Back-illuminated type solid-state image pickup device and camera module using the same
    11.
    发明授权
    Back-illuminated type solid-state image pickup device and camera module using the same 有权
    背照式固态摄像装置及使用其的相机模块

    公开(公告)号:US07859073B2

    公开(公告)日:2010-12-28

    申请号:US12166810

    申请日:2008-07-02

    IPC分类号: H01L31/0203

    摘要: The present invention provides a solid-state image pickup device including an image pickup pixel section which is provided on a semiconductor substrate and in which a plurality of pixels each having a photoelectric conversion element and a field-effect transistor are arranged, and a peripheral circuit section for the image pickup pixel section. An interconnect layer driving the field-effect transistor in the image pickup pixel section is formed on a first surface side of the semiconductor substrate. A light receiving surface of the photoelectric conversion element is located on a second surface side of the semiconductor substrate. The solid-state image pickup device includes a first terminal exposed from the second surface side of the semiconductor substrate, and a second terminal electrically connected to the first terminal and connectable to an external device on the first surface side of the semiconductor substrate.

    摘要翻译: 本发明提供了一种固态摄像装置,包括:设置在半导体衬底上的摄像像素部分,其中配置有多个具有光电转换元件和场效应晶体管的像素;以及外围电路 图像拾取像素部分。 驱动图像拾取像素部中的场效应晶体管的互连层形成在半导体衬底的第一表面侧上。 光电转换元件的光接收表面位于半导体衬底的第二表面侧。 固态摄像装置包括从半导体衬底的第二表面侧露出的第一端子和与第一端子电连接并可连接到半导体衬底的第一表面侧上的外部器件的第二端子。

    Polishing method and polishing apparatus
    18.
    发明授权
    Polishing method and polishing apparatus 失效
    抛光方法和抛光装置

    公开(公告)号:US5607718A

    公开(公告)日:1997-03-04

    申请号:US300127

    申请日:1994-09-02

    摘要: This invention provides a polishing method including the steps of forming a film to be polished on a substrate having a recessed portion in its surface so as to fill at least the recessed portion, and selectively leaving the film to be polished behind in the recessed portion by polishing the film by using a polishing agent containing polishing particles and a solvent, and having a pH of 7.5 or more. The invention also provides a polishing apparatus including a polishing agent storage vessel for storing a polishing agent, a turntable for polishing an object to be polished, a polishing agent supply pipe for supplying the polishing agent from the polishing agent storage vessel onto the turntable, a polishing object holding jig for holding the object to be polished such that the surface to be polished of the object opposes the turntable, and a polishing agent supply pipe temperature adjusting unit, connected to the polishing agent supply pipe, for adjusting the temperature of the polishing agent.

    摘要翻译: 本发明提供了一种抛光方法,包括以下步骤:在其表面上具有凹陷部分的基底上形成待研磨的膜,以便至少填充凹部,并且通过在凹部中选择性地将被抛光的膜留在后面 通过使用含有研磨粒子和溶剂的研磨剂,pH为7.5以上来研磨该膜。 本发明还提供了一种抛光装置,其包括:用于存储抛光剂的抛光剂储存容器,用于抛光待抛光对象物的转盘,用于将抛光剂从抛光剂储存容器供应到转台上的抛光剂供给管, 抛光对象保持夹具,用于保持待抛光对象物,使被处理物体的表面与转盘相对;抛光剂供给管温度调节单元,连接到抛光剂供应管,用于调节抛光温度 代理商

    Method for fabricating semiconductor device
    19.
    发明授权
    Method for fabricating semiconductor device 失效
    制造半导体器件的方法

    公开(公告)号:US07608537B2

    公开(公告)日:2009-10-27

    申请号:US11861087

    申请日:2007-09-25

    IPC分类号: G03F7/00 H01J49/42

    摘要: A method for fabricating a semiconductor device, includes forming an opening in a first film, embedding an alignment mark material for alignment with an upper layer in the opening, forming a second film on the first film in which the alignment mark material is embedded, irradiating the second film formed in a predetermined region including a position where the alignment mark material is embedded with a processing light, thereby to remove the second film to an extent that a portion of the second film remains in the predetermined region, and exposing the portion of the second film remaining in the predetermined region to an etching environment for etching the second film.

    摘要翻译: 一种制造半导体器件的方法,包括在第一膜中形成开口,在开口中嵌入用于与上层对准的对准标记材料,在其中嵌入对准标记材料的第一膜上形成第二膜,照射 所述第二膜形成在包括所述对准标记材料被嵌入处理光的位置的预定区域中,从而将所述第二膜移除到所述第二膜的一部分保留在所述预定区域中的程度, 所述第二膜保留在所述预定区域中以蚀刻所述第二膜的蚀刻环境。