公开(公告)号：US20240003025A1

公开(公告)日：2024-01-04

申请号：US17934541

申请日：2022-09-22

申请人： NATIONAL CHENG KUNG UNIVERSITY

发明人： Chia-yu Lin ,  Chia-sheng Su ,  Chia-hui Yen ,  Shih-ching Huang ,  Wei-hsin Lu

IPC分类号： C25B11/091 ,  C25D11/00 ,  C23C28/00 ,  C23C18/16 ,  C25B3/29 ,  C25B3/09 ,  C25B11/052 ,  C25B11/061

CPC分类号： C25B11/091 ,  C25D11/00 ,  C23C28/00 ,  C23C18/1637 ,  C23C18/1646 ,  C25B3/295 ,  C25B3/09 ,  C25B11/052 ,  C25B11/061

摘要： A modified electrode, manufacturing method thereof and use thereof are provided. The manufacturing method includes steps of soaking a copper substrate in a solution to obtain a BiOI/copper(I) iodide, BiOI/copper(I) iodide/metallic bismuth, and copper(I) iodide/metallic bismuth composite modified electrodes by electroless plating method. The obtained electrodes, designated as bismuth-based modified electrode, can be used for the electrohydrodimerization of acrylonitrile to synthesize adiponitrile.

公开(公告)号：US20180323101A1

公开(公告)日：2018-11-08

申请号：US15773158

申请日：2015-12-04

申请人： Intel Corporation

发明人： Aranzazu MAESTRE CARO ,  Ramanan V. CHEBIAM

IPC分类号： H01L21/768 ,  H01L21/324 ,  C23C18/16

CPC分类号： H01L21/76831 ,  B82Y30/00 ,  B82Y40/00 ,  C23C18/1646 ,  H01L21/3105 ,  H01L21/324 ,  H01L21/76837 ,  H01L21/76874 ,  H01L21/76882 ,  H01L23/53209 ,  H01L23/53242 ,  H01L23/53257

摘要： Embodiments of the disclosure are directed to using a SAM liner to promote electroless deposition of metal for integrated circuit interconnects. The SAM liner can be formed on a dielectric substrate. A protective layer can be formed on the SAM liner. The protective layer can double as a seed layer for electroless deposition of an interconnect metal. The interconnect metal can be deposited on the protective layer using electroless deposition. The dielectric, with the SAM liner, the protective layer, and the interconnect metal can be annealed to reflow the interconnect metal into trenches formed in the dielectric.

公开(公告)号：US20170321327A1

公开(公告)日：2017-11-09

申请号：US15522321

申请日：2015-12-17

申请人： Atotech Deutschland GmbH

发明人： Thomas BECK ,  Gerhard STEINBERGER ,  Andreas WALTER

IPC分类号： C23C18/44 ,  C23C18/16

CPC分类号： C23C18/44 ,  C23C18/1646

摘要： The present invention relates to an aqueous plating bath composition and a method for depositing a palladium layer by electroless plating onto a substrate. The aqueous plating bath composition according to the present invention comprises a source for palladium ions, a reducing agent for palladium ions and an aldehyde compound. The aqueous plating bath composition has an increased deposition rate for palladium while maintaining bath stability. The aqueous plating bath composition has also a prolonged life time. The aldehyde compounds of the present invention allow for adjusting the deposition rate to a constant range over the bath life time and for electrolessly depositing palladium layers at lower temperatures. The aldehyde compounds of the present invention activate electroless palladium plating baths having a low deposition rate and reactivate aged electroless palladium plating baths.

公开(公告)号：US20170107637A1

公开(公告)日：2017-04-20

申请号：US15394937

申请日：2016-12-30

申请人： The Royal Mint Limited

发明人： Jeffrey L. Conroy ,  Philip B. Forshee ,  James A. Shearer

IPC分类号： C25D15/00 ,  G07D7/12 ,  C25D17/06 ,  G07D5/00 ,  C25D7/00 ,  C25D3/40

CPC分类号： C25D7/00 ,  B32B15/01 ,  C23C18/1637 ,  C23C18/1646 ,  C23C18/1653 ,  C23C18/1662 ,  C23C18/31 ,  C23C18/36 ,  C25D3/12 ,  C25D3/22 ,  C25D3/38 ,  C25D3/58 ,  C25D5/02 ,  C25D5/10 ,  C25D7/005 ,  C25D15/00 ,  C25D17/16 ,  G07D5/00 ,  G07D7/12 ,  G07F7/0813 ,  Y10T428/12493

摘要： Formation of an authentication element by deposition of a metal layer with embedded particles on a metal substrate, wherein the embedded particles are configured to convert energy from one wavelength to another. The embedded particles may be upconverters, downconverters, or phosphorescent phosphors, which can be detected and measured with analytical equipment when deposited in the metal layer. A metal substrate may include coinage.

