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    Scanning electron microscope
    92.
    发明授权
    Scanning electron microscope 有权
    扫描电子显微镜

    公开(公告)号：US09305745B2

    公开(公告)日：2016-04-05

    申请号：US14379733

    申请日：2013-02-15

    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

    Inventor： Wataru Mori ,  Hiroyuki Ito ,  Yuko Sasaki ,  Hiromi Inada

    IPC: H01J37/00 ,  H01J37/28 ,  H01J37/05 ,  H01J37/244 ,  H01J37/09

    CPC classification number: H01J37/28 ,  H01J37/05 ,  H01J37/09 ,  H01J37/244 ,  H01J2237/2801 ,  H01J2237/2806

    Abstract: The purpose of the present invention is to provide a scanning electron microscope that achieves an increase in both resolution and pattern recognition capability. In order to achieve the purpose, the present invention proposes a scanning electron microscope provided with a monochromator that makes an electron beam monochromatic, the monochromator including a magnetic field generator that deflects the electron beam, and an energy selection aperture that passes a part of the electron beam deflected by the magnetic field generator. An aperture that passes some of electrons emitted from the sample and a detector that detects the electrons that have passed through the aperture are disposed on a trajectory to which the electrons emitted from the sample are deflected by a magnetic field generated by the magnetic field generator.

    Abstract translation: 本发明的目的是提供一种扫描电子显微镜，其实现分辨率和图案识别能力的增加。 为了实现该目的，本发明提出了一种具有单色仪的扫描电子显微镜，其使电子束单色，单色器包括使电子束偏转的磁场发生器，以及通过一部分能量选择孔 由磁场发生器偏转的电子束。 通过从样品发射的一些电子的孔和检测已经通过孔的电子的检测器设置在由样品发射的电子被磁场发生器产生的磁场偏转的轨迹上。

    Analysis apparatus and analysis method
    93.
    发明授权
    Analysis apparatus and analysis method 有权
    分析仪器及分析方法

    公开(公告)号：US09269533B2

    公开(公告)日：2016-02-23

    申请号：US14482652

    申请日：2014-09-10

    Applicant: KABUSHIKI KAISHA TOSHIBA

    Inventor： Takeshi Murakami

    IPC: H01J37/26 ,  H01J37/28

    CPC classification number: H01J37/26 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/032 ,  H01J2237/24415 ,  H01J2237/2445 ,  H01J2237/2801

    Abstract: In accordance with an embodiment, an analysis apparatus includes a secondary electron optical system, at least one detector, and a composition analysis unit. The secondary electron optical system includes a charged particle beam source and a lens. The charged particle beam source generates a charged particle beam and irradiates a sample with it. The lens controls a focal position and a trajectory of the charged particle beam using an electric field or a magnetic field. The detector detects a characteristic X-ray from the sample. The composition analysis unit analyzes a composition of a material constituting the sample from the detected characteristic X-ray. Each detector is arranged in such a manner that at least part of a detection surface thereof is placed on the same plane as an exit surface of the secondary electron optical system, or placed on the charged particle beam side of the same plane.

    Abstract translation: 根据实施例，分析装置包括二次电子光学系统，至少一个检测器和组成分析单元。 二次电子光学系统包括带电粒子束源和透镜。 带电粒子束源产生带电粒子束并照射样品。 透镜使用电场或磁场控制带电粒子束的焦点位置和轨迹。 检测器检测来自样品的特征X射线。 组分分析单元从检测到的特征X射线分析构成样品的材料的组成。 每个检测器被布置成使得其检测表面的至少一部分被放置在与二次电子光学系统的出射表面相同的平面上，或者放置在同一平面的带电粒子束侧上。

    INTERFACE, A METHOD FOR OBSERVING AN OBJECT WITHIN A NON-VACUUM ENVIRONMENT AND A SCANNING ELECTRON MICROSCOPE
    94.
    发明申请
    INTERFACE, A METHOD FOR OBSERVING AN OBJECT WITHIN A NON-VACUUM ENVIRONMENT AND A SCANNING ELECTRON MICROSCOPE 有权
    界面，用于观察非真空环境中的对象和扫描电子显微镜的方法

    公开(公告)号：US20150235806A1

    公开(公告)日：2015-08-20

    申请号：US14687890

    申请日：2015-04-15

    Applicant: Dov SHACHAL

    Inventor： Dov SHACHAL

    IPC: H01J37/28 ,  H01J37/06

    CPC classification number: H01J37/285 ,  H01J37/06 ,  H01J37/20 ,  H01J37/28 ,  H01J37/301 ,  H01J2237/006 ,  H01J2237/0458 ,  H01J2237/15 ,  H01J2237/164 ,  H01J2237/182 ,  H01J2237/2002 ,  H01J2237/2006 ,  H01J2237/2605 ,  H01J2237/28 ,  H01J2237/2801 ,  H01J2237/2806 ,  H01J2237/2807

    Abstract: An interface, a scanning electron microscope and a method for observing an object that is positioned in a non-vacuum environment. The method includes: passing at least one electron beam that is generated in a vacuum environment through at least one aperture out of an aperture array and through at least one ultra thin membrane that seals the at least one aperture; wherein the at least one electron beam is directed towards the object; wherein the at least one ultra thin membrane withstands a pressure difference between the vacuum environment and the non-vacuum environment; and detecting particles generated in response to an interaction between the at least one electron beam and the object.

