公开(公告)号：US20200091090A1

公开(公告)日：2020-03-19

申请号：US16691512

申请日：2019-11-21

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Meng-Tse Chen ,  Ching-Hua Hsieh ,  Chung-Shi Liu ,  Chih-Wei Lin ,  Hao-Cheng Hou ,  Jung-Wei Cheng

IPC: H01L23/00 ,  H01L23/31 ,  H01L23/498 ,  H01L21/48 ,  H01L21/56 ,  H01L21/02

Abstract: A package structure including a semiconductor die, a warpage control layer, an insulating encapsulant and a redistribution layer is provided. The semiconductor die has an active surface and a backside surface opposite to the active surface. The warpage control layer is disposed on the backside surface of the semiconductor die, wherein the warpage control layer comprises a material having a Young's Modulus of 100 GPa or more. The insulating encapsulant is encapsulating the semiconductor die and the warpage control layer. The redistribution layer is located on the insulating encapsulant and over the active surface of the semiconductor die.

公开(公告)号：US20190131119A1

公开(公告)日：2019-05-02

申请号：US15794352

申请日：2017-10-26

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Jen-Ti Wang ,  Chih-Wei Lin ,  Fu-Hsien Li ,  Yi-Ming Chen ,  Cheng-Ho Hung

IPC: H01L21/02 ,  H01L21/66 ,  H01L21/673 ,  G01B11/24 ,  G01N33/00

Abstract: A method includes receiving a carrier with a plurality of wafers inside; supplying a purge gas to an inlet of the carrier; extracting an exhaust gas from an outlet of the carrier; and generating a health indicator of the carrier while performing the supplying of the purge gas and the extracting of the exhaust gas.

公开(公告)号：US09947552B2

公开(公告)日：2018-04-17

申请号：US15195321

申请日：2016-06-28

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

Inventor： Shing-Chao Chen ,  Chih-Wei Lin ,  Meng-Tse Chen ,  Hui-Min Huang ,  Ming-Da Cheng ,  Kuo-Lung Pan ,  Wei-Sen Chang ,  Tin-Hao Kuo ,  Hao-Yi Tsai

IPC: H01L21/56 ,  H01L21/48 ,  H01L23/31 ,  H01L23/58

CPC classification number: H01L21/566 ,  H01L21/486 ,  H01L21/561 ,  H01L21/568 ,  H01L23/3114 ,  H01L23/3128 ,  H01L23/315 ,  H01L23/585 ,  H01L24/19 ,  H01L24/20 ,  H01L25/105 ,  H01L25/50 ,  H01L2224/04105 ,  H01L2224/12105 ,  H01L2224/16227 ,  H01L2224/16235 ,  H01L2224/32225 ,  H01L2224/73267 ,  H01L2224/83005 ,  H01L2224/92244 ,  H01L2224/97 ,  H01L2225/1035 ,  H01L2225/1041 ,  H01L2225/1058 ,  H01L2924/18162 ,  H01L2224/83 ,  H01L2224/81

Abstract: Structures and formation methods of a chip package are provided. The method includes forming multiple conductive structures over a carrier substrate and disposing a semiconductor die over the carrier substrate. The method also includes disposing a mold over the carrier substrate. The method further includes forming a protection layer between the mold and the carrier substrate to surround the semiconductor die and the conductive structures. In addition, the method includes removing the mold.

公开(公告)号：US09691708B1

公开(公告)日：2017-06-27

申请号：US15214475

申请日：2016-07-20

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Yu-Chih Huang ,  Chih-Hua Chen ,  Chih-Wei Lin ,  Hao-Yi Tsai ,  Yu-Feng Chen ,  Yu-Jen Cheng ,  Chih-Hsuan Tai

IPC: H01L23/538 ,  H01L23/31 ,  H01L21/48 ,  H01L21/56 ,  H01L23/58 ,  H01L23/00 ,  G06K9/00

CPC classification number: H01L23/5389 ,  G06K9/0002 ,  G06K9/00053 ,  H01L21/4853 ,  H01L21/4857 ,  H01L21/486 ,  H01L21/565 ,  H01L21/568 ,  H01L23/3114 ,  H01L23/5383 ,  H01L23/5384 ,  H01L23/5386 ,  H01L23/562 ,  H01L23/564 ,  H01L23/585 ,  H01L24/19 ,  H01L2224/04105 ,  H01L2224/16227 ,  H01L2224/16237 ,  H01L2224/19 ,  H01L2224/32225 ,  H01L2224/73267 ,  H01L2224/92244 ,  H01L2224/83005

