公开(公告)号：US10461061B2

公开(公告)日：2019-10-29

申请号：US16272190

申请日：2019-02-11

Applicant: MICRON TECHNOLOGY, INC.

Inventor： Sameer S. Vadhavkar ,  Xiao Li ,  Anilkumar Chandolu

IPC: H01L23/34 ,  H01L25/065 ,  H01L23/367

Abstract: Apparatuses and methods for semiconductor die heat dissipation are described. For example, an apparatus for semiconductor die heat dissipation may include a substrate and a heat spreader. The substrate may include a thermal interface layer disposed on a surface of the substrate, such as disposed between the substrate and the heat spreader. The heat spreader may include a plurality of substrate-facing protrusions in contact with the thermal interface layer, wherein the plurality of substrate-facing protrusions are disposed at least partially through the thermal interface layer.

公开(公告)号：US10297577B2

公开(公告)日：2019-05-21

申请号：US15693750

申请日：2017-09-01

Applicant: Micron Technology, Inc.

Inventor： Sameer S. Vadhavkar ,  Jaspreet S. Gandhi ,  James M. Derderian

IPC: H01L25/065 ,  H01L23/373 ,  H01L23/40 ,  H01L23/367 ,  H01L23/00 ,  H01L21/78 ,  H01L25/00 ,  H01L25/18 ,  H01L23/538

Abstract: Semiconductor device assemblies with heat transfer structures formed from semiconductor materials are disclosed herein. In one embodiment, a semiconductor device assembly can include a thermal transfer structure formed from a semiconductor substrate. The thermal transfer structure includes an inner region, an outer region projecting from the inner region, and a cavity defined in the outer region by the inner and outer regions. The semiconductor device assembly further includes a stack of first semiconductor dies in the cavity, and a second semiconductor die attached to the outer region of the thermal transfer structure and enclosing the stack of first semiconductor dies within the cavity.

公开(公告)号：US10163830B2

公开(公告)日：2018-12-25

申请号：US15344893

申请日：2016-11-07

Applicant: MICRON TECHNOLOGY, INC.

Inventor： Jaspreet S. Gandhi ,  James M. Derderian ,  Sameer S. Vadhavkar ,  Jian Li

IPC: H01L23/16 ,  H01L23/00 ,  H01L23/48 ,  H01L23/367 ,  H01L23/34 ,  H01L21/78 ,  H01L25/065 ,  H01L25/00

Abstract: Apparatuses and methods for providing thermal pathways from a substrate to a thermal bonding pad. The thermal pathways may be metal extensions of the thermal bonding pad that are disposed in channels formed in a backside passivation layer underneath the thermal bonding pad, and may be in direct contact with an underlying substrate. The thermal pathways may provide improved thermal dissipation from the substrate.

公开(公告)号：US20170365584A1

公开(公告)日：2017-12-21

申请号：US15693750

申请日：2017-09-01

Applicant: Micron Technology, Inc.

Inventor： Sameer S. Vadhavkar ,  Jaspreet S. Gandhi ,  James M. Derderian

IPC: H01L25/065 ,  H01L23/373 ,  H01L25/00 ,  H01L23/00 ,  H01L21/78 ,  H01L23/367 ,  H01L23/40 ,  H01L23/538 ,  H01L25/18

CPC classification number: H01L25/0657 ,  H01L21/78 ,  H01L23/3675 ,  H01L23/373 ,  H01L23/3738 ,  H01L23/4012 ,  H01L23/5385 ,  H01L24/05 ,  H01L24/13 ,  H01L24/16 ,  H01L24/17 ,  H01L24/32 ,  H01L24/73 ,  H01L24/92 ,  H01L24/94 ,  H01L24/97 ,  H01L25/18 ,  H01L25/50 ,  H01L2224/0401 ,  H01L2224/0557 ,  H01L2224/13025 ,  H01L2224/131 ,  H01L2224/13147 ,  H01L2224/16146 ,  H01L2224/16227 ,  H01L2224/17181 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/73203 ,  H01L2224/73204 ,  H01L2224/73253 ,  H01L2224/92242 ,  H01L2224/94 ,  H01L2224/97 ,  H01L2225/06513 ,  H01L2225/06517 ,  H01L2225/06541 ,  H01L2225/06555 ,  H01L2225/06589 ,  H01L2924/1431 ,  H01L2924/1434 ,  H01L2924/1436 ,  H01L2924/1437 ,  H01L2924/1438 ,  H01L2924/16235 ,  H01L2924/16251 ,  H01L2924/1632 ,  H01L2924/167 ,  H01L2224/83

Abstract: Semiconductor device assemblies with heat transfer structures formed from semiconductor materials are disclosed herein. In one embodiment, a semiconductor device assembly can include a thermal transfer structure formed from a semiconductor substrate. The thermal transfer structure includes an inner region, an outer region projecting from the inner region, and a cavity defined in the outer region by the inner and outer regions. The semiconductor device assembly further includes a stack of first semiconductor dies in the cavity, and a second semiconductor die attached to the outer region of the thermal transfer structure and enclosing the stack of first semiconductor dies within the cavity.