公开(公告)号：US09507061B2

公开(公告)日：2016-11-29

申请号：US13679674

申请日：2012-11-16

申请人： California Institute of Technology

发明人： Douglas C. Hofmann ,  Gregory L. Davis ,  Gregory S. Agnes ,  Andrew A. Shapiro

IPC分类号： B23P11/00 ,  G02B5/08 ,  B21K23/00 ,  B21D26/053 ,  B21D26/14 ,  B23K26/22 ,  C25D7/08 ,  B05D5/06 ,  B21J1/00 ,  C22C45/00 ,  C23C18/16 ,  C22C1/00 ,  C22C33/00 ,  C22C45/02 ,  C22C45/04 ,  C22C45/10 ,  B23P15/00

CPC分类号： G02B5/08 ,  B05D5/063 ,  B21D26/053 ,  B21D26/14 ,  B21J1/006 ,  B21K23/00 ,  B23K26/22 ,  B23P11/00 ,  B23P15/00 ,  C22C1/002 ,  C22C33/003 ,  C22C45/00 ,  C22C45/001 ,  C22C45/003 ,  C22C45/02 ,  C22C45/04 ,  C22C45/10 ,  C23C18/1646 ,  C25D7/08 ,  G02B5/0808 ,  Y10T29/49 ,  Y10T29/49826 ,  Y10T29/49986

摘要： A mirror or mirror assembly fabricated by molding, pressing, assembling, or depositing one or more bulk metal glass (BMG), bulk metal glass composite (BMGMC), or amorphous metal (AM) parts and where the optical surface and backing of the mirror can be fabricated without machining or polishing by utilizing the unique molding capabilities of this class of materials.

摘要翻译： 通过模制，压制，组装或沉积一个或多个大块金属玻璃（BMG），散装金属玻璃复合材料（BMGMC）或非晶金属（AM）部件制成的镜子或镜子组件，其中镜子的光学表面和背衬 可以通过利用这种类型的材料的独特的成型能力而被机械加工或抛光。

公开(公告)号：US09476124B2

公开(公告)日：2016-10-25

申请号：US14589487

申请日：2015-01-05

申请人： LAM RESEARCH CORPORATION

发明人： Aniruddha Joi ,  Ernest Chen ,  Yezdi Dordi

IPC分类号： B05D5/12 ,  C23C18/52 ,  C23C18/50 ,  C23C18/31 ,  H01L43/12 ,  C23C18/32

CPC分类号： C23C18/52 ,  C23C18/1646 ,  C23C18/166 ,  C23C18/1824 ,  C23C18/34 ,  C23C18/50 ,  H01L43/12

摘要： A method for selectively depositing a ferromagnetic layer on a conducting layer, includes providing a substrate including a conducting layer; preparing a solution including a metal salt; adding a complexing agent to the solution; adding a reducing agent to the solution; while a temperature of the solution is less than 75° C., immersing the substrate in the solution for a predetermined period to deposit a ferromagnetic layer on the conducting layer by electroless deposition, wherein the ferromagnetic layer comprises one of cobalt (Co), iron (Fe) or CoFe; and after the predetermined period, removing the substrate from the solution.

摘要翻译： 一种用于在导电层上选择性沉积铁磁层的方法，包括提供包括导电层的衬底; 制备包含金属盐的溶液; 向溶液中加入络合剂; 向溶液中加入还原剂; 当溶液的温度低于75℃时，将基板浸入溶液中一定时间以通过无电沉积在导电层上沉积铁磁层，其中铁磁层包括钴（Co），铁 （Fe）或CoFe; 并且在预定时间段之后，从溶液中去除衬底。

公开(公告)号：US20160194761A1

公开(公告)日：2016-07-07

申请号：US14589487

申请日：2015-01-05

申请人： LAM RESEARCH CORPORATION

发明人： Aniruddha Joi ,  Ernest Chen ,  Yezdi Dordi

IPC分类号： C23C18/52 ,  C23C18/32 ,  H01L43/12 ,  C23C18/50 ,  C23C18/31

CPC分类号： C23C18/52 ,  C23C18/1646 ,  C23C18/166 ,  C23C18/1824 ,  C23C18/34 ,  C23C18/50 ,  H01L43/12

摘要： A method for selectively depositing a ferromagnetic layer on a conducting layer, includes providing a substrate including a conducting layer; preparing a solution including a metal salt; adding a complexing agent to the solution; adding a reducing agent to the solution; while a temperature of the solution is less than 75° C., immersing the substrate in the solution for a predetermined period to deposit a ferromagnetic layer on the conducting layer by electroless deposition, wherein the ferromagnetic layer comprises one of cobalt (Co), iron (Fe) or CoFe; and after the predetermined period, removing the substrate from the solution.

