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51.发明申请GATE STACK ENGINEERING BY ELECTROCHEMICAL PROCESSING UTILIZING THROUGH-GATE-DIELECTRIC CURRENT FLOW 有权通过电化学处理利用栅极电介质电流流动的栅极堆叠工程公开(公告)号：US20080142894A1
公开(公告)日：2008-06-19
申请号：US12040350
申请日：2008-02-29
申请人： Philippe M. Vereecken , Veeraraghavan S. Basker , Cyril Cabral , Emanuel I. Cooper , Hariklia Deligianni , Martin M. Frank , Rajarao Jammy , Vamsi Krishna Paruchuri , Katherine L. Saenger , Xiaoyan Shao
发明人： Philippe M. Vereecken , Veeraraghavan S. Basker , Cyril Cabral , Emanuel I. Cooper , Hariklia Deligianni , Martin M. Frank , Rajarao Jammy , Vamsi Krishna Paruchuri , Katherine L. Saenger , Xiaoyan Shao
IPC分类号： H01L27/088 , H01L29/423
CPC分类号： H01L21/2885 , C25D3/50 , C25D5/02 , C25D5/024 , C25D5/54 , C25D7/123 , C25D9/04 , C25F3/14 , H01L21/28079 , H01L21/28114 , H01L21/76885 , H01L29/513 , H01L29/517 , H01L29/78648
摘要： A method is provided for electroplating a gate metal or other conducting or semiconducting material directly on a dielectric such as a gate dielectric. The method involves selecting a substrate, dielectric layer, and electrolyte solution or melt, wherein the combination of the substrate, dielectric layer, and electrolyte solution or melt allow an electrochemical current to be passed from the substrate through the dielectric layer into the electrolyte solution or melt. Methods are also provided for electrochemical modification of dielectrics utilizing through-dielectric current flow.
摘要翻译： 提供了一种用于将栅极金属或其它导电或半导体材料直接电镀在诸如栅极电介质的电介质上的方法。 该方法包括选择衬底，电介质层和电解质溶液或熔体，其中衬底，电介质层和电解质溶液或熔体的组合允许电化学电流从衬底通过电介质层进入电解质溶液或 熔化。 还提供了利用电介质电流流动的电介质电化学修饰方法。
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公开(公告)号：US07212091B2
公开(公告)日：2007-05-01
申请号：US11053732
申请日：2005-02-08
申请人： Panayotis Constantinou Andricacos , L. Paivikki Buchwalter , Hariklia Deligianni , Robert A. Groves , Christopher Jahnes , Jennifer L. Lund , Michael Meixner , David Earle Seeger , Timothy D. Sullivan , Ping-Chuan Wang
发明人： Panayotis Constantinou Andricacos , L. Paivikki Buchwalter , Hariklia Deligianni , Robert A. Groves , Christopher Jahnes , Jennifer L. Lund , Michael Meixner , David Earle Seeger , Timothy D. Sullivan , Ping-Chuan Wang
IPC分类号： H01H51/22
CPC分类号： H01H59/0009 , H01H2001/0078
摘要： A microelectromechanical switch including: at least one pair of actuator electrodes; at least one input electrode and at least one output electrode for input and output, respectively, of a radio frequency signal; and a beam movable by an attraction between the at least one pair of actuator electrodes, the movable beam having at least a portion electrically connected to the at least one input electrode and to the at least one output electrode when moved by the attraction between the at least one pair of actuator electrodes to make an electrical connection between the at least one input and output electrodes; wherein the at least one pair of actuator electrodes are electrically isolated from each of the at least one input and output electrodes. The microelectromechanical switch can be configured in single or multiple-poles and/or single or multiple throws.
