公开(公告)号：US20170254936A1

公开(公告)日：2017-09-07

申请号：US15320509

申请日：2015-08-11

Applicant: Konica Minolta, Inc.

Inventor： TAKAAKI MORITA

IPC: G02B5/20 ,  G02B5/26 ,  B32B37/06 ,  B29C65/48 ,  B32B7/02 ,  B32B7/12

CPC classification number: G02B5/208 ,  B29C65/48 ,  B29L2011/00 ,  B32B7/02 ,  B32B7/04 ,  B32B7/06 ,  B32B7/12 ,  B32B9/02 ,  B32B9/045 ,  B32B17/10036 ,  B32B17/1011 ,  B32B17/10201 ,  B32B17/10761 ,  B32B23/04 ,  B32B23/08 ,  B32B27/06 ,  B32B27/08 ,  B32B27/20 ,  B32B27/28 ,  B32B27/285 ,  B32B27/288 ,  B32B27/30 ,  B32B27/302 ,  B32B27/306 ,  B32B27/308 ,  B32B27/32 ,  B32B27/36 ,  B32B27/365 ,  B32B27/40 ,  B32B37/02 ,  B32B37/06 ,  B32B2250/04 ,  B32B2255/10 ,  B32B2255/205 ,  B32B2255/26 ,  B32B2255/28 ,  B32B2264/0214 ,  B32B2264/10 ,  B32B2264/102 ,  B32B2264/104 ,  B32B2270/00 ,  B32B2307/21 ,  B32B2307/302 ,  B32B2307/306 ,  B32B2307/31 ,  B32B2307/402 ,  B32B2307/412 ,  B32B2307/416 ,  B32B2307/50 ,  B32B2307/51 ,  B32B2307/518 ,  B32B2307/536 ,  B32B2307/554 ,  B32B2307/558 ,  B32B2307/584 ,  B32B2307/71 ,  B32B2307/712 ,  B32B2307/7242 ,  B32B2307/732 ,  B32B2307/736 ,  B32B2307/748 ,  B32B2307/752 ,  B32B2309/02 ,  B32B2315/08 ,  B32B2419/00 ,  B32B2457/00 ,  B32B2457/208 ,  B32B2509/00 ,  B32B2605/006 ,  B32B2605/08 ,  B32B2605/10 ,  B32B2605/12 ,  B32B2605/18 ,  G02B5/0816 ,  G02B5/0841 ,  G02B5/085 ,  G02B5/26

Abstract: A light reflecting film may be provided that improves the self-restoring property of a stretched section thereof when stretched and attached to a curved surface and that has excellent scratch resistance and light resistance, a production method for the light reflecting film, a decorative molding method may also be provided for the light reflecting film, laminated glass, and a curved surface body.

公开(公告)号：US20170248825A1

公开(公告)日：2017-08-31

申请号：US15257581

申请日：2016-09-06

Applicant: Microsoft Technology Licensing, LLC

Inventor： Andreas Georgiou ,  Joel S. Kollin

IPC: G02F1/1343 ,  G02F1/13363 ,  G02F1/1333 ,  G02F1/1335

CPC classification number: G02F1/134309 ,  B82Y30/00 ,  G02B5/0816 ,  G02F1/133345 ,  G02F1/133504 ,  G02F1/133509 ,  G02F1/133553 ,  G02F1/13363 ,  G02F1/13439 ,  G02F1/292 ,  G02F2001/13356 ,  G02F2001/133638 ,  G02F2201/121 ,  G02F2201/123 ,  G02F2201/305 ,  G02F2202/36 ,  G02F2202/42 ,  G02F2203/12 ,  G02F2413/01 ,  G03H1/02 ,  G03H1/2202 ,  G03H2001/0224 ,  G03H2223/20 ,  G03H2223/24 ,  G03H2223/50 ,  G03H2223/53 ,  G03H2225/32 ,  G03H2225/52 ,  G03H2225/55 ,  H01L51/0048 ,  H01L51/102

Abstract: Examples are disclosed relating to reducing orders of diffraction patterns in phase modulating devices. An example phase modulating device includes a phase modulating layer having first and second opposing sides, a common electrode adjacent the first side of the phase modulating layer, a plurality of pixel electrodes adjacent the second side of the phase modulating layer, and blurring material disposed between the phase modulating layer and the pixel electrodes. In the example phase modulating device, the blurring material is configured to smooth phase transitions in the phase modulating layer between localized areas associated with the pixel electrodes, the pixel electrodes have a pixel pitch by which the pixel electrodes are distributed along the phase modulating layer, and the pixel electrodes are separated from one another by an inter-pixel gap, where the ratio of the inter-pixel gap to the pixel pitch is between 0.50 and 1.0.

