Interposer substrate and method of manufacturing the same
    6.
    发明公开
    Interposer substrate and method of manufacturing the same 审中-公开
    Interposersubstrat和Verfahren zu seiner Herstellung

    公开(公告)号:EP2763514A1

    公开(公告)日:2014-08-06

    申请号:EP14166887.1

    申请日:2010-12-24

    Applicant: Fujikura Ltd.

    Abstract: A method of manufacturing an interposer substrate that is provided with a planar substrate, and with a through hole interconnection that is formed by filling a through hole that connects together a first main surface and a second main surface of the substrate with a conductor. The through hole has a first aperture portion in the first main surface, and has a second aperture portion in the second main surface. The through hole is formed by irradiating the area of the substrate with laser light, so that when the through hole is viewed in a vertical cross-sectional view of the substrate, the through hole has a trapezoidal shape. The side faces of the trapezoid are not parallel to each other and are both inclined towards the same side.

    Abstract translation: 一种制造具有平面基板的内插基板的制造方法,其特征在于,具有通过用导体填充将所述基板的第一主面与所述第二主面连接在一起的通孔而形成的贯通孔互连。 通孔在第一主表面具有第一开口部分,并且在第二主表面中具有第二开口部分。 通孔是通过用激光照射基板的区域而形成的,使得当在基板的垂直截面图中观察通孔时,通孔具有梯形形状。 梯形的侧面彼此不平行,并且朝向同一侧倾斜。

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