公开(公告)号：US08455321B2

公开(公告)日：2013-06-04

申请号：US13294526

申请日：2011-11-11

Applicant: Li-Shyue Lai ,  Jing-Cheng Lin

Inventor： Li-Shyue Lai ,  Jing-Cheng Lin

IPC: H01L21/336

CPC classification number: H01L29/785 ,  H01L29/1054 ,  H01L29/165 ,  H01L29/66795

Abstract: A method of forming an integrated circuit structure includes forming a first insulation region and a second insulation region in a semiconductor substrate and facing each other; and forming an epitaxial semiconductor region having a reversed T-shape. The epitaxial semiconductor region includes a horizontal plate including a bottom portion between and adjoining the first insulation region and the second insulation region, and a fin over and adjoining the horizontal plate. The bottom of the horizontal plate contacts the semiconductor substrate. The method further includes forming a gate dielectric on a top surface and at least top portions of sidewalls of the fin; and forming a gate electrode over the gate dielectric.

Abstract translation: 形成集成电路结构的方法包括：在半导体衬底中形成第一绝缘区域和第二绝缘区域并彼此面对; 以及形成具有反向T形的外延半导体区域。 外延半导体区域包括水平板，该水平板包括在第一绝缘区域和第二绝缘区域之间并邻接第一绝缘区域之间的底部，以及在水平板上并邻接的鳍状物。 水平板的底部接触半导体衬底。 该方法还包括在鳍的顶表面和至少顶部的顶部形成栅电介质; 以及在所述栅极电介质上形成栅电极。

公开(公告)号：US20130087916A1

公开(公告)日：2013-04-11

申请号：US13270850

申请日：2011-10-11

Applicant: Jing-Cheng Lin ,  Jui-Pin Hung ,  Yi-Hang Lin ,  Tsan-Hua Tung

Inventor： Jing-Cheng Lin ,  Jui-Pin Hung ,  Yi-Hang Lin ,  Tsan-Hua Tung

IPC: H01L23/498 ,  H01L21/60 ,  H01L21/50

CPC classification number: H01L21/78 ,  H01L21/31051 ,  H01L21/561 ,  H01L21/565 ,  H01L23/293 ,  H01L23/3114 ,  H01L23/3135 ,  H01L23/49816 ,  H01L23/5386 ,  H01L23/5389 ,  H01L24/03 ,  H01L24/05 ,  H01L24/08 ,  H01L24/09 ,  H01L24/11 ,  H01L24/13 ,  H01L24/17 ,  H01L24/19 ,  H01L24/96 ,  H01L25/0652 ,  H01L25/50 ,  H01L2224/0231 ,  H01L2224/0237 ,  H01L2224/02379 ,  H01L2224/03002 ,  H01L2224/0401 ,  H01L2224/04105 ,  H01L2224/05008 ,  H01L2224/05552 ,  H01L2224/05569 ,  H01L2224/05571 ,  H01L2224/11002 ,  H01L2224/12105 ,  H01L2224/13024 ,  H01L2224/131 ,  H01L2224/96 ,  H01L2924/00012 ,  H01L2924/00014 ,  H01L2924/014 ,  H01L2924/07025 ,  H01L2924/12042 ,  H01L2924/181 ,  H01L2924/18162 ,  H01L2224/03 ,  H01L2224/11 ,  H01L2924/00

Abstract: Methods of packaging semiconductor devices and structures thereof are disclosed. In one embodiment, a method of packaging a semiconductor device includes providing a carrier wafer, providing a plurality of dies, and forming a die cave material over the carrier wafer. A plurality of die caves is formed in the die cave material. At least one of the plurality of dies is placed within each of the plurality of die caves in the die cave material. A plurality of packages is formed, each of the plurality of packages being formed over a respective at least one of the plurality of dies.

公开(公告)号：US20130075937A1

公开(公告)日：2013-03-28

申请号：US13246556

申请日：2011-09-27

Applicant: Chung Yu Wang ,  Chih-Wei Wu ,  Szu Wei Lu ,  Jing-Cheng Lin

Inventor： Chung Yu Wang ,  Chih-Wei Wu ,  Szu Wei Lu ,  Jing-Cheng Lin

IPC: H01L23/28 ,  H01L21/50 ,  H01L21/56

CPC classification number: H01L21/78 ,  H01L21/561 ,  H01L23/16 ,  H01L23/3128 ,  H01L23/562 ,  H01L24/13 ,  H01L24/16 ,  H01L25/0655 ,  H01L2224/13111 ,  H01L2224/16238 ,  H01L2224/32225 ,  H01L2224/73204 ,  H01L2224/81191 ,  H01L2224/81815 ,  H01L2924/01322 ,  H01L2924/12042 ,  H01L2924/15311 ,  H01L2924/157 ,  H01L2924/18161 ,  H01L2924/3511 ,  H01L2224/16225 ,  H01L2924/00012 ,  H01L2924/00 ,  H01L2924/00014 ,  H01L2924/01047 ,  H01L2924/01029

