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公开(公告)号:US5302547A
公开(公告)日:1994-04-12
申请号:US14609
申请日:1993-02-08
申请人: Robert J. Wojnarowski , Herbert S. Cole , Richard J. Saia , Thomas B. Gorczyca , Ernest W. Balch
发明人: Robert J. Wojnarowski , Herbert S. Cole , Richard J. Saia , Thomas B. Gorczyca , Ernest W. Balch
IPC分类号: H01L23/12 , H01L21/268 , H01L21/302 , H01L21/311 , H01L21/48 , H01L21/768 , H01L23/538 , H05K1/03 , H05K3/00 , H01L21/283 , H01L21/306
CPC分类号: H05K3/0041 , H01L21/31138 , H01L21/486 , H01L21/76802 , H01L23/5389 , H01L24/24 , H01L24/82 , H01L2224/0401 , H01L2224/04105 , H01L2224/1147 , H01L2224/2402 , H01L2224/24227 , H01L2224/32225 , H01L2224/73267 , H01L2224/92244 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01014 , H01L2924/01018 , H01L2924/01027 , H01L2924/01029 , H01L2924/01033 , H01L2924/01042 , H01L2924/01074 , H01L2924/01075 , H01L2924/12042 , H01L2924/14 , H01L2924/15153 , H01L2924/15165 , H01L2924/30105 , H01L2924/3011 , H05K1/036 , H05K2201/0166 , H05K2201/0195 , H05K3/0032 , Y10S438/94 , Y10S438/945
摘要: A differentiable ablation approach to patterning dielectrics which are not of the same absorbance uses an absorbant dielectric at a specified laser wavelength over a non-absorbant dielectric at that wavelength. The absorbant dielectric may be laser-patterned and become an integral mask enabling plasma etching of the underlying non-absorbant dielectric. If the patterning of the absorbant dielectric involves vias, polymer ridges formed around via surfaces during laser patterning may be removed at the same time the underlying non-absorbant dielectric is etched using a transparent, oxygen plasma resistant mask. Alternatively, an inert mask may be used instead of the absorbant dielectric to allow plasma etching of the non-absorbant dielectric.
摘要翻译: 对于不相同吸光度的电介质图案的可微分消融方法,在该波长处的非吸收性电介质上使用指定的激光波长的吸收介质。 吸收介质可以是激光图案化的,并且成为能够对下面的非吸收性电介质进行等离子体蚀刻的整体掩模。 如果吸收介质的图案化涉及通孔,则可以在激光图案化期间在通孔表面周围形成的聚合物脊在同时使用透明的耐氧等离子体掩模蚀刻下面的非吸收性电介质。 或者,可以使用惰性掩模来代替吸收介质,以允许对非吸收性介质的等离子体蚀刻。
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公开(公告)号:US06715200B2
公开(公告)日:2004-04-06
申请号:US09846888
申请日:2001-05-01
申请人: Thomas P. Feist , Wit C. Bushko , Herbert S. Cole , John E. Davis , Thomas B. Gorczyca , Joseph T. Woods
发明人: Thomas P. Feist , Wit C. Bushko , Herbert S. Cole , John E. Davis , Thomas B. Gorczyca , Joseph T. Woods
IPC分类号: H01F300
CPC分类号: B82Y30/00 , B29C43/021 , B29C2043/025 , B29D17/005 , B29L2017/005 , B82Y10/00 , G11B5/72 , G11B5/73 , G11B5/7315 , G11B5/84 , G11B5/8404 , G11B5/855 , G11B7/24038 , G11B7/24047 , G11B7/24056 , G11B7/253 , G11B7/2531 , G11B7/2532 , G11B7/2533 , G11B7/2534 , G11B7/2536 , G11B7/2542 , G11B7/2548 , G11B7/2578 , G11B7/258 , G11B7/259 , G11B7/26 , G11B7/263 , G11B11/10582 , G11B11/10584 , G11B11/10586 , G11B2007/25708 , G11B2007/25713 , G11C13/02 , G11C13/025 , Y10T29/49002 , Y10T29/4902 , Y10T29/4903 , Y10T29/49043 , Y10T29/49069 , Y10T29/49158 , Y10T29/49172 , Y10T29/49176 , Y10T156/1002 , Y10T428/24355 , Y10T428/24479 , Y10T428/24967 , Y10T428/265 , Y10T428/266 , Y10T428/31 , Y10T428/3154
摘要: Methods for forming data storage media and the media formed thereby are disclosed herein. In one embodiment, the method for forming a data storage media, comprises: injection molding a substrate comprising surface features, wherein said surface features have greater than about 90% of a surface feature replication of an original master; and disposing a data layer over at least one surface of said substrate; wherein said data storage media has an axial displacement peak of less than about 500&mgr; under shock or vibration excitation.
