公开(公告)号：US09797037B2

公开(公告)日：2017-10-24

申请号：US15211993

申请日：2016-07-15

Applicant: Applied Materials, Inc.

Inventor： Jennifer Y. Sun ,  Vahid Firouzdor ,  Biraja Prasad Kanungo ,  Tom K. Cho ,  Vedapuram S. Achutharaman ,  Ying Zhang

IPC: C23C14/08 ,  C23C14/46 ,  C04B41/50 ,  C04B41/52 ,  C23C14/58 ,  C04B41/89 ,  C04B35/505 ,  C04B35/622 ,  H01J37/32 ,  C04B41/87 ,  C04B41/00

CPC classification number: C23C14/088 ,  C04B35/00 ,  C04B35/505 ,  C04B35/62222 ,  C04B41/009 ,  C04B41/4529 ,  C04B41/5045 ,  C04B41/52 ,  C04B41/87 ,  C04B41/89 ,  C04B2235/3217 ,  C04B2235/3222 ,  C04B2235/3225 ,  C04B2235/3246 ,  C04B2235/3418 ,  C04B2235/3826 ,  C04B2235/3873 ,  C04B2235/428 ,  C04B2235/445 ,  C23C14/08 ,  C23C14/083 ,  C23C14/46 ,  C23C14/5806 ,  H01J37/32477 ,  Y10T428/26 ,  Y10T428/265 ,  C04B35/10 ,  C04B35/50 ,  C04B35/14 ,  C04B35/584 ,  C04B35/565 ,  C04B41/5032 ,  C04B41/5042 ,  C04B41/5035 ,  C04B2103/54

Abstract: An article comprises a body and a conformal protective layer on at least one surface of the body. The conformal protective layer is a plasma resistant rare earth oxide film having a thickness of less than 1000 μm, wherein the plasma resistant rare earth oxide has a composition of 40-45 mol % of Y2O3, 5-10 mol % of ZrO2, 35-40 mol % of Er2O3, 5-10 mol % of Gd2O3, and 5-15 mol % of SiO2.

公开(公告)号：US20170287683A1

公开(公告)日：2017-10-05

申请号：US15620700

申请日：2017-06-12

Applicant: Applied Materials, Inc.

Inventor： Jennifer Y. Sun ,  Biraja Kanungo ,  Tom Cho ,  Ying Zhang

IPC: H01J37/32 ,  C23C24/04

CPC classification number: H01J37/32807 ,  C23C24/04 ,  H01J37/3244 ,  Y10T428/24413

Abstract: An component of a processing chamber comprises an aerosol deposited coating on the component, the aerosol deposited coating comprising a first type of metal oxide nanoparticle and a second type of metal oxide nanoparticle.

公开(公告)号：US20170247795A1

公开(公告)日：2017-08-31

申请号：US15595888

申请日：2017-05-15

Applicant: Applied Materials, Inc.

Inventor： Jennifer Y. Sun ,  Vahid Firouzdor

IPC: C23C24/04 ,  C25D11/18 ,  C25D11/16 ,  C23C28/00 ,  C25D11/26

CPC classification number: C25D11/34 ,  C23C24/04 ,  C23C28/321 ,  C23C28/322 ,  C23C28/345 ,  C23C28/3455 ,  C25D11/04 ,  C25D11/16 ,  C25D11/18 ,  C25D11/26 ,  Y10T428/12736 ,  Y10T428/12743 ,  Y10T428/12757 ,  Y10T428/12764

Abstract: A component for a manufacturing chamber comprises a cold spray coating and an anodization layer on the cold spray coating. The anodization layer has a thickness of about 2-10 mil. The anodization layer comprises a low porosity bottom layer portion having a porosity that is less than about 40-50% and a porous columnar top layer portion having a porosity of about 40-40% and comprising a plurality of columnar nanopores having a diameter of about 10-50 nm.

公开(公告)号：US20170203364A1

公开(公告)日：2017-07-20

申请号：US15326910

申请日：2015-07-16

Applicant: Applied Materials, Inc.

