Coupling of conductive vias to complex power-signal substructures
    65.
    发明申请
    Coupling of conductive vias to complex power-signal substructures 失效
    导电通孔耦合到复杂的功率信号子结构

    公开(公告)号:US20050005439A1

    公开(公告)日:2005-01-13

    申请号:US10912257

    申请日:2004-08-05

    摘要: An electrical structure, and associated method of formation, that includes a complex power-signal (CPS) substructure. The CPS substructure is formed and tested to determine whether the CPS substructure satisfies electrical performance acceptance requirements. The testing includes testing for electrical shorts, electrical opens, erroneous impedances, and electrical signal delay. If the CPS substructure passes the tests, then a dielectric-metallic (DM) laminate is formed on an external surface of the CPS substructure. The DM laminate includes an alternating sequence of an equal number N of dielectric layers and metallic layers such that a first dielectric layer of the N dielectric layers is formed on an external surface of the CPS substructure. N is at least 2. A multilevel conductive via is formed through the DM laminate and is electrically coupled to a metal layer of the CPS substructure.

    摘要翻译: 电气结构和相关的形成方法,其包括复合功率信号(CPS)子结构。 形成和测试CPS子结构以确定CPS子结构是否满足电气性能验收要求。 测试包括测试电气短路,电气开路,错误阻抗和电信号延迟。 如果CPS子结构通过测试,则在CPS子结构的外表面上形成介电金属(DM)层压体。 DM层压板包括相等数量的N个介电层和金属层的交替序列,使得N个介电层的第一介电层形成在CPS子结构的外表面上。 N至少为2.通过DM层压体形成多层导电通孔,并电耦合到CPS子结构的金属层。

    Method for providing an electroless copper plating bath in the take mode
    68.
    发明授权
    Method for providing an electroless copper plating bath in the take mode 失效
    在取样模式下提供化学镀铜浴的方法

    公开(公告)号:US4534797A

    公开(公告)日:1985-08-13

    申请号:US567723

    申请日:1984-01-03

    IPC分类号: H05K3/18 C23C18/40 C23C3/02

    CPC分类号: C23C18/40

    摘要: An electroless copper plating bath which is in the take mode is provided by determining the amount in the bath of at least four of the components selected from the group of oxygen, reducing agent, cyanide salt, cupric salt, and complexing agent; solving the equation:R=(CABD)/Ewherin C is the concentration of cupric salt, A is the concentration of reducing agent, B is the concentration of oxygen, D is the concentration of cyanide salt, E is the concentration of complexing agent, and R is a unitless number.The bath is provided with quantities of the above ingredients so that R in the equation is between about 5 and about 15.

    摘要翻译: 通过确定浴中至少四种选自氧,还原剂,氰化物盐,铜盐和络合剂的组分中的量来提供处于取样模式的化学镀铜浴; 求解方程:R =(CABD)/ E,C是铜盐的浓度,A是还原剂的浓度,B是氧的浓度,D是氰化物盐的浓度,E是络合剂的浓度 ,R是无单位数。 浴中提供了上述成分的数量,使得方程式中的R为约5至约15。