摘要翻译： 一种微机电开关，包括：至少一对致动器电极; 分别输入和输出射频信号的至少一个输入电极和至少一个输出电极; 以及可由所述至少一对致动器电极之间的吸引部移动的光束，所述可移动光束具有至少一部分电连接到所述至少一个输入电极，并且当所述至少一个输入电极在所述至少一个输入电极之间被所述吸引力移动时， 至少一对致动器电极，用于在所述至少一个输入和输出电极之间形成电连接; 其中所述至少一对致动器电极与所述至少一个输入和输出电极中的每一个电隔离。 微机电开关可以配置为单极或多极和/或单掷或多掷。
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53.发明申请公开(公告)号：US20070090902A1
公开(公告)日：2007-04-26
申请号：US11163485
申请日：2005-10-20
申请人： Hariklia Deligianni , Robert Edwards , Thomas Fleischman , Robert Groves , Charles Montrose , Richard Volant , Ping-Chuan Wang
发明人： Hariklia Deligianni , Robert Edwards , Thomas Fleischman , Robert Groves , Charles Montrose , Richard Volant , Ping-Chuan Wang
IPC分类号： H01H51/22
CPC分类号： H01H59/0009
摘要： The present invention provides multiple test structures for performing reliability and qualification tests on MEMS switch devices. A Test structure for contact and gap characteristic measurements is employed having a serpentine layout simulates rows of upper and lower actuation electrodes. A cascaded switch chain test is used to monitor process defects with large sample sizes. A ring oscillator is used to measure switch speed and switch lifetime. A resistor ladder test structure is configured having each resistor in series with a switch to be tested, and having each switch-resistor pair electrically connected in parallel. Serial/parallel test structures are proposed with MEMS switches working in tandem with switches of established technology. A shift register is used to monitor the open and close state of the MEMS switches. Pull-in voltage, drop-out voltage, activation leakage current, and switch lifetime measurements are performed using the shift register.
摘要翻译： 本发明提供用于在MEMS开关装置上执行可靠性和鉴定测试的多个测试结构。 采用具有蛇形布局的接触和间隙特性测量的测试结构来模拟上下驱动电极的行。 级联交换链测试用于监控大样本量的过程缺陷。 环形振荡器用于测量开关速度和开关寿命。 电阻梯形测试结构被配置为具有与要测试的开关串联的每个电阻器，并且每个开关电阻器对并联电连接。 提出了串联/并联测试结构，其中MEMS开关与成熟技术的开关串联工作。 移位寄存器用于监测MEMS开关的开启和关闭状态。 使用移位寄存器执行拉入电压，掉电电压，启动漏电流和开关寿命测量。
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公开(公告)号：US07008871B2
公开(公告)日：2006-03-07
申请号：US10611931
申请日：2003-07-03
申请人： Panayotis C. Andricacos , Shyng-Tsong Chen , John M. Cotte , Hariklia Deligianni , Mahadevaiyer Krishnan , Wei-Tsu Tseng , Philippe M. Vereecken
发明人： Panayotis C. Andricacos , Shyng-Tsong Chen , John M. Cotte , Hariklia Deligianni , Mahadevaiyer Krishnan , Wei-Tsu Tseng , Philippe M. Vereecken
IPC分类号： H01L21/44
CPC分类号： H01L21/76846 , H01L21/2885 , H01L21/6708 , H01L21/76849 , H01L21/7685 , H01L21/76874 , H01L21/76883
摘要： Patterned copper structures are fabricated by selectively capping the copper employing selective etching and/or selective electroplating in the presence of a liner material. Apparatus for addressing the problem of an increased resistive path as electrolyte during electroetching and/or electroplating flows from the wafer edge inwards is provided.
