Bonded semiconductor structures
    120.
    发明授权
    Bonded semiconductor structures 有权
    粘结半导体结构

    公开(公告)号:US09236369B2

    公开(公告)日:2016-01-12

    申请号:US13945243

    申请日:2013-07-18

    Inventor: Jing-Cheng Lin

    Abstract: A method is disclosed that includes the steps outlined below. A first oxide layer is formed to divide a first semiconductor substrate into a first part and a second part. A second oxide layer is formed on the first part of the first semiconductor substrate. The first oxide layer is bonded to a third oxide layer of a second semiconductor substrate. The second part of first semiconductor substrate and the first oxide layer are removed to expose the first part of the first semiconductor substrate.

    Abstract translation: 公开了一种包括以下概述的步骤的方法。 形成第一氧化物层以将第一半导体衬底分成第一部分和第二部分。 第二氧化物层形成在第一半导体衬底的第一部分上。 第一氧化物层结合到第二半导体衬底的第三氧化物层。 去除第一半导体衬底和第一氧化物层的第二部分以露出第一半导体衬底的第一部分。

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