公开(公告)号：US20130001443A1

公开(公告)日：2013-01-03

申请号：US13634071

申请日：2011-03-11

Applicant: Yong Woon Park ,  In Soo Ko ,  Sung Ju Park ,  Yong Jeong Park ,  Seung Hwan Kim ,  Ju Ho Hong ,  Sung Ik Moon

Inventor： Yong Woon Park ,  In Soo Ko ,  Sung Ju Park ,  Yong Jeong Park ,  Seung Hwan Kim ,  Ju Ho Hong ,  Sung Ik Moon

IPC: H01J9/26 ,  G21K5/00

CPC classification number: H01J37/06 ,  H01J3/024 ,  H01J3/027 ,  H01J37/075 ,  H01J2237/0473 ,  H01J2237/061 ,  H01J2237/166 ,  Y10T29/49004

Abstract: The present invention relates to an apparatus for generating an electron beam, comprising: a cathode; a housing which has an opening formed at one side thereof such that the cathode is coupled to the opening, and which has a resonant cavity formed therein; and a gasket interposed between the cathode and the housing such that the gasket is compressed in accordance with the coupling strength between the cathode and the housing so as to shut off the resonant cavity from the outside.

Abstract translation: 本发明涉及一种用于产生电子束的装置，包括：阴极; 壳体，其一侧形成有开口，所述开口与所述开口相连并且在其中形成有谐振腔; 以及插入在阴极和壳体之间的衬垫，使得衬垫根据阴极和壳体之间的耦合强度被压缩，以便将谐振腔从外部截止。

公开(公告)号：US08272346B2

公开(公告)日：2012-09-25

申请号：US12421845

申请日：2009-04-10

Applicant: Gregory R. Bettencourt ,  Gautam Bhattacharyya ,  Simon Gosselin Eng ,  Sandy Chao

Inventor： Gregory R. Bettencourt ,  Gautam Bhattacharyya ,  Simon Gosselin Eng ,  Sandy Chao

IPC: C23C16/50 ,  C23C16/503 ,  C23C16/509 ,  C23F1/00 ,  H01L21/306 ,  C23C16/06 ,  C23C16/22

CPC classification number: H01L21/67069 ,  H01J37/16 ,  H01J37/3244 ,  H01J37/32541 ,  H01J37/32605 ,  H01J2237/166

Abstract: An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing. The assembly includes an upper showerhead electrode which is mechanically attached to a backing plate by a series of spaced apart cam locks. A thermally and electrically conductive gasket with projections thereon is compressed between the showerhead electrode and the backing plate at a location three to four inches from the center of the showerhead electrode. A guard ring surrounds the backing plate and is movable to positions at which openings in the guard ring align with openings in the backing plate so that the cam locks can be rotated with a tool to release locking pins extending from the upper face of the electrode.

Abstract translation: 用于等离子体反应室的电极组件，用于半导体衬底处理。 该组件包括上部喷头电极，其通过一系列间隔开的凸轮锁定机械地附接到背板。 在其上具有突起的导电和导电垫片在喷头电极和背板之间在距离喷头电极的中心三至四英寸的位置处被压缩。 保护环围绕背板并且可移动到保护环中的开口与背板中的开口对准的位置，使得凸轮锁可以用工具旋转以释放从电极的上表面延伸的锁定销。

公开(公告)号：US20100237231A1

公开(公告)日：2010-09-23

申请号：US12661480

申请日：2010-03-18

Applicant: Jiong Chen

Inventor： Jiong Chen

IPC: H01J37/317 ,  H01J49/26 ,  H01J37/147

CPC classification number: H01J37/3171 ,  H01J37/05 ,  H01J37/1475 ,  H01J2237/153 ,  H01J2237/166 ,  H01J2237/24528 ,  H01J2237/24542 ,  H01J2237/30433 ,  H01J2237/30483

Abstract: An ion implantation apparatus with multiple operating modes is disclosed. The ion implantation apparatus has an ion source and an ion extraction means for forming a converging beam on AMU-non-dispersive plane therefrom. The ion implantation apparatus includes magnetic scanner prior to a magnetic analyzer for scanning the beam on the non-dispersive plane, the magnetic analyzer for selecting ions with specific mass-to-charge ratio to pass through a mass slit to project onto a substrate. A rectangular quadruple magnet is provided to collimate the scanned ion beam and fine corrections of the beam incident angles onto a target. A deceleration or acceleration system incorporating energy filtering is at downstream of the beam collimator. A two-dimensional mechanical scanning system for scanning the target is disclosed, in which a beam diagnostic means is build in.

