CHIP PACKAGE AND MANUFACTURING METHOD THEREOF

    公开(公告)号:US20190273175A1

    公开(公告)日:2019-09-05

    申请号:US16291637

    申请日:2019-03-04

    Applicant: XINTEC INC.

    Abstract: A chip package includes a chip, a sidewall structure that has a first light-shielding layer, a second light-shielding layer, and a cover. The chip has a light emitter and a light receiver that are located on a top surface of the chip. The sidewall structure is located on the top surface of the chip and has two aperture areas. The light emitter and the light receiver are respectively located in the two aperture areas. The sidewall structure surrounds the light emitter and the light receiver, and at least one surface of the sidewall structure has the first light-shielding layer. The second light-shielding layer is located between the chip and the sidewall structure. The cover is located on a surface of the sidewall structure facing away from the chip, and at least covers the light receiver and the sidewall structure that surrounds the light receiver.

    TOUCH PANEL-SENSING CHIP PACKAGE MODULE COMPLEX AND A MANUFACTURING METHOD THEREOF
    16.
    发明申请
    TOUCH PANEL-SENSING CHIP PACKAGE MODULE COMPLEX AND A MANUFACTURING METHOD THEREOF 审中-公开
    触控面板感应芯片组件模块及其制造方法

    公开(公告)号:US20160379040A1

    公开(公告)日:2016-12-29

    申请号:US15177143

    申请日:2016-06-08

    Applicant: XINTEC INC.

    CPC classification number: G06K9/00013 G06F3/041 G06F2203/04103

    Abstract: This invention provides a touch panel-sensing chip package module complex, comprising: a touch panel with a first top surface and a first bottom surface opposite to each other, wherein the first bottom surface having a first cavity with a bottom wall surrounded by a sidewall; a color layer formed on the bottom wall and the first bottom surface adjacent to the cavity; and a chip scale sensing chip package module bonded to the cavity by the color layer formed on the bottom wall of the cavity.

    Abstract translation: 本发明提供了一种触摸面板感测芯片封装模块复合体,包括:具有第一顶表面和彼此相对的第一底表面的触摸面板,其中所述第一底表面具有第一腔体,所述第一腔体具有被侧壁包围的底壁 ; 形成在所述底壁和与所述空腔相邻的所述第一底面的着色层; 以及通过形成在腔的底壁上的着色层与腔体结合的芯片尺度感测芯片封装模块。

    MANUFACTURING METHOD OF SEMICONDUCTOR STRUCTURE
    18.
    发明申请
    MANUFACTURING METHOD OF SEMICONDUCTOR STRUCTURE 有权
    半导体结构的制造方法

    公开(公告)号:US20160218140A1

    公开(公告)日:2016-07-28

    申请号:US15086809

    申请日:2016-03-31

    Applicant: XINTEC INC.

    Abstract: A manufacturing method of a semiconductor structure includes the following steps. A patterned photoresist layer is formed on a wafer of the wafer structure. The wafer is etched, such that channels are formed in the wafer, and a protection layer of the wafer structure is exposed through the channels. The protection layer is etched, such that openings aligned with the channels are formed in the protection layer. Landing pads in the protection layer are respectively exposed through the openings and the channels, and the caliber of each of the openings is gradually increased toward the corresponding channel. Side surfaces of the wafer surrounding the channels are etched, such that the channels are expanded to respectively form hollow regions. The caliber of the hollow region is gradually decreased toward the opening, and the caliber of the opening is smaller than that of the hollow region.

    Abstract translation: 半导体结构的制造方法包括以下步骤。 在晶片结构的晶片上形成图案化的光致抗蚀剂层。 蚀刻晶片,使得沟槽形成在晶片中,晶片结构的保护层通过沟道露出。 蚀刻保护层,使得在保护层中形成与沟道对准的开口。 保护层中的着陆垫分别通过开口和通道暴露,并且每个开口的口径朝着相应的通道逐渐增加。 蚀刻围绕通道的晶片的侧表面,使得通道膨胀以分别形成中空区域。 中空区域的口径朝向开口逐渐减小,并且开口的口径小于中空区域的口径。

    SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF
    19.
    发明申请
    SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF 有权
    半导体结构及其制造方法

    公开(公告)号:US20150179831A1

    公开(公告)日:2015-06-25

    申请号:US14640307

    申请日:2015-03-06

    Applicant: XINTEC INC.

    Abstract: A semiconductor structure includes a silicon substrate, a protection layer, an electrical pad, an isolation layer, a redistribution layer, a conductive layer, a passivation layer, and a conductive structure. The silicon substrate has a concave region, a step structure, a tooth structure, a first surface, and a second surface opposite to the first surface. The step structure and the tooth structure surround the concave region. The step structure has a first oblique surface, a third surface, and a second oblique surface facing the concave region and connected in sequence. The protection layer is located on the first surface of the silicon substrate. The electrical pad is located in the protection layer and exposed through the concave region. The isolation layer is located on the first and second oblique surfaces, the second and third surfaces of the step structure, and the tooth structure.

    Abstract translation: 半导体结构包括硅衬底,保护层,电焊盘,隔离层,再分配层,导电层,钝化层和导电结构。 硅基板具有凹形区域,台阶结构,齿结构,第一表面和与第一表面相对的第二表面。 台阶结构和齿结构围绕凹区域。 台阶结构具有第一倾斜表面,第三表面和面对凹入区域并且依次连接的第二倾斜表面。 保护层位于硅衬底的第一表面上。 电焊盘位于保护层中,并通过凹面露出。 隔离层位于第一和第二倾斜表面,台阶结构的第二和第三表面以及齿结构上。

    SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF
    20.
    发明申请
    SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF 有权
    半导体结构及其制造方法

    公开(公告)号:US20150054002A1

    公开(公告)日:2015-02-26

    申请号:US14464570

    申请日:2014-08-20

    Applicant: XINTEC INC.

    Abstract: A manufacturing method of a semiconductor structure includes the following steps. A patterned photoresist layer is formed on a wafer of the wafer structure. The wafer is etched, such that channels are formed in the wafer, and a protection layer of the wafer structure is exposed through the channels. The protection layer is etched, such that openings aligned with the channels are formed in the protection layer. Landing pads in the protection layer are respectively exposed through the openings and the channels, and the caliber of each of the openings is gradually increased toward the corresponding channel. Side surfaces of the wafer surrounding the channels are etched, such that the channels are expanded to respectively form hollow regions. The caliber of the hollow region is gradually decreased toward the opening, and the caliber of the opening is smaller than that of the hollow region.

    Abstract translation: 半导体结构的制造方法包括以下步骤。 在晶片结构的晶片上形成图案化的光致抗蚀剂层。 蚀刻晶片,使得沟槽形成在晶片中,晶片结构的保护层通过沟道露出。 蚀刻保护层,使得在保护层中形成与沟道对准的开口。 保护层中的着陆垫分别通过开口和通道暴露,并且每个开口的口径朝着相应的通道逐渐增加。 蚀刻围绕通道的晶片的侧表面,使得通道膨胀以分别形成中空区域。 中空区域的口径朝向开口逐渐减小,并且开口的口径小于中空区域的口径。

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