公开(公告)号：US09905394B1

公开(公告)日：2018-02-27

申请号：US15434132

申请日：2017-02-16

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Sreenivas Bhattiprolu ,  Lorenz Lechner

IPC: H01J37/244 ,  H01J37/10 ,  H01J37/28 ,  H01J37/305 ,  H01J37/26

CPC classification number: H01J37/244 ,  H01J37/10 ,  H01J37/265 ,  H01J37/28 ,  H01J37/3053 ,  H01J2237/221 ,  H01J2237/31745

Abstract: The system described herein analyzes an object using a charged particle beam device, such as an electron beam device and/or an ion beam device. The charged particle beam device is used to generate high resolution 3D data sets by sequentially removing material from the object, exposing surfaces of the object and generating images of the surfaces. When removing material from the object, an opening having sides is generated. Lamellas are generated using the sides and material characteristics of those lamellas are identified. Moreover, filtered data is generated for each pixel of images of the sides of the opening. The method uses the information with respect to the identified material characteristics, the images of the sides and the filtered data of those images to obtain information on the material characteristics for each pixel of each surface generated when sequentially removing material from the object.

公开(公告)号：US09874524B2

公开(公告)日：2018-01-23

申请号：US15061769

申请日：2016-03-04

Applicant: Applied Materials, Inc.

Inventor： Tae Seung Cho ,  Junghoon Kim ,  Soonwook Jung ,  Soonam Park ,  Dmitry Lubomirsky

IPC: G01J3/44 ,  G01N21/68 ,  H01J37/10 ,  H01J37/32

CPC classification number: G01N21/68 ,  G01J3/0208 ,  G01J3/0229 ,  G01J3/0237 ,  G01J3/0289 ,  G01J3/06 ,  G01J3/443 ,  G01N21/73 ,  G01N2201/0638 ,  G01N2201/068 ,  H01J37/10 ,  H01J37/32458 ,  H01J37/32935 ,  H01J37/32963 ,  H01J37/32972 ,  H01J2237/103 ,  H01J2237/3341

Abstract: Implementations of the present disclosure relate to a plasma chamber having an optical device for measuring emission intensity of plasma species. In one implementation, the plasma chamber includes a chamber body defining a substrate processing region therein, the chamber body having a sidewall, a viewing window disposed in the sidewall, and a plasma monitoring device coupled to the viewing window. The plasma monitoring device includes an objective lens and an aperture member having a pinhole, wherein the aperture member is movable relative to the objective lens by an actuator to adjust the focal point in the plasma using principles of optics, allowing only the light rays from the focal point in the plasma to reach the pinhole. The plasma monitoring device therefore enables an existing OES (coupled to the plasma monitoring device through an optical fiber) to monitor emission intensity of the species at any specific locations of the plasma.

公开(公告)号：US09824849B2

公开(公告)日：2017-11-21

申请号：US14943243

申请日：2015-11-17

Applicant: NuFlare Technology, Inc.

Inventor： Takahito Nakayama ,  Takanao Touya

IPC: H01J37/04 ,  H01J37/10 ,  H01J37/317 ,  B82Y10/00 ,  B82Y40/00

CPC classification number: H01J37/045 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/10 ,  H01J37/3174 ,  H01J2237/30461 ,  H01J2237/31776

Abstract: A charged particle beam writing apparatus according to one aspect of the present invention includes an emission unit to emit a charged particle beam, an electron lens to converge the charged particle beam, a blanking deflector, arranged backward of the electron lens with respect to a direction of an optical axis, to deflect the charged particle beam in the case of performing a blanking control of switching between beam-on and beam-off, a blanking aperture member, arranged backward of the blanking deflector with respect to the direction of the optical axis, to block the charged particle beam having been deflected to be in a beam-off state, and a magnet coil, arranged in a center height position of the blanking deflector, to deflect the charged particle beam.

公开(公告)号：US09799489B2

公开(公告)日：2017-10-24

申请号：US15402500

申请日：2017-01-10

Applicant: ADVANTEST CORPORATION

Inventor： Shinichi Hamaguchi ,  Hitoshi Tanaka ,  Atsushi Tokuno ,  Shinichi Kojima ,  Akio Yamada

IPC: G03B27/02 ,  G03B27/52 ,  H01J37/30 ,  H01J37/317 ,  H01J37/09 ,  H01J37/065

CPC classification number: H01J37/3177 ,  H01J37/045 ,  H01J37/065 ,  H01J37/09 ,  H01J37/10 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/06308 ,  H01J2237/0835 ,  H01J2237/31754

Abstract: The invention provides an exposure apparatus (100) including a formation module (122) which forms charged particle beams with different irradiation positions on a specimen. The formation module (122) includes: a particle source (20) which emits the charged particle beams from an emission region (21) in which a width in a longitudinal direction is different from and a width in a lateral direction orthogonal to the longitudinal direction; an aperture array device (60) provided with openings (62) arranged in an illuminated region (61) in which a width in a longitudinal direction is different from a width in a lateral direction orthogonal to the longitudinal direction; illumination lenses (30, 50) provided between the particle source (20) and the aperture array device (60); and a beam cross-section deformation device (40) which is provided between the particle source (20) and the aperture array device (60), and deforms a cross-sectional shape of the charged particle beams into an anisotropic shape by an action of a magnetic field or an electric field.

