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    Minimal contact gripping of thin optical devices
    114.
    发明授权
    Minimal contact gripping of thin optical devices 有权

    公开(公告)号：US11975422B2

    公开(公告)日：2024-05-07

    申请号：US18061327

    申请日：2022-12-02

    Applicant: Applied Materials, Inc.

    Inventor： Yaseer Arafath Ahamed ,  Kangkang Wang ,  Benjamin B. Riordon ,  James D. Strassner ,  Ludovic Godet

    IPC: B25B11/00 ,  G02B1/00 ,  G02B6/10

    CPC classification number: B25B11/005 ,  G02B1/002 ,  G02B6/10

    Abstract: Embodiments described herein provide for devices and methods for retaining optical devices. The devices and methods described herein provide for retention of the substrate without contacting sensitive portions of the substrate. The devices and methods utilize retention pads or vacuum pins to contact the exclusion zones i.e., inactive areas of the substrate to retain the substrate and prevent the substrate from moving laterally. Additionally, a holding force retains the substrate in the vertical direction, without contacting the substrate. The methods provide for adjusting the devices to account for multiple geometries of the substrate. The methods further provide for adjusting the devices, such as adjusting a gap between the optical device and a suction pad, to alter the holding force of the devices on the optical devices.

    Interference in-sensitive Littrow system for optical device structure measurement
    115.
    发明授权
    Interference in-sensitive Littrow system for optical device structure measurement 有权

    公开(公告)号：US11913776B2

    公开(公告)日：2024-02-27

    申请号：US17645200

    申请日：2021-12-20

    Applicant: Applied Materials, Inc.

    Inventor： Yangyang Sun ,  Jinxin Fu ,  Ludovic Godet

    IPC: G01B11/26

    CPC classification number: G01B11/26

    Abstract: Embodiments described herein provide for devices and methods of measuring a pitch P of optical device structures and an orientation angle ϕ of the optical device structures. One embodiment of the system includes an optical arm coupled to an arm actuator. The optical arm includes a light source. The light source emits a light path operable to be diffracted to the stage. The optical arm further includes a first beam splitter and a second beam splitter positioned in the light path. The first beam splitter directs the light path through a first lens and the second beam splitter directs the light path through a first dove prism and a second lens. The optical arm further includes a first detector operable to detect the light path from the first lens and second detector operable to detect the light path from the second lens.

    Optical device metrology systems and related methods
    119.
    发明授权
    Optical device metrology systems and related methods 有权

    公开(公告)号：US11802791B2

    公开(公告)日：2023-10-31

    申请号：US17456421

    申请日：2021-11-24

    Applicant: Applied Materials, Inc.

    Inventor： Jinxin Fu ,  Kazuya Daito ,  Ludovic Godet

    IPC: G01J1/04 ,  G01J1/08

    CPC classification number: G01J1/0459 ,  G01J1/0425 ,  G01J1/08

    Abstract: A method of optical device metrology is provided. The method includes providing a first type of light into a first optical device during a first time period; measuring a quantity of the first type of light transmitted from a first location on the top surface or the bottom surface during the first time period; coating at least a portion of an edge of the one or more edges with a first coating of optically absorbent material during a second time period that occurs after the first time period; providing the first type of light into the first optical device during a third time period that occurs after the second time period; and measuring a quantity of the first type of light transmitted from the first location on the top surface or the bottom surface during the third time period.

    Fabrication of diffraction gratings
    120.
    发明授权
    Fabrication of diffraction gratings 有权

    公开(公告)号：US11733533B2

    公开(公告)日：2023-08-22

    申请号：US17745457

    申请日：2022-05-16

    Applicant: Applied Materials, Inc.

    Inventor： Ludovic Godet ,  Wayne Mcmillan ,  Rutger Meyer Timmerman Thijssen

    IPC: G02B27/09 ,  G02B5/18 ,  G03F1/80 ,  G03F7/00

    CPC classification number: G02B27/0944 ,  G02B5/18 ,  G02B5/1857 ,  G03F1/80 ,  G03F7/0002

    Abstract: The systems and methods discussed herein are for the fabrication of diffraction gratings, such as those gratings used in waveguide combiners. The waveguide combiners discussed herein are fabricated using nanoimprint lithography (NIL) of high-index and low-index materials in combination with and directional etching high-index and low-index materials. The waveguide combiners can be additionally or alternatively formed by the directional etching of transparent substrates. The waveguide combiners that include diffraction gratings discussed herein can be formed directly on permanent transparent substrates. In other examples, the diffraction gratings can be formed on temporary substrates and transferred to a permanent, transparent substrate.

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