Selective nickel plating of aluminum, copper, and tungsten structures
    21.
    发明申请
    Selective nickel plating of aluminum, copper, and tungsten structures 有权
    铝,铜和钨结构的选择性镀镍

    公开(公告)号:US20060046088A1

    公开(公告)日:2006-03-02

    申请号:US10934635

    申请日:2004-09-02

    Abstract: A method of selectively plating nickel on an intermediate semiconductor device structure. The method comprises providing an intermediate semiconductor device structure having at least one aluminum or copper structure and at least one tungsten structure. One of the aluminum or copper structure and the tungsten structure is nickel plated while the other remains unplated. The aluminum or copper structure or the tungsten structure may first be activated toward nickel plating. The activated aluminum or copper structure or the activated tungsten structure may then be nickel plated by immersing the intermediate semiconductor device structure in an electroless nickel plating solution. The unplated aluminum or copper structure or the unplated tungsten structure may subsequently be nickel plated by activating the unplated structure and nickel plating the activated structure. A method of simultaneously plating the aluminum or copper structure and the tungsten structure with nickel is also disclosed, as is an intermediate semiconductor device structure.

    Abstract translation: 在中间半导体器件结构上选择性镀镍的方法。 该方法包括提供具有至少一个铝或铜结构和至少一个钨结构的中间半导体器件结构。 铝或铜结构之一和钨结构是镀镍的,而另一个保持未镀层。 可以首先将铝或铜结构或钨结构活化成镀镍。 然后可以通过将中间半导体器件结构浸入无电镀镍溶液中来将活化的铝或铜结构或活化的钨结构镀镍。 然后通过激活未镀层的结构和镀镍活化的结构,可以将未镀覆的铝或铜结构或未镀覆的钨结构镀镍。 还公开了一种用镍同时电镀铝或铜结构和钨结构的方法,以及中间半导体器件结构。

    Method and apparatus for testing bumped die
    29.
    发明申请
    Method and apparatus for testing bumped die 审中-公开
    碰撞模具测试方法和装置

    公开(公告)号:US20070063722A1

    公开(公告)日:2007-03-22

    申请号:US11601546

    申请日:2006-11-17

    Applicant: James Wark

    Inventor: James Wark

    Abstract: An apparatus for testing unpackaged semiconductor dice having raised ball contact locations is disclosed. The apparatus uses a temporary interconnect wafer that is adapted to establish an electrical connection with the raised ball contact locations on the die without damage to the ball contact locations. The interconnect is fabricated on a substrate, such as silicon, where contact members are formed in a pattern that matches the size and spacing of the ball contact locations on the die to be tested. The contact members on the interconnect wafer are formed as either pits, troughs, or spike contacts. The spike contacts penetrate through the oxide layer formed on the raised ball contact locations. Conductive traces are provided in both rows and columns and are terminated on the inner edges of the walls of the pits formed in the substrate.

    Abstract translation: 公开了一种用于测试具有凸起的球接触位置的未包装半导体晶片的测试装置。 该装置使用临时互连晶片,其适于与模具上的凸起的球接触位置建立电连接,而不损坏球接触位置。 互连制造在诸如硅的衬底上,其中接触构件以与待测试的管芯上的球接触位置的尺寸和间距匹配的图案形成。 互连晶片上的接触构件形成为凹坑,凹槽或尖峰触点。 尖钉触点穿过形成在凸起接触位置上的氧化物层。 导电迹线设置在行和列中,并且终止于形成在基板中的凹坑的壁的内边缘。

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