Abstract:
A GaN-on-Si device structure and a method of fabrication are disclosed for improved die yield and device reliability of high current/high voltage lateral GaN transistors. A plurality of conventional GaN device structures comprising GaN epi-layers are fabricated on a silicon substrate (GaN-on-Si die). After processing of on-chip interconnect layers, a trench structure is defined around each die, through the GaN epi-layers and into the silicon substrate. A trench cladding is provided on proximal sidewalls, comprising at least one of a passivation layer and a conductive metal layer. The trench cladding extends over exposed surfaces of the GaN epi-layers, over the interface region with the substrate, and over the exposed surfaces of the interconnect layers. This structure reduces risk of propagation of dicing damage and defects or cracks in the GaN epi-layers into active device regions. A metal trench cladding acts as a barrier for electro-migration of mobile ions.
Abstract:
Packaging solutions for devices and systems comprising lateral GaN power transistors are disclosed, including components of a packaging assembly, a semiconductor device structure, and a method of fabrication thereof. In the packaging assembly, a GaN die, comprising one or more lateral GaN power transistors, is sandwiched between first and second leadframe layers, and interconnected using low inductance interconnections, without wirebonding. For thermal dissipation, the dual leadframe package assembly can be configured for either front-side or back-side cooling. Preferred embodiments facilitate alignment and registration of high current/low inductance interconnects for lateral GaN devices, in which contact areas or pads for source, drain and gate contacts are provided on the front-side of the GaN die. By eliminating wirebonding, and using low inductance interconnections with high electrical and thermal conductivity, PQFN technology can be adapted for packaging GaN die comprising one or more lateral GaN power transistors.
Abstract:
Embedded packaging for devices and systems comprising lateral GaN power transistors is disclosed. The packaging assembly is suitable for large area, high power GaN transistors and comprises an assembly of a GaN power transistor and package components comprising a three level interconnect structure. In preferred embodiments, the three level interconnect structure comprises an on-chip metal layer, a copper redistribution layer and package metal layers, in which there is a graduated or tapered contact area sizing through the three levels for dividing/applying current on-chip and combining/collecting current off-chip, with distributed contacts over the active area of the GaN power device. This embedded packaging assembly provides a low inductance, low resistance interconnect structure suitable for devices and systems comprising large area, high power GaN transistors for high voltage/high current applications.
Abstract:
Driver circuitry for switching systems comprising enhancement mode (E-Mode) GaN power transistors with low threshold voltage is disclosed. An E-Mode high electron mobility transistor (HEMT) D3 has a monolithically integrated GaN driver, comprising smaller E-Mode GaN HEMTs D1 and D2, and a discrete dual-voltage pre-driver. In operation, D1 provides the gate drive voltage to the gate of the GaN switch D3, and D2 clamps the gate of the GaN switch D3 to the source, via an internal source-sense connection closely coupling the source of D3 and the source of D2. An additional source-sense connection is provided for the pre-driver. Boosting the drive voltage to the gate of D1 produces firm and rapid pull-up of D1 and D3 for improved switching performance at higher switching speeds. High current handling components of the driver circuitry are integrated with the GaN switch and closely coupled to reduce inductance, while the discrete pre-driver can be thermally separated from the GaN chip.
Abstract:
Packaging solutions for devices and systems comprising lateral GaN power transistors are disclosed, including components of a packaging assembly, a semiconductor device structure, and a method of fabrication thereof. In the packaging assembly, a GaN die, comprising one or more lateral GaN power transistors, is sandwiched between first and second leadframe layers, and interconnected using low inductance interconnections, without wirebonding. For thermal dissipation, the dual leadframe package assembly can be configured for either front-side or back-side cooling. Preferred embodiments facilitate alignment and registration of high current/low inductance interconnects for lateral GaN devices, in which contact areas or pads for source, drain and gate contacts are provided on the front-side of the GaN die. By eliminating wirebonding, and using low inductance interconnections with high electrical and thermal conductivity, PQFN technology can be adapted for packaging GaN die comprising one or more lateral GaN power transistors.
Abstract:
Power switching systems are disclosed comprising driver circuitry for enhancement-mode (E-Mode) GaN power transistors with low threshold voltage. Preferably, a GaN power switch (D3) comprises an E-Mode high electron mobility transistor (HEMT) with a monolithically integrated GaN driver. D3 is partitioned into sections. At least the pull-down and, optionally, the pull-up driver circuitry is similarly partitioned as a plurality of driver elements, each driving a respective section of D3. Each driver element is placed in proximity to a respective section of D3, reducing interconnect track length and loop inductance. In preferred embodiments, the layout of GaN transistor switch and the driver elements, dimensions and routing of the interconnect tracks are selected to further reduce loop inductance and optimize performance. Distributed driver circuitry integrated on-chip with one or more high power E-Mode GaN switches allows closer coupling of the driver circuitry and the GaN switches to reduce effects of parasitic inductances.
Abstract:
Packaging solutions for large area, GaN die comprising one or more lateral GaN power transistor devices and systems are disclosed. Packaging assemblies comprise an interposer sub-assembly comprising the lateral GaN die and a leadframe. The GaN die is electrically connected to the leadframe using bump or post interconnections, silver sintering, or other low inductance interconnections. Then, attachment of the GaN die to the substrate and the electrical connections of the leadframe to contacts on the substrate are made in a single process step. The sub-assembly may be mounted in a standard power module, or alternatively on a substrate, such as a printed circuit board. For high current applications, the sub-assembly also comprises a ceramic substrate for heat dissipation. This packaging scheme provides interconnections with lower inductance and higher current capacity, simplifies fabrication, and enables improved thermal matching of components, compared with conventional wirebonded power modules.
Abstract:
Embedded packaging for devices and systems comprising lateral GaN power transistors is disclosed. The packaging assembly is suitable for large area, high power GaN transistors and comprises an assembly of a GaN power transistor and package components comprising a three level interconnect structure. In preferred embodiments, the three level interconnect structure comprises an on-chip metal layer, a copper redistribution layer and package metal layers, in which there is a graduated or tapered contact area sizing through the three levels for dividing/applying current on-chip and combining/collecting current off-chip, with distributed contacts over the active area of the GaN power device. This embedded packaging assembly provides a low inductance, low resistance interconnect structure suitable for devices and systems comprising large area, high power GaN transistors for high voltage/high current applications.
Abstract:
An electronic switching system and device comprising driver circuits for power transistors are disclosed, with particular application for MOSFET driven, normally-on gallium nitride (GaN) power transistors. Preferably, a low power, high speed CMOS driver circuit with an integrated low voltage, lateral MOSFET driver is series coupled, in a hybrid cascode arrangement, to a high voltage GaN HEMT and provides for improved control of noise and voltage transients. Monitoring and control functions, including latching and clamping, are based on monitoring of Vcc conditions for shut-down and start-up conditioning to enable safer operation, particularly for high voltage and high current switching. Preferred embodiments also provide isolated, self-powered, high speed driver devices, with reduced input losses.