摘要:
A through-substrate via (TSV) structure that is immune to metal contamination due to a backside planarization process is provided. After forming a through-substrate via (TSV) trench, a diffusion barrier liner is conformally deposited on the sidewalls of the TSV trench. A dielectric liner is formed by depositing a dielectric material on vertical portions of the diffusion barrier liner. A metallic conductive via structure is formed by subsequently filling the TSV trench. Horizontal portions of the diffusion barrier liner are removed. The diffusion barrier liner protects the semiconductor material of the substrate during the backside planarization by blocking residual metallic material originating from the metallic conductive via structure from entering into the semiconductor material of the substrate, thereby protecting the semiconductor devices within the substrate from metallic contamination.
摘要:
The present disclosure relates to the field of integrated circuit package design and, more particularly, to packages using a bumpless build-up layer (BBUL) designs. Embodiments of the present description relate to the field of fabricating microelectronic packages, wherein an interposer, such as a through-silicon via interposer, may be used in a bumpless build-up layer package to facilitate stacked microelectronic components.
摘要:
A light-reflective anisotropic conductive adhesive and light-emitting device capable of maintaining luminous efficiency of a light-emitting element and preventing the occurrence of a crack to obtain conduction reliability are provided. The light-reflective anisotropic conductive adhesive contains a thermosetting resin composite, conductive particles, and a light-reflective acicular insulating particles. These light-reflective acicular insulating particles are inorganic particles of at least one type selected from the group including titanium oxide, zinc oxide, and titanate.
摘要:
The invention relates to a method for forming solder deposits (34) on raised contact metallization structures (24) of connection surfaces (23) of a substrate (19) designed in particular as a semiconductor component, wherein wetting surfaces (26) of the contact metallization structures (24) are brought in contact with a solder material layer (15) arranged on a solder material carrier (13), the substrate (19) is heated and the temperature of the solder material layer (15) is controlled at least during the duration of the contact, and subsequently the contact metallization structures (24) wetted with solder material (34) and the solder material layer (15) are separated, thus making it possible to prevent the formation of contact bridges between adjoining contact metallization structures (24) resulting from the surface tension of fused solder material when the wetting surfaces (26) of the contact metallization structures (24) and the solder material layer (15) are separated.
摘要:
A semiconductor device has a plurality of stacked semiconductor dice mounted on a substrate. Each die has similar dimensions. Each die has a first plurality of bonding pads arranged along a bonding edge of the die. A first group of the dice are mounted to the substrate with the bonding edge oriented in a first direction. A second group of the dice are mounted to the substrate with the bonding edge oriented in a second direction opposite the first direction. Each die is laterally offset in the second direction relative to the remaining dice by a respective lateral offset distance such that the bonding pads of each die are not disposed between the substrate and any portion of the remaining dice in a direction perpendicular to the substrate. A plurality of bonding wires connects the bonding pads to the substrate. A method of manufacturing a semiconductor device is also disclosed.
摘要:
According to one disclosed embodiment, a power semiconductor package includes an insulated-gate bipolar transistor (IGBT) residing on a package substrate (470, 570), where the IGBT (420,520) includes a plurality of solderable front metal (SFM) coated emitter segments (492,592) situated atop the IGBT (420,520) and connected to an emitter of the IGBT. The power semiconductor package also includes a conductive clip (480,580) coupling the plurality of SFM coated emitter segments (492, 592) to an emitter pad on the package substrate (470, 570). Additionally, the power semiconductor package includes a gate pad on the package substrate coupled to a gate of the IGBT, a collector pad on the package substrate situated under the IGBT and coupled to a collector of the IGBT, and an emitter terminal, a collector terminal and a gate terminal of the package substrate that are routed to the emitter pad, collector pad, and gate pad, respectively. The conductive clip (480, 580) further has through holes (484) in the conductive clip body (490) that are configured to allow reflow degassing to escape from the surface area of the coupling between emitter segements (492) and the conductiv clip body (490) thereby siginificantly reducing the risk of physical irregularities during the reflow process.
摘要:
A reliable semiconductor device is provided which comprises lower and upper IGBTs 1 and 2 preferably bonded to each other by solder, and a wire strongly connected to lower IGBT 1. The semiconductor device comprises a lower IGBT 1, a lower electrode layer 5 secured on lower IGBT 1, an upper electrode layer 6 secured on lower electrode layer 5, an upper IGBT 2 secured on upper electrode layer 6, and a solder layer 7 which connects upper electrode layer 6 and upper IGBT 2. Lower and upper electrode layers 5 and 6 are formed of different materials from each other, and upper electrode layer 6 has a notch 36 to partly define on an upper surface 5a of lower electrode layer 5 a bonding region 15 exposed to the outside through notch 36 so that one end of a wire 8 is connected to bonding region 15. Upper electrode layer 6 can be formed of one material superior in soldering, and also, lower electrode layer 5 can be formed of another material having a high adhesive strength to wire 8.
摘要:
A routing layer for a semiconductor die is disclosed. The routing layer includes pads for attaching solder bumps; bond-pads bonded to bump-pads of a die having an integrated circuit, and traces interconnecting bond-pads to pads. The routing layer is formed on a layer of dielectric material. The routing layer includes conductive traces at least partially surrounding some pads so as to absorb stress from solder bumps attached to the pads. Parts of the traces that surround pads protect parts of the underlying dielectric material proximate the solder bumps, from the stress.