公开(公告)号：US09651726B2

公开(公告)日：2017-05-16

申请号：US15042425

申请日：2016-02-12

Applicant: 3M INNOVATIVE PROPERTIES COMPANY

Inventor： William Ward Merrill ,  Douglas S. Dunn

IPC: G02B5/30 ,  G02B5/08 ,  G02B27/28 ,  G02B5/28 ,  B42D25/23 ,  B42D25/24 ,  B42D25/391 ,  G02F1/1335 ,  G02F1/13363

CPC classification number: G02B5/3041 ,  B42D25/23 ,  B42D25/24 ,  B42D25/391 ,  G02B5/0816 ,  G02B5/0841 ,  G02B5/285 ,  G02B5/287 ,  G02B5/30 ,  G02B5/305 ,  G02B5/3083 ,  G02B27/28 ,  G02F1/133536 ,  G02F1/13363 ,  G02F2001/133521 ,  Y10T428/24942

Abstract: A reflective film includes interior layers that selectively reflect light by constructive or destructive interference, the layers extending from a first to a second zone of the film. In the first zone the layers provide a first reflective polarizer characteristic, and in a second zone the layers provide a substantially different reflective polarizer characteristic. The second zone is characterized by at least some of the layers having a reduced birefringence relative to their birefringence in the first zone. In some cases the first reflective polarizer characteristic may have a pass axis that is substantially orthogonal to that of the second reflective polarizer characteristic. The film may have substantially the same thickness in the first and second zones, or a substantially reduced thickness in the second zone relative to the first zone.

公开(公告)号：US09606446B2

公开(公告)日：2017-03-28

申请号：US14732248

申请日：2015-06-05

Applicant: Carl Zeiss SMT GmbH

Inventor： Norbert Wabra ,  Boris Bittner ,  Martin Von Hodenberg ,  Hartmut Enkisch ,  Stephan Muellender ,  Olaf Conradi

IPC: G03F1/22 ,  G03F1/24 ,  G03F7/20 ,  G02B5/08 ,  G21K1/06 ,  G02B17/06 ,  G02B27/10 ,  B82Y10/00

CPC classification number: G03F7/702 ,  B82Y10/00 ,  G02B5/0816 ,  G02B5/0891 ,  G02B17/0663 ,  G02B27/1033 ,  G03F7/70308 ,  G03F7/70316 ,  G03F7/70916 ,  G03F7/70958 ,  G21K1/062

Abstract: A reflective optical element of an optical system for EUV lithography and an associated manufacturing method. The reflective optical element (20) includes a multilayer system (23, 83) for reflecting an incident electromagnetic wave having an operating wavelength in the EUV range, the reflected wave having a phase φ, and a capping layer (25, 85) made from a capping layer material. The method includes determining a dependency according to which the phase of the reflected wave varies with the thickness d of the capping layer, determining a linearity-region in the dependency in which the phase of the reflected wave varies substantially linearly with the thickness of the capping layer, and creating a thickness profile in the capping layer such that both the maximum thickness and the minimum thickness in the thickness profile are in the linearity-region.

公开(公告)号：US09599758B2

公开(公告)日：2017-03-21

申请号：US14440499

申请日：2013-10-01

Applicant: Konica Minolta, Inc.

Inventor： Akihito Hisamitsu

IPC: G02B5/08 ,  G02B5/28 ,  B32B27/30 ,  G02B1/10 ,  G02B5/26

CPC classification number: G02B5/287 ,  B32B27/306 ,  B32B2551/00 ,  G02B1/04 ,  G02B1/10 ,  G02B5/0816 ,  G02B5/0841 ,  G02B5/26 ,  G02B5/28

Abstract: An optical reflective film which includes at least one unit formed by laminating a high refractive index layer and a low refractive index layer on a substrate and is characterized in that at least either of the high refractive index layer or the low refractive index layer contains two or more kinds of polyvinyl alcohols having different degrees of saponification, the high refractive index layer and the low refractive index layer contain polyvinyl alcohols having approximately the same degree of saponification, and an average degree of saponification of polyvinyl alcohols contained in the high refractive index layer and an average degree of saponification of polyvinyl alcohols contained in the low refractive index layer are different from each other.

