公开(公告)号：US08084116B2

公开(公告)日：2011-12-27

申请号：US11239973

申请日：2005-09-30

Applicant: Joanna Aizenberg ,  Thomas Nikita Krupenkin ,  Oleksander Sydorenko ,  Joseph Ashley Taylor

Inventor： Joanna Aizenberg ,  Thomas Nikita Krupenkin ,  Oleksander Sydorenko ,  Joseph Ashley Taylor

IPC: B32B9/04 ,  G01N15/06 ,  G01N21/00 ,  G01N33/53 ,  H01L41/08

CPC classification number: C09D5/00 ,  B81B3/0089 ,  B81B2201/06 ,  B81B2203/0361 ,  B82Y30/00 ,  Y10T428/24 ,  Y10T428/24174 ,  Y10T428/24273 ,  Y10T428/24355 ,  Y10T428/24496 ,  Y10T428/24612 ,  Y10T428/2462 ,  Y10T428/31511 ,  Y10T428/31663

Abstract: An apparatus includes a substrate having a top surface, a substantially regular array of raised structures located over the top surface, and a layer located on the top surface between the structures. Distal surfaces of the structures are farther from the top surface than remaining portions of the structures. The layer is able to contract such that the distal surfaces of the structures protrude through the layer. The layer is able to swell such that the distal surfaces of the structures are closer to the top surface of the substrate than one surface of the layer.

Abstract translation: 一种装置包括具有顶表面，位于顶表面上方的基本上规则的凸起结构阵列的基底和位于结构之间的顶表面上的层。 结构的远端表面比结构的剩余部分远离顶表面。 该层能够收缩，使得结构的远端表面突出穿过该层。 该层能够膨胀，使得结构的远端表面比该层的一个表面更靠近衬底的顶表面。

公开(公告)号：US20110039095A1

公开(公告)日：2011-02-17

申请号：US12988268

申请日：2009-03-31

Applicant: Youhei Maeno ,  Yoshikazu Nakayama ,  Kaori Hirahara

Inventor： Youhei Maeno ,  Yoshikazu Nakayama ,  Kaori Hirahara

IPC: B32B5/02 ,  D02G3/22 ,  D02G3/02 ,  B82Y30/00

CPC classification number: B81B1/00 ,  B81B2203/0361 ,  B81C1/00206 ,  C09J7/00 ,  C09J2201/626 ,  Y10S977/742 ,  Y10S977/752 ,  Y10T428/249921 ,  Y10T428/26 ,  Y10T428/2913 ,  Y10T428/2918 ,  Y10T428/2973 ,  Y10T428/2975 ,  Y10T428/298

Abstract: Provided is a fibrous columnar structure aggregate having excellent mechanical properties, a high specific surface area, and excellent pressure-sensitive adhesive property. Provided is a fibrous columnar structure aggregate having excellent heat resistance, a high specific surface area, and excellent pressure-sensitive adhesive properties under temperature conditions ranging from room temperature to a high temperature. Provided is a fibrous columnar structure aggregate having a high specific surface area and such pressure-sensitive adhesive property that its adhesive strength for adherends different from each other in surface free energy does not change (the aggregate is free of adherend selectivity). Provided is a pressure-sensitive adhesive member using any such fibrous columnar structure aggregate. A fibrous columnar structure aggregate (1) of the present invention includes fibrous columnar structures having a plurality of diameters, in which the distribution width of the diameter distribution of the fibrous columnar structures having the plurality of diameters is 10 nm or more, and the relative frequency of the mode of the diameter distribution is 30% or less.

Abstract translation: 提供一种具有优异的机械性能，高比表面积和优异的压敏粘合性能的纤维状柱状结构体骨料。 提供一种在室温至高温的温度条件下具有优异的耐热性，高比表面积和优异的压敏粘合剂性能的纤维状柱状结构体聚集体。 本发明提供一种具有高比表面积的纤维状柱状结构体聚集体和其表面自由能彼此不同的被粘物的粘合强度不受变化的粘合性（聚集体无粘附选择性）。 提供使用任何这种纤维状柱状结构体聚集体的压敏粘合剂构件。 本发明的纤维状柱状结构体聚集体（1）包括具有多个直径的纤维状柱状结构体，其中具有多个直径的纤维状柱状结构的直径分布的分布宽度为10nm以上， 直径分布模式的频率为30％以下。