Abstract: A semiconductor package and a manufacturing method for the semiconductor package are provided. The semiconductor package includes a molded semiconductor device, a first redistribution layer, a second redistribution layer, and a plurality of through interlayer vias. The molded semiconductor device includes a die. The first redistribution layer is disposed on a first side of the molded semiconductor device. The second redistribution layer is disposed on a second side of the molded semiconductor device opposite to the first side, wherein the second redistribution layer includes a patterned metal layer having an interconnection circuit portion electrically connected to the die and a metal ring surrounding and insulated from the interconnection circuit portion. The through interlayer vias are located right under the metal ring and extending through the molded semiconductor device to be electrically connect the first redistribution layer and the second redistribution layer.

公开(公告)号：US09418978B2

公开(公告)日：2016-08-16

申请号：US14828244

申请日：2015-08-17

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chen-Hua Yu ,  Chung-Shi Liu ,  Mirng-Ji Lii ,  Ming-Da Cheng ,  Chih-Wei Lin

IPC: H01L25/10 ,  H01L21/56 ,  H01L23/485 ,  H01L25/00 ,  H01L23/538 ,  H01L21/48 ,  H01L21/768 ,  H01L25/065 ,  H01L21/3105 ,  H01L23/00 ,  H01L21/683 ,  H01L23/31 ,  H05K1/18 ,  H01L23/498

CPC classification number: H01L25/50 ,  H01L21/31051 ,  H01L21/4846 ,  H01L21/4853 ,  H01L21/4857 ,  H01L21/565 ,  H01L21/568 ,  H01L21/6835 ,  H01L21/76802 ,  H01L21/76819 ,  H01L21/76877 ,  H01L21/76898 ,  H01L23/3128 ,  H01L23/49816 ,  H01L23/49822 ,  H01L23/49827 ,  H01L23/5383 ,  H01L24/16 ,  H01L24/19 ,  H01L24/32 ,  H01L24/81 ,  H01L25/0657 ,  H01L25/105 ,  H01L2221/68345 ,  H01L2224/04105 ,  H01L2224/12105 ,  H01L2224/13082 ,  H01L2224/131 ,  H01L2224/16225 ,  H01L2224/16237 ,  H01L2224/2919 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/45124 ,  H01L2224/45144 ,  H01L2224/73204 ,  H01L2224/73253 ,  H01L2224/73267 ,  H01L2224/81005 ,  H01L2224/81191 ,  H01L2224/81815 ,  H01L2224/83104 ,  H01L2225/06513 ,  H01L2225/06548 ,  H01L2225/06555 ,  H01L2225/06572 ,  H01L2225/06589 ,  H01L2225/1023 ,  H01L2225/1058 ,  H01L2924/00014 ,  H01L2924/12042 ,  H01L2924/15311 ,  H01L2924/15331 ,  H01L2924/181 ,  H05K1/185 ,  H01L2924/00 ,  H01L2924/00012 ,  H01L2924/014 ,  H01L2924/0665 ,  H01L2224/48

Abstract: A package-on-package (PoP) structure comprises a first package and a second package. The first package comprises a first die, a second die, and a core material. The core material has a first surface and a second surface. A first redistribution layer (RDL) is on the first surface, and a second RDL is on the second surface. The first die is disposed in the core material between the first surface and the second surface. The second die is coupled to one of the first RDL and the second RDL. The second package comprises a third die and an interposer. The interposer has a first side and a second side. The third die is coupled to the second side of the interposer. The first package is coupled to the second package by first electrical connectors coupled to the second side of the interposer and the first RDL.

