Manufacturing method of flexible semiconductor device and flexible semiconductor device
    91.
    发明授权
    Manufacturing method of flexible semiconductor device and flexible semiconductor device 有权
    柔性半导体器件和柔性半导体器件的制造方法

    公开(公告)号:US07977741B2

    公开(公告)日:2011-07-12

    申请号:US12939729

    申请日:2010-11-04

    IPC分类号: H01L29/786

    摘要: A layered film of a three-layer clad foil formed with a first metal layer 23, a second metal layer 25, and an inorganic insulating layer 35 interposed therebetween is prepared. After the second metal layer 25 is partially etched to form a gate electrode 20g, the first metal layer 23 is partially etched to form source/drain electrodes 20s, 20d in a region corresponding to the gate electrode 20g. A semiconductor layer 40 is then formed in contact with the source/drain electrodes 20s, 20d and on the gate electrode 20g with the inorganic insulating layer 35 interposed therebetween. The inorganic insulating layer 35 on the gate electrode 20g functions as a gate insulating film 30, and the semiconductor layer 40 between the source/drain electrodes 20s, 20d on the inorganic insulating layer 35 functions as a channel.

    摘要翻译: 制备形成有第一金属层23,第二金属层25和介于其间的无机绝缘层35的三层复合箔的分层膜。 在第二金属层25被部分蚀刻以形成栅电极20g之后,第一金属层23被部分蚀刻以在对应于栅电极20g的区域中形成源/漏电极20s,20d。 然后,将半导体层40形成为与源极/漏极20s,20d接触并且在栅极电极20g上形成有绝缘层35。 栅电极20g上的无机绝缘层35用作栅极绝缘膜30,无机绝缘层35上的源/漏电极20s,20d之间的半导体层40用作沟道。

    Manufacturing method of flexible semiconductor device and flexible semiconductor device
    92.
    发明授权
    Manufacturing method of flexible semiconductor device and flexible semiconductor device 有权
    柔性半导体器件和柔性半导体器件的制造方法

    公开(公告)号:US07851281B2

    公开(公告)日:2010-12-14

    申请号:US12518602

    申请日:2008-10-01

    IPC分类号: H01L21/336

    摘要: A layered film of a three-layer clad foil formed with a first metal layer 23, a second metal layer 25, and an inorganic insulating layer 35 interposed therebetween is prepared. After the second metal layer 25 is partially etched to form a gate electrode 20g, the first metal layer 23 is partially etched to form source/drain electrodes 20s, 20d in a region corresponding to the gate electrode 20g. A semiconductor layer 40 is then formed in contact with the source/drain electrodes 20s, 20d and on the gate electrode 20g with the inorganic insulating layer 35 interposed therebetween. The inorganic insulating layer 35 on the gate electrode 20g functions as a gate insulating film 30, and the semiconductor layer 40 between the source/drain electrodes 20s, 20d on the inorganic insulating layer 35 functions as a channel.

    摘要翻译: 制备形成有第一金属层23,第二金属层25和介于其间的无机绝缘层35的三层复合箔的分层膜。 在第二金属层25被部分蚀刻以形成栅电极20g之后,第一金属层23被部分蚀刻以在对应于栅电极20g的区域中形成源/漏电极20s,20d。 然后,将半导体层40形成为与源极/漏极20s,20d接触并且在栅极电极20g上形成有绝缘层35。 栅电极20g上的无机绝缘层35用作栅极绝缘膜30,无机绝缘层35上的源/漏电极20s,20d之间的半导体层40用作沟道。

    SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND IMAGE DISPLAY DEVICE
    94.
    发明申请
    SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND IMAGE DISPLAY DEVICE 有权
    半导体器件,半导体器件制造方法和图像显示器件

    公开(公告)号:US20100181558A1

    公开(公告)日:2010-07-22

    申请号:US12667297

    申请日:2008-07-01

    IPC分类号: H01L51/10 H01L51/40

    摘要: A semiconductor device having semiconductor elements disposed with higher density and a method for manufacturing the same are provided.An image display device employing the semiconductor device is also provided.A semiconductor device comprises a resin film having a through hole; and a semiconductor element comprising a gate electrode disposed on the inner wall of the through hole, an insulating layer that covers the gate electrode within the through hole, an organic semiconductor disposed on the insulating layer within the through hole, and a source electrode and a drain electrode which are electrically connected to the organic semiconductor.

    摘要翻译: 提供了具有以更高密度设置的半导体元件的半导体器件及其制造方法。 还提供了采用半导体器件的图像显示装置。 半导体器件包括具有通孔的树脂膜; 以及半导体元件,包括设置在通孔的内壁上的栅电极,覆盖通孔内的栅电极的绝缘层,设置在通孔内的绝缘层上的有机半导体,以及源电极和 电极与有机半导体电连接。

    Ink-jet recording method, ink-jet ink, ink-jet recording unit, ink cartridge for ink-jet recording and ink-jet recording apparatus
    100.
    发明授权
    Ink-jet recording method, ink-jet ink, ink-jet recording unit, ink cartridge for ink-jet recording and ink-jet recording apparatus 失效
    喷墨记录方法,喷墨油墨,喷墨记录单元,喷墨记录用墨盒和喷墨记录装置

    公开(公告)号:US07314276B2

    公开(公告)日:2008-01-01

    申请号:US11008918

    申请日:2004-12-13

    IPC分类号: G01D11/00

    CPC分类号: B41J11/0015 C09D11/38

    摘要: The present invention provides an ink-jet recording method for forming an image by applying an ink to a recording medium, wherein the ink used contains at least water, a pigment, a dispersing agent for dispersing the pigment and an acid form of an anionic surfactant. The ink has a surface tension higher than the critical surface tension of the recording medium. The ink is applied to the recording medium, and the surface tension of the ink is reduced to a surface tension below the critical surface tension of the recording medium after contacting the recording medium.

    摘要翻译: 本发明提供了一种用于通过向记录介质施加油墨来形成图像的喷墨记录方法,其中使用的油墨至少含有水,颜料,用于分散颜料的分散剂和酸形式的阴离子表面活性剂 。 油墨的表面张力高于记录介质的临界表面张力。 油墨被施加到记录介质上,并且在接触记录介质之后,油墨的表面张力降低到低于记录介质的临界表面张力的表面张力。