WAFER-TO-WAFER ALIGNMENTS
    3.
    发明申请
    WAFER-TO-WAFER ALIGNMENTS 失效
    WAFER-WAFER对准

    公开(公告)号:US20070132067A1

    公开(公告)日:2007-06-14

    申请号:US11557668

    申请日:2006-11-08

    IPC分类号: H01L23/544

    摘要: Structures for aligning wafers and methods for operating the same. The structure includes (a) a first semiconductor wafer including a first capacitive coupling structure, and (b) a second semiconductor wafer including a second capacitive coupling structure. The first and second semiconductor wafers are in direct physical contact with each other via a common surface. If the first and second semiconductor wafers are moved with respect to each other by a first displacement distance of 1 nm in a first direction while the first and second semiconductor wafers are in direct physical contact with each other via the common surface, then a change of at least 10−18 F in capacitance of a first capacitor comprising the first and second capacitive coupling structures results. The first direction is essentially parallel to the common surface.

    摘要翻译: 用于对准晶片的结构及其操作方法。 该结构包括(a)包括第一电容耦合结构的第一半导体晶片和(b)包括第二电容耦合结构的第二半导体晶片。 第一和第二半导体晶片经由公共表面彼此直接物理接触。 如果第一和第二半导体晶片在第一方向上相对于彼此移动了1nm的第一位移距离,同时第一和第二半导体晶片经由公共表面彼此直接物理接触,则 包括第一电容耦合结构和第二电容耦合结构的第一电容器的电容中的至少10 -18 F。 第一个方向基本上平行于共同的表面。

    TECHNIQUES FOR PROVIDING DECOUPLING CAPACITANCE
    10.
    发明申请
    TECHNIQUES FOR PROVIDING DECOUPLING CAPACITANCE 有权
    提供去耦电容的技术

    公开(公告)号:US20080067628A1

    公开(公告)日:2008-03-20

    申请号:US11930698

    申请日:2007-10-31

    IPC分类号: H01L29/00

    摘要: Techniques for electronic device fabrication are provided. In one aspect, an electronic device is provided. The electronic device comprises at least one interposer structure having one or mote vias and a plurality of decoupling capacitors integrated therein, the at least one interposer structure being configured to allow for one or more of the plurality of decoupling capacitors to be selectively deactivated. In another aspect, a method of fabricating an electronic device comprising at least one interposer structure having one or more vias and a plurality of decoupling capacitors integrated therein comprises the following step. One or more of the plurality of decoupling capacitors are selectively deactivated

    摘要翻译: 提供电子器件制造技术。 一方面,提供一种电子设备。 该电子设备包括具有一个或多个微通孔和集成在其中的多个去耦电容器的至少一个插入器结构,所述至少一个插入器结构被配置为允许选择性地去激活多个去耦电容器中的一个或多个。 在另一方面,一种制造电子器件的方法,包括至少一个具有一个或多个通孔的内插器结构和集成在其中的多个去耦电容器,其包括以下步骤。 选择性地去激活多个去耦电容器中的一个或多个