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公开(公告)号:CN105517947A
公开(公告)日:2016-04-20
申请号:CN201380079527.1
申请日:2013-09-13
申请人: EV集团E·索尔纳有限责任公司
发明人: M.温普林格
CPC分类号: H01L24/83 , B81C3/001 , B81C2203/036 , H01L24/29 , H01L24/32 , H01L2224/29082 , H01L2224/291 , H01L2224/29105 , H01L2224/29111 , H01L2224/29116 , H01L2224/29117 , H01L2224/29118 , H01L2224/29123 , H01L2224/29124 , H01L2224/29139 , H01L2224/29144 , H01L2224/29147 , H01L2224/29155 , H01L2224/29157 , H01L2224/2916 , H01L2224/29166 , H01L2224/29169 , H01L2224/29171 , H01L2224/29184 , H01L2224/32145 , H01L2224/32507 , H01L2224/8302 , H01L2224/83022 , H01L2224/8381 , H01L2224/83894 , H01L2924/01003 , H01L2924/01005 , H01L2924/01011 , H01L2924/01012 , H01L2924/01019 , H01L2924/0102 , H01L2924/01034 , H01L2924/01037 , H01L2924/01038 , H01L2924/0105 , H01L2924/01052 , H01L2924/01055 , H01L2924/01056 , H01L2924/01322 , H01L2924/10251 , H01L2924/10252 , H01L2924/10253 , H01L2924/1026 , H01L2924/10271 , H01L2924/10272 , H01L2924/10323 , H01L2924/10328 , H01L2924/10329 , H01L2924/1033 , H01L2924/10331 , H01L2924/10332 , H01L2924/10333 , H01L2924/10334 , H01L2924/10335 , H01L2924/10336 , H01L2924/10346 , H01L2924/1037 , H01L2924/10371 , H01L2924/10372 , H01L2924/10373 , H01L2924/10375 , H01L2924/10376 , H01L2924/10377 , H01L2924/10821 , H01L2924/10823 , H01L2924/10831 , H01L2924/00 , H01L2924/00014 , H01L2924/01032 , H01L2924/01013 , H01L2924/01031 , H01L2924/0103
摘要: 本发明涉及一种用于将由基本层及保护层组成的接合层施加到基板上的方法,其具有以下方法步骤:将可氧化的基本材料作为基本层施加到该基板的接合侧上,用可至少部分地溶解于该基本材料中的保护材料作为保护层来至少部分地覆盖该基本层。另外,本发明涉及一种相应的基板。
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公开(公告)号:CN106660153A
公开(公告)日:2017-05-10
申请号:CN201580046808.6
申请日:2015-07-15
申请人: 阿尔法装配解决方案公司
IPC分类号: B23K1/00 , B23K1/002 , B23K1/005 , B23K1/08 , B23K35/00 , B23K35/14 , B23K35/26 , C22C13/00 , C22C13/02
CPC分类号: B23K35/262 , B23K1/0016 , B23K1/002 , B23K1/0056 , B23K1/085 , B23K35/00 , B23K35/0222 , B23K35/0227 , B23K35/0233 , B23K35/0238 , B23K35/0244 , B23K35/025 , B23K35/26 , B23K2101/40 , B23K2101/42 , C22C13/00 , C22C13/02 , H01L24/29 , H01L24/83 , H01L2224/29101 , H01L2224/29105 , H01L2224/29109 , H01L2224/29111 , H01L2224/29113 , H01L2224/29117 , H01L2224/29123 , H01L2224/29124 , H01L2224/29138 , H01L2224/29139 , H01L2224/29144 , H01L2224/29147 , H01L2224/29149 , H01L2224/29155 , H01L2224/29157 , H01L2224/2916 , H01L2224/29163 , H01L2224/29166 , H01L2224/29169 , H01L2224/29171 , H01L2224/29172 , H01L2224/2918 , H01L2224/83815 , H01L2924/01015 , H01L2924/0102 , H01L2924/01032 , H01L2924/01034 , H01L2924/01052 , H01L2924/01058
