公开(公告)号：US11217421B2

公开(公告)日：2022-01-04

申请号：US16879151

申请日：2020-05-20

Applicant: EBARA CORPORATION

Inventor： Takehide Hayashi ,  Ryo Tajima ,  Tatsuya Kohama ,  Kenji Watanabe ,  Tsutomu Karimata

IPC: H01J37/147 ,  H01J37/244 ,  H01J37/32 ,  H01J37/14

Abstract: An adjustment method for adjusting a path of an electron beam passing through an electron beam device including at least one unit having at least one lens and at least one aligner electrode, and a detector configured to detect the electron beam, the method including: a step of measuring, by a coordinate measuring machine, an assembly tolerance for each of a plurality of the units constituting the electron beam device; a step of determining a shift amount of the electron beam at a position of the at least one of the lenses; a step of determining an electrode condition for each of a plurality of the aligner electrodes included in the units in a manner such that a shift amount of the electron beam is to be the determined shift amount; and a step of setting each of the aligner electrodes to the corresponding determined electrode condition.

公开(公告)号：US10900573B2

公开(公告)日：2021-01-26

申请号：US16511363

申请日：2019-07-15

Applicant: EBARA CORPORATION

Inventor： Tsutomu Karimata

IPC: F16K3/02

Abstract: A gate valve 1 includes: a plate 2 having an opening portion 9; a plate 3 located opposite to the plate 2; a guide space 5 formed between the plates 2, 3; and a plate 6 provided in the space 5. The plate 6 is slidable along a direction in which an opening portion 11 is offset from the opening portion 9 in the space 5 in a state in which the plate 6 is pressed by the pressing portion 13 and separated from the plate 2, and a position of the plate 6 is fixed with respect to the plate 2 in the space 5 in a state in which the plate 6 is pressed by the pressing portion 16 and is in contact with the plate 2. The pressing portions 13, 16 each have a bellows structure formed by diffusion-bonding metal plates 18 and 19 to each other.

公开(公告)号：US20160307726A1

公开(公告)日：2016-10-20

申请号：US15195665

申请日：2016-06-28

Applicant: EBARA CORPORATION

Inventor： Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Yoshihiko Naito ,  Yasushi Toma ,  Tsutomu Karimata ,  Takehide Hayashi ,  Kiwamu Tsukamoto ,  Tatsuya Kohama ,  Noboru Kobayashi

IPC: H01J37/09 ,  G01N23/225 ,  H01J37/28 ,  H01J37/22 ,  H01J37/10

CPC classification number: H01J37/073 ,  G01N23/22 ,  G01N23/223 ,  G01N23/2251 ,  G01N2223/611 ,  H01J1/34 ,  H01J37/09 ,  H01J37/10 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/265 ,  H01J37/28 ,  H01J37/29 ,  H01J2237/0048 ,  H01J2237/022 ,  H01J2237/032 ,  H01J2237/038 ,  H01J2237/045 ,  H01J2237/0458 ,  H01J2237/0473 ,  H01J2237/0492 ,  H01J2237/061 ,  H01J2237/06333 ,  H01J2237/166 ,  H01J2237/186 ,  H01J2237/2002 ,  H01J2237/2007 ,  H01J2237/2008 ,  H01J2237/2448 ,  H01J2237/2482 ,  H01J2237/2485 ,  H01J2237/2817 ,  H01J2237/2855 ,  H01J2237/2857

Abstract: An inspection device for inspecting a surface of an inspection object using a beam includes a beam generator capable of generating one of either charge particles or an electromagnetic wave as a beam, a primary optical system capable of guiding and irradiating the beam to the inspection object supported within a working chamber, a secondary optical system capable of including a first movable numerical aperture and a first detector which detects secondary charge particles generated from the inspection object, the secondary charge particles passing through the first movable numerical aperture, an image processing system capable of forming an image based on the secondary charge particles detected by the first detector; and a second detector arranged between the first movable numerical aperture and the first detector and which detects a location and shape at a cross over location of the secondary charge particles generated from the inspection object.

