Abstract:
A back side illumination photodiode includes a light-receiving back side surface of a semiconductor material substrate. An area of the light-receiving back side surface includes a recess. The recess is filled with a material having an optical index that is lower than an optical index of the semiconductor material substrate. Both the substrate and the filling material are transparent to an operating wavelength of the photodiode. The recess may be formed to have a ring shape.
Abstract:
The invention relates to a III-V heterostructure laser device (1) arranged in and/or on silicon, comprising:a III-V heterostructure gain medium (3); andan optical rib waveguide (11), arranged facing the gain medium (3) and comprising a slab waveguide (15) equipped with a longitudinal rib (17), the optical rib waveguide (11) being arranged in the silicon.The optical rib waveguide (11) is oriented so that at least one Bragg grating (19, 19a, 19b) is arranged on that side (21) of the slab waveguide (15) which is proximal relative to the gain medium (3) and in that the rib (17) is placed on that side (23) of the slab waveguide (15) that is distal relative to the gain medium (3).
Abstract:
The electric behavior of a reverse-biased PN junction diode is modeled by measuring the value of voltage V present across the diode and the value of the corresponding current I running through this diode, the voltage V varying within a range of values including the value of diode breakdown voltage. A representation of a function ln ( I - I s ) according to voltage V is established from the measured values of current I and of voltage V, IS being the saturation current of the diode. A linear function representative of a substantially linear portion of the function, characterized by voltages V greater than breakdown voltage VBK in terms of absolute value, is determined. An avalanche multiplication factor MM is then calculated by MM = 1 + ⅇ ( - slbv · V + bv bv ) , with parameter slbv equal to the ordinate at the origin of the linear function, and parameter slbv/bv equal to the slope of the linear function.
Abstract:
A terahertz imager includes an array of pixel circuits. Each pixel circuit has an antenna and a detector. The detector is coupled to differential output terminals of the antenna. A frequency oscillator is configured to generate a frequency signal on an output line. The output line is coupled to an input terminal of the antenna of at least one of the pixel circuits.
Abstract:
A device for generating a signal, including: a balun; and a circuit capable of summing up, on a first access terminal of the balun, currents representative of signals received on first input terminals of the device, and on a second access terminal of the balun, currents representative of signals received on second input terminals of the device.
Abstract:
The present disclosure relates to a method for manufacturing a bipolar transistor. The method forms a trench to isolate a first region from a second region in a semiconductor wafer, and to isolate these regions from the rest of the wafer. The method forms first P-doped well in the second region and produces a collector region of second and third wells by a P doping in the first region. The second well is in contact with the first well below the trench. The method also produces an N-doped base well on the collector region and, at the wafer surface, and forms a CMOS transistor gate on the first region and delimiting a third region and a fourth region. The method also forms a P+-doped collector contact region in the first well, forms a P+ doped emitter region in the third region, and forms an N+-doped base contact region in the fourth region.
Abstract:
The method for processing signals originating for example from several proximity sensors for the recognition of a movement of an object, comprises first respective samplings of the said signals delivered by the sensors so as to obtain a first set of first date-stamped samples, the generation, from the first set of first date-stamped samples, of new sampling times comprising a start of movement time, an end of movement time, and times regularly spaced between the start of movement time and the end of movement time, a re-sampling of the signal delivered by each sensor between the start of movement time and the end of movement time at the said new sampling times using the first samples, in such a manner as to generate a second set of second date-stamped samples, and a processing of the said second set of date-stamped samples by a movement recognition algorithm.
Abstract:
The disclosure concerns a method of stressing a semiconductor layer comprising: forming, over a silicon on insulator structure having a semiconductor layer in contact with an insulating layer, one or more stressor blocks aligned with first regions of said semiconductor layer in which transistor channels are to be formed, wherein said stressor blocks are stressed such that they locally stress said semiconductor layer; and deforming second regions of said insulating layer adjacent to said first regions by temporally decreasing, by annealing, the viscosity of said insulator layer.
Abstract:
A multichannel splitter formed from 1 to 2 splitters. An input terminal of a first 1 to 2 splitter defines an input of the multichannel splitter. The 1 to 2 splitters are electrically series-connected. First respective outputs of the 1 to 2 splitters define output terminals of the multichannel splitter.
Abstract:
The invention relates to a method for producing an interconnection pad on a conducting element comprising an upper face and a side wall; the method being executed from a substrate at least the upper face of which is insulating; the conducting element going through at least an insulating portion of the substrate, the method being characterized in that it comprises the sequence of the following steps: a step of embossing the conducting element, a step of forming, above the upper insulating face of the substrate, a stack of layers comprising at least one electrically conducting layer and one electrically resistive layer, a step of partially removing the electrically resistive layer, a step of electrolytic growth on the portion of the electrically conducting layer so as to form at least one interconnection pad on said conducting element.