摘要翻译: 本文公开了形成数据存储介质和由此形成的介质的方法。 在一个实施例中,用于形成数据存储介质的方法包括:注射成型包含表面特征的基底,其中所述表面特征具有大于原始主体的表面特征复制的大约90% 以及在所述衬底的至少一个表面上设置数据层; 其中所述数据存储介质在冲击或振动激励下具有小于约500mu的轴向位移峰。
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公开(公告)号:US20080201937A1
公开(公告)日:2008-08-28
申请号:US11873782
申请日:2007-10-17
申请人: Thomas P. Feist , Wit C. Bushko , Herbert S. Cole , John E. Davis , Thomas B. Gorczyca , Joseph T. Woods
发明人: Thomas P. Feist , Wit C. Bushko , Herbert S. Cole , John E. Davis , Thomas B. Gorczyca , Joseph T. Woods
IPC分类号: H01F7/06
CPC分类号: B82Y30/00 , B29C43/021 , B29C2043/025 , B29D17/005 , B29L2017/005 , B82Y10/00 , G11B5/72 , G11B5/73 , G11B5/7315 , G11B5/84 , G11B5/8404 , G11B5/855 , G11B7/24038 , G11B7/24047 , G11B7/24056 , G11B7/253 , G11B7/2531 , G11B7/2532 , G11B7/2533 , G11B7/2534 , G11B7/2536 , G11B7/2542 , G11B7/2548 , G11B7/2578 , G11B7/258 , G11B7/259 , G11B7/26 , G11B7/263 , G11B11/10582 , G11B11/10584 , G11B11/10586 , G11B2007/25708 , G11B2007/25713 , G11C13/02 , G11C13/025 , Y10T29/49002 , Y10T29/4902 , Y10T29/4903 , Y10T29/49043 , Y10T29/49069 , Y10T29/49158 , Y10T29/49172 , Y10T29/49176 , Y10T156/1002 , Y10T428/24355 , Y10T428/24479 , Y10T428/24967 , Y10T428/265 , Y10T428/266 , Y10T428/31 , Y10T428/3154
摘要: Methods for forming data storage media and the media formed thereby are disclosed herein. In one embodiment, the method for forming a data storage media, comprises: injection molding a substrate comprising surface features, wherein said surface features have greater than about 90% of a surface feature replication of an original master; and disposing a data layer over at least one surface of said substrate; wherein said data storage media has an axial displacement peak of less than about 500μ under shock or vibration excitation when excited by a 1 G sinusoidal loading.
摘要翻译: 本文公开了形成数据存储介质和由此形成的介质的方法。 在一个实施例中,用于形成数据存储介质的方法包括:注射成型包含表面特征的基底,其中所述表面特征具有大于原始主体的表面特征复制的大约90% 以及在所述衬底的至少一个表面上设置数据层; 其中所述数据存储介质在由G G正弦负载激励时,在冲击或振动激励下具有小于约500mu的轴向位移峰。
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公开(公告)号:US07299535B2
公开(公告)日:2007-11-27
申请号:US10757877
申请日:2004-01-14
申请人: Thomas P. Feist , Wit C. Bushko , Herbert S. Cole , John E. Davis , Thomas B. Gorczyca , Joseph T. Woods
发明人: Thomas P. Feist , Wit C. Bushko , Herbert S. Cole , John E. Davis , Thomas B. Gorczyca , Joseph T. Woods
CPC分类号: B82Y30/00 , B29C43/021 , B29C2043/025 , B29D17/005 , B29L2017/005 , B82Y10/00 , G11B5/72 , G11B5/73 , G11B5/7315 , G11B5/84 , G11B5/8404 , G11B5/855 , G11B7/24038 , G11B7/24047 , G11B7/24056 , G11B7/253 , G11B7/2531 , G11B7/2532 , G11B7/2533 , G11B7/2534 , G11B7/2536 , G11B7/2542 , G11B7/2548 , G11B7/2578 , G11B7/258 , G11B7/259 , G11B7/26 , G11B7/263 , G11B11/10582 , G11B11/10584 , G11B11/10586 , G11B2007/25708 , G11B2007/25713 , G11C13/02 , G11C13/025 , Y10T29/49002 , Y10T29/4902 , Y10T29/4903 , Y10T29/49043 , Y10T29/49069 , Y10T29/49158 , Y10T29/49172 , Y10T29/49176 , Y10T156/1002 , Y10T428/24355 , Y10T428/24479 , Y10T428/24967 , Y10T428/265 , Y10T428/266 , Y10T428/31 , Y10T428/3154
摘要: Methods for forming data storage media and the media formed thereby are disclosed herein. In one embodiment, the method for forming a data storage media, comprises: injection molding a substrate comprising surface features, wherein said surface features have greater than about 90% of a surface feature replication of an original master; and disposing a data layer over at least one surface of said substrate; wherein said data storage media has an axial displacement peak of less than about 500μ under shock or vibration excitation.