Abstract translation: 用于使用光束检查检查对象的表面的检查装置包括能够产生电荷粒子或电磁波之一作为光束的光束发生器，能够将所述光束引导并照射到被检查对象的主光学系统 在工作室内，能够包括第一可移动数值孔径的二次光学系统和检测从检查对象产生的二次电荷粒子的第一检测器，通过第一可移动数值孔径的二次电荷粒子，能够 基于由所述第一检测器检测到的次级电荷粒子形成图像; 以及第二检测器，其布置在第一可移动数值孔径和第一检测器之间，并且检测在从检查对象生成的次级充电颗粒的交叉位置处的位置和形状。

公开(公告)号：US09406480B2

公开(公告)日：2016-08-02

申请号：US14596447

申请日：2015-01-14

Applicant: EBARA CORPORATION

Inventor： Nobuharu Noji ,  Tohru Satake ,  Hirosi Sobukawa ,  Toshifumi Kimba ,  Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Kenichi Suematsu ,  Yutaka Tabe ,  Ryo Tajima ,  Keiichi Tohyama

IPC: H01J37/28 ,  G01N23/22 ,  G01N23/225 ,  H01J37/20 ,  H01J37/05 ,  H01L21/683

CPC classification number: H01J37/20 ,  G01N23/2204 ,  G01N23/225 ,  H01J37/05 ,  H01J37/28 ,  H01J2237/202 ,  H01J2237/2441 ,  H01J2237/2446 ,  H01J2237/2801 ,  H01J2237/2817 ,  H01L21/6833 ,  H01L2223/54466

Abstract: A substrate is irradiated by primary electrons and secondary electrons generated from the substrate are detected by a detector. A reference die is placed on the stage to obtain a pattern matching template image including feature coordinates of the reference die. A pattern matching is performed with an arbitrary die in a row or column including the reference die using the template image to obtain feature coordinates of the arbitrary die. An angle of misalignment is calculated between the direction of the row or column including the reference die and one of the directions of movement of the substrate on the basis of the feature coordinates of the arbitrary die and those of the reference die. The stage is rotated to correct the angle of misalignment to conform the direction of the row or column including the reference die with the one of the directions of movement of the substrate.

公开(公告)号：US08946631B2

公开(公告)日：2015-02-03

申请号：US14156140

申请日：2014-01-15

Applicant: Ebara Corporation

Inventor： Nobuharu Noji ,  Tohru Satake ,  Hirosi Sobukawa ,  Toshifumi Kimba ,  Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Kenichi Suematsu ,  Yutaka Tabe ,  Ryo Tajima ,  Keiichi Tohyama

IPC: G01N23/225 ,  H01J37/28 ,  H01L21/683

CPC classification number: H01J37/20 ,  G01N23/2204 ,  G01N23/225 ,  H01J37/05 ,  H01J37/28 ,  H01J2237/202 ,  H01J2237/2441 ,  H01J2237/2446 ,  H01J2237/2801 ,  H01J2237/2817 ,  H01L21/6833 ,  H01L2223/54466

Abstract: A substrate is irradiated by primary electrons and secondary electrons generated from the substrate are detected by a detector. A reference die is placed on the stage to obtain a pattern matching template image including feature coordinates of the reference die. A pattern matching is performed with an arbitrary die in a row or column including the reference die using the template image to obtain feature coordinates of the arbitrary die. An angle of misalignment is calculated between the direction of the row or column including the reference die and one of the directions of movement of the substrate on the basis of the feature coordinates of the arbitrary die and those of the reference die. The stage is rotated to correct the angle of misalignment to conform the direction of the row or column including the reference die with the one of the directions of movement of the substrate.

Abstract translation: 用一次电子照射衬底，由检测器检测由衬底产生的二次电子。 将参考管芯放置在平台上以获得包括参考管芯的特征坐标的模式匹配模板图像。 使用模板图像，使用包含基准管芯的行或列中的任意管芯进行图案匹配，以获得任意管芯的特征坐标。 基于任意模具的特征坐标和参考模具的特征坐标，在包括基准模具的行或列的方向与基板的移动方向之间计算出未对准的角度。 旋转台阶以校正未对准的角度，以使包括基准模具的行或列的方向与衬底的运动方向之一相一致。

公开(公告)号：US08796621B2

公开(公告)日：2014-08-05

申请号：US13853418

申请日：2013-03-29

Applicant: Ebara Corporation

Inventor： Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Kenichi Suematsu ,  Tsutomu Karimata ,  Nobuharu Noji

