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23 条记录 (耗时 0.02 秒)

    Electrophoretically depositable photosensitive polymer composition
    2.
    发明授权
    Electrophoretically depositable photosensitive polymer composition 失效
    电泳沉积的光敏聚合物组合物

    公开(公告)号：US4877818A

    公开(公告)日：1989-10-31

    申请号：US142110

    申请日：1988-01-11

    申请人： William D. Emmons ,  Mark R. Winkle

    发明人： William D. Emmons ,  Mark R. Winkle

    IPC分类号： G03F7/027 ,  G03F7/16

    CPC分类号： G03F7/164 ,  G03F7/027 ,  Y10S522/904

    摘要： The invention is directed to a photosensitive polymer composition capable of being electrophoretically depositable as an adherent, uniform photosensitive film on a conductive surface. The photosensitive polymer composition useful for electrodeposition is formed from an aqueous solution or emulsion of at least one polymer having charged carrier groups, a photoinitiator and a source of unsaturation for crosslinking the resulting film upon exposure to actinic radiation. The photosensitive film formed from the photosensitive polymer composition is aqueous developable and resistant to strong inorganic acids and strong bases. The photosensitive polymer composition is useful in the preparation of printed circuit boards, lithographic printing plates, cathode ray tubes, as well as in chemical milling, solder resist and planarizing layer applications.

    摘要翻译： 本发明涉及能够在导电表面上作为粘附的均匀感光膜电泳沉积的光敏聚合物组合物。 可用于电沉积的光敏聚合物组合物由具有带电荷的载体基团的至少一种聚合物的水溶液或乳液形成，光引发剂和不饱和源用于在曝光于光化辐射下使得到的膜交联。 由感光性聚合物组合物形成的感光性膜为水性显影性，耐强的无机酸和强碱。 感光性聚合物组合物可用于制备印刷电路板，平版印刷版，阴极射线管，以及化学研磨，阻焊剂和平坦化层应用。

    Electrophoretic deposition process
    3.
    发明授权
    Electrophoretic deposition process 失效
    电泳沉积工艺

    公开(公告)号：US4592816A

    公开(公告)日：1986-06-03

    申请号：US654821

    申请日：1984-09-26

    申请人： William D. Emmons ,  Mark R. Winkle

    发明人： William D. Emmons ,  Mark R. Winkle

    IPC分类号： C08F2/00 ,  C08F2/48 ,  C08F2/50 ,  C08F290/00 ,  C08F299/00 ,  C23F1/02 ,  C25D13/04 ,  C25D13/06 ,  G03C1/74 ,  G03F7/004 ,  G03F7/027 ,  G03F7/028 ,  G03F7/038 ,  G03F7/16 ,  H05K3/06 ,  C25D13/12 ,  C25D13/20

    CPC分类号： G03F7/027 ,  G03F7/164 ,  Y10S430/138

    摘要： The invention is directed to a photosensitive polymer composition capable of being electrophoretically depositable as an adherent, uniform photosensitive film on a conductive surface. The photosensitive polymer composition useful for electrodeposition is formed from an aqueous solution or emulsion of at least one polymer having charged carrier groups, a photoinitiator and a source of unsaturation for crosslinking the resulting film upon exposure to actinic radiation. The photosensitive film formed from the photosensitive polymer composition is aqueous developable and resistant to strong inorganic acids and strong bases. The photosensitive polymer composition is useful in the preparation of printed circuit boards, lithographic printing plates, cathode ray tubes, as well as in chemical milling, solder resist and planarizing layer applications.