摘要翻译: 本文公开了形成数据存储介质和由此形成的介质的方法。 在一个实施例中,用于形成数据存储介质的方法包括:注射成型包含表面特征的基底,其中所述表面特征具有大于原始主体的表面特征复制的大约90% 以及在所述衬底的至少一个表面上设置数据层; 其中所述数据存储介质在冲击或振动激励下具有小于约500mu的轴向位移峰。
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公开(公告)号:US5300812A
公开(公告)日:1994-04-05
申请号:US987849
申请日:1992-12-09
CPC分类号: C08K5/0016 , C09J179/08 , H01L21/481 , H01L23/10 , H01L24/24 , H01L24/75 , H01L24/82 , H01L24/83 , H01L2224/24227 , H01L2224/2919 , H01L2224/32225 , H01L2224/73267 , H01L2224/75315 , H01L2224/8319 , H01L2224/8385 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01014 , H01L2924/01015 , H01L2924/01018 , H01L2924/0102 , H01L2924/01024 , H01L2924/01027 , H01L2924/01029 , H01L2924/01032 , H01L2924/01033 , H01L2924/01039 , H01L2924/0132 , H01L2924/0665 , H01L2924/07802 , H01L2924/10329 , H01L2924/12042 , H01L2924/14 , H01L2924/15153 , H01L2924/15165
摘要: A plasticized polyetherimide, such as a blend of polyetherimide and a pentaerythritol tetrabenzoate ester, has been found useful as a low temperature laminating adhesive for making high density interconnect circuit arrays.
摘要翻译: 已经发现增塑聚醚酰亚胺,例如聚醚酰亚胺和季戊四醇四苯甲酸酯的共混物可用作制备高密度互连电路阵列的低温层压粘合剂。
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6.
公开(公告)号:US07011983B2
公开(公告)日:2006-03-14
申请号:US10324417
申请日:2002-12-20
IPC分类号: H01L51/40
CPC分类号: H01L51/0097 , H01L51/5036 , H01L51/52 , H01L51/5203 , H01L51/5212 , H01L51/524 , H01L51/5256 , H01L2251/5338 , H01L2251/5361 , Y02E10/549 , Y02P70/521
摘要: Large, light-weight organic devices and methods of preparing large, light-weight organic devices. Specifically, flexible and rigid light-weight plastics are implemented. The flexible plastic may be disposed from a reel. A metal grid is fabricated on the flexible plastic to provide current conduction over the large area. A transparent oxide layer is provided over the metal grid to form the bottom electrode of the organic device. A light emitting or light gathering organic layer is disposed on the transparent oxide layer. A second electrode is disposed over the organic layer. Electrodes are coupled to the metal grid and the second electrode to provide electrical current to or from the organic layer. Depending on the type of materials used for the organic layer, the organic device may comprise an area light device or a photovoltaic device.
