Wafer's ambiance control
    27.
    发明授权
    Wafer's ambiance control 有权
    晶圆的氛围控制

    公开(公告)号:US08827695B2

    公开(公告)日:2014-09-09

    申请号:US12435861

    申请日:2009-05-05

    CPC classification number: H01L21/67772 H01L21/67017 Y10S414/135

    Abstract: A semiconductor manufacturing system, an interface system, a carrier, and a method for providing an ambient controlled environment is disclosed. The semiconductor manufacturing system comprises a plurality of process chambers; at least one interface system, wherein the interface system includes a first ambient control element; at least one carrier, wherein the carrier comprises a second ambient control element; and a control module coupled to the plurality of process chambers, the at least one interface system, and the at least one carrier.

    Abstract translation: 公开了一种半导体制造系统,接口系统,载体和用于提供环境受控环境的方法。 半导体制造系统包括多个处理室; 至少一个接口系统,其中所述接口系统包括第一环境控制元件; 至少一个载体,其中载体包括第二环境控制元件; 以及耦合到所述多个处理室,所述至少一个接口系统和所述至少一个载体的控制模块。

    Flash lamp annealing device
    29.
    发明授权
    Flash lamp annealing device 有权
    闪光灯退火装置

    公开(公告)号:US07981212B2

    公开(公告)日:2011-07-19

    申请号:US11391563

    申请日:2006-03-29

    CPC classification number: H01L21/67115 Y10T117/10 Y10T117/1004 Y10T117/1008

    Abstract: A flash lamp annealing device comprises a heater plate, a loader, a lamp set and a control circuit. The heater plate heats a wafer to a predetermined temperature. The wafer is loaded on the loader disposed on the heater plate. The lamp set has one or a plurality of lamps to provide the wafer with a power. The control circuit is coupled to the lamp set to control the flash time of the lamp set.

    Abstract translation: 闪光灯退火装置包括加热板,装载器,灯组和控制电路。 加热板将晶片加热至预定温度。 将晶片装载在设置在加热板上的装载机上。 灯组具有一个或多个灯以提供晶片的功率。 控制电路耦合到灯组以控制灯组的闪光时间。

    Substrate carrier, port apparatus and facility interface and apparatus including same
    30.
    发明授权
    Substrate carrier, port apparatus and facility interface and apparatus including same 有权
    基板载体,端口装置和设备接口及包括其的设备

    公开(公告)号:US07758338B2

    公开(公告)日:2010-07-20

    申请号:US11754789

    申请日:2007-05-29

    CPC classification number: H01L21/67017 H01L21/67393 H01L21/67772

    Abstract: An apparatus includes a first enclosure, a first door, at least one first valve, at least one inlet diffuser and at least one substrate holder. The first enclosure has a first opening. The first door is configured to seal the first opening. The first valve is coupled to the first enclosure. The inlet diffuser is coupled to the first valve and configured to provide a first gas with a temperature substantially higher than a temperature of an environment around the first enclosure. Each substrate holder disposed within the first enclosure supports at least one substrate.

    Abstract translation: 一种装置包括第一外壳,第一门,至少一个第一阀,至少一个入口扩散器和至少一个基板支架。 第一个外壳具有第一个开口。 第一个门被配置为密封第一个开口。 第一阀联接到第一外壳。 入口扩散器联接到第一阀并且被配置为提供具有基本上高于围绕第一外壳的环境的温度的温度的第一气体。 设置在第一外壳内的每个衬底保持器支撑至少一个衬底。

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