Abstract:
A manufacturing method of a semiconductor structure includes the following steps. A patterned photoresist layer is formed on a wafer of the wafer structure. The wafer is etched, such that channels are formed in the wafer, and a protection layer of the wafer structure is exposed through the channels. The protection layer is etched, such that openings aligned with the channels are formed in the protection layer. Landing pads in the protection layer are respectively exposed through the openings and the channels, and the caliber of each of the openings is gradually increased toward the corresponding channel. Side surfaces of the wafer surrounding the channels are etched, such that the channels are expanded to respectively form hollow regions. The caliber of the hollow region is gradually decreased toward the opening, and the caliber of the opening is smaller than that of the hollow region.
Abstract:
This present invention provides a chip scale sensing chip package, comprising a sensing chip having a first top surface and a first bottom surface opposite to each other, a touch plate having a second top surface and a second bottom surface opposite to each other, formed above the sensing chip, and a color layer, sandwiched between the sensing chip and the touch plate, wherein the sensing chip comprises a sensing device formed nearby the first top surface and a plurality of conductive pads formed nearby the first top surface and adjacent to the sensing device, a plurality of through silicon vias exposing their corresponding conductive pads formed on the first bottom surface, a plurality of conductive structures formed on the first bottom surface, and a re-distribution layer overlaying the first bottom surface and each through silicon via to electrically connect each conductive pad and each conductive structure.
Abstract:
The present invention provides a chip package that includes a semiconductor chip, at least one recess, a plurality of first redistribution metal lines, and at least one protrusion. The semiconductor chip has a plurality of conductive pads disposed on an upper surface of the semiconductor chip. The recess extends from the upper surface to a lower surface of the semiconductor chip, and is arranged on the side of the semiconductor chip. The first redistribution metal lines are disposed on the upper surface, electrically connected to the conductive pad individually, and extended into the recesses separately. The protrusion is disposed in the recess and located between the adjacent first redistribution metal lines.
Abstract:
A semiconductor structure includes a wafer, at least one nonmetal oxide layer, a pad, a passivation layer, an isolation layer, and a conductive layer. The wafer has a first surface, a second surface, a third surface, a first stage difference surface connected between the second and third surfaces, and a second stage difference surface connected between the first and third surfaces. The nonmetal oxide layer is located on the first surface of the wafer. The pad is located on the nonmetal oxide layer and electrically connected to the wafer. The passivation layer is located on the nonmetal oxide layer. The isolation layer is located on the passivation layer, nonmetal oxide layer, the first, second and third surfaces of the wafer, and the first and second stage difference surfaces of the wafer. The conductive layer is located on the isolation layer and electrically contacts the pad.
Abstract:
A chip package includes semiconductor chips, inner spacers, cavities, conductive portions and solder balls. The semiconductor chip has at least an electronic component and at least an electrically conductive pad disposed on an upper surface thereof. The conductive pad is arranged abreast to one side of the electronic component and electrically connected thereto. The cavities open to a lower surface of the semiconductor chip and extend toward the upper surface to expose the conductive pad on the upper surface. The conductive portions fill the cavities from the lower surface and electrically connected the to conductive pad. The solder balls are disposed on the lower surface and electrically connected to the conductive portions. A gap is created between an outer wall of the inner spacers and an edge of the semiconductor chip.
Abstract:
A chip package is provided. The chip package includes a semiconductor chip, an isolation layer, a redistributing metal layer, and at least a bonding pad. The semiconductor chip includes at least one conducting disposed on a surface of the semiconductor chip. The isolation layer is disposed on the surface of the semiconductor chip, wherein the isolation layer has at least one first opening to expose the first conducting pad. The redistributing metal layer is disposed on the isolation layer and has at least a redistributing metal line corresponding to the conducting pad, the redistributing metal line is connected to the first conducting pad through the first opening. The bonding pad is disposed on the isolation layer and one side of the semiconductor chip, wherein the redistributing metal line extends to the bonding pad to electrically connect the conducting pad to the bonding pad.
Abstract:
An embodiment of the invention provides a chip package which includes: a semiconductor substrate having a first surface and a second surface; a device region disposed in the semiconductor substrate; a dielectric layer disposed on the first surface of the semiconductor substrate; a conducting pad structure disposed in the dielectric layer and electrically connected to the device region, a carrier substrate disposed on the dielectric layer; and a conducting structure disposed in a bottom surface of the carrier substrate and electrically contacting with the conducting pad structure.
Abstract:
A chip package is disclosed. The package includes a semiconductor chip having a first surface and a second surface opposite thereto, at least one conductive pad adjacent to the first surface, and an opening extending toward the first surface from the second surface to expose the conductive pad. The caliber adjacent to the first surface is greater than that of the opening adjacent to the second surface. An insulating layer and a redistribution layer (RDL) are successively disposed on the second surface and extend to a sidewall and a bottom of the opening, in which the RDL is electrically connected to the conductive pad through the opening. A passivation layer covers the RDL and partially fills the opening to form a void between the passivation layer and the conductive pad in the opening. A fabrication method of the chip package is also disclosed.
Abstract:
A chip device package and a fabrication method thereof are provided. The chip device package includes a semiconductor substrate having a first surface and an opposing second surface. A recessed portion is disposed adjacent to a sidewall of the semiconductor substrate, extending from the first surface of the semiconductor substrate to at least the second surface of the semiconductor substrate. A protection layer is disposed over the first surface of the semiconductor substrate and in the recessed portion. A through hole is disposed on the first surface of the semiconductor substrate. A buffer material that is different from the material of the protection layer is disposed in the through hole and covered by the protection layer.
Abstract:
The invention provides a chip package and a fabrication method thereof. In one embodiment, the chip package includes: a substrate having a semiconductor device and a conductive pad thereon; an insulator ring filling a trench formed in the substrate, wherein the insulator ring surrounds an intermediate layer below the conductive pad; and a conductive layer disposed below a backside of the substrate and electrically connected to the conductive pad.