公开(公告)号：US09647167B2

公开(公告)日：2017-05-09

申请号：US14603102

申请日：2015-01-22

Applicant: Micron Technology, Inc.

Inventor： Sameer S. Vadhavkar

IPC: H01L31/18 ,  H01L33/54 ,  H01L33/62 ,  H01L33/48 ,  H01L33/58 ,  H01L31/0203 ,  H01L31/0232 ,  H01L33/50

CPC classification number: H01L33/62 ,  H01L31/0203 ,  H01L31/02322 ,  H01L31/18 ,  H01L33/486 ,  H01L33/505 ,  H01L33/507 ,  H01L33/508 ,  H01L33/54 ,  H01L33/58 ,  H01L2224/73204 ,  H01L2933/0033 ,  H01L2933/0041 ,  H01L2933/005 ,  H01L2933/0058 ,  H01L2933/0066 ,  Y02E10/52

Abstract: Solid-state radiation transducer (SSRT) devices and methods of manufacturing and using SSRT devices are disclosed herein. One embodiment of the SSRT device includes a radiation transducer (e.g., a light-emitting diode) and a transmissive support assembly including a transmissive support member, such as a transmissive support member including a converter material. A lead can be positioned at a back side of the transmissive support member. The radiation transducer can be flip-chip mounted to the transmissive support assembly. For example, a solder connection can be present between a contact of the radiation transducer and the lead of the transmissive support assembly.

公开(公告)号：US09397078B1

公开(公告)日：2016-07-19

申请号：US14635888

申请日：2015-03-02

Applicant: Micron Technology, Inc.

Inventor： Anilkumar Chandolu ,  Wayne H. Huang ,  Sameer S. Vadhavkar

IPC: H01L25/18 ,  H01L23/367 ,  H01L25/00 ,  H01L23/48 ,  H01L25/065 ,  H01L21/56 ,  H01L23/31

CPC classification number: H01L25/18 ,  H01L21/563 ,  H01L23/04 ,  H01L23/367 ,  H01L23/42 ,  H01L25/0657 ,  H01L25/50 ,  H01L29/0657 ,  H01L2224/0401 ,  H01L2224/0557 ,  H01L2224/16145 ,  H01L2224/16146 ,  H01L2224/17181 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/32245 ,  H01L2224/73204 ,  H01L2224/73253 ,  H01L2224/92125 ,  H01L2225/06513 ,  H01L2225/06541 ,  H01L2225/06548 ,  H01L2225/06555 ,  H01L2225/06568 ,  H01L2225/06589 ,  H01L2924/0002 ,  H01L2924/1431 ,  H01L2924/1434 ,  H01L2924/16235 ,  H01L2924/00

Abstract: Semiconductor device assemblies with underfill containment cavities are disclosed herein. In one embodiment, a semiconductor device assembly can include a first semiconductor die having a base region formed from a substrate material, a recessed surface along the base region, a peripheral region formed from the substrate material and projecting from the base region, and a sidewall surface along the peripheral region and defining a cavity with the sidewall surface in the peripheral region. The semiconductor device assembly further includes a thermal transfer structure attached to the peripheral region of the first die adjacent the cavity, and an underfill material at least partially filling the cavity and including a fillet between the peripheral region and the stack of second semiconductor dies.

Abstract translation: 本文公开了具有底部填充容纳腔的半导体器件组件。 在一个实施例中，半导体器件组件可以包括第一半导体管芯，其具有由基底材料形成的基极区域，沿着基底区域的凹陷表面，由基底材料形成并从底部区域突出的外围区域，以及侧壁 沿着周边区域形成表面，并且在周边区域中限定具有侧壁表面的空腔。 所述半导体器件组件还包括附接到邻近所述空腔的所述第一裸片的周边区域的热传递结构，以及至少部分地填充所述腔并且在所述外围区域和所述第二半导体管芯堆叠之间包括圆角的底部填充材料。

公开(公告)号：US20160013173A1

公开(公告)日：2016-01-14

申请号：US14330805

申请日：2014-07-14

Applicant: Micron Technology, Inc.

Inventor： Sameer S. Vadhavkar ,  Xiao Li ,  Steven K. Groothuis ,  Jian Li ,  Jaspreet S. Gandhi ,  James M. Derderian ,  David R. Hembree

