公开(公告)号：US09685298B1

公开(公告)日：2017-06-20

申请号：US15012308

申请日：2016-02-01

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Alexandre Likhanskii ,  Jay T. Scheuer ,  William Davis Lee

IPC: H01J37/08

CPC classification number: H01J37/08 ,  H01J37/3171 ,  H01J2237/0213 ,  H01J2237/022 ,  H01J2237/151

Abstract: An apparatus may include an ion source generating an ion beam, the ion source coupled to a first voltage. The apparatus may further include a stopping element disposed between the ion source and a substrate position; a stopping voltage supply coupled to the stopping element; and a control component to direct the stopping voltage supply to apply a stopping voltage to the stopping element, the stopping voltage being equal to or more positive than the first voltage when the ion beam comprises positive ions, and being equal to or more negative than the first voltage when the ion beam comprises negative ions, wherein at least a portion of the ion beam is deflected backwardly from an initial trajectory as deflected ions when the stopping voltage is applied to the stopping element.

公开(公告)号：US09659736B2

公开(公告)日：2017-05-23

申请号：US14484914

申请日：2014-09-12

Applicant: Alpha Source LLC

Inventor： Glenn B. Rosenthal

IPC: H01J27/18 ,  H01J37/08 ,  H05H1/02 ,  H05H1/14 ,  G21G1/10

CPC classification number: H01J27/18 ,  G21G1/10 ,  H01J37/08 ,  H05H1/02 ,  H05H1/14

Abstract: An isotope generation apparatus is disclosed including: an ion beam source of any of the types described herein; an extractor for extracting the ion beam from the confinement region, where the beam includes a portion of multiply ionized ions in a selected final ionization state; a target including a target material; and an accelerator for accelerating the ion beam and directing the ion beam to the target. The ion beam directed to the target transmutes at least a portion of the target material to a radio-isotope in response to a nuclear reaction between ions in the selected final ion state and atoms of the target material.

公开(公告)号：US09640361B2

公开(公告)日：2017-05-02

申请号：US14830106

申请日：2015-08-19

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Anto Yasaka ,  Yasuhiko Sugiyama ,  Hiroshi Oba

IPC: G21K5/04 ,  H01J27/26 ,  H01J37/08 ,  H01J1/15 ,  H01J27/02 ,  H01J1/18 ,  H01J3/04

CPC classification number: H01J27/26 ,  H01J1/15 ,  H01J1/18 ,  H01J3/04 ,  H01J27/024 ,  H01J37/08 ,  H01J2237/002 ,  H01J2237/06316

Abstract: A focused ion beam system includes a gas ion source and an emitter structure. The emitter structure includes a pair of conductive pins fixed to a base member, a filament connected between the pair of conductive pins, and an emitter which has a tip end with one atom or three atoms and which is connected to the filament. A supporting member is fixed to the base material, and the emitter is connected to the supporting member.

公开(公告)号：US20170110284A1

公开(公告)日：2017-04-20

申请号：US15272574

申请日：2016-09-22

Applicant: Massachusetts Institute of Technology

Inventor： Paulo C. Lozano ,  Steven Mark Arestie

IPC: H01J37/08

CPC classification number: H01J37/08 ,  B01L3/502715 ,  C25F3/14 ,  H01J1/05 ,  H01J9/02 ,  H01J49/0445 ,  H01J2237/0802 ,  H01J2237/317

Abstract: An ionic liquid ion source can include a microfabricated body including a base and a tip. The body can be formed of a porous material compatible with at least one of an ionic liquid or room-temperature molten salt. The body can have a pore size gradient that decreases from the base of the body to the tip of the body, such that the at least one of an ionic liquid or room-temperature molten salt is capable of being transported through capillarity from the base to the tip.

