substrate. By using elongated bonding structures on either the package and/or the bonding substrate and by orienting such bonding structures, the bonding structures are designed to withstand bonding stress caused by thermal cycling to reduce cold joints.
Abstract:
The embodiments described above provide enlarged overlapping surface areas of bonding structures between a package and a bonding substrate. By using elongated bonding structures on either the package and/or the bonding substrate and by orienting such bonding structures, the bonding structures are designed to withstand bonding stress caused by thermal cycling to reduce cold joints.
Abstract:
The embodiments described provide elongated bonded structures near edges of packaged structures free of solder wetting on sides of copper posts substantially facing the center of the packaged structures. Solder wetting occurs on other sides of copper posts of these bonded structures. The elongated bonded structures are arranged in different arrangements and reduce the chance of shorting between neighboring bonded structures. In addition, the elongated bonded structures improve the reliability performance.
Abstract:
An apparatus includes an integrated circuit having at least one input/output terminal comprising copper formed thereon. A metal cap layer overlies an upper surface of the at least one input/output terminal. A substrate includes at least one conductive trace formed on a first surface, and a metal finish layer overlies a portion of the at least one conductive trace. A lead free solder connection is disposed between the metal cap layer and the metal finish layer, and a first intermetallic compound is disposed at an interface between the metal cap layer and the lead free solder connection. The lead free solder connection has a copper content of less than 0.5 wt. %, and the first intermetallic compound is substantially free of copper.
Abstract:
Methods and apparatus for flip chip substrates with guard rings. An embodiment comprises a substrate core with a die attach region for attaching an integrated circuit die; at least one dielectric layer overlying a die side surface of the substrate core; and at least one guard ring formed adjacent a corner of the substrate core, the at least one guard ring comprising: a first trace overlying the dielectric layer having rectangular portions extending in two directions from the corner of the substrate core and in parallel to the edges of the substrate core; a second trace underlying the dielectric layer; and at least one via extending through the dielectric layer and coupling the first and second traces; wherein the first trace, the at least one via, and the second trace form a vertical via stack. Methods for forming the flip chip substrates with the guard rings are disclosed.
Abstract:
A structure comprises a top metal connector formed underneath a bond pad. The bond pad is enclosed by a first passivation layer and a second passivation layer. A polymer layer is further formed on the second passivation layer. The dimension of an opening in the first passivation layer is less than the dimension of the top metal connector. The dimension of the top metal connector is less than the dimensions of an opening in the second passivation layer and an opening in the polymer layer.
Abstract:
An integrated circuit structure includes a semiconductor chip having a first region and a second region; a dielectric layer formed on the first region and the second region of the semiconductor chip; a first elongated under-bump metallization (UBM) connector formed in the dielectric layer and on the first region of the semiconductor chip and having a first longer axis extending in a first direction; and a second elongated UBM connector formed in the dielectric layer on the second region of the semiconductor chip and having a second longer axis extending in a second direction. The first direction is different from the second direction.