公开(公告)号：US20060251800A1

公开(公告)日：2006-11-09

申请号：US11385344

申请日：2006-03-20

申请人： Timothy Weidman ,  Kapila Wijekoon ,  Zhize Zhu ,  Avgerinos Gelatos ,  Amit Khandelwal ,  Arulkumar Shanmugasundram ,  Michael Yang ,  Fang Mei ,  Farhad Moghadam

发明人： Timothy Weidman ,  Kapila Wijekoon ,  Zhize Zhu ,  Avgerinos Gelatos ,  Amit Khandelwal ,  Arulkumar Shanmugasundram ,  Michael Yang ,  Fang Mei ,  Farhad Moghadam

IPC分类号： B05D5/12

CPC分类号： C23C18/1678 ,  B82Y30/00 ,  C23C16/0227 ,  C23C16/0281 ,  C23C16/045 ,  C23C16/14 ,  C23C18/1608 ,  C23C18/1651 ,  C23C18/1653 ,  C23C18/31 ,  C23C18/32 ,  C23C18/34 ,  C23C18/38 ,  C23C18/40 ,  C23C18/48 ,  C25D5/34 ,  H01L21/02063 ,  H01L21/02074 ,  H01L21/28518 ,  H01L21/28556 ,  H01L21/288 ,  H01L21/2885 ,  H01L21/76814 ,  H01L21/76843 ,  H01L21/76844 ,  H01L21/76846 ,  H01L21/76847 ,  H01L21/76849 ,  H01L21/76855 ,  H01L21/76856 ,  H01L21/76861 ,  H01L21/76862 ,  H01L21/76874 ,  H01L21/76877 ,  H01L21/76879 ,  H01L23/53238 ,  H01L2924/0002 ,  H01L2924/00

摘要： Embodiments of the invention generally provide methods of filling contact level features formed in a semiconductor device by depositing a barrier layer over the contact feature and then filing the layer using an PVD, CVD, ALD, electrochemical plating process (ECP) and/or electroless deposition processes. In one embodiment, the barrier layer has a catalytically active surface that will allow the electroless deposition of a metal on the barrier layer. In one aspect, the electrolessly deposited metal is copper or a copper alloy. In one aspect, the contact level feature is filled with a copper alloy by use of an electroless deposition process. In another aspect, a copper alloy is used to from a thin conductive copper layer that is used to subsequently fill features with a copper containing material by use of an ECP, PVD, CVD, and/or ALD deposition process. In one embodiment, a portion of the barrier layer is purposely allowed to react with traces of residual oxide at the silicon junction of the contact level feature to form a low resistance connection.

公开(公告)号：US20070111519A1

公开(公告)日：2007-05-17

申请号：US11428230

申请日：2006-06-30

申请人： Dmitry Lubomirsky ,  Arulkumar Shanmugasundram ,  Allen D'Ambra ,  Timothy Weidman ,  Michael Stewart ,  Eugene Rabinovich ,  Svetlana Sherman ,  Manoocher Birang ,  Yaxin Wang ,  Michael Yang ,  Bradley Hansen

发明人： Dmitry Lubomirsky ,  Arulkumar Shanmugasundram ,  Allen D'Ambra ,  Timothy Weidman ,  Michael Stewart ,  Eugene Rabinovich ,  Svetlana Sherman ,  Manoocher Birang ,  Yaxin Wang ,  Michael Yang ,  Bradley Hansen

IPC分类号： H01L21/44

CPC分类号： H01L21/288 ,  C23C18/1619 ,  C23C18/1653 ,  C23C18/168 ,  C23C18/1682 ,  C23C18/1685 ,  C23C18/1689 ,  C25D7/123 ,  C25D17/001 ,  H01L21/02063 ,  H01L21/02068 ,  H01L21/02087 ,  H01L21/28518 ,  H01L21/28562 ,  H01L21/67051 ,  H01L21/6719 ,  H01L21/6723 ,  H01L21/67751 ,  H01L21/68785 ,  H01L21/76814 ,  H01L21/76843 ,  H01L21/76856 ,  H01L21/76873 ,  H01L21/76874

摘要： Embodiments of the invention provide methods for depositing a material onto a surface of a substrate by using one or more electroless, electrochemical plating, CVD and/or ALD processes. Embodiments of the invention provide a method for depositing a seed layer on a substrate with an electroless process and to subsequently fill interconnect features on the substrate with an ECP process on a single substrate processing platform. Other aspects provide a method for depositing a seed layer on a substrate, fill interconnect features on a substrate, or sequentially deposit both a seed layer and fill interconnect features on the substrate. One embodiment provides a method for forming a capping layer over substrate interconnects. Methods include the use of a vapor dryer for pre- and post-deposition cleaning of substrates as well as a brush box chamber for post-deposition cleaning.