    摘要翻译： 本发明涉及能够在导电表面上作为粘附的均匀感光膜电泳沉积的光敏聚合物组合物。 可用于电沉积的光敏聚合物组合物由具有带电荷的载体基团的至少一种聚合物的水溶液或乳液形成，光引发剂和不饱和源用于在曝光于光化辐射下使得到的膜交联。 由感光性聚合物组合物形成的感光性膜为水性显影性，耐强的无机酸和强碱。 感光性聚合物组合物可用于制备印刷电路板，平版印刷版，阴极射线管，以及化学研磨，阻焊剂和平坦化层应用。

    Amine flux composition and method of soldering
    7.
    发明授权
    Amine flux composition and method of soldering 有权
    胺助焊剂组成及焊接方法

    公开(公告)号：US08070046B1

    公开(公告)日：2011-12-06

    申请号：US12958493

    申请日：2010-12-02

    申请人： David D. Fleming ,  Mike K. Gallagher ,  Kim Sang Ho ,  Xiang-Qian Liu ,  Mark R. Winkle ,  Asghar Akber Peera ,  Glenn N. Robinson ,  Ian Tomlinson

    发明人： David D. Fleming ,  Mike K. Gallagher ,  Kim Sang Ho ,  Xiang-Qian Liu ,  Mark R. Winkle ,  Asghar Akber Peera ,  Glenn N. Robinson ,  Ian Tomlinson

    IPC分类号： B23K31/02 ,  B23K35/34

    CPC分类号： B23K35/3615 ,  B23K1/0016 ,  B23K1/203 ,  B23K35/362 ,  B23K2101/38 ,  B23K2101/42 ,  C07C215/18 ,  C07C215/28 ,  C07C217/28

    摘要： An amine flux composition is provided, comprising, as an initial component: an amine fluxing agent represented by formula I: wherein R1, R2, R3 and R4 are independently selected from a hydrogen, a substituted C1-80 alkyl group, an unsubstituted C1-80 alkyl group, a substituted C7-80 arylalkyl group and an unsubstituted C7-80 arylalkyl group; wherein R7 and R8 are independently selected from a C1-20 alkyl group, a substituted C1-20 alkyl group, a C6-20 aryl group and a substituted C6-20 aryl group or wherein R7 and R8, together with the carbon to which they are attached, form a C3-20 cycloalkyl ring optionally substituted with a C1-6 alkyl group; wherein R10 and R11 are independently selected from a C1-20 alkyl group, a substituted C1-20 alkyl group, a C6-20 aryl group and a substituted C6-20 aryl group or wherein R10 and R11, together with the carbon to which they are attached, form a C3-20 cycloalkyl ring optionally substituted with a C1-6 alkyl group; and, wherein R9 is selected from a hydrogen, a C1-30 alkyl group, a substituted C1-30 alkyl group, a C6-30 aryl group and a substituted C6-30 aryl group. Also provided is a method of soldering an electrical contact using the amine flux composition.

    摘要翻译： 提供了一种胺助剂组合物，其包含作为初始组分的：由式I表示的胺助熔剂：其中R 1，R 2，R 3和R 4独立地选自氢，取代的C 1-80烷基，未取代的C1- 80烷基，取代的C7-80芳烷基和未取代的C7-80芳烷基; 其中R 7和R 8独立地选自C 1-20烷基，取代的C 1-20烷基，C 6-20芳基和取代的C 6-20芳基，或者其中R 7和R 8与它们 连接，形成任选被C 1-6烷基取代的C 3-20环烷基环; 其中R 10和R 11独立地选自C 1-20烷基，取代的C 1-20烷基，C 6-20芳基和取代的C 6-20芳基，或其中R 10和R 11与它们 连接，形成任选被C 1-6烷基取代的C 3-20环烷基环; 并且其中R9选自氢，C1-30烷基，取代的C1-30烷基，C6-30芳基和取代的C6-30芳基。 还提供了使用胺通量组合物焊接电接触的方法。

    Elimination of film defects due to hydrogen evolution during cathodic electrodeposition
    8.
    发明授权
    Elimination of film defects due to hydrogen evolution during cathodic electrodeposition 失效
    消除阴极电沉积过程中由于析氢导致的膜缺陷

