Through silicon via with dummy structure and method for forming the same
    8.
    发明授权
    Through silicon via with dummy structure and method for forming the same 有权
    通过具有虚拟结构的硅通孔及其形成方法

    公开(公告)号:US07969013B2

    公开(公告)日:2011-06-28

    申请号:US12791978

    申请日:2010-06-02

    IPC分类号: H01L23/48

    摘要: A through silicon via structure includes a top pad and a vertical conductive post that is connected to the top pad. The top pad covers a wider area than the cross section of the vertical conductive post. An interconnect pad is formed at least partially below the top pad. An under layer is also formed at least partially below the top pad. At least one dummy structure connects the top pad and the under layer to fasten the top pad and the interconnect pad.

    摘要翻译: 透硅通孔结构包括顶焊盘和连接到顶焊盘的垂直导电柱。 顶部焊盘覆盖比垂直导电柱的横截面更宽的区域。 互连焊盘至少部分地形成在顶部焊盘的下方。 底层也至少部分地形成在顶垫的下方。 至少一个虚拟结构连接顶部焊盘和下层以紧固顶部焊盘和互连焊盘。

    Method of forming through silicon via with dummy structure
    9.
    发明授权
    Method of forming through silicon via with dummy structure 有权
    通过具有虚拟结构的硅通孔形成方法

    公开(公告)号:US08202800B2

    公开(公告)日:2012-06-19

    申请号:US13112347

    申请日:2011-05-20

    IPC分类号: H01L21/44

    摘要: A method of forming a through silicon via (TSV) structure includes forming an interconnect pad over a substrate. An under layer is formed over the interconnect pad. A vertical conductive post is formed at least partially through the substrate. At least one dummy structure is formed at least partially through the under layer. A top pad is formed over the dummy structure and the vertical conductive post. The top pad covers a wider area than a cross section of the vertical conductive post. The interconnect pad is electrically connected to the top pad. The dummy structure connects the top pad and the under layer thereby fastening the top pad and the interconnect pad.

    摘要翻译: 形成贯穿硅通孔(TSV)结构的方法包括在衬底上形成互连焊盘。 在互连焊盘上形成下层。 至少部分地穿过衬底形成垂直导电柱。 至少部分地通过底层形成至少一个虚拟结构。 顶部衬垫形成在虚拟结构和垂直导电柱上。 顶部焊盘覆盖比垂直导电柱的横截面更宽的区域。 互连焊盘电连接到顶部焊盘。 虚拟结构连接顶部焊盘和下层,从而紧固顶部焊盘和互连焊盘。