公开(公告)号：US09318298B2

公开(公告)日：2016-04-19

申请号：US14536946

申请日：2014-11-10

Applicant: Sumitomo Heavy Industries Ion Technology Co., Ltd.

Inventor： Masateru Sato

IPC: G21K5/00 ,  H01J27/08 ,  H01J37/08 ,  H01J37/317

CPC classification number: H01J27/08 ,  H01J37/08 ,  H01J37/3171 ,  H01J2237/31705

Abstract: An ion generator is provided with: an arc chamber that is at least partially made up of a material containing carbon; a thermal electron emitter that emits thermal electrons into the arc chamber; and a gas introducer that introduces a source gas and a compound gas into the arc chamber. The source gas to be introduced into the arc chamber contains a halide gas, and the compound gas to be introduced into the arc chamber contains a compound having carbon atoms and hydrogen atoms.

Abstract translation: 离子发生器具有：至少部分由含碳材料组成的电弧室; 将热电子发射到电弧室中的热电子发射体; 以及将源气体和复合气体引入电弧室的气体导入器。 被引入电弧室的源气体含有卤化物气体，导入电弧室的化合物气体含有具有碳原子和氢原子的化合物。

公开(公告)号：US20160104599A1

公开(公告)日：2016-04-14

申请号：US14973424

申请日：2015-12-17

Applicant: FEI Company

Inventor： Gregory A. Schwind ,  N. William Parker

IPC: H01J37/21 ,  H01J37/08

CPC classification number: H01J37/21 ,  H01J27/205 ,  H01J37/08 ,  H01J2237/006 ,  H01J2237/082 ,  H01J2237/0827 ,  H01J2237/31749

Abstract: A high brightness ion source with a gas chamber includes multiple channels, wherein the multiple channels each have a different gas. An electron beam is passed through one of the channels to provide ions of a certain species for processing a sample. The ion species can be rapidly changed by directing the electrons into another channel with a different gas species and processing a sample with ions of a second species. Deflection plates are used to align the electron beam into the gas chamber, thereby allowing the gas species in the focused ion beam to be switched quickly.

Abstract translation: 具有气室的高亮度离子源包括多个通道，其中多个通道各自具有不同的气体。 电子束通过一个通道以提供某种物质的离子用于处理样品。 可以通过将电子引导到具有不同气体种类的另一个通道并用第二种离子的离子处理样品来快速改变离子种类。 偏转板用于将电子束对准气体室，从而允许聚焦离子束中的气体物质快速切换。

公开(公告)号：US20160104598A1

公开(公告)日：2016-04-14

申请号：US14969352

申请日：2015-12-15

Applicant: Carl Zeiss Microscopy, LLC

Inventor： John A. Notte, IV ,  FHM-Faridur Rahman ,  Weijie Huang ,  Shawn McVey

IPC: H01J37/08 ,  H01J27/26

CPC classification number: H01J37/18 ,  G21K5/04 ,  H01J27/26 ,  H01J37/08 ,  H01J2237/002 ,  H01J2237/0216 ,  H01J2237/032 ,  H01J2237/0653 ,  H01J2237/0807 ,  H01J2237/1501 ,  H01J2237/1502 ,  H01J2237/1825 ,  H01J2237/188 ,  H01J2237/20207 ,  H01J2237/20214 ,  H01J2237/20221 ,  H01J2237/20235

Abstract: The present disclosure relates to a gas field ion source comprising a housing, an electrically conductive tip arranged within the housing, a gas supply for supplying one or more gases to the housing, wherein the one or more gases comprise neon or a noble gas with atoms having a mass larger than neon, and an extractor electrode having a hole to permit ions generated in the neighborhood of the tip to pass through the hole. A surface of the extractor electrode facing the tip can be made of a material having a negative secondary ion sputter rate of less than 10−5 per incident neon ion.

