Multi-layer wiring structure
    5.
    发明授权
    Multi-layer wiring structure 失效
    多层布线结构

    公开(公告)号:US5768108A

    公开(公告)日:1998-06-16

    申请号:US720028

    申请日:1996-09-27

    摘要: A multi-layer wiring structure for mounting electronic devices is provided to be used in an electronic computer, a work station or the like, and more particularly a multi-layer packaging board having microscopic wiring layers, which board has an excellent dimensional stability and a high reliability, and also a method of producing such a board are provided. The multi-layer wiring structure includes a complex of at least two sub-assemblies each having wiring layers formed respectively on opposite sides of a core material of a low thermal expansive metal through an insulation layer in such a manner that the wiring layers correspond in area ratio to each other. The sub-assemblies are connected to one another by conductors via through holes. In this structure, the wiring structure having the core material of a low thermal expansive metal is used as a base, and therefore a dimensional change of a board is small, and microscopic wiring layers can be formed, and the reliability of connection between the sub-assemblies is enhanced. Furthermore, the board can be produced at low costs.

    摘要翻译: 在电子计算机,工作站等中使用用于安装电子装置的多层布线结构,特别是具有微细布线层的多层封装板,该板具有优异的尺寸稳定性和 高可靠性,以及制造这种基板的方法。 多层布线结构包括至少两个子组件的复合体,每个子组件具有通过绝缘层分别形成在低热膨胀金属的芯材的相对侧上的布线层,使得布线层对应于区域 相互之间的比例。 子组件通过导体经由通孔彼此连接。 在这种结构中,将具有低热膨胀金属的芯材的布线结构用作基底,因此板的尺寸变化小,并且可以形成微细的布线层,并且子层之间的连接的可靠性 大会组合得到增强。 此外,该板可以低成本生产。

    Method for formation of conductor using electroless plating
    9.
    发明授权
    Method for formation of conductor using electroless plating 失效
    使用化学镀形成导体的方法

    公开(公告)号:US5595943A

    公开(公告)日:1997-01-21

    申请号:US495021

    申请日:1995-06-27

    摘要: A method for forming a conductor circuit is provided which comprises depositing and filling a conductor metal in recessions of insulator in the form of grooves or holes using an electroless plating solution, the conductor metal being deposited and filled in the recession to the same level as the surface of the insulator, wherein said electroless plating solution contains an inhibitor which inhibits the cathodic partial reaction which is a metal deposition reaction and the electroless plating is carried out with stirring the plating solution. Since the plating reaction automatically stops when the metal conductor 1 is formed up to the level of the surface of the insulator 2, a conductor circuit in which the surface of the metal conductor 1 and that of the insulator 2 are even and at the same level can be easily obtained. Furthermore, since the conductor circuits differing in thickness can be simultaneously formed on one substrate, the number of lamination in making multilayer circuit can be reduced and a multilayer circuit board of low electric resistance can be obtained.

    摘要翻译: 提供一种用于形成导体电路的方法,其包括使用化学镀溶液沉积并填充凹槽或孔形式的绝缘体凹陷中的导体金属,将导体金属沉积并填充在与经济衰退相同的水平上 表面,其中所述化学镀溶液含有抑制作为金属沉积反应的阴极部分反应的抑制剂,并且通过搅拌电镀液进行化学镀。 由于当金属导体1形成到绝缘体2的表面的高度时,电镀反应自动停止,其中金属导体1的表面和绝缘体2的表面均匀并处于相同水平的导体电路 可以很容易地获得。 此外,由于可以在一个基板上同时形成厚度不同的导体电路,因此可以减少制造多层电路中的层压次数,并且可以获得低电阻的多层电路板。