Abstract: Methods and apparatus for performing molding on die on wafer interposers. A method includes receiving an interposer assembly having a die side and an opposite side including two or more integrated circuit dies mounted on the die side of the interposer, the interposer assembly having spaces formed on the die side of the interposer between the two or more integrated circuit dies; mounting at least one stress relief feature on the die side of the interposer assembly in one of the spaces between the two or more integrated circuit dies; and molding the integrated circuit dies using a mold compound, the mold compound surrounding the two or more integrated circuit dies and the at least one stress relief feature. An apparatus is disclosed having integrated circuits mounted on a die side of an interposer, stress relief features between the integrated circuits and mold compound over the integrated circuits.

Abstract translation: 用于在晶片插入件上的模具上进行模制的方法和装置。 一种方法包括接收具有管芯侧面和相对侧的插入件组件，所述插入件组件包括安装在所述插入件的裸片侧上的两个或多个集成电路管芯，所述插入器组件具有形成在所述插入件的裸片侧上的两个或更多个集成 电路模具; 在所述两个或更多个集成电路管芯之间的空间之一中在所述插入器组件的管芯侧上安装至少一个应力释放特征; 以及使用模具化合物模制所述集成电路模具，围绕所述两个或更多个集成电路管芯的所述模具化合物以及所述至少一个应力释放特征。 公开了一种装置，其集成电路安装在插入件的裸片侧，集成电路之间的应力消除特征和集成电路上的模具化合物。

公开(公告)号：US20120145204A1

公开(公告)日：2012-06-14

申请号：US12964097

申请日：2010-12-09

Applicant: Yu-Liang Lin ,  Weng-Jin Wu ,  Jing-Cheng Lin ,  Wen-Chih Chiou

Inventor： Yu-Liang Lin ,  Weng-Jin Wu ,  Jing-Cheng Lin ,  Wen-Chih Chiou

IPC: B08B3/08 ,  B08B3/02

CPC classification number: H01L21/67051 ,  H01L21/68728

Abstract: A device and system for thin wafer cleaning is disclosed. A preferred embodiment comprises a spin chuck having at least three holding clamps. A thin wafer with a wafer frame is mounted on the spin chuck through a tape layer. When the holding clamps are unlocked, there is no interference with the removal and placement of the wafer frame. On the other hand, when the holding clamps are locked, the holding clamps are brought into contact with the outer edge of the wafer frame so as to prevent the wafer frame from moving laterally. Furthermore, the shape of the holding clamps in a locked position is capable of preventing the wafer frame from moving vertically.

Abstract translation: 公开了用于薄晶片清洁的装置和系统。 优选实施例包括具有至少三个保持夹具的旋转卡盘。 具有晶片框架的薄晶片通过带层安装在旋转卡盘上。 当保持夹具解锁时，不会干扰晶片框架的移除和放置。 另一方面，当保持夹具被锁定时，保持夹具与晶片框架的外边缘接触，以防止晶片框架横向移动。 此外，保持夹具处于锁定位置的形状能够防止晶片框架垂直移动。

公开(公告)号：US20120112282A1

公开(公告)日：2012-05-10

申请号：US13351824

申请日：2012-01-17

Applicant: Jing-Cheng Lin

Inventor： Jing-Cheng Lin

IPC: H01L29/78 ,  H01L29/94

CPC classification number: H01L29/7833 ,  H01L21/02175 ,  H01L21/28255 ,  H01L29/16 ,  H01L29/4966 ,  H01L29/513 ,  H01L29/517 ,  H01L29/6659

Abstract: Germanium field effect transistors and methods of fabricating them are described. In one embodiment, the method includes forming a germanium oxide layer over a substrate and forming a metal oxide layer over the germanium oxide layer. The germanium oxide layer and the metal oxide layer are converted into a first dielectric layer. A first electrode layer is deposited over the first dielectric layer.