IPC: G01N23/00 ,  G21K7/00

CPC classification number: H01J37/261 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/2441 ,  H01J2237/2446

Abstract: An inspecting apparatus for reducing a time loss associated with a work for changing a detector is characterized by comprising a plurality of detectors 11, 12for receiving an electron beam emitted from a sample W to capture image data representative of the sample W, and a switching mechanism M for causing the electron beam to be incident on one of the plurality of detectors 11, 12, where the plurality of detectors 11, 12 are disposed in the same chamber MC. The plurality of detectors 11, 12 can be an arbitrary combination of a detector comprising an electron sensor for converting an electron beam into an electric signal with a detector comprising an optical sensor for converting an electron beam into light and converting the light into an electric signal. The switching mechanism M may be a mechanical moving mechanism or an electron beam deflector.

Abstract translation: 用于减少与用于改变检测器的工作相关联的时间损失的检查装置的特征在于包括多个检测器11,12，用于接收从样品W发射的电子束以捕获表示样品W的图像数据，以及切换机构 M，用于使电子束入射到多个检测器11,12中的一个上，其中多个检测器11,12设置在同一个室MC中。 多个检测器11,12可以是包括用于将电子束转换为电信号的电子传感器的检测器的任意组合，该检测器包括用于将电子束转换成光并将光转换成电信号的光学传感器 。 切换机构M可以是机械移动机构或电子束偏转器。

公开(公告)号：US20140014848A1

公开(公告)日：2014-01-16

申请号：US13946198

申请日：2013-07-19

Applicant: EBARA CORPORATION

Inventor： Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Yoshihiko Naito ,  Yasushi Toma ,  Tsutomu Karimata ,  Takehide Hayashi ,  Kiwamu Tsukamoto ,  Tatsuya Kohama ,  Noboru Kobayashi

IPC: G01N23/22 ,  G01N23/223

CPC classification number: H01J37/073 ,  G01N23/22 ,  G01N23/223 ,  G01N23/2251 ,  G01N2223/611 ,  H01J1/34 ,  H01J37/09 ,  H01J37/10 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/265 ,  H01J37/28 ,  H01J37/29 ,  H01J2237/0048 ,  H01J2237/022 ,  H01J2237/032 ,  H01J2237/038 ,  H01J2237/045 ,  H01J2237/0458 ,  H01J2237/0473 ,  H01J2237/0492 ,  H01J2237/061 ,  H01J2237/06333 ,  H01J2237/166 ,  H01J2237/186 ,  H01J2237/2002 ,  H01J2237/2007 ,  H01J2237/2008 ,  H01J2237/2448 ,  H01J2237/2482 ,  H01J2237/2485 ,  H01J2237/2817 ,  H01J2237/2855 ,  H01J2237/2857

Abstract: An inspection device for inspecting a surface of an inspection object using a beam includes a beam generator capable of generating one of either charge particles or an electromagnetic wave as a beam, a primary optical system capable of guiding and irradiating the beam to the inspection object supported within a working chamber, a secondary optical system capable of including a first movable numerical aperture and a first detector which detects secondary charge particles generated from the inspection object, the secondary charge particles passing through the first movable numerical aperture, an image processing system capable of forming an image based on the secondary charge particles detected by the first detector; and a second detector arranged between the first movable numerical aperture and the first detector and which detects a location and shape at a cross over location of the secondary charge particles generated from the inspection object.

Abstract translation: 用于使用光束检查检查对象的表面的检查装置包括能够产生电荷粒子或电磁波之一作为光束的光束发生器，能够将所述光束引导并照射到被检查对象的主光学系统 在工作室内，能够包括第一可移动数值孔径的二次光学系统和检测从检查对象产生的二次电荷粒子的第一检测器，通过第一可移动数值孔径的二次电荷粒子，能够 基于由所述第一检测器检测到的次级电荷粒子形成图像; 以及第二检测器，其布置在第一可移动数值孔径和第一检测器之间，并且检测在从检查对象生成的次级充电颗粒的交叉位置处的位置和形状。

