Manufacturing method of metal structure

    公开(公告)号:US11672081B2

    公开(公告)日:2023-06-06

    申请号:US16953338

    申请日:2020-11-20

    IPC分类号: H05K3/02 H05K3/00

    CPC分类号: H05K3/027 H05K3/007

    摘要: A manufacturing method of a metal structure is disclosed, which includes the following steps: forming a seed layer on a substrate; forming a patterned metal layer on the seed layer, wherein the patterned metal layer includes a metal member; forming a first patterned photoresist layer on the seed layer, wherein a thickness of the first patterned photoresist layer is less than a thickness of the patterned metal layer; and performing a first patterning process to the seed layer through the first patterned photoresist layer to form a patterned seed layer, wherein after the first patterning process, the metal member includes a first part and a second part, the first part is disposed between the patterned seed layer and the second part, and a width of the first part is greater than a width of the second part.