Semiconductor device and method for manufacturing the same
    65.
    发明授权
    Semiconductor device and method for manufacturing the same 有权
    半导体装置及其制造方法

    公开(公告)号:US08338904B2

    公开(公告)日:2012-12-25

    申请号:US12883674

    申请日:2010-09-16

    IPC分类号: H01L31/05

    摘要: According to an embodiment, there is provided a semiconductor device including a semiconductor substrate having a first surface on which an active layer having a light receiving portion is provided and a second surface to be a light receiving surface for the light receiving portion, a wiring layer provided on the active layer, an insulating layer provided to cover the wiring layer, and a supporting substrate joined to the semiconductor substrate via the insulating layer to face the first surface of the semiconductor substrate. A joined body of the semiconductor substrate and the supporting substrate includes an intercalated portion provided between its outer peripheral surface and the active surface. The intercalated portion is provided to penetrate the semiconductor substrate and the insulating layer from the second surface of the semiconductor substrate and to reach inside the supporting substrate.

    摘要翻译: 根据实施例,提供了一种半导体器件,其包括具有第一表面的半导体衬底,在该第一表面上设置有具有光接收部分的有源层和作为光接收部分的光接收表面的第二表面,布线层 设置在有源层上,设置为覆盖布线层的绝缘层,以及经由绝缘层与半导体基板接合以与半导体基板的第一表面相对的支撑基板。 半导体衬底和支撑衬底的接合体包括设置在其外周表面和活性表面之间的插入部分。 插入部分被设置为从半导体衬底的第二表面穿透半导体衬底和绝缘层并到达支撑衬底内部。

    SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
    67.
    发明申请
    SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME 有权
    半导体器件及其制造方法

    公开(公告)号:US20110073974A1

    公开(公告)日:2011-03-31

    申请号:US12880838

    申请日:2010-09-13

    IPC分类号: H01L31/0232 H01L31/18

    摘要: In one embodiment, a method for manufacturing a semiconductor device includes following steps. An aperture is formed in an interlayer insulating film formed on a semiconductor wafer apart from an integrated circuit portion by etching process. The interlayer insulating film has a dielectric constant smaller than a silicon oxide film (SiO2), and the width of the aperture is larger than a dicing region. A resin layer is embedded in the aperture. An adhesive layer is formed on the interlayer insulating film and the resin layer. The semiconductor wafer is attached to a glass substrate using the adhesive layer by Face Down method. The semiconductor wafer, the resin layer, and the adhesive layer on a dicing region are cut by blade dicing. The semiconductor wafer and the glass substrate adhered to the semiconductor wafer are cut into pieces by the blade dicing of the glass substrate under the dicing region.

    摘要翻译: 在一个实施例中,制造半导体器件的方法包括以下步骤。 在通过蚀刻工艺与集成电路部分隔开的半导体晶片上形成的层间绝缘膜中形成开口。 层间绝缘膜的介电常数小于氧化硅膜(SiO 2),并且孔径的宽度大于切割区域。 树脂层嵌入孔中。 在层间绝缘膜和树脂层上形成粘接层。 半导体晶片通过Face Down方法使用粘合剂层附着到玻璃基板上。 通过刀片切割切割切割区域上的半导体晶片,树脂层和粘合剂层。 通过在切割区域下方的玻璃基板的切片将切割半导体晶片和粘附到半导体晶片的玻璃基板切割成片。