Abstract:
The present invention relates to an electrical assembly which has a conformal coating, wherein said conformal coating is obtainable by a method which comprises: (a) plasma polymerization of a compound of formula (I) and a fluorohydrocarbon, wherein the molar ratio of the compound of formula (I) to the fluorohydrocarbon is from 5:95 to 50:50, and deposition of the resulting polymer onto at least one surface of the electrical assembly: wherein: R 1 represents C 1 -C 3 alkyl or C 2 -C 3 alkenyl; R 2 represents hydrogen, C 1 -C 3 alkyl or C 2 -C 3 alkenyl; R 3 represents hydrogen, C 1 -C 3 alkyl or C 2 -C 3 alkenyl; R 4 represents hydrogen, C 1 -C 3 alkyl or C 2 -C 3 alkenyl; R 5 represents hydrogen, C 1 -C 3 alkyl or C 2 -C 3 alkenyl; and R 6 represents hydrogen, C 1 -C 3 alkyl or C 2 -C 3 alkenyl, and (b) plasma polymerization of a compound of formula (I) and deposition of the resulting polymer onto the polymer formed in step (a).
Abstract:
A method for bonding a hermetic module to an electrode array including the steps of: providing the electrode array having a flexible substrate with a top surface and a bottom surface and including a plurality of pads in the top surface of the substrate; attaching the hermetic module to the bottom surface of the electrode array, the hermetic module having a plurality of bond-pads wherein each bond-pad is adjacent to the bottom surface of the electrode array and aligns with a respective pad; drill holes through each pad to the corresponding bond-pad; filling each hole with biocompatible conductive ink; forming a rivet on the biocompatible conductive ink over each pad; and overmolding the electrode array with a moisture barrier material.
Abstract:
Un substrat muni d'un fil (3) électriquement conducteur enrobé par un matériau électriquement isolant est imprégné par un matériau polymérisable (4). Une zone d'accueil (5) pour une puce (2) est formée sur une surface du substrat (1), par rigidification du matériau polymérisable (4) dans une première zone du substrat. La puce (2) est disposée dans la zone d'accueil (5) et une zone (8) de connexion électrique de la puce (2) est connectée électriquement au fil (3) électriquement conducteur du substrat (1).
Abstract:
It is an object of the present invention to provide a wireless chip of which mechanical strength can be increased. Moreover, it is an object of the present invention to provide a wireless chip which can prevent an electric wave from being blocked. The invention is a wireless chip in which a layer having a thin film transistor is fixed to an antenna by an anisotropic conductive adhesive or a conductive layer, and the thin film transistor is connected to the antenna. The antenna has a dielectric layer, a first conductive layer, and a second conductive layer. The dielectric layer is sandwiched between the first conductive layer and the second conductive layer. The first conductive layer serves as a radiating electrode and the second conductive layer serves as a ground contact body.
Abstract:
A semiconductor device includes: opposed first and second metal plates; a plurality of semiconductor elements each interposed between the first metal plate and the second metal plate; a metal block interposed between the first metal plate and each of the semiconductor elements; a solder member interposed between the first metal plate and the metal block and connecting the first metal plate to the metal block; and a resin molding sealing the semiconductor elements and the metal block. A face of the first metal plate, which is on an opposite side of a face of the first metal plate to which the metal block is connected via the solder member, is exposed from the resin molding. The first metal plate has a groove formed along an outer periphery of a region in which the solder member is provided, the groove collectively surrounding the solder member.
Abstract:
Die Erfindung betrifft ein Verfahren zum Herstellen eines hermetisch abgeschlossenen Gehäuses (22), in dem ein Unterdruck herrscht, aus einem ersten Bauteil (20) mit einer ersten Kontaktfläche (26), die mit einer Schicht aus einem ersten Bondelement (28) beschichtet ist, und wenigstens einem zweiten Bauteil (24) mit einer zweiten Kontaktfläche (30), die mit einer Schicht aus einem zweiten Bondelement (32) beschichtet ist, das eine höhere Solidustemperatur als das erste Bondelement (28) aufweist, wobei das Verfahren folgende Schritte aufweist: a) Positionieren des ersten Bauteils (20) und des zweiten Bauteils (24) in einem Behälter, sodass die erste Kontaktfläche (26) des ersten Bauteiles (20) an der zweiten Kontaktfläche (30) des zweiten Bauteiles (24) zumindest teilweise anliegt, b) Erzeugen eines Unterdrucks in dem Behälter, c) Erhöhen einer Temperatur (T) in dem Behälter auf ein Verbindungstemperaturwert (12), wobei das erste Bondelement (28) das zweite Bondelement (32) und der Verbindungstemperaturwert (12) derart ausgewählt sind, dass es zu einer Mischung (38) des ersten Bondelements (28) und des zweiten Bondelements (32) kommt, die eine Liquidustemperatur aufweist, die über dem Verbindungstemperaturwert (12) liegt.
Abstract:
A metal inter-diffusion bonding method for forming hermetically sealed wafer-level packaging for MEMS devices, comprising the steps of: providing a stack of a first metal on a surface of both a first wafer and a second wafer, said first metal being susceptible to oxidation in air; providing a layer of a second metal, having a melting point lower than that of the first metal, on an upper surface of each stack of first metal, the layer of second metal being sufficiently thick to inhibit oxidation of the upper surface of the first metal; bringing the layer of second metal on the first wafer into contact with the layer of second metal on the second wafer to form a bond interface; and applying a bonding pressure to the first and second wafers at a bonding temperature lower than the melting point of the second metal to initiate a bond, the bonding pressure being sufficient to deform the layers of second metal at the bond interface.
Abstract:
Integrated circuits (ICs 110) are attached to a wafer (120W). A stabilization layer (404) is formed over the wafer to strengthen the structure for further processing. Unlike a conventional mold compound, the stabilization layer is separated from at least some wafer areas around the ICs by one or more gap regions (450) to reduce the thermo- mechanical stress on the wafer and hence the wafer warpage. Alternatively or in addition, the stabilization layer can be a porous material having a low horizontal elastic modulus to reduce the wafer warpage, but having a high flexural modulus to reduce warpage and otherwise strengthen the structure for further processing. Other features and advantages are also provided.