摘要翻译： 本发明的实施方案提供了通过使用一种或多种化学镀，CVD和/或ALD工艺将材料沉积到衬底的表面上的方法。 本发明的实施方案提供了一种用于在基板上沉积种子层的方法，该方法具有无电解方法，并随后在单个基板处理平台上用ECP工艺填充基板上的互连特征。 其它方面提供了一种用于在衬底上沉积种子层的方法，在衬底上填充互连特征，或者在衬底上顺序地沉积种子层和填充互连特征。 一个实施例提供了一种在衬底互连上形成覆盖层的方法。 方法包括使用蒸气干燥器进行基板的沉积前和沉积后清洁以及用于后沉积清洁的刷盒室。

公开(公告)号：US20060033678A1

公开(公告)日：2006-02-16

申请号：US11192993

申请日：2005-07-29

申请人： Dmitry Lubomirsky ,  Arulkumar Shanmugasundram ,  Allen D'Ambra ,  Timothy Weidman ,  Eugene Rabinovich ,  Svetlana Sherman ,  Manoocher Birang ,  Yaxin Wang ,  Michael Yang ,  Bradley Hansen

发明人： Dmitry Lubomirsky ,  Arulkumar Shanmugasundram ,  Allen D'Ambra ,  Timothy Weidman ,  Eugene Rabinovich ,  Svetlana Sherman ,  Manoocher Birang ,  Yaxin Wang ,  Michael Yang ,  Bradley Hansen

IPC分类号： G09G3/00 ,  H05H1/24 ,  C23C16/00

CPC分类号： H01L21/67167 ,  C23C16/06 ,  C23C16/34 ,  C23C16/4488 ,  C23C18/1632 ,  C23C18/1653 ,  H01L21/28556 ,  H01L21/288 ,  H01L21/6719 ,  H01L21/67207 ,  H01L21/6723 ,  H01L21/67742 ,  H01L21/67745 ,  H01L21/76843 ,  H01L21/76873 ,  H01L21/76877

摘要： Embodiments of the invention provide a cluster tool configured to deposit a material onto a substrate surface by using one or more electroless, electrochemical plating, CVD and/or ALD processing chambers. In one aspect, a ruthenium-containing catalytic layer is formed. Embodiments of the invention provide a hybrid deposition system configured to deposit a seed layer on a substrate with an electroless process and to subsequently fill interconnect features on the substrate with an ECP cell. Other aspects provide an electroless deposition system configured to deposit a seed layer on a substrate, fill interconnect features on a substrate, or sequentially deposit both a seed layer and fill interconnect features on the substrate. One embodiment provides an electroless deposition system configured to form a capping layer over substrate interconnects. The system includes a vapor dryer for pre- and post-deposition cleaning of substrates as well as a brush box chamber for post-deposition cleaning.

摘要翻译： 本发明的实施例提供了一种集群工具，其被配置为通过使用一个或多个化学镀，CVD和/或ALD处理室将材料沉积到衬底表面上。 一方面，形成含钌催化剂层。 本发明的实施例提供了一种混合沉积系统，其被配置为利用无电解方法将种子层沉积在衬底上，并随后用ECP单元填充衬底上的互连特征。 其它方面提供一种无电镀沉积系统，其被配置为将衬底层沉积在衬底上，填充衬底上的互连特征，或者顺序地沉积衬底上的晶种层和填充互连特征。 一个实施例提供了一种配置成在衬底互连上形成覆盖层的无电沉积系统。 该系统包括蒸发干燥器，用于底物的沉积前和沉积后清洁以及用于后沉积清洁的刷盒室。

