公开(公告)号：US20060001350A1

公开(公告)日：2006-01-05

申请号：US11169785

申请日：2005-06-30

Applicant: Tadashi Fujieda ,  Kishio Hidaka ,  Mitsuo Hayashibara

Inventor： Tadashi Fujieda ,  Kishio Hidaka ,  Mitsuo Hayashibara

IPC: H01J1/304

CPC classification number: H01J3/021 ,  B82Y10/00 ,  B82Y30/00 ,  B82Y40/00 ,  C01B21/0605 ,  C01B32/162 ,  C01B32/956 ,  C01P2002/54 ,  C01P2004/03 ,  C01P2004/04 ,  C01P2004/13 ,  C01P2004/133 ,  H01J37/073 ,  H01J2201/30469 ,  H01J2209/0223 ,  H01J2237/0635 ,  H01J2237/2815 ,  H01J2237/3175

Abstract: A field emission electron gun has a field emission cathode composed of a carbon fiber and a conductive base for supporting the carbon fiber, an extractor for causing the field emission of electrons, and an accelerator for accelerating the electrons. The carbon fiber contains at least one of trivalent and pentavalent elements. In particular, the trivalent and pentavalent elements are boron and/or nitrogen. The content of at least one of boron and nitrogen in the carbon fiber is 0.1% to 5% at an atomic weight ratio of the contained element to carbon. The diameter of the carbon fiber is 20 nm to 200 nm. Such an electron gun can have a high-brightness electron beam with a narrow energy width. The field emission electron gun is applied to various electron beam apparatus.

Abstract translation: 场发射电子枪具有由碳纤维和用于支撑碳纤维的导电基底构成的场发射阴极，用于引起电子的场发射的提取器和用于加速电子的加速器。 碳纤维含有三价元素和五价元素中的至少一种。 特别地，三价和五价元素是硼和/或氮。 碳纤维中的硼和氮中的至少一种的含量以含有元素与碳的原子重量比为0.1〜5％。 碳纤维的直径为20nm〜200nm。 这种电子枪可以具有具有窄能量宽度的高亮度电子束。 场发射电子枪适用于各种电子束装置。

公开(公告)号：US20050147148A1

公开(公告)日：2005-07-07

申请号：US11070741

申请日：2005-03-01

Applicant: Jorg Eichholz

Inventor： Jorg Eichholz

IPC: G09G3/22 ,  H05G1/30 ,  H01S3/30 ,  H01S3/09

CPC classification number: B82Y10/00 ,  G09G3/22 ,  H01J2201/30469 ,  H01J2237/0635 ,  H01J2237/065 ,  H05G1/30

Abstract: A control circuit for controlling an electron-emitting device is formed to draw, with a voltage applied, an excitation current being related to a number of electrons emitted. The inventive control circuit includes a first determinator for determining whether an amount of charge transported by the excitation current has reached a predetermined charge threshold value, a second determinator for determining whether a magnitude of the excitation current has reached a predetermined current threshold value, and a switch for switching off the excitation current as soon as the first determinator determines that the amount of charge has reached a predetermined charge threshold value, or as soon as the second determinator determines that the magnitude of the excitation current is smaller than the predetermined current threshold value. The control circuit allows the usage of, for example, CNT arrays for irradiation and operates on the basis of the current drawn by the electron-emitting device, which makes possible a simple setup.

Abstract translation: 形成用于控制电子发射器件的控制电路，以施加电压来绘制与所发射的电子数量有关的激励电流。 本发明的控制电路包括用于确定由激励电流传输的电荷量是否已经达到预定充电阈值的第一确定器，用于确定励磁电流的大小是否已经达到预定电流阈值的第二确定器，以及 一旦第一确定器确定电荷量已经达到预定的充电阈值，或者一旦第二确定器确定激励电流的大小小于预定的电流阈值，一旦关闭激励电流 。 控制电路允许使用例如CNT阵列进行照射，并且基于由电子发射器件绘制的电流进行操作，这使得可以进行简单的设置。

公开(公告)号：US20050001178A1

公开(公告)日：2005-01-06

申请号：US10842849

申请日：2004-05-10

Applicant: N. Parker ,  S. Miller ,  Victor Galande

Inventor： N. Parker ,  S. Miller ,  Victor Galande

IPC: G01N23/00 ,  G01Q20/02 ,  G01Q30/02 ,  G21K5/10 ,  G21K7/00 ,  H01J37/065 ,  H01J37/08 ,  H01J37/30

CPC classification number: H01J37/065 ,  H01J37/32862 ,  H01J2237/0635 ,  H01J2237/1501 ,  H01J2237/2817