IPC: H01L25/00 ,  H01L23/00 ,  H01L21/56

CPC classification number: H01L25/50 ,  H01L21/50 ,  H01L21/563 ,  H01L23/04 ,  H01L23/3675 ,  H01L23/44 ,  H01L24/13 ,  H01L24/16 ,  H01L24/17 ,  H01L24/29 ,  H01L24/32 ,  H01L24/33 ,  H01L24/83 ,  H01L24/92 ,  H01L25/0657 ,  H01L25/18 ,  H01L2224/1134 ,  H01L2224/13025 ,  H01L2224/131 ,  H01L2224/13111 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/1329 ,  H01L2224/133 ,  H01L2224/16145 ,  H01L2224/16146 ,  H01L2224/16227 ,  H01L2224/1703 ,  H01L2224/17181 ,  H01L2224/17519 ,  H01L2224/2919 ,  H01L2224/29191 ,  H01L2224/2929 ,  H01L2224/2939 ,  H01L2224/29393 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/32245 ,  H01L2224/33181 ,  H01L2224/73203 ,  H01L2224/73204 ,  H01L2224/73253 ,  H01L2224/73265 ,  H01L2224/83101 ,  H01L2224/83102 ,  H01L2224/83104 ,  H01L2224/83424 ,  H01L2224/83447 ,  H01L2224/8388 ,  H01L2224/92125 ,  H01L2225/06513 ,  H01L2225/06517 ,  H01L2225/06541 ,  H01L2225/06589 ,  H01L2924/1431 ,  H01L2924/1434 ,  H01L2924/15311 ,  H01L2924/156 ,  H01L2924/16235 ,  H01L2924/16251 ,  H01L2924/1815 ,  H01L2924/0715 ,  H01L2924/00014 ,  H01L2924/01006 ,  H01L2924/014 ,  H01L2924/01047 ,  H01L2924/00012 ,  H01L2924/0665 ,  H01L2924/00

Abstract: Method for packaging a semiconductor die assemblies. In one embodiment, a method is directed to packaging a semiconductor die assembly having a first die and a plurality of second dies arranged in a stack over the first die, wherein the first die has a peripheral region extending laterally outward from the stack of second dies. The method can comprise coupling a thermal transfer structure to the peripheral region of the first die and flowing an underfill material between the second dies. The underfill material is flowed after coupling the thermal transfer structure to the peripheral region of the first die such that the thermal transfer structure limits lateral flow of the underfill material.

Abstract translation: 封装半导体管芯组件的方法。 在一个实施例中，一种方法涉及将具有第一管芯和多个第二管芯的半导体管芯组件封装在第一管芯上，其中第一管芯具有从第二管芯的堆叠体横向向外延伸的周边区域 。 该方法可以包括将热传递结构耦合到第一模具的周边区域并且在第二模具之间流动底部填充材料。 在将热传递结构连接到第一模具的周边区域之后，底部填充材料流动，使得热转印结构限制底部填充材料的横向流动。

公开(公告)号：US20220013434A1

公开(公告)日：2022-01-13

申请号：US17335994

申请日：2021-06-01

Applicant: Micron Technology, Inc.

Inventor： Sameer S. Vadhavkar ,  Xiao Li ,  Steven K. Groothuis ,  Jian Li ,  Jaspreet S. Gandhi ,  James M. Derderian ,  David R. Hembree

IPC: H01L23/44 ,  H01L25/00 ,  H01L21/56 ,  H01L23/00 ,  H01L23/367 ,  H01L25/18 ,  H01L23/04 ,  H01L21/50 ,  H01L25/065 ,  H01L23/373 ,  H01L21/52 ,  H01L21/54 ,  H01L23/053 ,  H01L23/31

Abstract: Method for packaging a semiconductor die assemblies. In one embodiment, a method is directed to packaging a semiconductor die assembly having a first die and a plurality of second dies arranged in a stack over the first die, wherein the first die has a peripheral region extending laterally outward from the stack of second dies. The method can comprise coupling a thermal transfer structure to the peripheral region of the first die and flowing an underfill material between the second dies. The underfill material is flowed after coupling the thermal transfer structure to the peripheral region of the first die such that the thermal transfer structure limits lateral flow of the underfill material.

公开(公告)号：US20210343670A1

公开(公告)日：2021-11-04

申请号：US17376934

申请日：2021-07-15

Applicant: Micron Technology, Inc.

Inventor： Suresh Yeruva ,  Owen R. Fay ,  Sameer S. Vadhavkar ,  Adriel Jebin Jacob Jebaraj ,  Wayne H. Huang

IPC: H01L23/00

Abstract: A method of manufacturing a semiconductor device having a conductive substrate having a first surface, a second surface opposite the first surface, and a passivation material covering a portion of the first surface can include applying a seed layer of conductive material to the first surface of the conductive substrate and to the passivation material, the seed layer having a first face opposite the conductive substrate. The method can include forming a plurality of pillars comprising layers of first and second materials. The method can include etching the seed layer to undercut the seed layer between the conductive substrate and the first material of at least one of the pillars. In some embodiments, a cross-sectional area of the seed layer in contact with the passivation material between the first material and the conductive substrate is less than the cross-sectional area of the second material.

公开(公告)号：US10916527B2

公开(公告)日：2021-02-09

申请号：US16934924

申请日：2020-07-21

Applicant: Micron Technology, Inc.

Inventor： Sameer S. Vadhavkar ,  Xiao Li ,  Anilkumar Chandolu

IPC: H01L25/065 ,  H01L23/367

Abstract: Apparatuses and methods for semiconductor die heat dissipation are described. For example, an apparatus for semiconductor die heat dissipation may include a substrate and a heat spreader. The substrate may include a thermal interface layer disposed on a surface of the substrate, such as disposed between the substrate and the heat spreader. The heat spreader may include a plurality of substrate-facing protrusions in contact with the thermal interface layer, wherein the plurality of substrate-facing protrusions are disposed at least partially through the thermal interface layer.