公开(公告)号：US07887723B2

公开(公告)日：2011-02-15

申请号：US11623817

申请日：2007-01-17

Applicant: Kenji Murao ,  Kosuke Kuwabara ,  Masahiko Ogino

Inventor： Kenji Murao ,  Kosuke Kuwabara ,  Masahiko Ogino

IPC: B29C65/00

CPC classification number: B81C1/0046 ,  B29C43/021 ,  B29C2043/025 ,  B81B2201/0214 ,  B81B2203/0361 ,  B81C2201/0153 ,  B82Y10/00 ,  B82Y15/00 ,  B82Y40/00 ,  G03F7/0002

Abstract: It is an object of the present invention to provide a method which can easily and selectively modify specific sites on indentations or protrusions of indentation/protrusion structures fabricated by nano-imprinting. Pressing a mold having indentation/protrusion structures onto a polymer substrate comprising at least two layers of different chemical composition exposes the second layer, which has been covered by the outermost layer, in pillars formed as a result of the pressing. Site-specific chemical modification of the pillars can be achieved by formulating a desired chemical composition for the second layer beforehand, or by chemical modification of the exposed second layer cross-sections in the pillars.

Abstract translation: 本发明的一个目的是提供一种方法，其可以容易且选择性地改变通过纳米压印制造的压痕/突起结构的凹陷或凸起上的特定部位。 将具有凹陷/突起结构的模具压到包含至少两层不同化学组成的聚合物基材上，将由最外层覆盖的第二层暴露在由压制形成的柱中。 可以通过预先为第二层配制所需的化学组合物，或者通过化学修饰柱中暴露的第二层横截面来实现柱的特定位点的化学修饰。

公开(公告)号：US20100310773A1

公开(公告)日：2010-12-09

申请号：US12859802

申请日：2010-08-20

Applicant: Hiroshi Yoshida ,  Haruo Akahoshi ,  Akihiro Miyauchi ,  Masahiko Ogino

Inventor： Hiroshi Yoshida ,  Haruo Akahoshi ,  Akihiro Miyauchi ,  Masahiko Ogino

IPC: B05D3/10

CPC classification number: B29C33/3842 ,  B29C33/424 ,  B81B2203/0361 ,  B81C1/00111 ,  B81C1/00206 ,  B81C99/0085 ,  B81C99/009 ,  B81C2201/034 ,  B82Y10/00 ,  B82Y40/00 ,  C23C18/1608 ,  C23C18/1651 ,  C23C18/1653 ,  C23C18/1657 ,  C23C18/1689 ,  C23C18/208 ,  C23C18/42 ,  G03F7/0002 ,  H01J1/304 ,  H01J9/025 ,  Y10T428/12389 ,  Y10T428/12993

Abstract: A fine metal structure having its surface furnished with microprojections of high strength, high precision and large aspect ratio; and a process for producing the fine metal structure free of defects. There is provided a fine metal structure having its surface furnished with microprojections, characterized in that the microprojections have a minimum thickness or minimum diameter ranging from 10 nanometers to 10 micrometers and that the ratio between minimum thickness or minimum diameter (D) of microprojections and height of microprojections (H), H/D, is greater than 1. There is further provided a process for producing a fine metal structure, characterized by comprising providing a substrate having a fine rugged pattern on its surface, applying a molecular electroless plating catalyst to the surface, thereafter carrying out electroless plating to thereby form a metal layer having the rugged pattern filled, and detaching the metal layer from the substrate to thereby obtain a fine metal structure furnished with a surface having undergone reversal transfer of the above rugged pattern.

Abstract translation: 精细的金属结构，其表面具有高强度，高精度和大纵横比的微喷射体; 以及没有缺陷的金属微细结构的制造方法。 提供了具有微喷射体的表面的细金属结构，其特征在于，微喷射体具有10纳米至10微米的最小厚度或最小直径，并且微喷射体的最小厚度或最小直径（D）与高度 的微喷射体（H）H / D大于1.还提供了一种制造精细金属结构的方法，其特征在于，在其表面上提供具有细凹凸图案的基板，将分子无电镀催化剂 然后进行无电解电镀，从而形成具有凹凸图案的金属层，并将金属层与基板分离，从而获得配备有经过上述凹凸图案的反转传送的表面的精细金属结构。