公开(公告)号：US09627174B2

公开(公告)日：2017-04-18

申请号：US14973424

申请日：2015-12-17

Applicant: FEI Company

Inventor： Gregory A. Schwind ,  N. William Parker

IPC: H01J37/08 ,  H01J37/21 ,  H01J27/20

CPC classification number: H01J37/21 ,  H01J27/205 ,  H01J37/08 ,  H01J2237/006 ,  H01J2237/082 ,  H01J2237/0827 ,  H01J2237/31749

Abstract: A high brightness ion source with a gas chamber includes multiple channels, wherein the multiple channels each have a different gas. An electron beam is passed through one of the channels to provide ions of a certain species for processing a sample. The ion species can be rapidly changed by directing the electrons into another channel with a different gas species and processing a sample with ions of a second species. Deflection plates are used to align the electron beam into the gas chamber, thereby allowing the gas species in the focused ion beam to be switched quickly.

公开(公告)号：US09620327B2

公开(公告)日：2017-04-11

申请号：US14978776

申请日：2015-12-22

Applicant: Axcelis Technologies, Inc.

Inventor： Edward C. Eisner

IPC: H01J37/00 ,  H01J37/141 ,  H01J37/08 ,  H01J37/317 ,  H01J37/147

CPC classification number: H01J37/141 ,  H01J37/05 ,  H01J37/08 ,  H01J37/1472 ,  H01J37/1475 ,  H01J37/3171 ,  H01J2237/04922 ,  H01J2237/1415 ,  H01J2237/152

Abstract: A combined scanning and focusing magnet for an ion implantation system is provided. The combined scanning and focusing magnet has a yoke having a high magnetic permeability. The yoke defines a hole configured to pass an ion beam therethrough. One or more scanner coils operably are coupled to the yoke and configured to generate a time-varying predominantly dipole magnetic field when electrically coupled to a power supply. One or more focusing coils are operably coupled to the yoke and configured to generate a predominantly multipole magnetic field, wherein the predominantly multipole magnetic field is one of static or time-varying.

公开(公告)号：US20170098525A1

公开(公告)日：2017-04-06

申请号：US15380649

申请日：2016-12-15

Applicant: Frederick A. Flitsch

Inventor： Frederick A. Flitsch

IPC: H01J37/244 ,  H01J37/317

CPC classification number: H01J37/244 ,  B82B3/00 ,  G03F9/00 ,  H01J9/022 ,  H01J37/06 ,  H01J37/08 ,  H01J37/20 ,  H01J37/248 ,  H01J37/317 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/20 ,  H01J2237/303 ,  H01J2237/304 ,  H01J2237/3174 ,  H01J2237/31759 ,  H01J2237/31798 ,  Y10T29/49004

Abstract: The present invention provides apparatus for an imaging system comprising a multitude of imaging elements upon a substrate. In some embodiments the substrate may be approximately round with a radius of approximately one inch. Various methods relating to using and producing an imaging system are discussed.

公开(公告)号：US20170076901A1

公开(公告)日：2017-03-16

申请号：US15361911

申请日：2016-11-28

Applicant: Gregory Hirsch

Inventor： Gregory Hirsch

IPC: H01J9/02 ,  C23C14/24 ,  C23C14/16 ,  C25D3/50 ,  B21C1/16 ,  C25D17/00 ,  H01J37/073 ,  H01J37/08 ,  H05G2/00 ,  C23C14/58 ,  C25D5/50

CPC classification number: H01J9/025 ,  B21C1/16 ,  C23C14/16 ,  C23C14/24 ,  C23C14/5806 ,  C25D3/50 ,  C25D5/50 ,  C25D17/00 ,  H01J1/3044 ,  H01J37/073 ,  H01J37/08 ,  H01J37/3178 ,  H01J2201/30411 ,  H01J2209/0226 ,  H01J2237/0802 ,  H01J2237/0805 ,  H05G2/005

Abstract: Optimization techniques are disclosed for producing sharp and stable tips/nanotips relying on liquid Taylor cones created from electrically conductive materials with high melting points. A wire substrate of such a material with a preform end in the shape of a regular or concave cone, is first melted with a focused laser beam. Under the influence of a high positive potential, a Taylor cone in a liquid/molten state is formed at that end. The cone is then quenched upon cessation of the laser power, thus freezing the Taylor cone. The tip of the frozen Taylor cone is reheated by the laser to allow its precise localized melting and shaping. Tips thus obtained yield desirable end-forms suitable as electron field emission sources for a variety of applications. In-situ regeneration of the tip is readily accomplished. These tips can also be employed as regenerable bright ion sources using field ionization/desorption of introduced chemical species.

