ULTRA HIGH PERFORMANCE INTERPOSER
    35.
    发明申请
    ULTRA HIGH PERFORMANCE INTERPOSER 有权
    超高性能插座

    公开(公告)号:US20150041988A1

    公开(公告)日:2015-02-12

    申请号:US13962349

    申请日:2013-08-08

    Abstract: An interconnection component includes a semiconductor material layer having a first surface and a second surface opposite the first surface and spaced apart in a first direction. At least two metalized vias extend through the semiconductor material layer. A first pair of the at least two metalized vias are spaced apart from each other in a second direction orthogonal to the first direction. A first insulating via in the semiconductor layer extends from the first surface toward the second surface. The insulating via is positioned such that a geometric center of the insulating via is between two planes that are orthogonal to the second direction and that pass through each of the first pair of the at least two metalized vias. A dielectric material at least partially fills the first insulating via or at least partially encloses a void in the insulating via.

    Abstract translation: 互连部件包括半导体材料层,其具有第一表面和与第一表面相对的第二表面,并且在第一方向上间隔开。 至少两个金属化通孔延伸穿过半导体材料层。 所述至少两个金属化通孔中的第一对在与第一方向正交的第二方向上彼此间隔开。 半导体层中的第一绝缘通孔从第一表面延伸到第二表面。 绝缘通孔被定位成使得绝缘通孔的几何中心在与第二方向正交的两个平面之间并且穿过第一对至少两个金属化通孔中的每一个。 电介质材料至少部分地填充第一绝缘通孔或至少部分地封闭绝缘通孔中的空隙。

    Ultra high performance interposer
    36.
    发明授权

    公开(公告)号:US10700002B2

    公开(公告)日:2020-06-30

    申请号:US16446822

    申请日:2019-06-20

    Abstract: An interconnection component includes a semiconductor material layer having a first surface and a second surface opposite the first surface and spaced apart in a first direction. At least two metalized vias extend through the semiconductor material layer. A first pair of the at least two metalized vias are spaced apart from each other in a second direction orthogonal to the first direction. A first insulating via in the semiconductor layer extends from the first surface toward the second surface. The insulating via is positioned such that a geometric center of the insulating via is between two planes that are orthogonal to the second direction and that pass through each of the first pair of the at least two metalized vias. A dielectric material at least partially fills the first insulating via or at least partially encloses a void in the insulating via.

    Wire bond wires for interference shielding

    公开(公告)号:US10559537B2

    公开(公告)日:2020-02-11

    申请号:US16127110

    申请日:2018-09-10

    Abstract: Apparatuses relating generally to a microelectronic package having protection from interference are disclosed. In an apparatus thereof, a substrate has an upper surface and a lower surface opposite the upper surface and has a ground plane. A first microelectronic device is coupled to the upper surface of the substrate. Wire bond wires are coupled to the ground plane for conducting the interference thereto and extending away from the upper surface of the substrate. A first portion of the wire bond wires is positioned to provide a shielding region for the first microelectronic device with respect to the interference. A second portion of the wire bond wires is not positioned to provide the shielding region. A second microelectronic device is coupled to the substrate and located outside of the shielding region. A conductive surface is over the first portion of the wire bond wires for covering the shielding region.

Patent Agency Ranking