公开(公告)号：US20100190654A1

公开(公告)日：2010-07-29

申请号：US12517750

申请日：2007-12-05

Applicant: Ginger D. Rothrock ,  Robert L. Henn

Inventor： Ginger D. Rothrock ,  Robert L. Henn

IPC: C40B30/04 ,  C40B40/06 ,  C40B50/14

CPC classification number: G01N33/54386 ,  B01J2219/00317 ,  B01J2219/005 ,  B01J2219/00504 ,  B01J2219/00605 ,  B01J2219/00659 ,  B01J2219/00722 ,  B01J2219/00725 ,  B01L3/5085 ,  B01L2200/0668 ,  B01L2300/0819 ,  B01L2300/0893 ,  B01L2300/0896 ,  B81B2201/0214 ,  B81B2203/0361 ,  B81C1/00031 ,  B82Y30/00

Abstract: A nanoarray includes a fluoropolymer array defining a plurality of cavities where each cavity has a predetermined shape and is less than about 5 micrometers in a broadest cross-sectional dimension. The nanoarray also includes a composition discretely contained in each cavity, where the composition includes a linking group for coupling with a modifying group. The nanoarray can be fabricated from fluoropolyether or perfluoropolyether.

Abstract translation: 纳米阵列包括限定多个空腔的氟聚合物阵列，其中每个空腔具有预定形状并且在最宽的横截面尺寸中小于约5微米。 纳米阵列还包括离散地包含在每个空腔中的组合物，其中组合物包含用于与修饰基团偶联的连接基团。 纳米阵列可以由氟聚醚或全氟聚醚制备。

公开(公告)号：US20100116780A1

公开(公告)日：2010-05-13

申请号：US12349164

申请日：2009-01-06

Applicant: Jae Min Myoung ,  Jyoti Prakash Kar

Inventor： Jae Min Myoung ,  Jyoti Prakash Kar

IPC: B44C1/22 ,  B32B9/00

CPC classification number: B81C1/00206 ,  B81B2203/0361 ,  C30B25/005 ,  C30B25/04 ,  C30B29/16 ,  C30B29/605 ,  G03F7/0035 ,  H01L21/02521 ,  H01L21/02554 ,  H01L21/02603 ,  H01L21/02639 ,  H01L21/0331

Abstract: A method for patterning nanowires on a substrate. The method includes procedures of preparing a substrate having a patterned sacrificial layer of barium fluoride thereon; growing nanowires on an entire surface of the resultant substrate including the patterned sacrificial layer; and removing the patterned sacrificial layer using a solvent to remove part of the nanowires on the patterned sacrificial layer such that part of the nanowires in direct contact with the substrate remains on the substrate to thereby form a nanowire pattern.

Abstract translation: 一种用于在衬底上构图纳米线的方法。 该方法包括制备其上具有氟化钡的图案化牺牲层的衬底的步骤; 在包括图案化牺牲层的所得基底的整个表面上生长纳米线; 并且使用溶剂去除图案化的牺牲层以去除图案化牺牲层上的部分纳米线，使得与衬底直接接触的部分纳米线保留在衬底上，从而形成纳米线图案。

公开(公告)号：US07691307B2

公开(公告)日：2010-04-06

申请号：US11080037

申请日：2005-03-14

Applicant: Ronald S. Fearing ,  Metin Setti

Inventor： Ronald S. Fearing ,  Metin Setti

IPC: B23B3/06

CPC classification number: A44B18/0003 ,  A44B18/0049 ,  A44B18/0061 ,  B08B1/00 ,  B08B7/0028 ,  B29C33/42 ,  B29L2031/756 ,  B81B3/0059 ,  B81B2203/0361 ,  B82Y30/00 ,  C09J7/00 ,  C09J2201/626 ,  F16B2/005 ,  F16B5/07 ,  Y10S977/84 ,  Y10T24/27 ,  Y10T24/2742 ,  Y10T428/23943 ,  Y10T428/24008 ,  Y10T428/24174 ,  Y10T428/24355 ,  Y10T428/28 ,  Y10T428/2913 ,  Y10T428/2973 ,  Y10T428/2976 ,  Y10T428/2978 ,  Y10T428/298

Abstract: A fabricated microstructure comprising at least one protrusion capable of providing an adhesive force at a surface of between about 60 and 2,000 nano-Newtons. A stalk supports the protrusion at an oblique angle relative to a supporting surface. The microstructure can adhere to different surfaces.