Abstract translation: 本公开涉及一种气体离子源，其包括壳体，布置在壳体内的导电尖端，用于向壳体供应一种或多种气体的气体源，其中所述一种或多种气体包括氖或具有原子的惰性气体 具有大于氖的质量，以及具有孔的提取器电极，其允许在尖端附近产生的离子穿过孔。 提取器电极的面向尖端的表面可以由每个入射氖离子具有小于10-5的负次级离子溅射速率的材料制成。

公开(公告)号：US20160104597A1

公开(公告)日：2016-04-14

申请号：US14787263

申请日：2014-04-14

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Yuta IMAI ,  Takashi OHSHIMA ,  Hideo MORISHITA

IPC: H01J37/073 ,  H01J37/145 ,  H01J37/28 ,  H01J37/20 ,  H01J29/48 ,  H01J27/02

CPC classification number: H01J37/073 ,  H01J27/02 ,  H01J27/26 ,  H01J29/481 ,  H01J37/06 ,  H01J37/063 ,  H01J37/08 ,  H01J37/145 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/062 ,  H01J2237/06341 ,  H01J2237/06375 ,  H01J2237/0802 ,  H01J2237/1508 ,  H01J2237/2007 ,  H01J2237/2801

Abstract: The purpose of the present invention is to provide a charged particle gun using merely an electrostatic lens, said charged particle gun being relatively small and having less aberration, and to provide a field emission-type charged particle gun having high luminance even with a high current. This charged particle gun has: a charged particle source; an acceleration electrode that accelerates charged particles emitted from the charged particle source; a control electrode, which is disposed further toward the charged particle source side than the acceleration electrode, and which has a larger aperture diameter than the aperture diameter of the acceleration electrode; and a control unit that controls, on the basis of a potential applied to the acceleration electrode, a potential to be applied to the control electrode.

Abstract translation: 本发明的目的是提供一种仅使用静电透镜的带电粒子枪，所述带电粒子枪相对较小并且具有较小的像差，并且提供即使具有高电流也具有高亮度的场致发射型带电粒子枪 。 该带电粒子枪具有：带电粒子源; 加速电极，其加速从带电粒子源发射的带电粒子; 控制电极，其设置成比加速电极更加朝向带电粒子源侧，并且具有比加速电极的开口直径大的孔径; 以及控制单元，其基于对加速电极施加的电位控制施加到控制电极的电位。

公开(公告)号：US20160056016A1

公开(公告)日：2016-02-25

申请号：US14878206

申请日：2015-10-08

Applicant: CANON ANELVA CORPORATION

Inventor： Yasushi Yasumatsu ,  Naoyuki Okamoto ,  Masashi Tsujiyama ,  Fumihito Suzuki

IPC: H01J37/305 ,  H01J37/063 ,  B08B3/08 ,  H01J37/317

CPC classification number: H01J37/3053 ,  B08B3/08 ,  H01J27/024 ,  H01J37/063 ,  H01J37/08 ,  H01J37/3171 ,  H01J2237/022 ,  H01J2237/061 ,  H01J2237/0815 ,  H01J2237/083 ,  H01J2237/3151

Abstract: Provided is an ion beam processing apparatus including an ion generation chamber, a processing chamber, and electrodes to form an ion beam by extracting ions generated in the ion generation chamber to the processing chamber. The electrodes includes a first electrode disposed close to the ion generation chamber and provided with an ion passage hole to allow passage of the ions, and a second electrode disposed adjacent to the first electrode and closer to the processing chamber than the first electrode is, and provided with an ion passage hole to allow passage of the ions. The apparatus also includes a power unit which applies different electric potentials to the first electrode and the second electrode, respectively, so as to accelerate the ions generated by an ion generator in the ion generation chamber. A material of the first electrode is different from a material of the second electrode.

Abstract translation: 提供了一种离子束处理装置，其包括离子产生室，处理室和通过将在离子产生室中产生的离子提取到处理室来形成离子束的电极。 所述电极包括靠近所述离子产生室设置的第一电极，并设置有离子通道孔以允许所述离子通过，以及邻近所述第一电极设置并且比所述第一电极更靠近所述处理室设置的第二电极，以及 设置有允许离子通过的离子通道孔。 该装置还包括分别对第一电极和第二电极施加不同电位的功率单元，以便加速由离子产生室中的离子发生器产生的离子。 第一电极的材料与第二电极的材料不同。

公开(公告)号：US20160042909A1

公开(公告)日：2016-02-11

申请号：US14815265

申请日：2015-07-31

Applicant: TEL Epion Inc.