摘要翻译： 一种用于在导电层上选择性沉积铁磁层的方法，包括提供包括导电层的衬底; 制备包含金属盐的溶液; 向溶液中加入络合剂; 向溶液中加入还原剂; 当溶液的温度低于75℃时，将基板浸入溶液中一定时间以通过无电沉积在导电层上沉积铁磁层，其中铁磁层包括钴（Co），铁 （Fe）或CoFe; 并且在预定时间段之后，从溶液中去除衬底。

公开(公告)号：US09371587B2

公开(公告)日：2016-06-21

申请号：US14212078

申请日：2014-03-14

申请人： OTICS CORPORATION

发明人： Eiji Isogai

IPC分类号： C23C18/54 ,  C25D9/02 ,  C23C18/16 ,  C23C18/32 ,  C25D13/04 ,  F02M37/00 ,  F02M61/16 ,  F02M69/46 ,  F16L58/08 ,  F16L58/10

CPC分类号： C23C18/54 ,  C23C18/1608 ,  C23C18/1646 ,  C23C18/32 ,  C25D9/02 ,  C25D13/04 ,  F02M37/0017 ,  F02M37/0064 ,  F02M61/166 ,  F02M61/168 ,  F02M69/465 ,  F02M2200/8069 ,  F02M2200/9038 ,  F16L58/08 ,  F16L58/1072

摘要： A method manufactures a fuel delivery pipe including a crude metal made of forged iron, a nickel-phosphorus plating layer formed on an inner surface of the crude metal, and a nonmetal paint film formed on an outer surface of the crude metal. The method includes coating the outer surface of the crude metal with paint to form the paint film, machining the crude metal with the paint film formed thereon to form a machined surface inside the crude metal, and electroless plating the machined crude metal in nickel-phosphorus plating solution to form the nickel-phosphorus plating layer on the machined surface.

摘要翻译： 一种制造燃料输送管，其包括由锻造铁制成的粗金属，形成在粗金属的内表面上的镍 - 磷镀层和形成在粗金属的外表面上的非金属漆膜。 该方法包括用涂料涂覆粗金属的外表面以形成漆膜，用形成在其上的漆膜加工粗金属，以在粗金属内形成机加工表面，并将加工的粗金属在镍磷中无电镀 电镀溶液以在加工表面上形成镍 - 磷镀层。

公开(公告)号：US09339588B2

公开(公告)日：2016-05-17

申请号：US14166217

申请日：2014-01-28

申请人： Bactiguard AB

发明人： Mattias Ohrlander ,  Billy Södervall

IPC分类号： A01N59/16 ,  A61L2/238 ,  A61L27/30 ,  B32B5/16 ,  B32B27/00 ,  C23C18/18 ,  A61L27/50 ,  A61L29/10 ,  A61L31/08 ,  A61L33/00 ,  C23C18/16 ,  C23C18/42 ,  C23C18/44 ,  C23C26/00 ,  C23C30/00 ,  A01N25/08 ,  A61K9/00 ,  A61K33/24 ,  A61K33/38 ,  B32B5/30 ,  B32B9/00 ,  B32B15/16 ,  B32B27/14 ,  B32B27/16 ,  A61L26/00 ,  B05D3/02

CPC分类号： A61L31/088 ,  A01N25/08 ,  A01N59/16 ,  A61K9/00 ,  A61K33/24 ,  A61K33/38 ,  A61L2/238 ,  A61L26/0004 ,  A61L27/30 ,  A61L27/306 ,  A61L27/50 ,  A61L29/10 ,  A61L29/106 ,  A61L31/022 ,  A61L31/024 ,  A61L31/026 ,  A61L31/042 ,  A61L31/048 ,  A61L31/06 ,  A61L31/08 ,  A61L33/0076 ,  A61L2400/18 ,  A61L2420/02 ,  B05D3/0254 ,  B32B5/16 ,  B32B5/30 ,  B32B9/005 ,  B32B15/16 ,  B32B27/00 ,  B32B27/14 ,  B32B27/16 ,  B32B2255/10 ,  B32B2255/205 ,  B32B2264/105 ,  B32B2307/7145 ,  B32B2307/73 ,  B32B2535/00 ,  C23C18/1635 ,  C23C18/1646 ,  C23C18/1689 ,  C23C18/18 ,  C23C18/42 ,  C23C18/44 ,  C23C26/00 ,  C23C30/00 ,  Y10T428/12569 ,  Y10T428/12875 ,  Y10T428/12896 ,  Y10T428/256 ,  Y10T428/27 ,  Y10T428/273 ,  Y10T428/29 ,  Y10T428/2991 ,  Y10T428/31667 ,  Y10T428/31678 ,  A01N25/10 ,  A01N25/34 ,  A01N2300/00