摘要翻译: 大型,重量轻的有机器件和制备大型轻质有机器件的方法。 具体来说,实现了柔性和刚性轻质塑料。 柔性塑料可以从卷轴设置。 在柔性塑料上制造金属网格以在大面积上提供电流传导。 在金属网格上设置透明氧化物层以形成有机器件的底部电极。 发光或聚光有机层设置在透明氧化物层上。 第二电极设置在有机层上。 电极耦合到金属网格和第二电极以向有机层提供电流或从有机层提供电流。 根据用于有机层的材料的类型,有机器件可以包括区域光器件或光伏器件。
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公开(公告)号:US5353498A
公开(公告)日:1994-10-11
申请号:US87434
申请日:1993-07-09
申请人: Raymond A. Fillion , Robert J. Wojnarowski , Michael Gdula , Herbert S. Cole , Eric J. Wildi , Wolfgang Daum
发明人: Raymond A. Fillion , Robert J. Wojnarowski , Michael Gdula , Herbert S. Cole , Eric J. Wildi , Wolfgang Daum
IPC分类号: H01L23/52 , H01L21/56 , H01L21/58 , H01L21/68 , H01L23/29 , H01L23/433 , H01L23/538 , H01L25/04 , H01L25/065 , H01L25/18 , H05K3/34
CPC分类号: H01L21/568 , H01L21/6835 , H01L23/293 , H01L23/295 , H01L23/4334 , H01L23/538 , H01L23/5389 , H01L24/24 , H01L24/29 , H01L24/82 , H01L24/83 , H01L24/96 , H01L25/0652 , H01L25/0657 , H01L25/105 , H01L2224/04105 , H01L2224/2402 , H01L2224/24137 , H01L2224/24195 , H01L2224/2518 , H01L2224/2919 , H01L2224/82039 , H01L2224/83192 , H01L2224/8385 , H01L2225/06517 , H01L2225/0652 , H01L2225/06524 , H01L2225/06541 , H01L2225/06551 , H01L2225/06589 , H01L2225/1035 , H01L2225/1058 , H01L2225/1064 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01015 , H01L2924/01027 , H01L2924/01029 , H01L2924/01032 , H01L2924/01033 , H01L2924/01039 , H01L2924/01042 , H01L2924/01046 , H01L2924/01047 , H01L2924/01078 , H01L2924/01079 , H01L2924/0132 , H01L2924/014 , H01L2924/0665 , H01L2924/07802 , H01L2924/12042 , H01L2924/14 , H01L2924/18162 , H01L2924/19041 , H01L2924/19042 , H01L2924/19043 , Y10T29/49144
摘要: Substrate material is molded directly to semiconductor chips and other electrical components that are positioned for integrated circuit module fabrication. Chips having contact pads are placed face down on a layer of adhesive supported by a base. A mold form is positioned around the chips. Substrate molding material is added within the mold form, and the substrate molding material is then hardened. A dielectric layer having vias aligned with predetermined ones of the contact pads and having an electrical conductor extending through the vias is situated on the hardened substrate molding material and the faces of the chips. A thermal plug may be affixed to the backside of a chip before substrate molding material is added. A connector frame may be placed on the adhesive layer before substrate molding material is added. A dielectric layer may be placed over the backsides of the chips before the substrate molding material is added to enhance repairability. A portion of the chips and substrate molding material may be removed after the substrate molding material is hardened.
摘要翻译: 基板材料直接模制到半导体芯片和其他用于集成电路模块制造的电气部件。 具有接触垫的芯片面朝下放置在由基底支撑的粘合剂层上。 模具周围位于芯片周围。 在模具形式中加入基材成型材料,然后将基材成型材料硬化。 具有与预定接触焊盘对准的通孔并具有延伸通过通孔的电导体的通孔的电介质层位于硬化的基底成型材料和芯片的表面上。 在添加基板模制材料之前,可以将热塞固定到芯片的背面。 在添加基材模塑材料之前,连接器框架可以放置在粘合剂层上。 在添加基底成型材料之前,可以将电介质层放置在芯片的背面上以增强可修复性。 芯片和基材成型材料的一部分可以在基材模塑材料硬化之后被去除。
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公开(公告)号:US5554305A
公开(公告)日:1996-09-10
申请号:US411178
申请日:1995-03-27
IPC分类号: B32B7/02 , B32B18/00 , H01L21/48 , H01L21/60 , H01L23/498 , H01L23/538 , H05K1/02 , H05K1/03 , H05K3/00 , H05K3/38 , H01L21/3105
CPC分类号: H05K1/0313 , H01L21/481 , H01L23/49894 , H01L23/5389 , H01L24/24 , H01L24/82 , H05K1/024 , H05K1/0373 , H05K3/0032 , H01L2224/2402 , H01L2224/24227 , H01L2224/32225 , H01L2224/73267 , H01L2224/92244 , H01L2924/01004 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01015 , H01L2924/01018 , H01L2924/01023 , H01L2924/01024 , H01L2924/01027 , H01L2924/01029 , H01L2924/01033 , H01L2924/01052 , H01L2924/01074 , H01L2924/014 , H01L2924/10329 , H01L2924/12042 , H01L2924/14 , H01L2924/15153 , H01L2924/15165 , H01L2924/3011 , H05K2201/0116 , H05K2201/015 , H05K2201/0158 , H05K2203/083 , H05K2203/122 , H05K3/386 , Y10S521/918 , Y10T29/49124 , Y10T29/49155
摘要: A method for processing a low dielectric constant material includes dispersing an additive material in a porous low dielectric constant layer, fabricating a desired electronic structure, and then removing the additive material from the pores of the low dielectric constant layer. The removal of the additive material from the pores can be accomplished by sublimation, evaporation, and diffusion. Applications for the low dielectric constant layer include the use as an overlay layer for interconnecting a circuit chip supported by a substrate and the use as printed circuit board material.