Abstract translation: 公开了一种具有多种工作模式的离子注入装置。 离子注入装置具有离子源和用于在其AMU非分散平面上形成会聚束的离子提取装置。 离子注入装置包括在用于扫描非分散平面上的束的磁分析仪之前的磁扫描器，用于选择具有特定质荷比的离子的磁分析器通过质量狭缝以投射到基底上。 提供矩形四极磁体以准直扫描的离子束并将光束入射角精细校正到目标上。 结合能量过滤的减速或加速系统位于射束准直仪的下游。 公开了一种用于扫描目标的二维机械扫描系统，其中构建了光束诊断装置。

公开(公告)号：US20090090883A1

公开(公告)日：2009-04-09

申请号：US12333043

申请日：2008-12-11

Applicant: Ke Ling Lee ,  Shinichi Kurita ,  Emanuel Beer

Inventor： Ke Ling Lee ,  Shinichi Kurita ,  Emanuel Beer

IPC: F16K25/00

CPC classification number: F16K3/0227 ,  F16K51/02 ,  H01J37/32844 ,  H01J2237/166 ,  H01L21/67126 ,  Y02C20/30 ,  Y02P70/605 ,  Y10S277/919 ,  Y10S277/92 ,  Y10T137/8242

Abstract: Embodiments described herein provide a method and apparatus for grounding a chamber isolation valve. In one embodiment, a grounded chamber isolation valve for a plasma processing system is described. The chamber isolation valve includes a door and a bracing member movably attached to and opposing the door, and at least one electrically conductive member in electrical communication with the door, the at least one electrically conductive member comprising one or more reaction bumpers disposed on the bracing member that are adapted to contact at least one grounded component of the plasma processing system when the door is in the closed position.

Abstract translation: 本文描述的实施例提供了用于使腔室隔离阀接地的方法和装置。 在一个实施例中，描述了用于等离子体处理系统的接地室隔离阀。 室隔离阀包括门和可移动地附接到门并与其相对的支撑构件，以及至少一个与门电连通的导电构件，所述至少一个导电构件包括设置在支撑上的一个或多个反应缓冲器 当门处于关闭位置时，适于接触等离子体处理系统的至少一个接地部件的构件。

公开(公告)号：US07464941B2

公开(公告)日：2008-12-16

申请号：US11286410

申请日：2005-11-25

Applicant: Akio Hashimoto

Inventor： Akio Hashimoto

IPC: F16J15/00

CPC classification number: H01J37/32431 ,  F16J15/006 ,  F16J15/3212 ,  F16J15/3236 ,  H01J2237/166 ,  H01L21/67126 ,  Y10S277/913 ,  Y10S277/918 ,  Y10S277/927

Abstract: A sealing mechanism comprises a support member forming part of the semiconductor producing apparatus which has a vacuum chamber, a rotation shaft rotatably received in the support member, and at least three seal rings axially spaced apart from each other between the support member and the rotation shaft to form a first fluid chamber close to the atmosphere and a second fluid chamber close to the vacuum chamber. The first fluid chamber is vacuumized to have a first pressure, and the second fluid chamber is also vacuumized to have a second pressure which is lower than the first pressure. The first and second fluid chambers work together to enhance the sealing performance of the sealing mechanism.