Inventor： Matthew C. Gwinn ,  Avrum Freytsis ,  Robert K. Becker

IPC: H01J37/08 ,  H01J37/305

CPC classification number: H01J37/08 ,  H01J37/305 ,  H01J2237/006 ,  H01J2237/0206 ,  H01J2237/061 ,  H01J2237/0812 ,  H01J2237/0822 ,  H01J2237/3151

Abstract: A nozzle assembly used for performing gas cluster ion beam (GCIB) etch processing of various materials is described. In particular, the nozzle assembly includes two or more conical nozzles that are aligned such that they are both used to generate the same GCIB. The first conical nozzle may include the throat that initially forms the GCIB and the second nozzle may form a larger conical cavity that may be appended to the first conical nozzle. A transition region may be disposed between the two conical nozzles that may substantially cylindrical and slightly larger than the largest diameter of the first conical nozzle.

Abstract translation: 描述了用于进行各种材料的气体簇离子束（GCIB）蚀刻处理的喷嘴组件。 特别地，喷嘴组件包括两个或更多个锥形喷嘴，其被对准，使得它们都用于产生相同的GCIB。 第一锥形喷嘴可以包括最初形成GCIB的喉部，并且第二喷嘴可以形成可以附着到第一锥形喷嘴的更大的锥形空腔。 过渡区域可以设置在两个锥形喷嘴之间，其可以基本上圆柱形并稍微大于第一锥形喷嘴的最大直径。

公开(公告)号：US20160013013A1

公开(公告)日：2016-01-14

申请号：US14861469

申请日：2015-09-22

Applicant: GLOBAL PLASMA SOLUTIONS, LLC

Inventor： Charles Houston WADDELL

IPC: H01J37/16 ,  H01J37/30

CPC classification number: A61L9/22 ,  A61L2209/16 ,  B01D46/0032 ,  B01D46/521 ,  B03C3/011 ,  B03C3/04 ,  B03C3/155 ,  B03C3/41 ,  B03C3/82 ,  F01N3/0892 ,  F02M27/04 ,  F02M27/042 ,  F02M35/0205 ,  F02M35/0217 ,  F16M13/02 ,  F24F3/166 ,  F24F2003/1682 ,  H01J27/022 ,  H01J27/028 ,  H01J37/08 ,  H01J37/16 ,  H01J37/3002 ,  H01T23/00

Abstract: The present invention provides methods and systems for an ion generator mounting device for application of bipolar ionization to airflow within a conduit, the device includes a housing for mounting to the conduit having an internal panel within the enclosure, and an arm extending from the housing for extension into the conduit and containing at least one opening. At least one coupling for mounting an ion generator to the arm oriented with an axis extending between a pair of electrodes of the ion generator being generally perpendicular to a flow direction of the airflow within the conduit.

Abstract translation: 本发明提供了用于将双极电离应用于管道内的气流的离子发生器安装装置的方法和系统，该装置包括用于安装到具有在外壳内的内部面板的导管的壳体，以及从壳体延伸的臂 延伸到导管中并且包含至少一个开口。 用于将离子发生器安装到臂上的至少一个联接器，其以在离子发生器的一对电极之间延伸的轴线定向，大体垂直于导管内气流的流动方向。

公开(公告)号：US09230773B1

公开(公告)日：2016-01-05

申请号：US14516032

申请日：2014-10-16

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Alexandre Likhanskii ,  Svetlana B. Radovanov ,  Bon-Woong Koo

IPC: H01J37/00 ,  H01J27/02 ,  H01J27/16

CPC classification number: H01J27/024 ,  H01J27/16 ,  H01J37/08 ,  H01J2237/0815 ,  H05H2001/4652 ,  H05H2001/466

Abstract: A plasma chamber having improved controllability of the ion density of the extracted ribbon ion beam is disclosed. A plurality of pairs of RF biased electrodes is disposed on opposite sides of the extraction aperture in a plasma chamber. In some embodiments, one of each pair of RF biased electrodes is biased at the extraction voltage, while the other of each pair is coupled to a RF bias power supply, which provides a RF voltage having a DC component and an AC component. In another embodiment, both of the electrodes in each pair are coupled to a RF biased power supply. A blocker may be disposed in the plasma chamber near the extraction aperture. In some embodiments, RF biased electrodes are disposed on the blocker.