公开(公告)号：US20170287674A1

公开(公告)日：2017-10-05

申请号：US15608229

申请日：2017-05-30

Applicant: CARL ZEISS MICROSCOPY GMBH ,  APPLIED MATERIALS ISRAEL LTD.

Inventor： Rainer KNIPPELMEYER ,  Oliver KIENZLE ,  Thomas KEMEN ,  Heiko MUELLER ,  Stephan UHLEMANN ,  Maximilian HAIDER ,  Antonio CASARES ,  Steven ROGERS

IPC: H01J37/04 ,  H01J37/317 ,  H01J37/09 ,  H01J37/28 ,  H01J37/14 ,  H01J37/30 ,  H01J37/153

CPC classification number: H01J37/04 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/10 ,  H01J37/14 ,  H01J37/153 ,  H01J37/28 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/047 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/06 ,  H01J2237/14 ,  H01J2237/2817 ,  H01J2237/31774

Abstract: A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first regularity.

公开(公告)号：US20170263415A1

公开(公告)日：2017-09-14

申请号：US15529281

申请日：2014-11-26

Applicant: Hitachi, Ltd.

Inventor： Daisuke BIZEN ,  Hideo MORISHITA ,  Michio HATANO ,  Hiroya OHTA

IPC: H01J37/26 ,  H01J37/147 ,  H01J37/10 ,  H01J37/285 ,  H01J37/28 ,  H01J37/05

CPC classification number: H01J37/263 ,  H01J37/05 ,  H01J37/10 ,  H01J37/1472 ,  H01J37/21 ,  H01J37/244 ,  H01J37/28 ,  H01J37/285 ,  H01J2237/0473 ,  H01J2237/0475 ,  H01J2237/057 ,  H01J2237/1534 ,  H01J2237/24485 ,  H01J2237/2806 ,  H01J2237/2823

Abstract: To provide a scanning electron microscope having an electron spectroscopy system to attain high spatial resolution and a high secondary electron detection rate under the condition that energy of primary electrons is low, the scanning electron microscope includes: an objective lens 105; primary electron acceleration means 104 that accelerates primary electrons 102; primary electron deceleration means 109 that decelerates the primary electrons and irradiates them to a sample 106; a secondary electron deflector 103 that deflects secondary electrons 110 from the sample to the outside of an optical axis of the primary electrons; a spectroscope 111 that disperses secondary electrons; and a controller that controls application voltage to the objective lens, the primary electron acceleration means and the primary electron deceleration means so as to converge the secondary electrons to an entrance of the spectroscope.

公开(公告)号：US09679738B2

公开(公告)日：2017-06-13

申请号：US14916529

申请日：2014-05-16

Applicant: Hitachi High-Technologies Corporation

Inventor： Hiroaki Matsumoto ,  Takeshi Sato ,  Yoshifumi Taniguchi ,  Ken Harada

IPC: H01J47/00 ,  H01J37/10 ,  H01J37/295 ,  H01J37/04 ,  H01J37/26 ,  G01N23/20 ,  H01J37/09 ,  H01J37/147 ,  H01J37/153 ,  H01J37/24 ,  H01J37/244 ,  H01J37/28 ,  H01J37/05 ,  H01J37/285

CPC classification number: H01J37/10 ,  G01N23/20058 ,  G01N2223/418 ,  H01J37/04 ,  H01J37/05 ,  H01J37/09 ,  H01J37/147 ,  H01J37/1472 ,  H01J37/153 ,  H01J37/24 ,  H01J37/244 ,  H01J37/26 ,  H01J37/261 ,  H01J37/28 ,  H01J37/285 ,  H01J37/295 ,  H01J2237/21 ,  H01J2237/2614

Abstract: The present invention relates to a lens-less Foucault method wherein a transmission electron microscope objective lens (5) is turned off, an electron beam crossover (11, 13) is matched with a selected area aperture (65), and the focal distance of a first imaging lens (61) can be changed to enable switching between a sample image observation mode and a sample diffraction pattern observation mode, characterized in that a deflector (81) is disposed in a stage following the first imaging lens (61), and conditions for an irradiating optical system (4) can be fixed after conditions for the imaging optical system have been determined. This allows a lens-less Foucault method to be implemented in a common general-use transmission electron microscope with no magnetic shielding lens equipped, without burdening the operator.