公开(公告)号：US11515118B2

公开(公告)日：2022-11-29

申请号：US16794948

申请日：2020-02-19

Applicant: EBARA CORPORATION

Inventor： Kenji Watanabe ,  Shinichi Okada ,  Ryo Tajima ,  Tsutomu Karimata

IPC: H01J37/147 ,  H01J37/244

Abstract: Provided is an electron beam irradiation apparatus including: an aligner configured to perform an alignment of an electron beam by deflecting the electron beam; a deflector having a plurality of electrodes and configured to deflect the electron beam after passing through the aligner; and an adjuster configured to adjust deflection caused by the aligner, wherein the adjuster is configured to perform, on each of the plurality of electrodes, detecting an image of the electron beam by applying a test voltage to one of the plurality of electrodes and applying a reference voltage to the other electrodes, determine a position shift of the electron beam based on each position of the image of the electron beam corresponding to each electrode, and adjust deflection of the aligner so as to cancel the position shift of the electron beam.

公开(公告)号：US09601302B2

公开(公告)日：2017-03-21

申请号：US14813768

申请日：2015-07-30

Applicant: EBARA CORPORATION

Inventor： Shoji Yoshikawa ,  Kiwamu Tsukamoto ,  Takeshi Murakami ,  Masahiro Hatakeyama ,  Tsutomu Karimata

IPC: H01J37/26 ,  H01J37/02 ,  G01N23/22 ,  H01J37/09 ,  H01J37/16 ,  H01J37/20 ,  H01J37/285 ,  G01N21/95

CPC classification number: H01J37/023 ,  G01N21/9501 ,  G01N23/2204 ,  H01J37/09 ,  H01J37/16 ,  H01J37/20 ,  H01J37/285 ,  H01J2237/022 ,  H01J2237/0264 ,  H01J2237/1501 ,  H01J2237/166 ,  H01J2237/20 ,  H01J2237/2007 ,  H01J2237/20221 ,  H01J2237/20278 ,  H01J2237/26

Abstract: An inspection apparatus capable of facilitating reduction in cost of the apparatus is provided. The inspection apparatus includes: beam generation means for generating any of charged particles and electromagnetic waves as a beam; a primary optical system that guides the beam into an inspection object held on a movable stage in a working chamber and irradiates the inspection object with the beam; a secondary optical system that detects secondary charged particles occurring from the inspection object; and an image processing system that forms an image on the basis of the detected secondary charged particles. The inspection apparatus further includes: a linear motor that drives the movable stage; and a Helmholtz coil that causes a magnetic field for canceling a magnetic field caused by the linear motor when the movable stage is driven.

公开(公告)号：US09368314B2

公开(公告)日：2016-06-14

申请号：US14319620

申请日：2014-06-30

Applicant: EBARA CORPORATION

Inventor： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Masahiro Hatakeyama ,  Toshifumi Kimba ,  Hirosi Sobukawa ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Shin Oowada ,  Mutsumi Saito ,  Yuichiro Yamazaki ,  Takamitsu Nagai ,  Ichirota Nagahama

IPC: G01N23/225 ,  H01J29/70 ,  H01J37/06 ,  H01J37/073 ,  H01J37/18 ,  H01J37/20 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28 ,  H01L21/67 ,  G01N23/227 ,  H01J37/26 ,  H01J37/141

CPC classification number: H01J29/70 ,  G01N23/225 ,  G01N23/2251 ,  G01N23/227 ,  H01J37/06 ,  H01J37/073 ,  H01J37/141 ,  H01J37/185 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/266 ,  H01J37/28 ,  H01J2237/082 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2816 ,  H01J2237/2817 ,  H01L21/6719 ,  H01L21/67213

Abstract: An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical systems; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; and a loader 60 for transferring the object to the stage system through the loading chambers.

Abstract translation: 电子束检查装置包括：电子光学装置70，具有用于从电子束源向一个电子束照射物体的电子 - 光学系统;以及用于检测由电子束投射的二次电子图像的检测器， 光学系统; 用于相对于电子 - 光学系统保持和移动物体的平台系统50; 小型环境室20，用于向物体供给清洁气体，以防止灰尘与物体接触; 用于容纳平台装置的工作室31，工作室可控制为具有真空气氛; 设置在微环境室和工作室之间的至少两个装载室41,42适于独立控制以具有真空气氛; 以及用于通过装载室将物体传送到舞台系统的装载器60。