TECHNIQUES FOR PROVIDING DECOUPLING CAPACITANCE
    9.
    发明申请
    TECHNIQUES FOR PROVIDING DECOUPLING CAPACITANCE 有权
    提供去耦电容的技术

    公开(公告)号:US20080067628A1

    公开(公告)日:2008-03-20

    申请号:US11930698

    申请日:2007-10-31

    IPC分类号: H01L29/00

    摘要: Techniques for electronic device fabrication are provided. In one aspect, an electronic device is provided. The electronic device comprises at least one interposer structure having one or mote vias and a plurality of decoupling capacitors integrated therein, the at least one interposer structure being configured to allow for one or more of the plurality of decoupling capacitors to be selectively deactivated. In another aspect, a method of fabricating an electronic device comprising at least one interposer structure having one or more vias and a plurality of decoupling capacitors integrated therein comprises the following step. One or more of the plurality of decoupling capacitors are selectively deactivated

    摘要翻译: 提供电子器件制造技术。 一方面,提供一种电子设备。 该电子设备包括具有一个或多个微通孔和集成在其中的多个去耦电容器的至少一个插入器结构,所述至少一个插入器结构被配置为允许选择性地去激活多个去耦电容器中的一个或多个。 在另一方面,一种制造电子器件的方法,包括至少一个具有一个或多个通孔的内插器结构和集成在其中的多个去耦电容器,其包括以下步骤。 选择性地去激活多个去耦电容器中的一个或多个

    LOW RESISTANCE AND INDUCTANCE BACKSIDE THROUGH VIAS AND METHODS OF FABRICATING SAME
    10.
    发明申请
    LOW RESISTANCE AND INDUCTANCE BACKSIDE THROUGH VIAS AND METHODS OF FABRICATING SAME 有权
    通过VIAS的低电阻和电感及其制造方法

    公开(公告)号:US20070190692A1

    公开(公告)日:2007-08-16

    申请号:US11275542

    申请日:2006-01-13

    IPC分类号: H01L21/50

    摘要: A backside contact structure and method of fabricating the structure. The method includes: forming a dielectric isolation in a substrate, the substrate having a frontside and an opposing backside; forming a first dielectric layer on the frontside of the substrate; forming a trench in the first dielectric layer, the trench aligned over and within a perimeter of the dielectric isolation and extending to the dielectric isolation; extending the trench formed in the first dielectric layer through the dielectric isolation and into the substrate to a depth less than a thickness of the substrate; filling the trench and co-planarizing a top surface of the trench with a top surface of the first dielectric layer to form an electrically conductive through via; and thinning the substrate from a backside of the substrate to expose the through via.

    摘要翻译: 背面接触结构及其制造方法。 该方法包括:在衬底中形成电介质隔离,所述衬底具有前侧和相对的背面; 在所述基板的前侧形成第一电介质层; 在所述第一电介质层中形成沟槽,所述沟槽在所述电介质隔离的周边内并且在所述介电隔离的周边内对准并且延伸到所述电介质隔离; 将形成在第一电介质层中的沟槽通过电介质隔离延伸到衬底中至小于衬底厚度的深度; 填充沟槽并将沟槽的顶表面与第一介电层的顶表面共平面化以形成导电通孔; 并从衬底的背面稀释衬底以露出通孔。