    公开(公告)号：US5206277A

    公开(公告)日：1993-04-27

    申请号：US724065

    申请日：1991-07-01

    申请人： Mark R. Winkle

    发明人： Mark R. Winkle

    IPC分类号： C09D5/44 ,  H05K3/00

    CPC分类号： C09D5/4492 ,  H05K3/0076 ,  H05K3/0079

    摘要： This invention is directed to a method for eliminating or reducing pinhole defects in cataphoretically deposited films without interfering with the electrolysis of water needed for electrodeposition. This method comprises decreasing the evolution of hydrogen gas at the cathode by adding a compound to the emulsion. This compound is reduced by the hydrogen produced at the cathode during the electrodeposition. The hydrogen reacts with the this non-gaseous compound rather than becoming hydrogen gas and forming bubbles which lead to pinhole defects.

    摘要翻译： 本发明涉及消除或减少电渗沉积膜中针孔缺陷的方法，而不干扰电沉积所需的电解电解。 该方法包括通过向乳液中加入化合物来减少阴极处的氢气的演变。 在电沉积期间，该化合物被阴极产生的氢还原。 氢气与这种非气态化合物反应而不是变成氢气并形成导致针孔缺陷的气泡。

    Polyamine flux composition and method of soldering
    10.
    发明授权
    Polyamine flux composition and method of soldering 有权
    多胺助焊剂组成及焊接方法

    公开(公告)号：US08070044B1

    公开(公告)日：2011-12-06

    申请号：US12958480

    申请日：2010-12-02

    申请人： David D. Fleming ,  Mike K. Gallagher ,  Kim Sang Ho ,  Xiang-Qian Liu ,  Mark R. Winkle

    发明人： David D. Fleming ,  Mike K. Gallagher ,  Kim Sang Ho ,  Xiang-Qian Liu ,  Mark R. Winkle

    IPC分类号： B23K31/02 ,  B23K35/34

    CPC分类号： B23K35/36 ,  B22F2998/00 ,  B23K35/025 ,  B23K35/262 ,  B23K35/3612 ,  B23K35/362 ,  C22C12/00 ,  C22C13/00 ,  C22C1/0483

    摘要： A polyamine flux composition is provided, comprising, as an initial component: a polyamine fluxing agent represented by formula I: wherein R1, R2, R3 and R4 are independently selected from a hydrogen, a substituted C1-80 alkyl group, an unsubstituted C1-80 alkyl group, a substituted C7-80 arylalkyl group and an unsubstituted C7-80 arylalkyl group; wherein R7 comprises at least two tertiary carbons and is selected from an unsubstituted C5-80 alkyl group, a substituted C5-80 alkyl group, an unsubstituted C12-80 arylalkyl group and a substituted C12-80 arylalkyl group; and, wherein the two nitrogens shown in formula I are each separately bound to one of the at least two tertiary carbons of R7; with the proviso that when the polyamine fluxing agent of formula I is represented by formula Ia: then zero to three of R1, R2, R3 and R4 is(are) hydrogen. Also provided is a method of soldering an electrical contact using the polyamine flux composition.

    摘要翻译： 提供多胺助剂组合物，其包含作为初始组分的由式I表示的多胺助熔剂：其中R1，R2，R3和R4独立地选自氢，取代的C1-80烷基，未取代的C1- 80烷基，取代的C7-80芳烷基和未取代的C7-80芳烷基; 其中R7包含至少两个叔碳，并且选自未取代的C 5-80烷基，取代的C 5-80烷基，未取代的C 12〜80芳烷基和取代的C 12〜80芳烷基; 并且其中式I中所示的两个氮各自独立地与R7的至少两个叔碳中的一个结合; 条件是当式I的多胺助熔剂由式Ia表示时：然后R 1，R 2，R 3和R 4中的0至3个为氢。 还提供了使用多胺通量组合物焊接电接触的方法。