Abstract translation: 封装封装（PoP）结构包括第一封装和第二封装。 第一包装包括第一模具，第二模具和芯材料。 芯材料具有第一表面和第二表面。 第一再分配层（RDL）位于第一表面上，第二RDL位于第二表面上。 第一模具设置在第一表面和第二表面之间的芯材料中。 第二管芯耦合到第一RDL和第二RDL之一。 第二包装包括第三管芯和插入件。 插入器具有第一侧和第二侧。 第三裸片耦合到插入器的第二侧。 第一封装通过耦合到插入件的第二侧和第一RDL的第一电连接器耦合到第二封装。

公开(公告)号：US20150357320A1

公开(公告)日：2015-12-10

申请号：US14828244

申请日：2015-08-17

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

Inventor： Chen-Hua Yu ,  Chung-Shi Liu ,  Mirng-Ji Lii ,  Ming-Da Cheng ,  Chih-Wei Lin

IPC: H01L25/00 ,  H01L21/56 ,  H01L23/00 ,  H01L25/065 ,  H01L21/3105 ,  H01L21/48 ,  H01L21/768

CPC classification number: H01L25/50 ,  H01L21/31051 ,  H01L21/4846 ,  H01L21/4853 ,  H01L21/4857 ,  H01L21/565 ,  H01L21/568 ,  H01L21/6835 ,  H01L21/76802 ,  H01L21/76819 ,  H01L21/76877 ,  H01L21/76898 ,  H01L23/3128 ,  H01L23/49816 ,  H01L23/49822 ,  H01L23/49827 ,  H01L23/5383 ,  H01L24/16 ,  H01L24/19 ,  H01L24/32 ,  H01L24/81 ,  H01L25/0657 ,  H01L25/105 ,  H01L2221/68345 ,  H01L2224/04105 ,  H01L2224/12105 ,  H01L2224/13082 ,  H01L2224/131 ,  H01L2224/16225 ,  H01L2224/16237 ,  H01L2224/2919 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/45124 ,  H01L2224/45144 ,  H01L2224/73204 ,  H01L2224/73253 ,  H01L2224/73267 ,  H01L2224/81005 ,  H01L2224/81191 ,  H01L2224/81815 ,  H01L2224/83104 ,  H01L2225/06513 ,  H01L2225/06548 ,  H01L2225/06555 ,  H01L2225/06572 ,  H01L2225/06589 ,  H01L2225/1023 ,  H01L2225/1058 ,  H01L2924/00014 ,  H01L2924/12042 ,  H01L2924/15311 ,  H01L2924/15331 ,  H01L2924/181 ,  H05K1/185 ,  H01L2924/00 ,  H01L2924/00012 ,  H01L2924/014 ,  H01L2924/0665 ,  H01L2224/48

Abstract: A package-on-package (PoP) structure comprises a first package and a second package. The first package comprises a first die, a second die, and a core material. The core material has a first surface and a second surface. A first redistribution layer (RDL) is on the first surface, and a second RDL is on the second surface. The first die is disposed in the core material between the first surface and the second surface. The second die is coupled to one of the first RDL and the second RDL. The second package comprises a third die and an interposer. The interposer has a first side and a second side. The third die is coupled to the second side of the interposer. The first package is coupled to the second package by first electrical connectors coupled to the second side of the interposer and the first RDL.

Abstract translation: 封装封装（PoP）结构包括第一封装和第二封装。 第一包装包括第一模具，第二模具和芯材料。 芯材料具有第一表面和第二表面。 第一再分配层（RDL）位于第一表面上，第二RDL位于第二表面上。 第一模具设置在第一表面和第二表面之间的芯材料中。 第二管芯耦合到第一RDL和第二RDL之一。 第二包装包括第三管芯和插入件。 插入器具有第一侧和第二侧。 第三裸片耦合到插入器的第二侧。 第一封装通过耦合到插入件的第二侧和第一RDL的第一电连接器耦合到第二封装。

公开(公告)号：US12300659B2

公开(公告)日：2025-05-13

申请号：US17646816

申请日：2022-01-03

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Ying-Jui Huang ,  Chien Ling Hwang ,  Chih-Wei Lin ,  Ching-Hua Hsieh ,  Chung-Shi Liu ,  Chen-Hua Yu

IPC: H01L23/31 ,  H01L21/48 ,  H01L21/56 ,  H01L21/683 ,  H01L23/00 ,  H01L23/538

Abstract: A method includes placing a first package component and a second package component over a carrier. The first conductive pillars of the first package component and second conductive pillars of the second package component face the carrier. The method further includes encapsulating the first package component and the second package component in an encapsulating material, de-bonding the first package component and the second package component from the carrier, planarizing the first conductive pillars, the second conductive pillars, and the encapsulating material, and forming redistribution lines to electrically couple to the first conductive pillars and the second conductive pillars.

