Ion generator and ion generating method
    91.
    发明授权
    Ion generator and ion generating method 有权
    离子发生器和离子发生方法

    公开(公告)号:US09318298B2

    公开(公告)日:2016-04-19

    申请号:US14536946

    申请日:2014-11-10

    Inventor: Masateru Sato

    CPC classification number: H01J27/08 H01J37/08 H01J37/3171 H01J2237/31705

    Abstract: An ion generator is provided with: an arc chamber that is at least partially made up of a material containing carbon; a thermal electron emitter that emits thermal electrons into the arc chamber; and a gas introducer that introduces a source gas and a compound gas into the arc chamber. The source gas to be introduced into the arc chamber contains a halide gas, and the compound gas to be introduced into the arc chamber contains a compound having carbon atoms and hydrogen atoms.

    Abstract translation: 离子发生器具有:至少部分由含碳材料组成的电弧室; 将热电子发射到电弧室中的热电子发射体; 以及将源气体和复合气体引入电弧室的气体导入器。 被引入电弧室的源气体含有卤化物气体,导入电弧室的化合物气体含有具有碳原子和氢原子的化合物。

    MULTI SPECIES ION SOURCE
    92.
    发明申请
    MULTI SPECIES ION SOURCE 审中-公开
    多品种离子源

    公开(公告)号:US20160104599A1

    公开(公告)日:2016-04-14

    申请号:US14973424

    申请日:2015-12-17

    Applicant: FEI Company

    Abstract: A high brightness ion source with a gas chamber includes multiple channels, wherein the multiple channels each have a different gas. An electron beam is passed through one of the channels to provide ions of a certain species for processing a sample. The ion species can be rapidly changed by directing the electrons into another channel with a different gas species and processing a sample with ions of a second species. Deflection plates are used to align the electron beam into the gas chamber, thereby allowing the gas species in the focused ion beam to be switched quickly.

    Abstract translation: 具有气室的高亮度离子源包括多个通道,其中多个通道各自具有不同的气体。 电子束通过一个通道以提供某种物质的离子用于处理样品。 可以通过将电子引导到具有不同气体种类的另一个通道并用第二种离子的离子处理样品来快速改变离子种类。 偏转板用于将电子束对准气体室,从而允许聚焦离子束中的气体物质快速切换。

    ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CLEANING ELECTRODE ASSEMBLY
    95.
    发明申请
    ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CLEANING ELECTRODE ASSEMBLY 审中-公开
    离子束处理装置,电极组件以及清洁电极组件的方法

    公开(公告)号:US20160056016A1

    公开(公告)日:2016-02-25

    申请号:US14878206

    申请日:2015-10-08

    Abstract: Provided is an ion beam processing apparatus including an ion generation chamber, a processing chamber, and electrodes to form an ion beam by extracting ions generated in the ion generation chamber to the processing chamber. The electrodes includes a first electrode disposed close to the ion generation chamber and provided with an ion passage hole to allow passage of the ions, and a second electrode disposed adjacent to the first electrode and closer to the processing chamber than the first electrode is, and provided with an ion passage hole to allow passage of the ions. The apparatus also includes a power unit which applies different electric potentials to the first electrode and the second electrode, respectively, so as to accelerate the ions generated by an ion generator in the ion generation chamber. A material of the first electrode is different from a material of the second electrode.

    Abstract translation: 提供了一种离子束处理装置,其包括离子产生室,处理室和通过将在离子产生室中产生的离子提取到处理室来形成离子束的电极。 所述电极包括靠近所述离子产生室设置的第一电极,并设置有离子通道孔以允许所述离子通过,以及邻近所述第一电极设置并且比所述第一电极更靠近所述处理室设置的第二电极,以及 设置有允许离子通过的离子通道孔。 该装置还包括分别对第一电极和第二电极施加不同电位的功率单元,以便加速由离子产生室中的离子发生器产生的离子。 第一电极的材料与第二电极的材料不同。

    GCIB NOZZLE ASSEMBLY
    96.
    发明申请
    GCIB NOZZLE ASSEMBLY 有权
    GCIB喷嘴总成

    公开(公告)号:US20160042909A1

    公开(公告)日:2016-02-11

    申请号:US14815265

    申请日:2015-07-31

    Applicant: TEL Epion Inc.

    Abstract: A nozzle assembly used for performing gas cluster ion beam (GCIB) etch processing of various materials is described. In particular, the nozzle assembly includes two or more conical nozzles that are aligned such that they are both used to generate the same GCIB. The first conical nozzle may include the throat that initially forms the GCIB and the second nozzle may form a larger conical cavity that may be appended to the first conical nozzle. A transition region may be disposed between the two conical nozzles that may substantially cylindrical and slightly larger than the largest diameter of the first conical nozzle.

    Abstract translation: 描述了用于进行各种材料的气体簇离子束(GCIB)蚀刻处理的喷嘴组件。 特别地,喷嘴组件包括两个或更多个锥形喷嘴,其被对准,使得它们都用于产生相同的GCIB。 第一锥形喷嘴可以包括最初形成GCIB的喉部,并且第二喷嘴可以形成可以附着到第一锥形喷嘴的更大的锥形空腔。 过渡区域可以设置在两个锥形喷嘴之间,其可以基本上圆柱形并稍微大于第一锥形喷嘴的最大直径。

    Ion implantation apparatus
    100.
    发明授权
    Ion implantation apparatus 有权
    离子注入装置

    公开(公告)号:US09208991B1

    公开(公告)日:2015-12-08

    申请号:US14721752

    申请日:2015-05-26

    CPC classification number: H01J37/1477 H01J37/08 H01J37/3171 H01J2237/30483

    Abstract: An ion implantation apparatus includes a scanning unit scanning the ion beams in a horizontal direction perpendicular to the reference trajectory and a downstream electrode device disposed downstream of the scanning electrode device. The scanning electrode device includes a pair of scanning electrodes disposed to face each other in the horizontal direction with the reference trajectory interposed therebetween. The downstream electrode device includes an electrode body configured such that, with respect to an opening width in a vertical direction perpendicular to both the reference trajectory and the horizontal direction and/or an opening thickness in a direction along the reference trajectory, the opening width and/or the opening thickness in a central portion in which the reference trajectory is disposed is different from the opening width and/or the opening thickness in the vicinity of a position facing the downstream end of the scanning electrode.

    Abstract translation: 离子注入装置包括:扫描单元,沿垂直于参考轨迹的水平方向扫描离子束;以及下游电极装置,设置在扫描电极装置的下游。 扫描电极装置包括一对沿水平方向彼此相对设置的扫描电极,其间插入有基准轨迹。 下游电极装置包括:电极体,其构成为:相对于垂直于基准轨迹和水平方向的垂直方向的开口宽度和/或沿着基准轨迹的方向的开口厚度,开口宽度和 配置基准轨迹的中央部的开口厚度与扫描电极的下游端的位置附近的开口宽度和/或开口厚度不同。

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