    Abstract translation: 接口，扫描电子显微镜和用于观察位于非真空环境中的物体的方法。 该方法包括：使在真空环境中产生的至少一个电子束通过孔阵列中的至少一个孔并通过至少一个密封所述至少一个孔的超薄膜; 其中所述至少一个电子束被引向所述物体; 其中所述至少一个超薄膜承受真空环境和非真空环境之间的压力差; 以及检测响应于所述至少一个电子束和所述物体之间的相互作用而产生的微粒。

    Charged particle beam apparatus
    97.
    发明授权
    Charged particle beam apparatus 有权
    带电粒子束装置

    公开(公告)号：US09105446B2

    公开(公告)日：2015-08-11

    申请号：US14376901

    申请日：2013-01-28

    Applicant: Hitachi High-Technologies Corporation

    Inventor： Yasushi Ebizuka ,  Seiichiro Kanno ,  Makoto Nishihara ,  Masashi Fujita

    IPC: H01J37/30 ,  H01J37/22 ,  H02N13/00 ,  H01J37/28 ,  H01J37/20

    CPC classification number: H01J37/226 ,  H01J37/026 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/0047 ,  H01J2237/06 ,  H01J2237/2007 ,  H01J2237/2801 ,  H02N13/00

    Abstract: An object of the present invention is to provide a charged particle beam apparatus that effectively removes electrical charges from an electrostatic chuck.In order to achieve the above object, the charged particle beam apparatus of the present invention includes a sample chamber that maintains a space containing an electrostatic chuck mechanism (5) in a vacuum state; and in which the charged particle beam apparatus includes an ultraviolet light source (6) to irradiate ultraviolet light within the sample chamber, and a irradiation target member irradiated by the ultraviolet light; and the irradiation target member is placed perpendicular to the adsorption surface of the electrostatic chuck.

    Abstract translation: 本发明的目的是提供一种有效地从静电卡盘去除电荷的带电粒子束装置。 为了实现上述目的，本发明的带电粒子束装置包括在真空状态下保持包含静电卡盘机构（5）的空间的样本室; 并且其中带电粒子束装置包括用于照射样品室内的紫外光的紫外光源和照射由紫外光照射的照射目标构件; 并且照射目标构件垂直于静电吸盘的吸附表面放置。

    Holder and Method for Fixing Observation Sample
    98.
    发明申请
    Holder and Method for Fixing Observation Sample 有权
    固定观察样本的持有者和方法

    公开(公告)号：US20150137002A1

    公开(公告)日：2015-05-21

    申请号：US14405485

    申请日：2013-05-30

    Applicant: Hitachi High-Technologies Corporation

    Inventor： Kazuhiro Koyama ,  Masahiro Akatsu

    IPC: H01J37/20 ,  H01J37/28

    CPC classification number: H01J37/20 ,  H01J37/28 ,  H01J2237/2007 ,  H01J2237/2008 ,  H01J2237/202 ,  H01J2237/28 ,  H01J2237/2801

    Abstract: A sample holder is provided allowing for favorable observation of a cross-sectional sample using a retarding method. The sample holder includes: a sample placement member on which a first fixing member, a cross-sectional sample as an observation sample, and a second fixing member are placed in contact with each other, and inserted inside the electronic optical lens barrel of an electron microscope; and a voltage introduction means for introducing a voltage to the sample placement member. The sample placement member has a positioning section for positioning the first fixing member, the cross-sectional sample, and the second fixing member onto a placement position. A positioning section positions the first planar surface of the first fixing member and the second planar surface of the second fixing member which are disposed respectively adjacent to the observation surface of the cross-sectional sample, parallel to the observation surface at locations equidistant from the observation surface.

    Abstract translation: 提供了一种样品保持器，允许使用延迟方法有利地观察截面样品。 样品架包括：样品放置构件，第一固定构件，作为观察样品的横截面样品和第二固定构件彼此接触并插入电子的电子光学镜筒内部 显微镜; 以及用于将电压引入样品放置构件的电压引入装置。 样品放置构件具有用于将第一固定构件，横截面样本和第二固定构件定位在放置位置上的定位部。 定位部将位于横截面样本的观察面附近分别配置的第一固定部件的第一平面和第二固定部件的第二平面配置成与观察面平行的观察面 表面。

    System and Method for Controlling Charge-up in an Electron Beam Apparatus
    99.
    发明申请
    System and Method for Controlling Charge-up in an Electron Beam Apparatus 有权
    用于控制电子束装置中电荷的系统和方法

    公开(公告)号：US20150060665A1

    公开(公告)日：2015-03-05

    申请号：US14512672

    申请日：2014-10-13

    Applicant: Hermes Microvision Inc.

    Inventor： Weiming Ren ,  Zhongwei Chen

    IPC: H01J37/02 ,  H01J37/28

    CPC classification number: H01J37/026 ,  H01J37/14 ,  H01J37/261 ,  H01J37/28 ,  H01J2237/0045 ,  H01J2237/0262 ,  H01J2237/1405 ,  H01J2237/2801 ,  H01J2237/2803

    Abstract: The present invention provides means and corresponding embodiments to control charge-up in an electron beam apparatus, which can eliminate the positive charges soon after being generated on the sample surface within a frame cycle of imaging scanning. The means are to let some or all of secondary electrons emitted from the sample surface return back to neutralize positive charges built up thereon so as to reach a charge balance within a limited time period. The embodiments use control electrodes to generate retarding fields to reflect some of secondary electrons with low kinetic energies back to the sample surface.

    Abstract translation: 本发明提供了用于控制电子束装置中的充电的装置和相应的实施例，其可以在成像扫描的帧周期内在样品表面上产生后不久就消除正电荷。 该方法是使从样品表面发射的二次电子的一些或全部返回到中和积聚在其上的正电荷，从而在有限的时间段内达到电荷平衡。 这些实施例使用控制电极产生延迟场，以将具有低动能的一些二次电子反射回样品表面。

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