公开(公告)号：US20160377769A1

公开(公告)日：2016-12-29

申请号：US14901575

申请日：2014-09-25

Applicant: HOYA CORPORATION

Inventor： Kazuhiro HAMAMOTO ,  Toshihiko ORIHARA

IPC: G02B5/08 ,  G03F1/24 ,  G03F7/20 ,  G02B1/14 ,  G02B5/00

CPC classification number: G02B5/0816 ,  G02B1/14 ,  G02B5/003 ,  G02B5/0891 ,  G02B5/26 ,  G02B5/285 ,  G03F1/24 ,  G03F1/52 ,  G03F1/84 ,  G03F7/70216

Abstract: A substrate with a multilayer reflective film capable of facilitating the discovery of contaminants, scratches and other critical defects by inhibiting the detection of pseudo defects attributable to surface roughness of a substrate or film in a defect inspection using a highly sensitive defect inspection apparatus.The substrate with a multilayer reflective film has a multilayer reflective film obtained by alternately laminating a high refractive index layer and a low refractive index layer on a main surface of a mask blank substrate used in lithography, wherein an integrated value I of the power spectrum density (PSD) at a spatial frequency of 1 μm−1 to 10 μm−1 of the surface of the substrate with a multilayer reflective film, obtained by measuring a region measuring 3 μm×3 μm with an atomic force microscope, is not more than 180×10−3 nm3, and the maximum value of the power spectrum density (PSD) at a spatial frequency of 1 μm−1 to 10 μm−1 is not more than 50 nm4.

Abstract translation: 具有多层反射膜的基板具有通过在光刻中使用的掩模坯料基板的主表面交替层叠高折射率层和低折射率层而获得的多层反射膜，其中功率谱密度的积分值I 通过使用原子力显微镜测量3μm×3μm的区域获得的具有多层反射膜的基板的表面的1μm-1〜10μm的空间频率的PSD（PSD）不大于 180×10-3nm 3，空间频率为1μm〜10μm的功率谱密度（PSD）的最大值不大于50nm 4。

公开(公告)号：US09494851B2

公开(公告)日：2016-11-15

申请号：US14348413

申请日：2013-03-28

Applicant: HOYA CORPORATION

Inventor： Toshihiko Orihara ,  Kazuhiro Hamamoto ,  Hirofumi Kozakai ,  Youichi Usui ,  Tsutomu Shoki ,  Junichi Horikawa

IPC: G03F1/50 ,  G03F1/22 ,  G02B5/08 ,  G03F1/48 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/20 ,  C03C3/06 ,  C03C17/34 ,  C03C17/36 ,  C03C23/00

CPC classification number: G03F1/48 ,  B82Y10/00 ,  B82Y40/00 ,  C03C3/06 ,  C03C17/3435 ,  C03C17/3626 ,  C03C17/3636 ,  C03C17/3639 ,  C03C17/3649 ,  C03C17/3665 ,  C03C23/0075 ,  C03C2201/42 ,  C03C2218/33 ,  G02B5/08 ,  G02B5/0816 ,  G02B5/0891 ,  G03F1/22 ,  G03F7/16 ,  G03F7/2002 ,  G03F7/2004 ,  G03F7/70733 ,  H01L21/3081 ,  H01L21/3085

Abstract: Disclosed is a mask blank substrate for use in lithography, wherein the main surface on which the transfer pattern of the substrate is formed has a root mean square roughness (Rms) of not more than 0.15 nm obtained by measuring an area of 1 μm×1 μm with an atomic force microscope, and has a power spectrum density of not more than 10 nm4 at a spatial frequency of not less than 1 μm−1.

Abstract translation: 公开了一种用于光刻的掩模空白基板，其中形成基板的转印图案的主表面具有通过测量1μm×1的面积获得的不大于0.15nm的均方根粗糙度（Rms） 具有原子力显微镜，并且在不小于1μm-1的空间频率下具有不大于10nm 4的功率谱密度。

公开(公告)号：US09488760B2

公开(公告)日：2016-11-08

申请号：US13834230

申请日：2013-03-15

Applicant: CORNING INCORPORATED

Inventor： Jason S Ballou ,  Frederick J Gagliardi ,  Gary Allen Hart ,  Timothy R Soucy ,  Robin Merchant Walton ,  Leonard G Wamboldt ,  Jue Wang