Abstract translation: 描述锗场效应晶体管及其制造方法。 在一个实施例中，该方法包括在衬底上形成氧化锗层并在氧化锗层上形成金属氧化物层。 氧化锗层和金属氧化物层被转换为第一电介质层。 第一电极层沉积在第一介电层上。

公开(公告)号：US20120104578A1

公开(公告)日：2012-05-03

申请号：US13342583

申请日：2012-01-03

Applicant: Hsien-Pin Hu ,  Chen-Hu Yu ,  Shin-Puu Jeng ,  Shang-Yun Hou ,  Jing-Cheng Lin ,  Wen-Chih Chiou ,  Hung-Jung Tu

Inventor： Hsien-Pin Hu ,  Chen-Hu Yu ,  Shin-Puu Jeng ,  Shang-Yun Hou ,  Jing-Cheng Lin ,  Wen-Chih Chiou ,  Hung-Jung Tu

IPC: H01L23/495

CPC classification number: H01L21/561 ,  H01L21/486 ,  H01L23/147 ,  H01L23/3128 ,  H01L23/49816 ,  H01L23/49822 ,  H01L23/49827 ,  H01L24/97 ,  H01L25/0655 ,  H01L2224/05001 ,  H01L2224/05027 ,  H01L2224/05571 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2224/32225 ,  H01L2224/73204 ,  H01L2224/97 ,  H01L2924/00014 ,  H01L2924/01029 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/14 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/18161 ,  H01L2224/81 ,  H01L2924/00012 ,  H01L2924/00 ,  H01L2224/05541 ,  H01L2224/05005 ,  H01L2224/05599 ,  H01L2224/05099

Abstract: A method includes providing an interposer wafer including a substrate, and a plurality of through-substrate vias (TSVs) extending from a front surface of the substrate into the substrate. A plurality of dies is bonded onto a front surface of the interposer wafer. After the step of bonding the plurality of dies, a grinding is performed on a backside of the substrate to expose the plurality of TSVs. A plurality of metal bumps is formed on a backside of the interposer wafer and electrically coupled to the plurality of TSVs.

Abstract translation: 一种方法包括提供包括衬底的中介层晶片，以及从衬底的前表面延伸到衬底中的多个贯通衬底通孔（TSV）。 多个管芯结合到插入件晶片的前表面上。 在结合多个模具的步骤之后，在基板的背面进行研磨以暴露多个TSV。 多个金属凸块形成在插入器晶片的背面并电耦合到多个TSV。

公开(公告)号：US20120007154A1

公开(公告)日：2012-01-12

申请号：US12834304

申请日：2010-07-12

Applicant: Jing-Cheng Lin ,  Yung-Chi Lin ,  Ku-Feng Yang

Inventor： Jing-Cheng Lin ,  Yung-Chi Lin ,  Ku-Feng Yang

IPC: H01L23/48 ,  H01L29/06 ,  H01L21/768 ,  H01L29/78

CPC classification number: H01L21/76898 ,  H01L21/30604 ,  H01L21/31111 ,  H01L21/762 ,  H01L21/76802 ,  H01L21/76831 ,  H01L21/76877 ,  H01L21/823475 ,  H01L21/823481 ,  H01L23/481 ,  H01L24/11 ,  H01L29/78 ,  H01L2224/131 ,  H01L2924/01029 ,  H01L2924/00014

Abstract: A device includes a semiconductor substrate having a front surface and a back surface opposite the front surface. An insulation region extends from the front surface into the semiconductor substrate. An inter-layer dielectric (ILD) is over the insulation region. A landing pad extends from a top surface of the ILD into the insulation region. A through-substrate via (TSV) extends from the back surface of the semiconductor substrate to the landing pad.

Abstract translation: 一种器件包括具有与前表面相对的前表面和后表面的半导体衬底。 绝缘区域从前表面延伸到半导体衬底中。 层间电介质（ILD）在绝缘区域之上。 着陆垫从ILD的顶表面延伸到绝缘区域中。 贯穿基板通孔（TSV）从半导体基板的背面延伸到着陆焊盘。

公开(公告)号：US20090047780A1

公开(公告)日：2009-02-19

申请号：US12287516

申请日：2008-10-10

Applicant: Cheng-Lin Huang ,  Ching-Hua Hsieh ,  Hsien-Ming Lee ,  Shing-Chyang Pan ,  Chao-Hsien Peng ,  Li-Lin Su ,  Jing-Cheng Lin ,  Shao-Lin Shue ,  Mong-Song Liang

