Abstract:
PROBLEM TO BE SOLVED: To provide a stretchable component or interconnect for establishing electrical contact with device components.SOLUTION: The component or interconnect comprises a first end, a second end, and a central portion located between the first end and the second end.
Abstract:
In a wiring substrate (2) of a semiconductor device (1), a hollow portion (H) is provided under a pad wiring portion (23) including a connection pad (P), and thus a wiring layer (24) has a cantilever structure in which the pad wiring portion (23) is formed as an aerial wiring, and a semiconductor chip (40) is flip-chip connected to the connection pad (P). The pad wiring portion (23) including the connection pad (P) is formed on a sacrifice layer (14) which is filled in a recess portion (C) in an interlayer insulating layer (32) of the wiring substrate (2), then the semiconductor chip (40) is flip-chip connected to the connection pad (P), and then the hollow portion (H) is provided by removing the sacrifice layer (14).
Abstract:
A wiring substrate of a semiconductor component includes: an underside with a wiring structure; a top side with cutouts; a rubber-elastic material arranged in the cutouts; and external contact pads arranged on the rubber-elastic material and configured to be coupled to external contacts. A method for producing a wiring substrate of this type, involves pressing the rubber-elastic material pads into a precursor of a polymer plastic during the production process.
Abstract:
PROBLEM TO BE SOLVED: To provide a circuit connection material for electric and electronic purposes excellent in low temperature rapid-curing property and having a long pot life.SOLUTION: This circuit connection material is a film-shaped anisotropically conductive circuit connection material interposed between circuit electrodes confronting each other, pressurizing the circuit electrodes opposite to each other to electrically connect between the electrodes in the pressurizing direction, containing as essential components, the components (1) to (4) below, and containing a specific amount of a radical-polymerizable substance having the phosphoric acid ester structure below. (1) a curing agent generating a free radical by being heated selected from diacyl peroxide, peroxy dicarbonate, peroxy ester, peroxy ketal, dialkyl peroxide, hydroperoxide, and silyl peroxide, (2) a hydroxy group-containing resin having a molecular weight of 10,000 or more, (3) a radical-polymerizable substance containing a radical-polymerizable substance having a phosphoric acid ester structure, (4) conductive particles.