公开(公告)号：US20050287807A1

公开(公告)日：2005-12-29

申请号：US11206491

申请日：2005-08-18

申请人： Ken Lai ,  Jeong Byun ,  Frederick Wu ,  Ramanujapuran Srinivas ,  Avgerinos Gelatos ,  Mei Chang ,  Moris Kori ,  Ashok Sinha ,  Hua Chung ,  Hongbin Fang ,  Alfred Mak ,  Michael Yang ,  Ming Xi

发明人： Ken Lai ,  Jeong Byun ,  Frederick Wu ,  Ramanujapuran Srinivas ,  Avgerinos Gelatos ,  Mei Chang ,  Moris Kori ,  Ashok Sinha ,  Hua Chung ,  Hongbin Fang ,  Alfred Mak ,  Michael Yang ,  Ming Xi

IPC分类号： C23C16/14 ,  C23C16/02 ,  C23C16/04 ,  C23C16/08 ,  C23C16/44 ,  C23C16/455 ,  H01L21/28 ,  H01L21/285 ,  H01L21/768 ,  H01L21/44

CPC分类号： C23C16/45525 ,  C23C16/0281 ,  C23C16/08 ,  C23C16/14 ,  C23C16/45523 ,  H01L21/28556 ,  H01L21/28562 ,  H01L21/76843 ,  H01L21/76876 ,  H01L21/76877

摘要： Methods for the deposition of tungsten films are provided. The methods include depositing a nucleation layer by alternatively adsorbing a tungsten precursor and a reducing gas on a substrate, and depositing a bulk layer of tungsten over the nucleation layer.

摘要翻译： 提供了沉积钨膜的方法。 所述方法包括通过交替地将钨前体和还原气体吸附在基底上沉积成核层，以及在成核层上沉积钨层。

公开(公告)号：US20060075966A1

公开(公告)日：2006-04-13

申请号：US11146309

申请日：2005-06-06

申请人： Chen-An Chen ,  Avgerinos Gelatos ,  Michael Yang ,  Ming Xi ,  Mark Hytros

发明人： Chen-An Chen ,  Avgerinos Gelatos ,  Michael Yang ,  Ming Xi ,  Mark Hytros

IPC分类号： C23C16/00

CPC分类号： C23C16/06 ,  C23C16/34 ,  C23C16/42 ,  C23C16/452 ,  C23C16/4554 ,  C23C16/45544 ,  C23C16/45565 ,  C23C16/515 ,  H01J37/32082 ,  H01J37/3244 ,  H01L21/28556 ,  H01L21/28562 ,  H01L21/28568 ,  H01L21/3122 ,  H01L21/3127 ,  H01L21/76843

摘要： Embodiments of the present invention relate to an apparatus and method of plasma assisted deposition by generation of a plasma adjacent a processing region. One embodiment of the apparatus comprises a substrate processing chamber including a top shower plate, a power source coupled to the top shower plate, a bottom shower plate, and an insulator disposed between the top shower plate and the bottom shower plate. In one aspect, the power source is adapted to selectively provide power to the top shower plate to generate a plasma from the gases between the top shower plate and the bottom shower plate. In another embodiment, a power source is coupled to the top shower plate and the bottom shower plate to generate a plasma between the bottom shower plate and the substrate support. One embodiment of the method comprises performing in a single chamber one or more of the processes including, but not limited to, cyclical layer deposition, combined cyclical layer deposition and plasma-enhanced chemical vapor deposition; plasma-enhanced chemical vapor deposition; and/or chemical vapor deposition.

公开(公告)号：US20060009034A1

公开(公告)日：2006-01-12

申请号：US11038592

申请日：2005-01-19

申请人： Ken Lai ,  Ravi Rajagopalan ,  Amit Khandelwal ,  Madhu Moorthy ,  Srinivas Gandikota ,  Joseph Castro ,  Aygerinos Gelatos ,  Cheryl Knepfler ,  Ping Jian ,  Hongbin Fang ,  Chao-Ming Huang ,  Ming Xi ,  Michael Yang ,  Hua Chung ,  Jeong Byun

