摘要:
An assembly with modules (110, 1310) containing integrated circuits and attached to a wiring substrate (120) is reinforced by one or more reinforcement frames (410) attached to the wiring substrate. The modules are located in openings (e.g. cavities and/or through-holes 414) in the reinforcement frame. Other features are also provided.
摘要:
A metal inter-diffusion bonding method for forming hermetically sealed wafer-level packaging for MEMS devices, comprising the steps of: providing a stack of a first metal on a surface of both a first wafer and a second wafer, said first metal being susceptible to oxidation in air; providing a layer of a second metal, having a melting point lower than that of the first metal, on an upper surface of each stack of first metal, the layer of second metal being sufficiently thick to inhibit oxidation of the upper surface of the first metal; bringing the layer of second metal on the first wafer into contact with the layer of second metal on the second wafer to form a bond interface; and applying a bonding pressure to the first and second wafers at a bonding temperature lower than the melting point of the second metal to initiate a bond, the bonding pressure being sufficient to deform the layers of second metal at the bond interface.
摘要:
Die Erfindung betrifft einen Verbund (5), umfassend ein erstes Halbleitersubstrat (1), das mit Lotmaterial (3) an mindestens einem zweiten Halbleitersubstrat (4) festgelegt ist, wobei zwischen dem Lotmaterial (3) und dem zweiten Halbleitersubstrat (4) und/oder mindestens einer gegebenenfalls auf dem Halbleitersubstrat (4) vorgesehenen Schicht ein Eutektikum (6) ausgebildet ist. Erfindungsgemäß ist vorgesehen, dass das Eutektikum (6) zwischen dem Lotmaterial (3) und einer Mikrostruktur (8) ausgebildet ist, die im Kontaktbereich zu dem Lotmaterial (3) auf dem zweiten Halbleitersubstrat (4) und/oder der Schicht ausgebildet ist. Ferner betrifft die Erfindung ein Herstellungsverfahren.
摘要:
An assembly with modules (110, 1310) containing integrated circuits and attached to a wiring substrate (120) is reinforced by one or more reinforcement frames (410) attached to the wiring substrate. The modules are located in openings (e.g. cavities and/or through-holes 414) in the reinforcement frame. Other features are also provided.
摘要:
A method that in one embodiment is useful in bonding a first substrate (103) to a second substrate (303) includes forming a layer including metal over the first substrate. The layer including metal in one embodiment surrounds a semiconductor device, which can be a micro electromechanical system (MEMS) device. On the second substrate (303) is formed a first layer comprising silicon (401). A second layer (403) comprising germanium and silicon is formed on the first layer. A third layer (405) comprising germanium is formed on the second layer. The third layer is brought into contact with the layer including metal. Heat (and pressure in some embodiments) is applied to the third layer and the layer including metal to form a mechanical bond material between the first substrate and the second substrate in which the mechanical bond material is electrically conductive. In the case of the mechanical bond surrounding a semiconductor device such as a MEMS, the mechanical bond can be particularly advantageous as a hermetic seal for protecting the MEMS.