摘要: 无铅无锑的焊料合金,其包含:(a)从1至4重量%银(b)从0.5至6重量%铋(c)从3.55至15重量%铟(d)3重量%或更少的铜(e)任选地下列元素中的一种或多种:0至1重量%镍、0至1重量%的钛、0至1重量%锰、0至1重量%的稀土(例如铈)、0至1重量%的铬、0至1重量%锗、0至1重量%的镓、0至1重量%的钴、0至1重量%的铁、0至1重量%的铝、0至1重量%的磷、0至1重量%的金、0至1重量%的碲、0至1重量%的硒、0至1重量%的钙、0至1重量%的钒、0至1重量%的钼、0至1重量%的铂、0至1重量%的镁(f)余量为锡连同任何不可避免的杂质。
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公开(公告)号:CN106575628A
公开(公告)日:2017-04-19
申请号:CN201580043705.4
申请日:2015-10-09
申请人: 三菱电机株式会社
CPC分类号: H01L24/45 , H01L23/373 , H01L23/48 , H01L24/09 , H01L24/33 , H01L24/48 , H01L24/49 , H01L24/85 , H01L2224/05552 , H01L2224/05647 , H01L2224/29101 , H01L2224/29109 , H01L2224/29111 , H01L2224/29123 , H01L2224/29124 , H01L2224/32225 , H01L2224/34 , H01L2224/37124 , H01L2224/37599 , H01L2224/45014 , H01L2224/45015 , H01L2224/45032 , H01L2224/45124 , H01L2224/45147 , H01L2224/48091 , H01L2224/48227 , H01L2224/48472 , H01L2224/48491 , H01L2224/48647 , H01L2224/49111 , H01L2224/49113 , H01L2224/49433 , H01L2224/73265 , H01L2224/83447 , H01L2224/83801 , H01L2224/85075 , H01L2224/85205 , H01L2924/00014 , H01L2924/2076 , H01L2224/05599 , H01L2224/45099 , H01L2924/00012 , H01L2924/014
摘要: 关于使铝与铜重叠而进行压焊而成的包层材料,通过利用超声波接合等将包层材料的铝侧接合于功率半导体元件的电极表面并在包层材料的铜侧进行线接合,而形成电路。进而预先在比功率半导体元件的动作温度高的温度下对包层材料进行热处理,从而在接合处理后在铝以及铜的各个界面充分地形成金属间化合物,以避免膜厚生长。
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公开(公告)号:CN104617067A
公开(公告)日:2015-05-13
申请号:CN201410613709.9
申请日:2014-11-04
申请人: 开益禧株式会社
IPC分类号: H01L23/48 , H01L23/49 , H01L23/495
CPC分类号: H01L23/49531 , H01L23/4827 , H01L23/49513 , H01L23/49575 , H01L23/49582 , H01L24/05 , H01L24/29 , H01L24/32 , H01L24/83 , H01L24/85 , H01L24/92 , H01L2224/04026 , H01L2224/05073 , H01L2224/05082 , H01L2224/05155 , H01L2224/05166 , H01L2224/05172 , H01L2224/05617 , H01L2224/0562 , H01L2224/05623 , H01L2224/05624 , H01L2224/05638 , H01L2224/05639 , H01L2224/05644 , H01L2224/05647 , H01L2224/05655 , H01L2224/05657 , H01L2224/05666 , H01L2224/05672 , H01L2224/29082 , H01L2224/29083 , H01L2224/29109 , H01L2224/29111 , H01L2224/29113 , H01L2224/29117 , H01L2224/29118 , H01L2224/2912 , H01L2224/29123 , H01L2224/29124 , H01L2224/29138 , H01L2224/29139 , H01L2224/29144 , H01L2224/29147 , H01L2224/29155 , H01L2224/29157 , H01L2224/32245 , H01L2224/32501 , H01L2224/32505 , H01L2224/83191 , H01L2224/83825 , H01L2224/92247 , H01L2924/00014 , H01L2924/01322 , H01L2924/13055 , H01L2924/13091 , H01L2924/351 , H01L2924/3651 , H01L2924/00 , H01L2924/01014 , H01L2924/01032 , H01L2224/45015 , H01L2924/207 , H01L2224/45099
摘要: 提供了一种半导体器件及其接合结构,其中不与半导体裸片或引线框架形成金属间化合物,从而改善电特性和机械特性以及可润湿性,且抑制裸片接合材料的聚集。所述半导体器件包括:半导体裸片、形成在半导体裸片的表面上的阻挡层、形成在阻挡层上的第一金属层、形成在第一金属层上的中间金属层,以及形成在中间金属层上的第二金属层。这里,第一金属层和第二金属层具有第一熔化温度,中间金属层具有低于第一熔化温度的第二熔化温度。
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