发明人： Ken Lai ,  Ravi Rajagopalan ,  Amit Khandelwal ,  Madhu Moorthy ,  Srinivas Gandikota ,  Joseph Castro ,  Aygerinos Gelatos ,  Cheryl Knepfler ,  Ping Jian ,  Hongbin Fang ,  Chao-Ming Huang ,  Ming Xi ,  Michael Yang ,  Hua Chung ,  Jeong Byun

IPC分类号： H01L21/44

CPC分类号： H01L21/28562 ,  C23C16/0281 ,  C23C16/08 ,  C23C16/14 ,  C23C16/45525 ,  H01L21/28556 ,  H01L21/76843 ,  H01L21/76855 ,  H01L21/76856 ,  H01L21/7687 ,  H01L21/76876 ,  H01L21/76877 ,  H01L2221/1089

摘要： In one embodiment of the invention, a method for forming a tungsten-containing layer on a substrate is provided which includes positioning a substrate containing a barrier layer disposed thereon in a process chamber, exposing the substrate to a first soak process for a first time period and depositing a nucleation layer on the barrier layer by flowing a tungsten-containing precursor and a reductant into the process chamber. The method further includes exposing the nucleation layer to a second soak process for a second time period and depositing a bulk layer on the nucleation layer. In one example, the barrier layer contains titanium nitride, the first and second soak processes independently comprise at least one reducing gas selected from the group consisting of hydrogen, silane, disilane, dichlorosilane, borane, diborane, derivatives thereof and combinations thereof and the nucleation layer may be deposited by an atomic layer deposition process or a pulsed chemical vapor deposition process while the bulk layer may be deposited by a chemical vapor deposition process or a physical vapor deposition process.

摘要翻译： 在本发明的一个实施例中，提供了一种在衬底上形成含钨层的方法，其包括将包含设置在其上的阻挡层的衬底定位在处理室中，将衬底暴露于第一次浸泡过程第一时间段 以及通过使含钨前体和还原剂流入所述处理室，在所述阻挡层上沉积成核层。 该方法还包括将成核层暴露于第二次浸泡过程第二时间段，并将沉积层沉积在成核层上。 在一个实例中，阻挡层包含氮化钛，第一和第二浸泡工艺独立地包含选自氢，硅烷，乙硅烷，二氯硅烷，硼烷，乙硼烷，其衍生物及其组合中的至少一种还原气体和成核 层可以通过原子层沉积工艺或脉冲化学气相沉积工艺沉积，同时可以通过化学气相沉积工艺或物理气相沉积工艺沉积主体层。

公开(公告)号：US09214144B1

公开(公告)日：2015-12-15

申请号：US13950276

申请日：2013-07-24

申请人： Michael Yang

发明人： Michael Yang

IPC分类号： G10H1/36 ,  G10H1/08

CPC分类号： G10H1/08 ,  G10H1/46 ,  G10H7/008 ,  G10H2210/381 ,  G10H2210/385 ,  G10H2220/086 ,  G10H2250/035

摘要： A system and method are provided for mixing song data based on measure groupings. A player or program may recognize measure groupings in a song through identifying cuepoints. The player or program may use the cuepoints and/or other identifiers of measure groupings to generate a transition between the song and other songs. Parts of one or both songs may be time-stretched, or frames may be added or deleted, such that the beats in both songs are substantially aligned during the transition. The system and method may also involve altering the sequence of frames in one or both of the songs, so that the transition may have various sonic qualities as desired by a user. A choice of transition modes may be provided via a user interface that allow the user some control over when and how transitions between songs are executed.

摘要翻译： 提供了一种基于测量分组来混合歌曲数据的系统和方法。 播放器或程序可以通过识别曲线来识别歌曲中的测量分组。 播放器或程序可以使用度量分组的点和/或其他标识符来产生歌曲和其他歌曲之间的转换。 一首或两首歌曲的部分可能是时间延长的，或者可以添加或删除帧，使得两首歌曲中的节拍在转换期间基本对准。 系统和方法还可以涉及改变一个或两个歌曲中的帧序列，使得转换可以具有如用户所期望的各种声音质量。 转换模式的选择可以通过用户界面来提供，其允许用户对歌曲之间的转换何时以及如何进行控制。