公开(公告)号：US09218935B2

公开(公告)日：2015-12-22

申请号：US14314289

申请日：2014-06-25

Applicant: Carl Zeiss Microscopy, LLC

Inventor： John A. Notte, IV ,  FHM-Faridur Rahman ,  Weijie Huang ,  Shawn McVey

IPC: H01J27/26 ,  H01J37/08 ,  H01J37/18 ,  G21K5/04

CPC classification number: H01J37/18 ,  G21K5/04 ,  H01J27/26 ,  H01J37/08 ,  H01J2237/002 ,  H01J2237/0216 ,  H01J2237/032 ,  H01J2237/0653 ,  H01J2237/0807 ,  H01J2237/1501 ,  H01J2237/1502 ,  H01J2237/1825 ,  H01J2237/188 ,  H01J2237/20207 ,  H01J2237/20214 ,  H01J2237/20221 ,  H01J2237/20235

Abstract: The present disclosure relates to a gas field ion source comprising a housing, an electrically conductive tip arranged within the housing, a gas supply for supplying one or more gases to the housing, wherein the one or more gases comprise neon or a noble gas with atoms having a mass larger than neon, and an extractor electrode having a hole to permit ions generated in the neighborhood of the tip to pass through the hole. A surface of the extractor electrode facing the tip can be made of a material having a negative secondary ion sputter rate of less than 10−5 per incident neon ion.

Abstract translation: 本公开涉及一种气体离子源，其包括壳体，布置在壳体内的导电尖端，用于向壳体供应一种或多种气体的气体源，其中所述一种或多种气体包括氖或具有原子的惰性气体 具有大于氖的质量，以及具有孔的提取器电极，其允许在尖端附近产生的离子穿过孔。 提取器电极的面向尖端的表面可以由每个入射氖离子具有小于10-5的负次级离子溅射速率的材料制成。

公开(公告)号：US09208991B1

公开(公告)日：2015-12-08

申请号：US14721752

申请日：2015-05-26

Applicant: Sumitomo Heavy Industries Ion Technology Co., Ltd.

Inventor： Hiroshi Matsushita ,  Mitsuaki Kabasawa ,  Yoshitaka Amano ,  Takanori Yagita

IPC: H01J3/18 ,  H01J37/147 ,  H01J37/317 ,  H01J37/08

CPC classification number: H01J37/1477 ,  H01J37/08 ,  H01J37/3171 ,  H01J2237/30483

Abstract: An ion implantation apparatus includes a scanning unit scanning the ion beams in a horizontal direction perpendicular to the reference trajectory and a downstream electrode device disposed downstream of the scanning electrode device. The scanning electrode device includes a pair of scanning electrodes disposed to face each other in the horizontal direction with the reference trajectory interposed therebetween. The downstream electrode device includes an electrode body configured such that, with respect to an opening width in a vertical direction perpendicular to both the reference trajectory and the horizontal direction and/or an opening thickness in a direction along the reference trajectory, the opening width and/or the opening thickness in a central portion in which the reference trajectory is disposed is different from the opening width and/or the opening thickness in the vicinity of a position facing the downstream end of the scanning electrode.

Abstract translation: 离子注入装置包括：扫描单元，沿垂直于参考轨迹的水平方向扫描离子束;以及下游电极装置，设置在扫描电极装置的下游。 扫描电极装置包括一对沿水平方向彼此相对设置的扫描电极，其间插入有基准轨迹。 下游电极装置包括：电极体，其构成为：相对于垂直于基准轨迹和水平方向的垂直方向的开口宽度和/或沿着基准轨迹的方向的开口厚度，开口宽度和 配置基准轨迹的中央部的开口厚度与扫描电极的下游端的位置附近的开口宽度和/或开口厚度不同。