Abstract translation: 密封机构包括形成半导体制造装置的一部分的支撑构件，其具有真空室，可旋转地容纳在支撑构件中的旋转轴以及在支撑构件和旋转轴之间彼此轴向间隔开的至少三个密封环 以形成靠近大气的第一流体室和靠近真空室的第二流体室。 第一流体室被抽真空以具有第一压力，并且第二流体室也被抽真空以具有低于第一压力的第二压力。 第一和第二流体室一起工作以增强密封机构的密封性能。

公开(公告)号：US07394076B2

公开(公告)日：2008-07-01

申请号：US11206296

申请日：2005-08-18

Applicant: Andrew J. Devitt

Inventor： Andrew J. Devitt

IPC: G01F23/00

CPC classification number: H01L21/67784 ,  B05D3/0493 ,  B25B11/005 ,  F16C29/025 ,  F16C32/0618 ,  F16C33/748 ,  F16C2300/62 ,  F16J15/40 ,  F16J15/443 ,  G03F7/70716 ,  G03F7/70816 ,  G03F7/70841 ,  H01J37/20 ,  H01J2237/166 ,  H01J2237/2006 ,  H01J2237/202 ,  H01J2237/28 ,  H01J2237/31701 ,  H01J2237/3175 ,  H01L21/67126 ,  H01L21/68 ,  H01L21/68714

Abstract: A stage for processing a substrate, especially useful for vacuum applications, has a recess just large enough to hold a substantially flat substrate and a chuck or holder but not much more. The perimeter of the recessed side has an air bearing surface separated from the recess by differentially pumped groves and seal lands. The air bearing lands are urged against a reference plate guide surface and the seal lands being substantially coplanar create a resistance to flow between the groves and recess, on the other side of the base reference plate mounts the radiation source. The VCS may operate in a vacuum environment itself, or in another preferred embodiment, it provides the possibility for multiple stages moving between process or inspection steps within the same tool or process sequence.

Abstract translation: 用于处理衬底的阶段，特别适用于真空应用，具有刚好足够大以容纳基本上平坦的衬底和卡盘或保持器而不是更多的凹部。 凹入侧的周边具有空隙部分，该空气轴承表面通过差分泵送的格栅和密封接头与凹部分离。 空气轴承平台被推靠在参考板引导表面上，并且密封平台基本上共面地在基部参考板的另一侧上安装辐射源而产生在凹槽和凹槽之间的流动阻力。 VCS可以在真空环境中操作，或者在另一个优选实施例中，其提供在相同工具或处理顺序内的过程或检查步骤之间的多个阶段移动的可能性。

公开(公告)号：US20080132089A1

公开(公告)日：2008-06-05

申请号：US12028666

申请日：2008-02-08

Applicant: Tony P. Chiang ,  David E. Lazovsky ,  Thomas R. Boussie ,  Alexander Gorer

Inventor： Tony P. Chiang ,  David E. Lazovsky ,  Thomas R. Boussie ,  Alexander Gorer

IPC: H01L21/00

CPC classification number: H01L21/67011 ,  C23C14/54 ,  C23C16/4412 ,  C23C16/45544 ,  C23C16/4557 ,  C23C16/45578 ,  C23C16/4583 ,  C23C16/46 ,  C23C16/52 ,  H01J37/32449 ,  H01J37/32513 ,  H01J37/32724 ,  H01J2237/166 ,  H01J2237/20228 ,  H01J2237/20235 ,  H01L21/6715 ,  H01L21/76849 ,  H01L22/20 ,  H01L2924/0002 ,  Y10S438/907 ,  Y10S438/913 ,  Y10T137/8593 ,  H01L2924/00

Abstract: The present invention provides methods and systems for discretized, combinatorial processing of regions of a substrate such as for the discovery, implementation, optimization, and qualification of new materials, processes, and process sequence integration schemes used in integrated circuit fabrication. A substrate having an array of differentially processed regions thereon is processed by delivering materials to or modifying regions of the substrate.