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9.
公开(公告)号:US5449427A
公开(公告)日:1995-09-12
申请号:US247820
申请日:1994-05-23
IPC分类号: B32B7/02 , B32B18/00 , H01L21/48 , H01L21/60 , H01L23/498 , H01L23/538 , H05K1/02 , H05K1/03 , H05K3/00 , H05K3/38 , B32B31/12 , B32B31/14
CPC分类号: H05K1/0313 , H01L21/481 , H01L23/49894 , H01L23/5389 , H01L24/24 , H01L24/82 , H05K1/024 , H05K1/0373 , H05K3/0032 , H01L2224/2402 , H01L2224/24227 , H01L2224/32225 , H01L2224/73267 , H01L2224/92244 , H01L2924/01004 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01015 , H01L2924/01018 , H01L2924/01023 , H01L2924/01024 , H01L2924/01027 , H01L2924/01029 , H01L2924/01033 , H01L2924/01052 , H01L2924/01074 , H01L2924/014 , H01L2924/10329 , H01L2924/12042 , H01L2924/14 , H01L2924/15153 , H01L2924/15165 , H01L2924/3011 , H05K2201/0116 , H05K2201/015 , H05K2201/0158 , H05K2203/083 , H05K2203/122 , H05K3/386 , Y10S521/918 , Y10T29/49124 , Y10T29/49155
摘要: A method for processing a low dielectric constant material includes dispersing an additive material in a porous low dielectric constant layer, fabricating a desired electronic structure, and then removing the additive material from the pores of the low dielectric constant layer. The removal of the additive material from the pores can be accomplished by sublimation, evaporation, and diffusion. Applications for the low dielectric constant layer include the use as an overlay layer for interconnecting a circuit chip supported by a substrate and the use as printed circuit board material.
摘要翻译: 用于处理低介电常数材料的方法包括将添加剂材料分散在多孔低介电常数层中,制造所需的电子结构,然后从低介电常数层的孔中除去添加剂材料。 从孔中去除添加剂材料可以通过升华,蒸发和扩散来实现。 用于低介电常数层的应用包括用作互连由衬底支撑的电路芯片和用作印刷电路板材料的覆盖层的用途。
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公开(公告)号:US5169678A
公开(公告)日:1992-12-08
申请号:US456421
申请日:1989-12-26
IPC分类号: C08K5/00 , B23K26/00 , B23K26/18 , B23K26/40 , C08J7/00 , C08J7/04 , C08K5/22 , C08L101/00 , C09D201/00 , G03F7/039 , G03F7/20 , H01L21/027 , H01L21/30 , H01L21/311 , H01L23/12 , H01L23/538 , H01L25/04 , H01L25/18
CPC分类号: G03F7/039 , G03F7/2053 , H01L21/31127 , H01L23/5389 , H01L24/24 , H01L24/82 , H01L2224/24227 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01015 , H01L2924/01023 , H01L2924/01033 , H01L2924/01074 , H01L2924/12042 , H01L2924/14 , Y10S430/146
摘要: The ultraviolet absorption characteristics of a polymer material are modified by the addition of an ultraviolet absorbing dye to render it laser ablatable at a frequency at which the unmodified material is substantially non-laser ablatable.
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