Abstract: A multi-column charged particle optics assembly comprises: a first optical component which is continuous through all columns of the charged particle optics assembly; and a multiplicity of independently alignable second optical components coupled to the first optical component, such that there is one second component for each column in the charged particles optics assembly. The first component provides mechanical integrity to the charged particle optics assembly and each second optical component is independently alignable to the optic axis of its corresponding column. In a further embodiment, the charged particle optics assembly comprises: first and second continuous optical components; and a multiplicity of independently alignable electrodes coupled to the second optical component, such that there is a corresponding independently alignable electrode for each column.

Abstract translation: 多列带电粒子光学组件包括：连续穿过带​​电粒子光学组件的所有列的第一光学部件; 以及耦合到所述第一光学部件的多个独立对准的第二光学部件，使得所述带电粒子光学组件中的每一列存在一个第二部件。 第一组件为带电粒子光学组件提供机械完整性，并且每个第二光学部件独立地对准其相应色谱柱的光轴。 在另一实施例中，带电粒子光学组件包括：第一和第二连续光学部件; 以及耦合到第二光学部件的多个可独立对准的电极，使得对于每个列存在相应的可独立对准的电极。

公开(公告)号：US20030189180A1

公开(公告)日：2003-10-09

申请号：US09824881

申请日：2001-04-04

Inventor： Shinichi Hamaguchi ,  Takeshi Haraguchi ,  Hiroshi Yasuda

IPC: G21G005/00 ,  A61N005/00

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/3177 ,  H01J2237/0635 ,  H01J2237/1205

Abstract: An electron beam exposure apparatus for exposing a wafer with a plurality of electron beams has a multi-axis that includes: a plurality of magnetic conductive member arranged to be substantially parallel to each other, the magnetic conductive members having a plurality of openings; and a non-magnetic conductive member provided between the magnetic conductive members, the non-magnetic conductive member having a plurality of through holes. The openings of the magnetic conductive members and the through holes of the non-magnetic conductive members form together a plurality of lens openings operable to converge the electron beams independently of each other by allowing the electron beams to pass therethrough, respectively.

Abstract translation: 用于使多个电子束曝光晶片的电子束曝光装置具有多轴，其包括：多个导电构件，其被布置为基本上彼此平行，所述导电构件具有多个开口; 以及设置在所述导磁部件之间的非磁性导电部件，所述非磁性导电部件具有多个通孔。 磁性导电部件的开口和非磁性导电部件的通孔分别通过允许电子束通过其中而分别彼此独立地会聚电子束的多个透镜开口形成多个透镜开口。

公开(公告)号：US5892224A

公开(公告)日：1999-04-06

申请号：US855736

申请日：1997-05-09

Applicant: Mamoru Nakasuji

Inventor： Mamoru Nakasuji

IPC: G01N23/225 ,  G03F7/20 ,  H01J37/28 ,  G01N23/22

CPC classification number: G03F7/70616 ,  G01N23/225 ,  H01J37/28 ,  H01J2237/0635 ,  H01J2237/2817

Abstract: Apparatus and methods are disclosed for inspecting masks, reticles, and other patterned samples used in microlithography. The apparatus and methods are useful for detecting, at high speed and high accuracy, any defects in the pattern defined by the sample. Multiple charged-particle beams (e.g., electron beams) scannably irradiated simultaneously on respective loci in an irradiation region of a surface of the sample. A charged-particle detector is situated so as to detect charged particles propagating, during the irradiation, from the loci. The charged-particle detector produces data on whether or not the pattern in the irradiated region has any defects compared to a reference pattern. The detectors can be situated so as to receive charged particles reflected from the irradiated region, charged particles passing through the irradiated region, or secondary electrons produced from irradiating the loci. An electrode plate, preferably defining multiple apertures each dedicated to receiving charged particles originating at a respective locus, is used to attract the charged particles toward the detectors.