公开(公告)号：US20170154754A1

公开(公告)日：2017-06-01

申请号：US15257667

申请日：2016-09-06

Applicant: FEI Company

Inventor： Tim Dahmen ,  Niels de Jonge

IPC: H01J37/22 ,  H01J37/10 ,  H01J37/28 ,  H01J37/20

CPC classification number: H01J37/222 ,  H01J37/10 ,  H01J37/20 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/2611 ,  H01J2237/2802

Abstract: The disclosed subject matter relates to testing a sample by means of a particle beam microscope in which the sample is scanned in a point-wise manner by a focused beam of charged particles thereby generating imaging signals. The particle beam dose applied per scanning point is changed during scanning.

公开(公告)号：US20170025244A1

公开(公告)日：2017-01-26

申请号：US15196149

申请日：2016-06-29

Applicant: JEOL Ltd.

Inventor： Kazuya Yamazaki

IPC: H01J37/18 ,  H01J37/10 ,  H01J37/244

CPC classification number: H01J37/18 ,  H01J37/10 ,  H01J37/16 ,  H01J37/244 ,  H01J37/26 ,  H01J2237/002 ,  H01J2237/022 ,  H01J2237/028 ,  H01J2237/18 ,  H01J2237/186

Abstract: There is provided an electron microscope capable of easily achieving power saving. The electron microscope (100) includes a controller (60) for switching the mode of operation of the microscope from a first mode where electron lenses (12, 14, 18, 20) are activated to a second mode where the electron lenses (12, 14, 18, 20) are not activated. During this operation for making a switch from the first mode to the second mode, the controller (60) performs the steps of: closing a first vacuum gate valve (50), opening a second vacuum gate valve (52), and vacuum pumping the interior of the electron optical column (2) of the microscope by the second vacuum pumping unit (40); then controlling a heating section (26) to heat an adsorptive member (242); then opening the first vacuum gate valve (50), closing the second vacuum gate valve (52), and vacuum pumping the interior of the electron optical column (2) by the first vacuum pumping unit (30); and turning off the electron lenses (12, 14, 18, 20).

Abstract translation: 提供了能够容易地实现省电的电子显微镜。 电子显微镜（100）包括用于将电子透镜（12,14,18,20）激活的第一模式切换到第二模式的显微镜的操作模式的控制器（60），其中电子透镜（12， 14,18,20）未被激活。 在从第一模式切换到第二模式的操作期间，控制器（60）执行以下步骤：关闭第一真空闸阀（50），打开第二真空闸阀（52），并真空泵送 通过第二真空抽吸单元（40）显微镜的电子光学柱（2）的内部; 然后控制加热部分（26）以加热吸附构件（242）; 然后打开第一真空闸阀（50），关闭第二真空闸阀（52），并通过第一真空泵单元（30）真空泵送电子光学柱（2）的内部; 并关闭电子透镜（12,14,18,20）。

公开(公告)号：US09552957B2

公开(公告)日：2017-01-24

申请号：US14724432

申请日：2015-05-28

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Dirk Zeidler ,  Thomas Kemen ,  Christof Riedesel ,  Ralf Lenke

IPC: H01J37/00 ,  H01J37/10 ,  H01J37/26

CPC classification number: H01J37/10 ,  H01J37/09 ,  H01J37/12 ,  H01J37/24 ,  H01J37/26 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/1202

Abstract: Particle beam system comprising a particle source; a first multi-aperture plate with a multiplicity of openings downstream of which particle beams are formed; a second multi-aperture plate with a multiplicity of openings which are penetrated by the particle beams; an aperture plate with an opening which is penetrated by all the particles which also penetrate the openings in the first and the second multi-aperture plate; a third multi-aperture plate with a multiplicity of openings which are penetrated by the particle beams, and with a multiplicity of field generators which respectively provide a dipole field or quadrupole field for a beam; and a controller for feeding electric potentials to the multi-aperture plates and the aperture plate so that the second openings in the second multi-aperture plate respectively act as a lens on the particle beams and feed adjustable excitations to the field generators.

Abstract translation: 粒子束系统，包括粒子源; 第一多孔板，其上形成有多个开口，其上形成有粒子束; 第二多孔板，其具有被粒子束穿透的多个开口; 具有开口的孔板，所述开口由穿过第一和第二多孔板中的开口的所有颗粒穿透; 具有由粒子束穿透的多个开口的第三多孔板，以及分别为梁提供偶极场或四极场的多个场发生器; 以及用于将电位馈送到多孔板和孔板的控制器，使得第二多孔板中的第二开口分别用作粒子束上的透镜并将可调节的激发馈送到场发生器。