摘要： A substrate has an electron donating surface, and metal particles on its surface, the metal particles including palladium and at least one metal selected from the group consisting of gold, ruthenium, rhodium, osmium, iridium, and platinum, wherein the amount of the metal particles is from about 0.001 to about 8 μg/cm2. Examples of coated objects include contact lenses, pacemakers, pacemaker electrodes, stents, dental implants, rupture nets, rupture mesh, blood centrifuge equipment, surgical instruments, gloves, blood bags, artificial heart valves, central venous catheters, peripheral venous catheters, vascular ports, haemodialysis equipment, peritoneal dialysis equipment, plasmapheresis devices, inhalation drug delivery devices, vascular grafts, arterial grafts, cardiac assist devices, wound dressings, intermittent catheters, ECG electrodes, peripheral stents, bone replacing implants, orthopaedic implants, orthopaedic devices, tissue replacing implants, intraocular lenses, sutures, needles, drug delivery devices, endotracheal tubes, shunts, drains, suction devices, hearing aid devices, urethral medical devices, and artificial blood vessels.

摘要翻译： 基材具有给电子表面，其表面上的金属颗粒，金属颗粒包括钯和选自金，钌，铑，锇，铱和铂中的至少一种金属，其中金属的量 颗粒为约0.001至约8μg/ cm 2。 涂覆物体的实例包括隐形眼镜，起搏器，起搏器电极，支架，牙植入物，破裂网，破裂网，血液离心机设备，手术器械，手套，血袋，人造心脏瓣膜，中心静脉导管，外周静脉导管，血管端口 ，血液透析设备，腹膜透析设备，血浆置换装置，吸入药物递送装置，血管移植物，动脉移植物，心脏辅助装置，伤口敷料，间歇导管，ECG电极，外周支架，骨置换植入物，整形外科植入物，整形外科装置，组织替代 植入物，眼内透镜，缝线，针，药物输送装置，气管内导管，分流器，排水管，抽吸装置，助听器装置，尿道医疗装置和人造血管。

公开(公告)号：US20150197856A1

公开(公告)日：2015-07-16

申请号：US14153332

申请日：2014-01-13

申请人： Maria Celeste Rellamas Tria

发明人： Maria Celeste Rellamas Tria

IPC分类号： C23C18/34 ,  H05K3/18 ,  C23C18/31 ,  C23C18/44 ,  C23C18/18 ,  C23C18/16

CPC分类号： C23C18/34 ,  C23C18/1608 ,  C23C18/161 ,  C23C18/1612 ,  C23C18/1646 ,  C23C18/1648 ,  C23C18/166 ,  C23C18/1667 ,  C23C18/18 ,  C23C18/182 ,  C23C18/1844 ,  C23C18/1851 ,  C23C18/1879 ,  C23C18/30 ,  C23C18/31 ,  C23C18/40 ,  C23C18/405 ,  C23C18/44 ,  H05K3/182 ,  H05K3/187 ,  H05K3/389 ,  H05K2203/013 ,  Y10T428/24851 ,  Y10T428/24893

摘要： A conductive metal pattern can be formed using a titania sol-gel obtained from a titania precursor composition having (a) a titanium alkoxide or titanium aryloxide, (b) a R(O)mCOCH2CO(O)nR′ compound wherein R and R′ are independently alkyl and m and n are independently 0 or 1, (c) water, (d) either an acid having a pKa less than 1 or a source of a halogen, and (e) a water-miscible organic solvent, on a substrate, wherein the molar amounts of (a) through (d) are sufficient to form a pattern of a titania sol-gel upon drying on the substrate. This pattern is contacted with electroless seed metal ions to form a pattern of electroless seed metal ions deposited within the pattern of titania sol-gel on the substrate, which electroless seed metal ions are exposed to electromagnetic radiation to reduce the electroless seed metal. The article is then subjected to electroless metal plating.

摘要翻译： 导电金属图案可以使用由二氧化钛前体组合物获得的二氧化钛溶胶凝胶，所述二氧化钛前体组合物具有（a）钛醇盐或芳基氧化钛，（b）R（O）mCOCH 2 CO（O）n R'化合物，其中R和R' 独立地为烷基，m和n独立地为0或1，（c）水，（d）pKa小于1的酸或卤素源，和（e）水混溶性有机溶剂， 底物，其中（a）至（d）的摩尔量足以在基材上干燥后形成二氧化钛溶胶 - 凝胶图案。 这种图案与无电子种子金属离子接触以形成沉积在基底上的二氧化钛溶胶 - 凝胶图案内的无电子种子金属离子的图案，其中无电子种子金属离子暴露于电磁辐射以减少无电子种子金属。 然后将该制品进行化学镀金属。