公开(公告)号：US09111519B1

公开(公告)日：2015-08-18

申请号：US13282432

申请日：2011-10-26

申请人： Michael Yang ,  Neel U. Sukhatme

发明人： Michael Yang ,  Neel U. Sukhatme

IPC分类号： G10H1/36 ,  G10H7/00 ,  G10H1/40

CPC分类号： G10H1/40 ,  G10H2210/385 ,  G10H2220/126 ,  G10H2240/325 ,  G11B27/038 ,  G11B27/322

摘要： A system and method are provided for generating cuepoints for mixing song data. One or more people may listen to a song and identify measure groupings within the song. The one or more people might generate markings corresponding to these measure groupings and submit the markings to a cuepoint generation system. The markings may then be reconciled into cuepoints that may be used for mixing the song with other song data. In some embodiments, the cuepoints may be adjusted based on characteristics of the particular songs that are to be mixed together.

摘要翻译： 提供了一种用于产生用于混合歌曲数据的点的系统和方法。 一个或多个人可以听歌曲，并在歌曲中识别测量组。 一个或多个人可能产生与这些度量分组相对应的标记，并将标记提交给一个生成系统。 然后可以将标记调整成可用于将歌曲与其他歌曲数据混合的连接点。 在一些实施例中，可以基于要混合在一起的特定歌曲的特征来调整节点。

公开(公告)号：US09002478B1

公开(公告)日：2015-04-07

申请号：US13036821

申请日：2011-02-28

申请人： Michael Yang ,  Wenbo Hou ,  Sheldon Williams

发明人： Michael Yang ,  Wenbo Hou ,  Sheldon Williams

IPC分类号： A61N1/00 ,  A61N1/05

CPC分类号： A61N1/0587

摘要： An epicardial lead is passively fixed in a pericardial space by a passive fixation member. The passive fixation member extends from a distal portion of an epicardial lead and acts against a pericardial layer and an epicardial layer to hold the lead in place. The epicardial lead may include an electrode that is connected to a conductor that extends from a distal portion of the lead. In some embodiments the epicardial lead includes a material that promotes fibrosis to fix the lead to heart tissue. The passive fixation member may include a shocking coil.

摘要翻译： 心外膜由被动固定构件被动地固定在心包空间中。 被动固定构件从心外膜引导件的远端部分延伸并作用于心包层和心外膜层以将引线保持在适当位置。 心外膜引线可以包括连接到从引线的远端部分延伸的导体的电极。 在一些实施方案中，心外膜引线包括促进纤维化以将引线固定到心脏组织的材料。 被动固定构件可包括震动线圈。

公开(公告)号：US08478388B2

公开(公告)日：2013-07-02

申请号：US12755359

申请日：2010-04-06

申请人： Thao Thu Nguyen ,  Kjell Norén ,  Allen Keel ,  Kyungmoo Ryu ,  Stuart Rosenberg ,  Wenbo Hou ,  Steve Koh ,  Michael Yang

发明人： Thao Thu Nguyen ,  Kjell Norén ,  Allen Keel ,  Kyungmoo Ryu ,  Stuart Rosenberg ,  Wenbo Hou ,  Steve Koh ,  Michael Yang

IPC分类号： A61N1/00 ,  A61B5/04

CPC分类号： A61B5/042 ,  A61B5/7203 ,  A61N1/3627 ,  A61N1/36521 ,  A61N1/36535 ,  A61N1/36542 ,  A61N1/36578 ,  A61N1/3684 ,  A61N1/37258 ,  A61N1/37264

摘要： An exemplary method includes accessing cardiac information acquired via a catheter located at various positions in a venous network of a heart of a patient wherein the cardiac information comprises position information with respect to time for one or more electrodes of the catheter; performing a principal component analysis on at least some of the position information; and selecting at least one component of the principal component analysis to represent an axis of a cardiac coordinate system. Various other methods, devices, systems, etc., are also disclosed.

摘要翻译： 示例性方法包括访问经由位于患者心脏的静脉网络中的各个位置的导管获取的心脏信息，其中所述心脏信息包括相对于导管的一个或多个电极的时间的位置信息; 对至少一些所述位置信息进行主成分分析; 以及选择所述主成分分析的至少一个分量来表示心脏坐标系的轴。 还公开了各种其它方法，装置，系统等。