Abstract translation: 公开了用于检查在微光刻中使用的掩模，掩模版和其它图案化样品的装置和方法。 该装置和方法用于以高速和高精度检测由样品限定的图案中的任何缺陷。 多个带电粒子束（例如电子束）可以扫描地同时照射在样品表面的照射区域中的各个位点上。 带电粒子检测器被设置为检测在照射期间从基因座传播的带电粒子。 带电粒子检测器产生关于照射区域中的图案与参考图案相比是否具有任何缺陷的数据。 检测器可以被设置为接收从照射区域反射的带电粒子，穿过照射区域的带电粒子，或从照射位点产生的二次电子。 使用优选限定多个孔的电极板，每个孔专用于接收源自相应位置的带电粒子，以将带电粒子吸引到检测器。

公开(公告)号：US5637951A

公开(公告)日：1997-06-10

申请号：US513261

申请日：1995-08-10

Applicant: N. William Parker

Inventor： N. William Parker

IPC: H01L21/027 ,  B82B1/00 ,  H01J37/073 ,  H01J1/30

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/073 ,  H01J2237/0635 ,  H01J2237/31774

Abstract: An electron source including a non-orthogonal row-column matrix of two dimensional arrays of electron emitters positioned in groups of arrays, common control electrodes mounted adjacent associated groups, and electrical connections to the arrays in each group connecting the emitters in each array in parallel and connecting each array in each group to a similar array in each other group so as to form rows of groups equal in number to the number of arrays in each group. The groups are positioned along a first axial direction and arranged with the arrays in each group spaced apart in a second direction, at an angle to the first direction, so that the arrays are evenly spaced in the first direction. In one embodiment dummy control electrodes are used at each end of the structure and in another embodiment a field compensating electrode is provided on opposite sides of each control electrode and a surrounding electrode extends between adjacent field compensating electrodes.

Abstract translation: 电子源包括位于阵列组中的电子发射体的二维阵列的非正交行列矩阵，安装在相邻相关组上的公共控制电极以及连接每个阵列中的发射体并联的阵列的电连接 并将每个组中的每个阵列连接到每个其他组中的类似阵列，以便形成数量相等于每组中阵列数的组。 这些组沿着第一轴向方向定位，并且布置成每组中的阵列在第二方向上以与第一方向成角度间隔开，使得阵列在第一方向上均匀间隔开。 在一个实施例中，在结构的每一端使用虚拟控制电极，在另一个实施例中，场补偿电极设置在每个控制电极的相对侧上，并且周围电极在相邻的场补偿电极之间延伸。

公开(公告)号：US5294465A

公开(公告)日：1994-03-15

申请号：US877783

申请日：1992-05-04

Applicant: Alan C. Gallagher

Inventor： Alan C. Gallagher

IPC: B82B3/00 ,  C23C16/04 ,  C30B25/02 ,  H01J37/073 ,  H01J37/317 ,  C23C16/00

CPC classification number: B82B3/00 ,  B82Y10/00 ,  B82Y30/00 ,  B82Y40/00 ,  C23C16/047 ,  C23C16/45536 ,  C23C16/45544 ,  C30B25/02 ,  C30B29/06 ,  C30B29/42 ,  H01J37/073 ,  H01J37/3177 ,  H01J2237/0635 ,  H01J2237/30427 ,  H01J2237/31735 ,  Y10S977/707 ,  Y10S977/855 ,  Y10S977/856 ,  Y10S977/857 ,  Y10S977/875 ,  Y10S977/876 ,  Y10S977/878 ,  Y10S977/888

Abstract: Fabrication of crystalline or molecular nanostructures with dimensions less than or equal to 1000.ANG. on a substrate surface is achieved by the indirect and/or direct action of a highly-localized field-emission current, which causes atoms of molecular gases introduced into a vacuum chamber to deposit or etch at surface atomic sites that are fixed by the emission-tip location. The tip is shaped to maintain control of the emitting region and is typically about 10.ANG. above the structure. The tip position is stepped in a programmed sequence, with each step taken on detecting the current increase induced by an atomic deposition below the tip. Gas sequences or mixtures can also be programmed, and microstructures of typically 10.sup.2 -10.sup.8 atoms are thereby formed with exact control of the positions and types of atomic constituents.The multi-tipped tool consists of a large array of field-emitting nanostructure probe tip extensions on the end of a metal probe. The nanostructures are spaced in a prescribed, repeating pattern with typical spacings on the order of 400.ANG.. The probe voltage, current and position, as well as CVD or etching gas pressures, are sequentially adjusted to fabricate nanostructures on a nearby substrate, which is typically 10-30.ANG. below the termination points of the probe tip extensions.