公开(公告)号：US12162134B2

公开(公告)日：2024-12-10

申请号：US18170962

申请日：2023-02-17

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Jen-Ti Wang ,  Chih-Wei Lin ,  Fu-Hsien Li ,  Yi-Ming Chen ,  Cheng-Ho Hung

IPC: B25J11/00 ,  B23P6/00 ,  B25J1/04 ,  B25J18/00 ,  G01B11/24 ,  G01B11/30 ,  G01N33/00 ,  H01L21/02 ,  H01L21/66 ,  H01L21/673 ,  H01L21/677

Abstract: A system includes a plurality of semiconductor processing tools; a carrier purge station; a carrier repair station; and an overhead transport (OHT) loop for transporting one or more substrate carriers among the plurality of semiconductor processing tools, the carrier purge station, and the carrier repair station. The carrier purge station is configured to receive a substrate carrier from one of the plurality of semiconductor processing tools, purge the substrate carrier with an inert gas, and determine if the substrate carrier needs repair. The carrier repair station is configured to receive a substrate carrier to be repaired and replace one or more parts in the substrate carrier.

公开(公告)号：US12107051B2

公开(公告)日：2024-10-01

申请号：US18230829

申请日：2023-08-07

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chen-Hua Yu ,  Chung-Shi Liu ,  Chih-Wei Lin ,  Ming-Da Cheng

IPC: H01L23/538 ,  H01L21/56 ,  H01L23/00 ,  H01L23/31 ,  H01L23/498 ,  H01L25/10 ,  H01L21/60

CPC classification number: H01L23/5384 ,  H01L21/56 ,  H01L23/3128 ,  H01L23/49805 ,  H01L23/49827 ,  H01L23/49838 ,  H01L23/5386 ,  H01L24/19 ,  H01L24/20 ,  H01L24/73 ,  H01L24/92 ,  H01L25/105 ,  H01L21/568 ,  H01L2021/6006 ,  H01L23/49816 ,  H01L23/5389 ,  H01L24/32 ,  H01L24/83 ,  H01L2224/04105 ,  H01L2224/12105 ,  H01L2224/19 ,  H01L2224/2101 ,  H01L2224/214 ,  H01L2224/27334 ,  H01L2224/32225 ,  H01L2224/73267 ,  H01L2224/92244 ,  H01L2225/1035 ,  H01L2225/1058 ,  H01L2924/141 ,  H01L2924/143 ,  H01L2924/1431 ,  H01L2924/1432 ,  H01L2924/1434 ,  H01L2924/1436 ,  H01L2924/1437 ,  H01L2924/15311 ,  H01L2924/1533 ,  H01L2224/19 ,  H01L2224/83005

Abstract: A semiconductor device and method for forming the semiconductor device is provided. The semiconductor device includes an integrated circuit having through vias adjacent to the integrated circuit die, wherein a molding compound is interposed between the integrated circuit die and the through vias. The through vias have a projection extending through a patterned layer, and the through vias may be offset from a surface of the patterned layer. The recess may be formed by selectively removing a seed layer used to form the through vias.

公开(公告)号：US20240178091A1

公开(公告)日：2024-05-30

申请号：US18435362

申请日：2024-02-07

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Tzu-Sung Huang ,  Ming Hung Tseng ,  Yen-Liang Lin ,  Hao-Yi Tsai ,  Chi-Ming Tsai ,  Chung-Shi Liu ,  Chih-Wei Lin ,  Ming-Che Ho

IPC: H01L23/31 ,  H01L21/56 ,  H01L21/768 ,  H01L23/16 ,  H01L23/522 ,  H01L23/528

CPC classification number: H01L23/3157 ,  H01L21/56 ,  H01L21/76802 ,  H01L21/76843 ,  H01L23/16 ,  H01L23/5226 ,  H01L23/528

Abstract: In an embodiment, a device includes: an integrated circuit die; an encapsulant at least partially surrounding the integrated circuit die, the encapsulant including fillers having an average diameter; a through via extending through the encapsulant, the through via having a lower portion of a constant width and an upper portion of a continuously decreasing width, a thickness of the upper portion being greater than the average diameter of the fillers; and a redistribution structure including: a dielectric layer on the through via, the encapsulant, and the integrated circuit die; and a metallization pattern having a via portion extending through the dielectric layer and a line portion extending along the dielectric layer, the metallization pattern being electrically coupled to the through via and the integrated circuit die.