Inventor： Cheng-Lin Huang ,  Ching-Hua Hsieh ,  Hsien-Ming Lee ,  Shing-Chyang Pan ,  Chao-Hsien Peng ,  Li-Lin Su ,  Jing-Cheng Lin ,  Shao-Lin Shue ,  Mong-Song Liang

IPC: H01L21/44

CPC classification number: H01L21/76844 ,  H01L21/76846 ,  H01L21/76862 ,  Y10S438/927

Abstract: Provided is a method for forming a composite barrier layer with superior barrier qualities and superior adhesion properties to both dielectric materials and conductive materials as the composite barrier layer extends throughout the semiconductor device. The composite barrier layer may be formed in regions where it is disposed between two conductive layers and in regions where it is disposed between a conductive layer and a dielectric material. The composite barrier layer may consist of various pluralities of layers and the arrangement of layers that form the composite barrier layer may differ as the barrier layer extends throughout different sections of the device. Amorphous layers of the composite barrier layer generally form boundaries with dielectric materials and crystalline layers generally form boundaries with conductive materials such as interconnect materials.

Abstract translation: 提供了一种形成复合阻挡层的方法，该复合阻挡层具有优异的阻挡性能，并且当复合阻挡层贯穿整个半导体器件时，两种电介质材料和导电材料具有优异的粘合性能。 复合阻挡层可以形成在其设置在两个导电层之间的区域中，并且在其布置在导电层和电介质材料之间的区域中。 复合阻挡层可以由各种多个层组成，并且形成复合阻挡层的层的布置可以随着阻挡层在装置的不同部分延伸而不同。 复合阻挡层的非晶层通常与电介质材料形成边界，并且结晶层通常与诸如互连材料的导电材料形成边界。

公开(公告)号：US20080071511A1

公开(公告)日：2008-03-20

申请号：US11800623

申请日：2007-05-07

Applicant: Jing-Cheng Lin

Inventor： Jing-Cheng Lin

IPC: G06F17/50

CPC classification number: G06F17/5036

Abstract: A modeling system for modeling integrated circuits includes a process variation generator for generating a first statistic distribution of a process parameter; a performance parameter distribution generator for generating a second distribution of a performance parameter; a stress generator for generating a third statistic distribution of the performance parameter under a stress condition; and a circuit simulator for receiving data randomly generated based on the first, the second and the third distributions and for generating a statistic distribution of a target performance parameter.

Abstract translation: 用于对集成电路进行建模的建模系统包括用于生成过程参数的第一统计分布的过程变化发生器; 性能参数分配生成器，用于生成性能参数的第二分布; 应力发生器，用于在应力条件下产生所述性能参数的第三统计分布; 以及电路模拟器，用于接收基于第一，第二和第三分布随机生成的数据，并用于生成目标性能参数的统计分布。

公开(公告)号：US20060027922A1

公开(公告)日：2006-02-09

申请号：US10909980

申请日：2004-08-03

Applicant: Hsien-Ming Lee ,  Jing-Cheng Lin ,  Shing-Chyang Pan ,  Ching-Hua Hsieh ,  Chao-Hsien Peng ,  Cheng-Lin Huang ,  Li-Lin Su ,  Shau-Lin Shue

Inventor： Hsien-Ming Lee ,  Jing-Cheng Lin ,  Shing-Chyang Pan ,  Ching-Hua Hsieh ,  Chao-Hsien Peng ,  Cheng-Lin Huang ,  Li-Lin Su ,  Shau-Lin Shue

IPC: H01L23/48

CPC classification number: H01L21/76834 ,  H01L21/76849 ,  H01L21/76867 ,  H01L23/5329 ,  H01L23/53295 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A semiconductor device having a nonconductive cap layer comprising a first metal element. The nonconductive cap layer comprises a first metal nitride, a first metal oxide, or a first metal oxynitride over conductive lines and an insulating material between the conductive lines. An interface region may be formed over the top surface of the conductive lines, the interface region including the metal element of the cap layer. The cap layer prevents the conductive material in the conductive lines from migrating or diffusing into adjacent subsequently formed insulating material layers. The cap layer may also function as an etch stop layer.

Abstract translation: 一种具有包括第一金属元件的非导电盖层的半导体器件。 非导电盖层包括导电线上的第一金属氮化物，第一金属氧化物或第一金属氧氮化物，以及导电线之间的绝缘材料。 界面区域可以形成在导电线的顶表面上，界面区域包括盖层的金属元件。 盖层防止导电线中的导电材料迁移或扩散到相邻的随后形成的绝缘材料层中。 盖层也可以用作蚀刻停止层。