Abstract translation: 通过高度局部化的场致发射电流的间接和/或直接作用，实现尺寸小于或等于1000的结构或分子纳米结构的制造，其导致将分子气体的原子引入真空室 以在由发射尖端位置固定的表面原子位置沉积或蚀刻。 尖端成形为保持对发射区域的控制，并且通常在结构之上约为10安培。 尖端位置以编程序列步进，每个步骤检测由尖端下方的原子沉积引起的电流增加。 气体序列或混合物也可以编程，因此通过精确控制原子成分的位置和类型形成典型的102-108个原子的微结构。 多点工具由金属探针末端的大量场发射纳米结构探针尖端延伸件组成。 纳米结构以规定的重复图案间隔开，典型的间距为400。 依次调节探针电压，电流和位置以及CVD或蚀刻气体压力，以在附近的衬底上制造纳米结构，通常在探针尖端延伸部的终点下方为10-30安培。

公开(公告)号：US09466464B1

公开(公告)日：2016-10-11

申请号：US14694710

申请日：2015-04-23

Applicant: Multibeam Corporation

Inventor： David K. Lam ,  Kevin M. Monahan ,  Michael C. Smayling ,  Theodore A. Prescop

IPC: H01J37/30 ,  H01J37/305 ,  H01J37/22 ,  H01J37/05 ,  H01J37/304 ,  H01J37/317

CPC classification number: H01L21/3065 ,  B81C1/00373 ,  B81C2201/0143 ,  B81C2201/0188 ,  C23C14/48 ,  C23C16/047 ,  C23C16/48 ,  C23C16/486 ,  C23C16/487 ,  H01J37/05 ,  H01J37/06 ,  H01J37/08 ,  H01J37/228 ,  H01J37/244 ,  H01J37/30 ,  H01J37/304 ,  H01J37/305 ,  H01J37/3053 ,  H01J37/3056 ,  H01J37/3172 ,  H01J37/3174 ,  H01J37/3177 ,  H01J37/3178 ,  H01J2237/004 ,  H01J2237/0635 ,  H01J2237/1501 ,  H01J2237/24592 ,  H01J2237/30466 ,  H01J2237/30472 ,  H01J2237/31708 ,  H01J2237/31732 ,  H01J2237/31735 ,  H01J2237/31737 ,  H01J2237/3174 ,  H01J2237/31749 ,  H01L21/0228 ,  H01L21/0262 ,  H01L21/26 ,  H01L21/308 ,  H01L21/3085 ,  H01L22/12 ,  H01L22/20 ,  H01L22/26

Abstract: Methods, devices and systems for patterning of substrates using charged particle beams without photomasks and without a resist layer. Material can be removed from a substrate, as directed by a design layout database, localized to positions targeted by multiple, matched charged particle beams. Reducing the number of process steps, and eliminating lithography steps, in localized material removal has the dual benefit of reducing manufacturing cycle time and increasing yield by lowering the probability of defect introduction. Furthermore, highly localized, precision material removal allows for controlled variation of removal rate and enables creation of 3D structures or profiles. Local gas injectors and detectors, and local photon injectors and detectors, are local to corresponding ones of the columns, and can be used to facilitate rapid, accurate, targeted substrate processing.

Abstract translation: 用于使用没有光掩模并且没有抗蚀剂层的带电粒子束来图案化衬底的方法，装置和系统。 材料可以从设计布局数据库指导的基板上移除，该设计布局数据库被定位到由多个匹配的带电粒子束瞄准的位置。 在局部材料去除中减少工艺步骤的数量和消除光刻步骤具有减少制造周期时间并通过降低缺陷引入概率来提高产量的双重优点。 此外，高度局部化的精密材料去除允许控制的去除速率的变化，并且能够创建3D结构或轮廓。 本地气体注入器和检测器以及本地光子注入器和检测器对应于相应的列是局部的，并且可以用于促进快速，准确的靶向基板处理。

公开(公告)号：US09453281B1

公开(公告)日：2016-09-27

申请号：US14745463

申请日：2015-06-21

Applicant: Multibeam Corporation

Inventor： Theodore A. Prescop ,  Kevin M. Monahan ,  David K. Lam ,  Michael C. Smayling