Inventor： Kartik Ramaswamy ,  Anantha K. Subramani ,  Kasiraman Krishnan ,  Jennifer Y. Sun ,  Srinivas D. Nemani ,  Thomas B. Brezoczky ,  Christopher A. Rowland ,  Simon Yavelberg ,  Swaminathan Srinivasan ,  Nag B. Patibandla ,  Ellie Y. Yieh ,  Hou T. Ng

IPC: B22F3/105 ,  B33Y30/00 ,  B33Y50/02 ,  B28B1/00 ,  B23K26/70 ,  B23K10/02 ,  B23K10/00 ,  B23K26/342 ,  B23K26/00 ,  B33Y10/00 ,  B22F1/00

CPC classification number: B22F3/1055 ,  B22F1/0003 ,  B22F2003/1051 ,  B22F2003/1057 ,  B22F2202/13 ,  B22F2301/205 ,  B22F2998/10 ,  B23K10/006 ,  B23K10/027 ,  B23K26/0006 ,  B23K26/342 ,  B23K26/702 ,  B23K2103/14 ,  B28B1/001 ,  B29C64/153 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y50/02 ,  G05B2219/49007

Abstract: An additive manufacturing system includes a platen, a feed material dispenser apparatus configured to deliver a feed material over the platen, a laser configured to produce a laser beam, a controller configured to direct the laser beam to locations specified by data stored in a computer-readable medium to cause the feed material to fuse, and a plasma source configured to produce ions that are directed to substantially the same location on the platen as the laser beam.

公开(公告)号：US20170175284A1

公开(公告)日：2017-06-22

申请号：US15454946

申请日：2017-03-09

Applicant: Applied Materials, Inc.

Inventor： Jennifer Y. Sun ,  Biraja P. Kanungo

IPC: C25D11/12 ,  H01L21/288 ,  C25D17/00 ,  C25D5/44 ,  C25D11/20

CPC classification number: C25D11/12 ,  C25D5/44 ,  C25D11/02 ,  C25D11/04 ,  C25D11/08 ,  C25D11/20 ,  C25D17/001 ,  H01L21/2885 ,  Y10T428/26 ,  Y10T428/263 ,  Y10T428/264

Abstract: A chamber component for a processing chamber comprises a metallic article that comprises impurities. The chamber component further comprises a first anodization layer on the metallic article, the first anodization layer having a thickness greater than about 100 nm. The first anodization layer comprises a dense barrier layer portion and a porous columnar layer portion over the dense barrier layer portion, wherein the porous columnar layer portion comprises a plurality of pores that are free from moisture. The chamber component further comprises an aluminum coating on the first anodization layer, the aluminum coating being substantially free from impurities.

公开(公告)号：US09663870B2

公开(公告)日：2017-05-30

申请号：US14079586

申请日：2013-11-13

Applicant: Applied Materials, Inc.

Inventor： Jennifer Y. Sun ,  Vahid Firouzdor

IPC: C23C4/18 ,  C25D11/34 ,  C25D11/04 ,  C23C24/04 ,  C23C28/00

CPC classification number: C25D11/34 ,  C23C24/04 ,  C23C28/321 ,  C23C28/322 ,  C23C28/345 ,  C23C28/3455 ,  C25D11/04 ,  C25D11/16 ,  C25D11/18 ,  C25D11/26 ,  Y10T428/12736 ,  Y10T428/12743 ,  Y10T428/12757 ,  Y10T428/12764

Abstract: A method for coating a component for use in a semiconductor chamber for plasma etching includes providing a component for use in a semiconductor manufacturing chamber, loading the component into a deposition chamber, cold spray coating a metal powder onto the component to form a coating on the component, and anodizing the coating to form an anodization layer.

公开(公告)号：US09610591B2

公开(公告)日：2017-04-04

申请号：US13833257

申请日：2013-03-15

Applicant: APPLIED MATERIALS, INC.

Inventor： Dmitry Lubomirsky ,  Vladimir Knyazik ,  Hamid Noorbakhsh ,  Jason Della Rosa ,  Zheng John Ye ,  Jennifer Y. Sun ,  Sumanth Banda

IPC: B05B1/00 ,  H01J37/32 ,  C23C16/455

CPC classification number: B05B1/005 ,  B05B1/185 ,  C23C16/45565 ,  H01J37/3211 ,  H01J37/32146 ,  H01J37/32183 ,  H01J37/3244 ,  H01J37/32467 ,  H01J37/32522 ,  H01J37/32623

Abstract: Embodiments of showerheads having a detachable gas distribution plate are provided herein. In some embodiments, a showerhead for use in a semiconductor processing chamber may include a base having a first side and a second side; a gas distribution plate disposed proximate the second side of the base; a clamp disposed about a peripheral edge of the gas distribution plate to removably couple the gas distribution plate to the base; and a thermal gasket disposed between the base and gas distribution plate.