摘要翻译： 通过在衬垫材料的存在下使用选择性蚀刻和/或选择性电镀选择性地封盖铜来制造图案化的铜结构。 提供了用于解决在电蚀和/或电镀过程中作为电解质增加的电阻路径从晶片边缘向内流动的问题的装置。
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公开(公告)号：US06977569B2
公开(公告)日：2005-12-20
申请号：US10915742
申请日：2004-08-11
CPC分类号： H01H59/0009 , H01H2001/0068 , H01H2001/0078
摘要： A switch comprising a substrate, an elongated movable part, a pair of electrical contacts disposed at one side of said part, an actuation electrode disposed at the one side of the part and separated from the pair of electrical contacts, wherein the part, the contacts and the electrode are disposed on the substrate, wherein the elongated movable part is arranged and dimensioned such that the part is movable in a generally lateral direction toward the contacts; the movable part includes a central elongated member fixed to a head having an electrical contact disposed at the one side. One end of the movable part is attached to the substrate by means of various anchoring arrangements.
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公开(公告)号：US09085829B2
公开(公告)日：2015-07-21
申请号：US13222266
申请日：2011-08-31
CPC分类号： C25D5/006 , C25D3/58 , C25D5/06 , C25D5/10 , C25D5/48 , C25D5/50 , C25D7/12 , H01L31/032 , H01L31/0326 , H01L31/18 , H01L31/1864 , Y02E10/50
摘要： A structure and method of making a thin-film solar cell. A thin-film solar cell includes a substrate, absorber layer and a buffer layer. The absorber layer is deposited by a single-step bulk electrochemical process, or a multi-layer electrochemical process. The buffer layer is deposited by an electrochemical deposition process such as a multi-layer deposition or an atomic layer deposition. The absorber and buffer layers are non-toxic materials which can include sulfur incorporated during the deposition process or incorporated after deposition by an anneal step.
摘要翻译： 制造薄膜太阳能电池的结构和方法。 薄膜太阳能电池包括基板，吸收层和缓冲层。 吸收层通过单步本体电化学方法或多层电化学方法沉积。 通过诸如多层沉积或原子层沉积的电化学沉积工艺沉积缓冲层。 吸收器和缓冲层是无毒材料，其可以包括在沉积过程中引入的硫或通过退火步骤沉积后结合的硫。
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57.发明授权公开(公告)号：US08941240B2
公开(公告)日：2015-01-27
申请号：US13564414
申请日：2012-08-01
申请人： Hariklia Deligianni , Xiaoyan Shao
发明人： Hariklia Deligianni , Xiaoyan Shao
IPC分类号： H01L23/48 , H01L23/532 , C25D3/50 , C25D5/50 , H01L21/288 , H01L21/768
CPC分类号： H01L23/53242 , C25D3/50 , C25D5/50 , H01L21/2885 , H01L21/76877 , H01L2924/0002 , H01L2924/3011 , Y10T428/12007 , H01L2924/00
摘要： A contact rhodium structure is fabricated by a process that comprises obtaining a substrate having a dielectric layer thereon, wherein the dielectric layer has cavities therein into which the contact rhodium is to be deposited; depositing a seed layer in the cavities and on the dielectric layer; and depositing the rhodium by electroplating from a bath comprising a rhodium salt; an acid and a stress reducer; and then optionally annealing the structure.
摘要翻译： 通过包括获得其上具有电介质层的衬底的方法制造接触铑结构，其中介电层具有其中将沉积接触铑的空腔; 将种子层沉积在空腔中和介电层上; 并通过电镀从含铑盐的浴中沉积铑; 酸和减压剂; 然后可选地退火该结构。
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58.发明授权Working electrode design for electrochemical processing of electronic components 有权电子元器件电化学处理工作电极设计公开(公告)号：US08926820B2
公开(公告)日：2015-01-06
申请号：US13612661
申请日：2012-09-12
CPC分类号： C25D17/001 , C25D5/04 , C25D7/123 , C25D17/004 , C25D17/02 , C25D17/12
摘要： An electroplating apparatus including a plating tank for containing a plating electrolyte. A counter electrode, e.g., anode, is present in a first portion of the plating tank. A cathode system is present in a second portion of the plating tank. The cathode system includes a working electrode and a thief electrode. The thief electrode is present between the working electrode and the counter electrode. The thief electrode includes an exterior face that is in contact with the plating electrolyte that is offset from the plating surface of the working electrode. In one embodiment, the thief electrode overlaps a portion of the working electrode about the perimeter of the working electrode. In one embodiment, a method is provided of using the aforementioned electroplating apparatus that provides increased uniformity in the plating thickness.
