Systems and methods for nanowire growth and manufacturing
    2.
    发明授权
    Systems and methods for nanowire growth and manufacturing 有权
    纳米线生长和制造的系统和方法

    公开(公告)号:US07985454B2

    公开(公告)日:2011-07-26

    申请号:US12236209

    申请日:2008-09-23

    IPC分类号: B05D1/38

    摘要: The present invention is directed to compositions of matter, systems, and methods to manufacture nanowires. In an embodiment, a method to produce a catalytic-coated nanowire growth substrate for nanowire growth is disclosed which comprises: (a) depositing a buffer layer on a substrate; (b) treating the buffer layer with boiled water or steam to enhance interactions between the buffer layer and catalyst particles; and (c) depositing catalytic particles on a surface of the buffer layer. Methods to develop and use this catalytic-coated nanowire growth substrate are disclosed.

    摘要翻译: 本发明涉及制备纳米线的物质,体系和方法的组合物。 在一个实施方案中,公开了一种制备用于纳米线生长的催化涂覆的纳米线生长衬底的方法,其包括:(a)在衬底上沉积缓冲层; (b)用开水或蒸汽处理缓冲层以增强缓冲层和催化剂颗粒之间的相互作用; 和(c)在缓冲层的表面上沉积催化剂颗粒。 公开了开发和使用该催化涂覆的纳米线生长衬底的方法。

    Systems and methods for nanowire growth and manufacturing
    6.
    发明申请
    Systems and methods for nanowire growth and manufacturing 审中-公开
    纳米线生长和制造的系统和方法

    公开(公告)号:US20050279274A1

    公开(公告)日:2005-12-22

    申请号:US11103642

    申请日:2005-04-12

    IPC分类号: C01B31/02 H01L21/322

    摘要: The present invention is directed to compositions of matter, systems, and methods to manufacture nanowires. In an embodiment, a buffer layer is placed on a nanowire growth substrate and catalytic nanoparticles are added to form a catalytic-coated nanowire growth substrate. Methods to develop and use this catalytic-coated nanowire growth substrate are disclosed. In a further aspect of the invention, in an embodiment a nanowire growth system using a foil roller to manufacture nanowires is provided.

    摘要翻译: 本发明涉及制备纳米线的物质,体系和方法的组合物。 在一个实施方案中,将缓冲层放置在纳米线生长衬底上并加入催化纳米颗粒以形成催化涂覆的纳米线生长衬底。 公开了开发和使用该催化涂覆的纳米线生长衬底的方法。 在本发明的另一方面,在一个实施方案中,提供了使用箔辊制造纳米线的纳米线生长系统。

    Methods for Nanostructure Doping
    8.
    发明申请
    Methods for Nanostructure Doping 审中-公开
    纳米结构掺杂方法

    公开(公告)号:US20100167512A1

    公开(公告)日:2010-07-01

    申请号:US12720125

    申请日:2010-03-09

    IPC分类号: H01L21/22

    摘要: Methods of doping nanostructures, such as nanowires, are disclosed. The methods provide a variety of approaches for improving existing methods of doping nanostructures. The embodiments include the use of a sacrificial layer to promote uniform dopant distribution within a nanostructure during post-nanostructure synthesis doping. In another embodiment, a high temperature environment is used to anneal nanostructure damage when high energy ion implantation is used. In another embodiment rapid thermal annealing is used to drive dopants from a dopant layer on a nanostructure into the nanostructure. In another embodiment a method for doping nanowires on a plastic substrate is provided that includes depositing a dielectric stack on a plastic substrate to protect the plastic substrate from damage during the doping process. An embodiment is also provided that includes selectively using high concentrations of dopant materials at various times in synthesizing nanostructures to realize novel crystallographic structures within the resulting nanostructure.

    摘要翻译: 公开了掺杂纳米结构的方法,例如纳米线。 该方法提供了改进现有掺杂纳米结构方法的各种方法。 这些实施方案包括在后纳米结构合成掺杂期间使用牺牲层来促进纳米结构内的均匀掺杂剂分布。 在另一个实施例中,当使用高能离子注入时,使用高温环境退火纳米结构损伤。 在另一个实施方案中,使用快速热退火来将掺杂剂从纳米结构上的掺杂剂层驱动到纳米结构中。 在另一个实施例中,提供了一种在塑料衬底上掺杂纳米线的方法,其包括在塑料衬底上沉积电介质叠层以保护塑料衬底免于在掺杂过程期间损坏。 还提供了一种实施方案,其包括在合成纳米结构中在不同时间选择性地使用高浓度的掺杂剂材料以在所得纳米结构内实现新的晶体结构。