Acoustic wave filter and manufacturing method of the same
    1.
    发明授权
    Acoustic wave filter and manufacturing method of the same 失效
    声波滤波器及其制造方法相同

    公开(公告)号:US07583163B2

    公开(公告)日:2009-09-01

    申请号:US11891368

    申请日:2007-08-10

    IPC分类号: H03H9/00 H03H9/205 H01L41/08

    摘要: A technique capable of integrally forming SMR type acoustic wave filters corresponding to multiple bands on the same chip at low cost is provided. In SMR type acoustic wave filters including multiple bandpass filters corresponding to multiple bands formed over the same die (substrate), acoustic multilayer films are formed without or with a minimum number of masks and piezoelectric thin films having different thicknesses for respective bands are collectively formed. For example, after the acoustic multilayer films (low acoustic impedance layers and high acoustic impedance layers) are formed in a deep groove in a terrace paddy field shape over the die in a maskless manner, the piezoelectric thin films are c-axis-oriented and grown, and are polished by CMP method or the like to be adjusted in a thickness for respective bands, and therefore, the SMR type acoustic wave filters for multiple bands are formed over the same chip.

    摘要翻译: 提供了能够以低成本一体地形成对应于同一芯片上的多个频带的SMR型声波滤波器的技术。 在包括对应于形成在同一芯片(基板)上的多个带的多个带通滤波器的SMR型声波滤波器中,形成声学多层膜,而不需要最少数量的掩模,并且共同形成具有不同厚度的压电薄膜。 例如,在以无掩模的方式在模具上形成在平台水田的深槽中的声学多层膜(低声阻抗层和高声阻抗层)之后,压电薄膜是c轴取向的, 并通过CMP方法等进行抛光,以对各个带的厚度进行调整,因此,在同一芯片上形成多个带的SMR型声波滤波器。

    Acoustic wave filter and manufacturing method of the same
    3.
    发明申请
    Acoustic wave filter and manufacturing method of the same 失效
    声波滤波器及其制造方法相同

    公开(公告)号:US20080129412A1

    公开(公告)日:2008-06-05

    申请号:US11891368

    申请日:2007-08-10

    IPC分类号: H03H9/70 H03H9/54

    摘要: A technique capable of integrally forming SMR type acoustic wave filters corresponding to multiple bands on the same chip at low cost is provided. In SMR type acoustic wave filters including multiple bandpass filters corresponding to multiple bands formed over the same die (substrate), acoustic multilayer films are formed without or with a minimum number of masks and piezoelectric thin films having different thicknesses for respective bands are collectively formed. For example, after the acoustic multilayer films (low acoustic impedance layers and high acoustic impedance layers) are formed in a deep groove in a terrace paddy field shape over the die in a maskless manner, the piezoelectric thin films are c-axis-oriented and grown, and are polished by CMP method or the like to be adjusted in a thickness for respective bands, and therefore, the SMR type acoustic wave filters for multiple bands are formed over the same chip.

    摘要翻译: 提供了能够以低成本一体地形成对应于同一芯片上的多个频带的SMR型声波滤波器的技术。 在包括对应于形成在同一芯片(基板)上的多个带的多个带通滤波器的SMR型声波滤波器中,形成声学多层膜,而不需要最少数量的掩模,并且共同形成具有不同厚度的压电薄膜。 例如,在以无掩模的方式在模具上形成在平台水田的深槽中的声学多层膜(低声阻抗层和高声阻抗层)之后,压电薄膜是c轴取向的, 并通过CMP方法等进行抛光,以对各个带的厚度进行调整,因此,在同一芯片上形成多个带的SMR型声波滤波器。

    Physical sensor and method of process
    9.
    发明授权
    Physical sensor and method of process 有权
    物理传感器和过程方法

    公开(公告)号:US07905149B2

    公开(公告)日:2011-03-15

    申请号:US12175347

    申请日:2008-07-17

    IPC分类号: G01B7/16

    摘要: There is provided a physical sensor which ensures long-term reliability and can be miniaturized and increased in density, and a method of producing the same. A physical sensor includes a supporting substrate, an element substrate that includes a sensor element and is joined to the supporting substrate through an insulating layer, a glass cap that covers an area of the sensor element and is joined to the element substrate, and a built-in electrode that is electrically connected to the sensor element. The built-in electrode is formed in a through hole passing through the element substrate, the insulating layer and the supporting substrate. A portion of the glass cap that covers an area of the built-in electrode is anodically bonded to the element substrate.

    摘要翻译: 提供了一种物理传感器,其确保了长期可靠性并且可以小型化和增加密度,以及其制造方法。 物理传感器包括支撑基板,包括传感器元件并通过绝缘层与支撑基板接合的元件基板,覆盖传感器元件的区域并与元件基板接合的玻璃盖,以及内置 电连接到传感器元件。 内置电极形成在穿过元件基板,绝缘层和支撑基板的通孔中。 覆盖内置电极的区域的玻璃帽的一部分阳极接合到元件基板。