Method for forming conductive structures
    8.
    发明授权
    Method for forming conductive structures 有权
    形成导电结构的方法

    公开(公告)号:US07833893B2

    公开(公告)日:2010-11-16

    申请号:US11775257

    申请日:2007-07-10

    IPC分类号: H01L21/44

    摘要: A method of forming a method a conductive wire. The method includes forming a dielectric hardmask layer on a dielectric layer; forming an electrically conductive hardmask layer on the dielectric hardmask layer; forming a trench extending through the conductive and dielectric hardmask layers into the dielectric layer; depositing a liner/seed layer on the conductive hardmask layer and the sidewalls and bottom of the trench; filling the trench with a fill material; removing the liner/seed layer from the top surface of the conductive hardmask layer; removing the fill material from the trench; electroplating a metal layer onto exposed surfaces of the conductive hardmask layer and liner/seed layer; and removing the metal layer and the conductive hardmask layer from the dielectric hardmask layer so the metal layer and edges of the liner/seed layer are coplanar with the top surface of the dielectric hardmask layer.

    摘要翻译: 形成导线方法的方法。 该方法包括在电介质层上形成电介质硬掩模层; 在介电硬掩模层上形成导电硬掩模层; 形成延伸穿过所述导电和介电硬掩模层的沟槽进入所述电介质层; 在导电硬掩模层和沟槽的侧壁和底部上沉积衬里/籽晶层; 用填充材料填充沟槽; 从所述导电硬掩模层的顶表面去除所述衬里/籽晶层; 从沟槽中移除填充材料; 将金属层电镀到导电硬掩模层和衬里/籽晶层的暴露表面上; 并且从电介质硬掩模层去除金属层和导电硬掩模层,使得金属层和衬里/籽晶层的边缘与电介质硬掩模层的顶表面共面。

    METHOD FOR FORMING CONDUCTIVE STRUCTURES
    9.
    发明申请
    METHOD FOR FORMING CONDUCTIVE STRUCTURES 有权
    形成导电结构的方法

    公开(公告)号:US20090017616A1

    公开(公告)日:2009-01-15

    申请号:US11775257

    申请日:2007-07-10

    IPC分类号: H01L21/44

    摘要: A method of forming a method a conductive wire. The method includes forming a dielectric hardmask layer on a dielectric layer; forming an electrically conductive hardmask layer on the dielectric hardmask layer; forming a trench extending through the conductive and dielectric hardmask layers into the dielectric layer; depositing a liner/seed layer on the conductive hardmask layer and the sidewalls and bottom of the trench; filling the trench with a fill material; removing the liner/seed layer from the top surface of the conductive hardmask layer; removing the fill material from the trench; electroplating a metal layer onto exposed surfaces of the conductive hardmask layer and liner/seed layer; and removing the metal layer and the conductive hardmask layer from the dielectric hardmask layer so the metal layer and edges of the liner/seed layer are coplanar with the top surface of the dielectric hardmask layer.

    摘要翻译: 形成导线方法的方法。 该方法包括在电介质层上形成电介质硬掩模层; 在介电硬掩模层上形成导电硬掩模层; 形成延伸穿过所述导电和介电硬掩模层的沟槽进入所述电介质层; 在导电硬掩模层和沟槽的侧壁和底部上沉积衬里/籽晶层; 用填充材料填充沟槽; 从所述导电硬掩模层的顶表面去除所述衬里/籽晶层; 从沟槽中移除填充材料; 将金属层电镀到导电硬掩模层和衬里/籽晶层的暴露表面上; 并且从电介质硬掩模层去除金属层和导电硬掩模层,使得金属层和衬里/籽晶层的边缘与电介质硬掩模层的顶表面共面。