Integrated circuit package substrate

    公开(公告)号:US10242942B2

    公开(公告)日:2019-03-26

    申请号:US15127708

    申请日:2014-04-25

    摘要: Embodiments of the present disclosure are directed towards techniques and configurations for designing and assembling a die capable of being adapted to a number of different packaging configurations. In one embodiment an integrated circuit (IC) die may include a semiconductor substrate. The die may also include an electrically insulative material disposed on the semiconductor substrate; a plurality of electrical routing features disposed in the electrically insulative material to route electrical signals through the electrically insulative material; and a plurality of metal features disposed in a surface of the electrically insulative material. In embodiments, the plurality of metal features may be electrically coupled with the plurality of electrical routing features. In addition, the plurality of metal features may have an input/output (I/O) density designed to enable the die to be integrated with a plurality of different package configurations. Other embodiments may be described and/or claimed.

    Selective plating of package terminals
    2.
    发明授权
    Selective plating of package terminals 有权
    包装端子的选择性电镀

    公开(公告)号:US07321172B2

    公开(公告)日:2008-01-22

    申请号:US11227532

    申请日:2005-09-14

    IPC分类号: H01L23/48

    摘要: In one embodiment, a method including providing a semiconductor pad package having a first pad and a second pad is disclosed. A first layer comprising a first metal is deposited on the first pad using a first process. A second metal is then deposited on the first pad and the first layer using a second process. In another embodiment, the first process comprises and electroplating process, and the second process comprises a direct immersion gold (DIG) process. In a further embodiment, the first pad is a power or ground pad, and the second pad is a signal pad.

    摘要翻译: 在一个实施例中,公开了一种包括提供具有第一焊盘和第二焊盘的半导体焊盘封装的方法。 使用第一工艺将包含第一金属的第一层沉积在第一焊盘上。 然后使用第二工艺将第二金属沉积在第一焊盘和第一层上。 在另一个实施例中,第一工艺包括电镀工艺,第二工艺包括直接浸金(DIG)工艺。 在另一实施例中,第一焊盘是电源或接地焊盘,第二焊盘是信号焊盘。

    Selective plating of package terminals
    3.
    发明授权
    Selective plating of package terminals 有权
    包装端子的选择性电镀

    公开(公告)号:US07186645B2

    公开(公告)日:2007-03-06

    申请号:US10685171

    申请日:2003-10-13

    IPC分类号: H01L21/44

    摘要: In one embodiment, a method including providing a semiconductor pad package having a first pad and a second pad is disclosed. A first layer comprising a first metal is deposited on the first pad using a first process. A second metal is then deposited on the first pad and the first layer using a second process. In another embodiment, the first process comprises and electroplating process, and the second process comprises a direct immersion gold (DIG) process. In a further embodiment, the first pad is a power or ground pad, and the second pad is a signal pad.

    摘要翻译: 在一个实施例中,公开了一种包括提供具有第一焊盘和第二焊盘的半导体焊盘封装的方法。 使用第一工艺将包含第一金属的第一层沉积在第一焊盘上。 然后使用第二工艺将第二金属沉积在第一焊盘和第一层上。 在另一个实施例中,第一工艺包括电镀工艺,第二工艺包括直接浸金(DIG)工艺。 在另一实施例中,第一焊盘是电源或接地焊盘,第二焊盘是信号焊盘。