公开(公告)号：US20160326060A1

公开(公告)日：2016-11-10

申请号：US15211933

申请日：2016-07-15

Applicant: Applied Materials, Inc.

Inventor： Jennifer Y. Sun ,  Biraja P. Kanungo

IPC: C04B35/505 ,  C23C16/50 ,  C23C16/455 ,  C04B37/02

CPC classification number: C04B35/50 ,  C04B35/505 ,  C04B35/62222 ,  C04B35/62655 ,  C04B37/001 ,  C04B37/02 ,  C04B2235/3217 ,  C04B2235/3224 ,  C04B2235/3225 ,  C04B2235/3244 ,  C04B2235/3418 ,  C04B2235/656 ,  C04B2235/96 ,  C04B2235/9669 ,  C04B2237/34 ,  C04B2237/341 ,  C04B2237/348 ,  C04B2237/40 ,  C23C4/11 ,  C23C4/134 ,  C23C14/221 ,  C23C16/405 ,  C23C16/4401 ,  C23C16/45525 ,  C23C16/50 ,  H01J37/32082 ,  H01L21/67069 ,  H01L21/67109 ,  H01L21/67248 ,  H01L21/6833 ,  H01L21/68757

Abstract: An article comprises a plasma resistant ceramic material comprising 40 mol % to less than 100 mol % of Y2O3, above 0 mol % to 60 mol % of ZrO2, and above 0 mol % to 5 mol % of Al2O3.

Abstract translation: 一种制品包括含有40mol％至小于100mol％的Y 2 O 3，高于0mol％至60mol％的ZrO 2和高于0mol％至5mol％的Al 2 O 3的耐等离子体陶瓷材料。

公开(公告)号：US09447365B2

公开(公告)日：2016-09-20

申请号：US13757646

申请日：2013-02-01

Applicant: Applied Materials, Inc.

Inventor： Sumanth Banda ,  Jennifer Y. Sun

IPC: B08B3/04 ,  C11D7/08 ,  C11D11/00 ,  B08B3/12 ,  H01L21/02

CPC classification number: C11D7/08 ,  B08B3/04 ,  B08B3/12 ,  C11D11/0047 ,  C23C16/4407 ,  H01L21/02057

Abstract: A method including immersing a ceramic coated article into a bath including an HF acid solution having NH4F with a molar concentration of about 0.1M to 1.0M for a time period to remove a deposition, and rinsing the ceramic coated article.

Abstract translation: 一种方法，包括将陶瓷涂层制品浸入包括具有摩尔浓度为约0.1M至1.0M的NH 4 F的HF酸溶液的浴中以去除沉积物，并漂洗陶瓷涂覆的制品。

公开(公告)号：US20150329430A1

公开(公告)日：2015-11-19

申请号：US14712059

申请日：2015-05-14

Applicant: Applied Materials, Inc.

Inventor： Jennifer Y. Sun ,  Yikai Chen ,  Biraja Prasad Kanungo

IPC: C04B35/622 ,  B32B9/04 ,  C04B35/505 ,  C23C24/10 ,  B32B37/06

CPC classification number: C23C24/10 ,  B32B9/048 ,  B32B18/00 ,  B32B37/06 ,  B32B2305/77 ,  B32B2315/02 ,  C04B35/62222 ,  C04B2235/5454 ,  C04B2235/604 ,  C04B2235/666 ,  C04B2237/34 ,  C04B2237/343 ,  C04B2237/348 ,  C04B2237/365 ,  C04B2237/366 ,  C04B2237/368 ,  C23C28/042

Abstract: Disclosed herein are methods for fabricating layered ceramic materials via field assisted sintering technology. A method includes forming a ceramic green body on a surface of a substrate, and sintering the ceramic green body using a field-assisted sintering process to form a ceramic layer joined to the substrate.

Abstract translation: 本文公开了通过场辅助烧结技术制造层状陶瓷材料的方法。 一种方法包括在基板的表面上形成陶瓷生坯，并使用场辅助烧结工艺烧结陶瓷生坯以形成与基板接合的陶瓷层。