公开(公告)号：US20070001129A1

公开(公告)日：2007-01-04

申请号：US11173494

申请日：2005-07-01

Applicant: Joseph Ferrara

Inventor： Joseph Ferrara

IPC: H01J37/20

CPC classification number: H01J37/20 ,  H01J37/3171 ,  H01J2237/166 ,  H01J2237/20228 ,  H01L21/26506 ,  H01L21/68764

Abstract: An ion beam implanter includes an ion beam source for generating an ion beam moving along a beam line and an implantation chamber wherein a workpiece is positioned to intersect the ion beam for ion implantation of an implantation surface of the workpiece by the ion beam. The implanter further includes a workpiece support structure coupled to the implantation chamber and supporting the workpiece within an interior region of the implantation chamber, the workpiece support structure. The workpiece support structure includes a rotation member coupled to the implantation chamber for changing an implantation angle of the workpiece with respect to a portion of the ion beam within the implantation chamber. The workpiece support structure also includes a translation member movably coupled to the rotation member and supporting the workpiece for movement along a path of travel wherein at least some components of the translation member components are disposed within a reduced pressure translation member chamber. The translation member chamber is isolated from the implantation chamber interior region by a dynamic seal. A workpiece holder support arm of the translation member extends through the dynamic seal and into the implantation chamber.

Abstract translation: 离子束注入机包括用于产生沿着束线移动的离子束的离子束源和注入室，其中工件被定位成与离子束相交，用于通过离子束离子注入工件的注入表面。 所述注入机还包括耦合到所述注入室的工件支撑结构，并且将所述工件支撑在所述注入室的内部区域内，所述工件支撑结构。 工件支撑结构包括联接到注入室的旋转构件，用于相对于植入室内的离子束的一部分改变工件的植入角度。 工件支撑结构还包括可移动地联接到旋转构件并且支撑工件以沿着行进路径移动的平移构件，其中平移构件部件的至少一些部件设置在减压平移构件室内。 翻译构件室通过动态密封与植入室内部区域隔离。 平移构件的工件保持器支撑臂延伸穿过动态密封件并进入植入室。

公开(公告)号：US20060284090A1

公开(公告)日：2006-12-21

申请号：US11499776

申请日：2006-08-07

Applicant: Hans Koops ,  Peter Hoffrogge

Inventor： Hans Koops ,  Peter Hoffrogge

IPC: G21K7/00

CPC classification number: H01J37/3056 ,  H01J2237/006 ,  H01J2237/162 ,  H01J2237/166 ,  H01J2237/31732 ,  H01J2237/31744

Abstract: A material processing system for processing a work piece is provided. The material processing is effected by supplying a reactive gas and energetic radiation for activation of the reactive gas to a surrounding of a location of the work piece to be processed. The radiation is preferably provided by an electron microscope. An objective lens of the electron microscope is preferably disposed between a detector of the electron microscope and the work piece. A gas supply arrangement of the material processing system comprises a valve disposed spaced apart from the processing location, a gas volume between the valve and a location of emergence of the reaction gas being small. The gas supply arrangement further comprises a temperature-adjusted, especially cooled reservoir for accommodating a starting material for the reactive gas.

公开(公告)号：US20060006342A1

公开(公告)日：2006-01-12

申请号：US11155633

申请日：2005-06-20

Applicant: Masaki Hosoda ,  Masato Muraki ,  Yasuhiro Someda ,  Mahito Negishi ,  Koichi Wakizaka ,  Masakazu Sugaya

Inventor： Masaki Hosoda ,  Masato Muraki ,  Yasuhiro Someda ,  Mahito Negishi ,  Koichi Wakizaka ,  Masakazu Sugaya

IPC: G01F23/00

CPC classification number: H01J37/3007 ,  H01J9/18 ,  H01J37/04 ,  H01J2237/1205 ,  H01J2237/151 ,  H01J2237/166 ,  H01J2237/31774 ,  Y10T403/32713

Abstract: An assembly having first and second members arranged through a sealing member sandwiched between them is disclosed. The second member has a reference portion having a reference surface. The assembly includes a pressing portion which presses the first member against the reference surface in a direction substantially parallel to a surface of the second member. The second member is fixed to the first member while the first member abuts against the reference surface and the sealing member is compressed between the first and second members.

Abstract translation: 公开了一种具有通过夹在它们之间的密封构件布置的第一和第二构件的组件。 第二构件具有具有参考表面的参考部分。 该组件包括按照大致平行于第二构件的表面的方向将第一构件压靠参考表面的按压部分。 第二构件固定在第一构件上，而第一构件抵靠参考面，并且密封构件在第一构件和第二构件之间被压缩。