摘要翻译： 一种电镀设备，包括用于容纳电镀电解质的电镀槽。 对电极，例如阳极，存在于镀槽的第一部分中。 阴极系统存在于镀槽的第二部分中。 阴极系统包括工作电极和小偷电极。 小电极存在于工作电极和对电极之间。 防窃电极包括与电镀电解质接触的外表面，其与工作电极的电镀表面偏移。 在一个实施例中，窃电电极围绕工作电极的周边重叠一部分工作电极。 在一个实施例中，提供了使用提供镀层厚度增加的均匀性的上述电镀设备的方法。
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公开(公告)号：US08829329B2
公开(公告)日：2014-09-09
申请号：US12858535
申请日：2010-08-18
申请人： Hariklia Deligianni , Fei Liu
发明人： Hariklia Deligianni , Fei Liu
CPC分类号： H01M10/39 , G06F17/5045 , G06F17/5068 , G06F17/5081 , H01L31/022458 , H01L31/053 , H01L31/068 , H01M10/465 , H01M14/005 , H01M16/00 , H01M16/006 , H02J7/35 , H02S40/38 , Y02E10/547 , Y10T156/10 , Y10T307/50
摘要： An integrated photovoltaic cell and battery device, a method of manufacturing the same and a photovoltaic power system incorporating the integrated photovoltaic cell and battery device. The integrated photovoltaic cell and battery device includes a photovoltaic cell, a battery, and interconnects providing three-dimensional integration of the photovoltaic cell and the battery into an integrated device for capturing and storing solar energy. Also provided is a design structure readable by a machine to simulate, design, or manufacture the above integrated photovoltaic cell and battery device.
摘要翻译： 集成光伏电池和电池装置，其制造方法以及并入有集成光伏电池和电池装置的光伏发电系统。 集成光伏电池和电池装置包括光伏电池，电池和将光伏电池和电池三维集成在一起的用于捕获和存储太阳能的集成装置的互连。 还提供了用于模拟，设计或制造上述集成光伏电池和电池装置的机器可读的设计结构。
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60.发明授权公开(公告)号：US08784618B2
公开(公告)日：2014-07-22
申请号：US12806719
申请日：2010-08-19
CPC分类号： C25D17/001 , C25D5/04 , C25D7/123 , C25D17/004 , C25D17/02 , C25D17/12
摘要： An electroplating apparatus is provided that includes a plating tank for containing a plating electrolyte. A counter electrode, e.g., anode, is present in a first portion of the plating tank. A cathode system is present in a second portion of the plating tank. The cathode system includes a working electrode and a thief electrode. The thief electrode is present between the working electrode and the counter electrode. The thief electrode includes an exterior face that is in contact with the plating electrolyte that is offset from the plating surface of the working electrode. In one embodiment, the thief electrode overlaps a portion of the working electrode about the perimeter of the working electrode. In one embodiment, a method is provided of using the aforementioned electroplating apparatus that provides increased uniformity in the plating thickness.
摘要翻译： 提供一种电镀设备，其包括用于容纳电镀液的镀槽。 对电极，例如阳极，存在于镀槽的第一部分中。 阴极系统存在于镀槽的第二部分中。 阴极系统包括工作电极和小偷电极。 小电极存在于工作电极和对电极之间。 防窃电极包括与电镀电解质接触的外表面，其与工作电极的电镀表面偏移。 在一个实施例中，窃电电极围绕工作电极的周边重叠一部分工作电极。 在一个实施例中，提供了使用提供镀层厚度增加的均匀性的上述电镀设备的方法。
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