IPC: C23C16/48 ,  H01J37/08 ,  H01J37/30 ,  H01J37/244 ,  H01J37/06

CPC classification number: H01L21/3065 ,  B81C1/00373 ,  B81C2201/0143 ,  B81C2201/0188 ,  C23C14/48 ,  C23C16/047 ,  C23C16/48 ,  C23C16/486 ,  C23C16/487 ,  H01J37/05 ,  H01J37/06 ,  H01J37/08 ,  H01J37/228 ,  H01J37/244 ,  H01J37/30 ,  H01J37/304 ,  H01J37/305 ,  H01J37/3053 ,  H01J37/3056 ,  H01J37/3172 ,  H01J37/3174 ,  H01J37/3177 ,  H01J37/3178 ,  H01J2237/004 ,  H01J2237/0635 ,  H01J2237/1501 ,  H01J2237/24592 ,  H01J2237/30466 ,  H01J2237/30472 ,  H01J2237/31708 ,  H01J2237/31732 ,  H01J2237/31735 ,  H01J2237/31737 ,  H01J2237/3174 ,  H01J2237/31749 ,  H01L21/0228 ,  H01L21/0262 ,  H01L21/26 ,  H01L21/308 ,  H01L21/3085 ,  H01L22/12 ,  H01L22/20 ,  H01L22/26

Abstract: Methods, devices and systems for patterning of substrates using charged particle beams without photomasks and without a resist layer. Material can be deposited onto a substrate, as directed by a design layout database, localized to positions targeted by multiple, matched charged particle beam columns. Reducing the number of process steps, and eliminating lithography steps, in localized material addition has the dual benefit of reducing manufacturing cycle time and increasing yield by lowering the probability of defect introduction. Furthermore, highly localized, precision material deposition allows for controlled variation of deposition rate and enables creation of 3D structures. Local gas injectors and detectors, and local photon injectors and detectors, are local to corresponding ones of the columns, and can be used to facilitate rapid, accurate, targeted, highly configurable substrate processing, advantageously using large arrays of said beam columns.

Abstract translation: 用于使用没有光掩模并且没有抗蚀剂层的带电粒子束来图案化衬底的方法，装置和系统。 材料可以沉积到衬底上，如设计布局数据库所指示的那样，被定位到由多个匹配的带电粒子束柱靶向的位置上。 减少工艺步骤的数量和消除光刻步骤在局部化材料添加中具有减少制造周期时间并通过降低缺陷引入概率来提高产量的双重优点。 此外，高度局部化的精密材料沉积允许沉积速率的受控变化并且能够创建3D结构。 局部气体注入器和检测器以及本地光子注入器和检测器对于相应的列是局部的，并且可以用于促进快速，准确，有针对性的高度可配置的衬底处理，有利地使用所述束柱的大阵列。

公开(公告)号：US09153413B2

公开(公告)日：2015-10-06

申请号：US12528307

申请日：2008-02-22

Applicant: Gilad Almogy ,  Avishai Bartov ,  Juergen Frosien ,  Pavel Adamec ,  Helmut Banzhof

Inventor： Gilad Almogy ,  Avishai Bartov ,  Juergen Frosien ,  Pavel Adamec ,  Helmut Banzhof

IPC: G21K7/00 ,  H01J37/05 ,  H01J37/10 ,  H01J37/147 ,  H01J37/28

CPC classification number: H01J37/05 ,  H01J37/10 ,  H01J37/147 ,  H01J37/28 ,  H01J2237/0635 ,  H01J2237/1508 ,  H01J2237/2449 ,  H01J2237/2817

Abstract: A multi-beam scanning electron beam device (100) is described. The multi-bea scanning electron beam device having a column, includes a multi-beam emitter (110) for emitting a plurality of electron beams (12,13,14), at least one common electron beam optical element (130) having a common opening for at least two of the plurality of electron beams and being adapted for commonly influencing at least two of the plurality of electron beams, at least one individual electron beam optical element (140) for individually influencing the plurality of electron beams, a common objective lens assembly (150) for focusing the plurality of electrons beams having a common excitation for focusing at least two of the plurality of electron beams, and adapted for focusing the plurality of electron beams onto a specimen (20) for generation of a plurality of signal beams (121, 131,141), and a detection assembly (170) for individually detecting each signal beam on a corresponding detection element.

Abstract translation: 描述了多光束扫描电子束装置（100）。 具有列的多头扫描电子束装置包括用于发射多个电子束（12,13,14）的多光束发射器（110），至少一个共同的电子束光学元件（130） 用于多个电子束中的至少两个的开口，并适用于共同影响多个电子束中的至少两个，用于单独影响多个电子束的至少一个单独的电子束光学元件（140），共同的目标 透镜组件（150），用于聚焦具有用于聚焦多个电子束中的至少两个的共同激发的多个电子束，并且适于将多个电子束聚焦到样本（20）上以产生多个信号 光束（121,131,141）和检测组件（170），用于分别检测相应检测元件上的每个信号光束。