Abstract translation: 公开了优化技术，用于产生依赖于由具有高熔点的导电材料产生的液体泰勒锥的尖锐和稳定的尖端/纳米片。 首先用聚焦激光束熔化这种具有预制件端部为规则的或凹形的形状的材料的线基材。 在高正电位的影响下，在此端形成液态/熔融状态的泰勒锥。 然后在停止激光功率时，锥体被淬火，从而冻结泰勒锥。 冷冻泰勒锥的尖端被激光器重新加热，以允许其精确的局部熔化和成型。 如此获得的提示产生适合作为各种应用的电子场发射源的期望的终端形式。 尖端的原位再生容易实现。 这些尖端也可以用作引入化学物质的场电离/解吸的可再生的明亮离子源。

公开(公告)号：US20170069456A1

公开(公告)日：2017-03-09

申请号：US15256967

申请日：2016-09-06

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Yasuhiko SUGIYAMA ,  Hiroshi OBA

IPC: H01J37/08 ,  H01J37/10

CPC classification number: H01J37/08 ,  H01J37/10 ,  H01J37/12 ,  H01J37/18 ,  H01J2237/0805 ,  H01J2237/083 ,  H01J2237/103

Abstract: A focused ion beam apparatus includes an ion source that emits an ion beam, an extraction electrode that extracts ions from a tip end of an emitter of the ion source, and a first lens electrode that configures a condenser lens by a potential difference with the extraction electrode, the condenser lens focusing the ions extracted by the extraction electrode, in which a strong lens action is generated between the extraction electrode and the first lens electrode so as to focus all ions extracted from the ion source to pass through a hole of the condenser lens including the first lens electrode.

Abstract translation: 聚焦离子束装置包括发射离子束的离子源，从离子源的发射极的前端提取离子的提取电极和通过提取电位差构成聚光透镜的第一透镜电极 电极，所述聚光透镜聚焦由所述提取电极提取的离子，其中在所述提取电极和所述第一透镜电极之间产生强透镜作用，以便将从所述离子源提取的所有离子聚焦通过所述冷凝器的孔 透镜包括第一透镜电极。

公开(公告)号：US09570271B2

公开(公告)日：2017-02-14

申请号：US14635413

申请日：2015-03-02

Applicant: Ashwini K. Sinha ,  Stanley M. Smith ,  Douglas C. Heiderman ,  Serge M. Campeau

Inventor： Ashwini K. Sinha ,  Stanley M. Smith ,  Douglas C. Heiderman ,  Serge M. Campeau

IPC: H01J37/317 ,  H01J37/08

CPC classification number: H01J37/3171 ,  C01B3/00 ,  H01J27/22 ,  H01J37/08 ,  H01J37/32458 ,  H01J37/32807 ,  H01J2237/006 ,  H01J2237/0473 ,  H01J2237/08 ,  H01J2237/0815 ,  H01J2237/31701 ,  H01J2237/3365 ,  Y02E60/324

Abstract: A novel composition, system and method thereof for improving beam current during boron ion implantation are provided. The boron ion implant process involves utilizing B2H6, BF3 and H2 at specific ranges of concentrations. The B2H6 is selected to have an ionization cross-section higher than that of the BF3 at an operating arc voltage of an ion source utilized during generation and implantation of active hydrogen ions species. The hydrogen allows higher levels of B2H6 to be introduced into the BF3 without reduction in F ion scavenging. The active boron ions produce an improved beam current characterized by maintaining or increasing the beam current level without incurring degradation of the ion source when compared to a beam current generated from conventional boron precursor materials.

Abstract translation: 提供了一种用于在硼离子注入期间改善束电流的新型组成，系统及其方法。 硼离子注入工艺涉及使用特定浓度范围的B2H6，BF3和H2。 在生成和注入活性氢离子物质期间使用的离子源的工作电弧电压下，选择B2H6具有高于BF 3的电离横截面。 氢气允许更高水平的B 2 H 6被引入BF 3中而不减少F离子清除。 当与常规硼前体材料产生的束电流相比时，活性硼离子产生改进的束电流，其特征在于保持或增加束电流水平而不引起离子源的劣化。