IPC: G02B5/08

CPC classification number: G02B5/0858 ,  G02B1/14 ,  G02B5/0808 ,  G02B5/0816

Abstract: The disclosure is directed to a highly reflective multiband mirror that is reflective in the VIS-NIR_SWIR-MWIR-LWIR bands, the mirror being a complete thin film stack that consists of a plurality of layers on a selected substrate. In order from substrate to the final layer, the mirror consists of (a) substrate, (b) barrier layer, (c) first interface layer, (d) a reflective layer, (e) a second interface layer, (f) tuning layer(s) and (g) a protective layer. In some embodiments the tuning layer and the protective layer are combined into a single layer using a single coating material. The multiband mirror is more durable than existing mirrors on light weight metal substrates, for example 6061-Al, designed for similar applications. In each of the five layer types methods and materials are used to process each layer so as to achieve the desired layer characteristics, which aid to enhancing the durability performance of the stack.

Abstract translation: 本公开涉及在VIS-NIR_SWIR-MWIR-LWIR带中是反射性的高反射多波束镜，镜是由选定基底上的多个层组成的完整薄膜叠层。 按照从底层到最终层的顺序，反射镜由（a）衬底，（b）阻挡层，（c）第一界面层，（d）反射层，（e）第二界面层，（f）调谐 层和（g）保护层。 在一些实施例中，调谐层和保护层使用单一涂层材料组合成单层。 多镜像镜比现有的镜子在轻质金属基底上更耐用，例如适用于类似应用的6061-A1。 在五层类型中的每一种中，使用方法和材料来处理每层，以便实现期望的层特性，这有助于提高堆的耐久性能。

公开(公告)号：US20160254648A1

公开(公告)日：2016-09-01

申请号：US15149595

申请日：2016-05-09

Applicant: Palo Alto Research Center Incorporated

Inventor： Thomas Wunderer ,  Christopher L. Chua ,  Brent S. Krusor ,  Noble M. Johnson

IPC: H01S5/183 ,  H01S5/343 ,  G01N21/17 ,  G02B5/08

CPC classification number: H01S5/18363 ,  B82Y20/00 ,  G01N21/17 ,  G01N21/41 ,  G01N2201/0635 ,  G01N2201/08 ,  G02B5/0816 ,  G02B5/085 ,  H01S5/18308 ,  H01S5/18341 ,  H01S5/18369 ,  H01S5/18377 ,  H01S5/34333 ,  H01S2304/04

Abstract: A device includes one or more reflector components. Each reflector component comprises layer pairs of epitaxially grown reflective layers and layers of a non-epitaxial material, such as air. Vias extend through at least some of the layers of the reflector components. The device may include a light emitting layer.

Abstract translation: 装置包括一个或多个反射器部件。 每个反射器组件包括外延生长反射层的层对和非外延材料（例如空气）的层。 通孔延伸穿过反射器部件的至少一些层。 该装置可以包括发光层。

公开(公告)号：US20160202396A1

公开(公告)日：2016-07-14

申请号：US15078105

申请日：2016-03-23

Applicant: Carl Zeiss SMT GmbH

Inventor： Aksel GOEHNERMEIER ,  Gisela VON BLANCKENHAGEN

IPC: G02B5/08 ,  G03F7/20 ,  G21K1/06

CPC classification number: G02B5/0816 ,  G02B5/0891 ,  G03F7/702 ,  G03F7/70316 ,  G03F7/70575 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/061

Abstract: A multilayer mirror for reflecting extreme ultraviolet (EUV) radiation, the mirror has a substrate and a stack of layers formed on the substrate. The stack of layers comprises layers including a low index material and a high index material, the low index material having a lower real part of the refractive index than the high index material at a given operating wavelength λ. The mirror provides a first peak of reflectivity of 20% or more at a first wavelength λ1 in a first wavelength band extending from 6 nm to 7 nm and a second peak of reflectivity of 20% or more at a second wavelength λ2 in a second wavelength band extending from 12.5 nm to 15 nm.

Abstract translation: 用于反射极紫外（EUV）辐射的多层反射镜，反射镜具有在基板上形成的基底和一叠层。 层叠层包括低折射率材料和高折射率材料的层，低折射率材料在给定的工作波长λ下具有比高折射率材料更低的折射率部分。 反射镜在从第一波长λ1延伸到6nm至7nm的第一波长λ1处提供20％以上的反射率的第一峰值，而在第二波长处的第二波长λ2处提供20％以上的反射率的第二峰值 带从12.5nm延伸到15nm。