Abstract translation: 一种制造的微结构，包括至少一个能够在约60和2,000纳米牛顿之间的表面提供粘合力的突起。 杆以相对于支撑表面倾斜的角度支撑突起。 微结构可以粘附在不同的表面上。

公开(公告)号：US07651736B2

公开(公告)日：2010-01-26

申请号：US11766908

申请日：2007-06-22

Applicant: Aya Imada ,  Toru Den

Inventor： Aya Imada ,  Toru Den

IPC: B05D3/00

CPC classification number: B81C1/00111 ,  B81B2203/0361 ,  C25D1/08 ,  C25D11/04 ,  C25D11/045 ,  C25D11/16 ,  C25D11/18 ,  C25D11/26

Abstract: The present invention provides a method of producing a structure, which is capable of easily obtaining a structure of the nanometer scale by using an anodic oxidation method. A method of producing a structure with a hole includes: forming first projected structures regularly arranged on a substrate; forming a first anodic oxidating layer on the substrate having the first projected structures, thereby forming first recessed structures at center portions of cells formed by the projected structures on the anodic oxidating layer; removing the first projected structures to form holes; and subjecting the first anodic oxidating layer to anodic oxidation to form holes at positions of the first recessed structures.

Abstract translation: 本发明提供一种通过使用阳极氧化法容易地得到纳米级结构的结构体的制造方法。 制造具有孔的结构的方法包括：形成规则地布置在基板上的第一突出结构; 在具有第一投影结构的基板上形成第一阳极氧化层，从而在由阳极氧化层上的投影结构形成的单元的中心部分形成第一凹陷结构; 移除第一投影结构以形成孔; 以及对所述第一阳极氧化层进行阳极氧化，以在所述第一凹部结构的位置形成孔。

公开(公告)号：US20100003460A1

公开(公告)日：2010-01-07

申请号：US12165880

申请日：2008-07-01

Applicant: Cristian A. Bolle ,  Flavio Pardo

Inventor： Cristian A. Bolle ,  Flavio Pardo

IPC: B32B3/00 ,  B44C1/22

CPC classification number: H01L21/30604 ,  B81B2201/047 ,  B81B2203/0118 ,  B81B2203/0307 ,  B81B2203/0361 ,  B81B2203/0384 ,  B81B2207/056 ,  B81C1/00015 ,  B81C1/00039 ,  B81C1/00531 ,  B81C1/00539 ,  H01L21/3065 ,  Y10T428/24479

Abstract: As discussed herein, there is presented an apparatus comprising micro-posts. The apparatus includes a substrate having a planar surface, a plurality of micro-posts located on the planar surface, wherein each micro-post has a base portion on the planar surface and a post portion located on a top surface of the corresponding base portion, and wherein side surfaces of the base portions intersect the planar surface at oblique angles.

Abstract translation: 如本文所讨论的，提供了一种包括微柱的装置。 该装置包括具有平坦表面的基底，位于平坦表面上的多个微柱，其中每个微柱在平坦表面上具有基部，并且位于相应基部的顶表面上的柱部分， 并且其中所述基部的侧表面以倾斜角与所述平坦表面相交。

公开(公告)号：US20090243584A1

公开(公告)日：2009-10-01

申请号：US12232152

申请日：2008-09-11

Applicant: Guigen Zhang ,  Venkataramani Anandan ,  Yeshwanth L. Rao

Inventor： Guigen Zhang ,  Venkataramani Anandan ,  Yeshwanth L. Rao

IPC: G01R19/15 ,  C25D5/02 ,  C25D7/00 ,  B32B3/30

CPC classification number: C25D1/04 ,  B81B2201/0214 ,  B81B2203/0361 ,  B81C1/00031 ,  B81C2201/0183 ,  B82Y15/00 ,  C25D1/20 ,  C25D3/48 ,  C25D11/12 ,  Y10T428/2457

Abstract: This invention presents microstructures enhanced with nanopillars. The invention also provides a novel way for manufacturing nanopillar-enhanced microstructures, using conventional microfabrication techniques. In some embodiments, the invention also provides methods of use for the nanopillar-enhanced microstructures.

Abstract translation: 本发明提出了用纳米柱增强的微结构。 本发明还提供了使用常规微细加工技术制造纳米柱增强微结构的新方法。 在一些实施方案中，本发明还提供了用于纳米柱增强微结构的方法。