SUBSTRATE PROCESSING APPARATUS AND METHOD
    6.
    发明公开

    公开(公告)号:US20230420285A1

    公开(公告)日:2023-12-28

    申请号:US18314983

    申请日:2023-05-10

    CPC classification number: H01L21/6838 H01L21/68742 H01L21/67288

    Abstract: A substrate processing apparatus includes: a stage including a first region and a second region surrounding the first region, the stage configured to receive a substrate; and a plurality of pins in or on the stage and configured to adsorb the substrate with negative pressure. The plurality of pins include a plurality of first pins in the first region and are configured to be elevated at the same time, and a plurality of second pins in the second region and are configured to be elevated at the same time. In operation, the first pins are elevated and adsorb the substrate first, and then, the second pins are elevated and adsorb the substrate.

    Semiconductor packages
    8.
    发明授权

    公开(公告)号:US10651154B2

    公开(公告)日:2020-05-12

    申请号:US16046471

    申请日:2018-07-26

    Abstract: A semiconductor package includes a plurality of semiconductor chips on a substrate. The semiconductor chips include a first semiconductor chip, a second semiconductor chip, and a third semiconductor chip that are sequentially stacked on the substrate. The semiconductor package further includes a plurality of non-conductive layers between the substrate and the first semiconductor chip and between adjacent semiconductor chips among the semiconductor chips. The semiconductor chips include smaller widths as a distance from the substrate increases. Each of the non-conductive layers includes an extension protruding outward from a side surface of an overlying one of the semiconductor chips.

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